• 한국식품조리과학회지
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• 제24권1호
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• pp.23-30
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• 2008

Sulgidduk samples made with additions of 2, 4, 6, 8, and 10% Houttuynia cordata Thunb. powder, and a control were examined for quality characteristics such as moisture content, water activity, color, gelatinization properties, textural characteristics, and sensory qualities in order to determine the optimal ratio of Houttuynia cordata Thunb. powder in the formulation. The moisture contents among the samples ranged from 41.98% to 44.97%, and increased as the content of Houttuynia cordata Thunb. powder increased. The water activities of the samples were not significantly different. As the Houttuynia cordata Thunb. powder content increased, the redness and yellowness of the samples also increased, but lightness decreased. For the gelatinization properties, the additions of Houttuynia cordata Thunb. powder caused decreases in peak viscosity (P) and holding strength viscosity (H). Furthermore, final viscosity