• Title/Summary/Keyword: C-H ratio

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SynGas Production from Propane using GlidArc Plasma Reforming (부채꼴방전 플라즈마 개질을 이용한 프로판으로부터의 합성가스 생산)

  • Song, Hyoung-Oon;Chun, Young-Nam
    • Journal of Korean Society of Environmental Engineers
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    • v.28 no.3
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    • pp.323-328
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    • 2006
  • The purpose of this paper was to investigate the reforming characteristics and optimum operating condition of the GlidArc-assisted $C_3H_8$ reforming reaction for the synthesis gas(SynGas) production without formation of carbon black from propane using GildArc plasma reforming. Also, in order to increase the hydrogen production and the propane conversion rate, 13 wt % nickel catalyst was filled into the catalytic reactor and parametric screening studies were conducted, in which there were the variations of vapor mole ratio$(H_2O/C_3H_8),\;CO_2$ mole ratio($CO_2/C_3H_8$), input power and injection flow rate. When the variations of vapor mole ratio, $CO_2$ mole ratio, input power and injection flow rate were 1.86, 0.48, 1.37 kW and 14 L/min, respectively, the conversion rate of the propane reached its most optimal condition, or 62.6%. Under the condition mentioned above, the dry basic concentrations of the SynGas were $H_2\;44.4%,\;CO\;18.2%,\;CH_4\;11.2%,\;C_2H_2\;2.0%,\;C_3H_6\;1.6%,\;C_2H_4\;0.6%\;and\;C_3H_4$ 0.4%. The conversion rate of carbon dioxide was 29.2% and the concentration ratio of hydrogen to carbon monoxide($H_2/CO$) in the SynGas was 2.4.

Control of Diurnal Night Temperature on Watermelon(Citrullus vulgaris S.) for Energy Saving Greenhouse (시설내 수박재배시 에너지 절약을 위한 야간온도의 조절)

  • Kwon, Sung-Whan;Chun, Hee
    • Journal of Bio-Environment Control
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    • v.4 no.2
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    • pp.131-135
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    • 1995
  • In winter, most of the energy for a greenhouse crop is supplied during the night. Since watermelon is grown under high night temperature, the experiments were set up to investigate night temperature influence on watermelon in order to obtain the best economic output. Day temperatures ranged from $25^{\circ}C$ and 3$0^{\circ}C$ ; night temperatures ranged from 2$0^{\circ}C$ to 3$0^{\circ}C$ at 5$^{\circ}C$ interval. Two cultivars of watermelon(Citrullus vulgaris S. ‘Binna’ and ‘Kamro’) treated with 30/3$0^{\circ}C$ yielded maximum leaf areas, flowers and leaf numbers. 30(14h)/25(10h)$^{\circ}C$ or 30(12h)/25(12h)$^{\circ}C$ grown plants had higher germination ratio and more dry weight and chlorophyll than those of 30/3$0^{\circ}C$ which were the highest temperature integral. Although 25/$25^{\circ}C$ and 30/2$0^{\circ}C$ regime are same average temperature, the growth of watermelons at 30/2$0^{\circ}C$ was significantly higher than 25/$25^{\circ}C$. ‘Binna’ was growing more than ‘Kamro’ at the same temperature. Leaf area ratio(LAR) was reduced with increasing DIF temperature from 30/3$0^{\circ}C$ to 30/2$0^{\circ}C$, but leaf weight ratio(LWR) was increased.

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Characteristics and oxidation behavior of the hybrid-HVOF sprayed $Cr_3C_2$-7wt%(NiCr) coatings depending on $H_2/O_2$ ratio ($H_2/O_2$ 비에 따른 Hybrid HVOF 용사된 $Cr_3C_2$-7wt%(NiCr) 용사층의 특성 및 산화거동)

  • 김병희;서동수
    • Journal of Welding and Joining
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    • v.15 no.4
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    • pp.126-135
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    • 1997
  • $H_2/O_2$ 비에 따른 Hybrid HVOF 용사된 $Cr_3C_2$-7wt%(NiCr) 용사층의 특성 및 산화거동 This study was performed to investigate the influence of fuel/oxygen ratio (F/O=3.2, 3.0, 2.8) on the characteristics and the oxidation behavior of the hybrid-HVOF sprayed $Cr_3C_2$-7wt%NiCr coatings. Decomposition and the oxidation of the $Cr_3C_2$was occured during spraying. The degree of transformation from $Cr_3C_2$to $Cr_7C_3$ was increased with decreasing the F/O ratio. The microstructural differences of the as sprayed coating with F/O ratio can not be distinguished, However, large pores were diminished and then the coatings became dense by heat treatment. Microhardness of the as-sprayed specimen which sprayed with F/O=3.0 condition was hightest ($Hv_{300}$=1140) and the hardness was increased to 1500 after heat treatment at $600^{\circ}C$ for 50hrs in air. It was supposed that hardness was increased due to the formation of $Cr_2O_3$ within $Cr_3C_2$/$Cr_7C_3$matrix and the densification of coating layer during heat treatment. Apparent activation energy for oxidation was varied from 21.2 kcal$mol^{-1}K^{-1}$ to 23.8 kcal$mol^{-1}K^{-1}$ with respect to the F/O ratio. The surface morphology was changed to porous and oxide chusters were grown after oxidation $1000^{\circ}C$ for 50 hours by the aggressive evolution of gas phase ($CrO_3$ and$CO_2$). The oxide cluster was composed of Ni and Cr.

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Charge/discharge characteristics by heat treatment condition of cathode active material LiMn$_2$O$_4$ for Li rechargeable batteries (리튬 2차 전지용 정극 활물질 LiMn$_2$O$_4$의 열처리 조건에 따른 충방전 특성)

  • 정인성;구할본
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.369-372
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    • 1996
  • We prepared LiMn$_2$O$_4$ by reacting stoichiometric mixture of LiOH.$H_2O$ and MnO$_2$ (mole ratio 1 : 1) and heating at 80$0^{\circ}C$ for 24h, 36h, 48h, 60h and 70h. We obtained through X-ray diffraction that lattice parameter varied as function of heat treatment time. heated cathode active materials at 80$0^{\circ}C$ for 36h, (111)/(311) peak ratio was 0.37. It expected good charge/discharge characteristics. When (111)/(311) peak ratio was 0.37, it will be that crystal structure is farmed very well. In the result of charge/discharge test When heated at 80$0^{\circ}C$ for 36h, charge/discharge characteristic of LiMn$_2$O$_4$is the most property. It agree with our expectation.

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The Control of SiC/C Ratio for the Synthesis of SiC/C Functionally Gradient Materials (SiC/C 경사기능재료(FGM)의 합성을 위한 SiC/C 분율 조절)

  • 김유택;최준태;최종건;오근호
    • Journal of the Korean Ceramic Society
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    • v.32 no.6
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    • pp.685-696
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    • 1995
  • The most important techniques in the synthesis of SiC/C function gradient material (FGM) are to control the SiC/C ratio and to obtain the moderate deposition rate. For these, various gas systems and flow rates were attempted and evaluated. It turned out that the CH4+SiCl4+H2 system was suitable for the deposition of SiC-rich layers, the C3H8+SiCl4+Ar system for the deposition of carbon-rich layers, and the C3H8+SiCl4+H2+Ar system was good to deposit the layers between them.

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Thermodynamic Comparison of Silicon Carbide CVD Process between CH3SiCl3-H2 and C3H8-SiCl4-H2 Systems (탄화규소 CVD 공정에서 CH3SiCl3-H2과 C3H8-SiCl4-H2계의 열역학적 비교)

  • Choi, Kyoon;Kim, Jun-Woo
    • Korean Journal of Metals and Materials
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    • v.50 no.8
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    • pp.569-573
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    • 2012
  • In order to understand the difference in SiC deposition between the $CH_3SiCl_3-H_2$ and $C_3H_8-SiCl_4-H_2$ systems, we calculate the phase stability among ${\beta}$-SiC, graphite and silicon. We constructed the phase-diagram of ${\beta}$-SiC over graphite and silicon via computational thermodynamic calculation considering pressure (P), temperature (T) and gas composition (C) as variables. Both P-T-C diagrams showed a very steep phase boundary between the SiC+C and SiC region perpendicular to the H/Si axis, and also showed an SiC+Si region with a H/Si value of up to 6700 in the $C_3H_8-SiCl_4-H_2$, and 5000 in the $CH_3SiCl_3-H_2$ system. This difference in phase boundaries is explained by the ratio of Cl to Si, which is 4 for the $C_3H_8-SiCl_4-H_2$ system and 3 for the $C_3H_8-SiCl_4-H_2$ system. Because the C/Si ratio is fixed at 1 in the $CH_3SiCl_3-H_2$ system while it can be variable in the $C_3H_8-SiCl_4-H_2$ system, the functionally graded material is applicable for better mechanical bonding during SiC coating on graphite substrate in the $C_3H_8-SiCl_4-H_2$ system.

Pseudomonas oleovorans의 유가식 배양에 의한 medium chain length Polyhydroxyalkanoates (MCL-PHA) 생산

  • Kim, Beom-Su;Im, Hui-Yeon
    • 한국생물공학회:학술대회논문집
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    • 2000.04a
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    • pp.207-210
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    • 2000
  • Pseudomonas oleovorans was cultivated to produce medium chain length polyhydroxyalkanoates (MCL-PHA) fram octanoic acid and ammonium nitrate as carbon and nitrogen source, respectively, by a pH-stat fed-batch culture technique. The octanoate concentration of the culture broth was maintained below 4 g/L by feeding the mixture of octanoic acid and ammonium nitrate when the culture pH rose above high limit. The effect of the ratio of octanoic acid to ammonium nitrate (C/N ratio) in the feed on the PHA production was examined. The final cell concentrations of 62.5, 54.7, and 9.5 g/L, PHA contents of 62.9, 75.1, and 67.6% of dry cell weight, and productivities of 1.03, 0.632, and 0.161 g/L/h were obtained when the C/N ratio in the feed were 10, 20, and 100 g octanoic acid/g ammonium nitrate, respectively.

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Effects Of Oxygen Enrichment on the Structure of CH4/CHCI3/O2N2 Premixed Flames (CH4/CHCI3/O2N2 예혼합 화염 구조에서 산소부화의 효과)

  • Lee, Ki-Yong
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.27 no.7
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    • pp.893-900
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    • 2003
  • Numerical simulations of freely propagating flames burning stoichiometric C $H_4$/CHC1$_3$/ $O_2$/$N_2$ mixtures are performed at atmospheric pressure in order to understand the effect of the $O_2$ enrichment level and the CHC1$_3$/C $H_4$ molar ratio. A chemical kinetic mechanism is developed, which involves 69 gas-phase species and 379 forward and 364 backward reactions. The calculated flame speeds are compared with the experiments for the flames established at several CHC1$_3$/C $H_4$ molar ratio (R<1), the results of which is in excellent agreement. As a results of the increased $O_2$ enrichment level from 0.21 to 1, the flame speed and the temperature in the burned gas are increased. At high CHC1$_3$/C $H_4$ molar ratio two peak values appear on the $O_2$ consumption rate, which are affected by CC1$_2$$O_2$$_{-}$>C1O+CC1O and H+ $O_2$$_{-}$>O+OH.+OH.

Fabrication of $\mu$c-Si:H TFTs by PECVD (PECVD에 의한 $\mu$c-Si:H 박막트랜지스터의 제조)

  • 문교호;이재곤;최시영
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.5
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    • pp.117-124
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    • 1996
  • The .mu.c-Si:H films have been deposited by PeCVD at the various conditions such as hydrogen dilution ratio, substrate temperature and RF power density. Then, we studied their electrical and optical properties. Top gate hydrogenated micro-crystalline silicon thin film transistors($\mu$c-Si:H TFTs) using $\mu$-Si:H and a-SiN:H films have been fabricated by FECVD. The electrical characteristics of the devices have been investigated by semiconductor parameter analyzer and compared with amorphous silicon thin film transistors (a-Si:H TFTs). In this study, on/off current ratio, threshold voltage and the field effect mobility of the $\mu$c-Si:H TFT were $3{\times}10^{4}$, 5.06V and 0.94cm$^{2}$Vs, respectively.

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Interaction Experiment on Chloride Ion Adsorption Behavior of C-S-H Phases (C-S-H 상의 염소이온 흡착 메커니즘 규명을 위한 반응 작용 실험)

  • Yoon, In-Seok
    • Journal of the Korea Concrete Institute
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    • v.29 no.1
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    • pp.65-75
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    • 2017
  • C-S-H phase is the most abundant reaction product, occupying about 50~60% of cement paste volume. The phase is also responsible for most of engineering properties of cement paste. This is not because it is intrinsically strong or stable, but because it forms a continuous layer that binds together the original cement particles into a cohesive whole. The binding ability of C-S-H phase arises from its nanometer-level structure. In terms of chloride penetration in concrete, C-S-H phase is known to adsorb chloride ions, however, its mechanism is very complicated and still not clear. The purpose of this study is to examine the interaction between chloride ions and C-S-H phase with various Ca/Si ratios and identify the adsorption mechanism. C-S-H phase can absorb chloride ions with 3 steps. In the C-S-H phase with low Ca/Si ratios, momentary physical adsorption could not be expected. Physical adsorption is strongly dependent on electro-kinetic interaction between surface area of C-S-H phase and chloride ions. For C-S-H phase with high Ca/Si ratio, electrical kinetic interaction was strongly activated and the amount of surface complexation increased. However, chemical adsorption could not be activated for C-S-H phase with high Ca/Si ratio. The reason can be explained in such a speculation that chloride ions cannot be penetrated and adsorbed chemically. Thus, the maximum chloride adsorption capacity was obtained from the C-S-H phase with a 1.50 Ca/Si ratio.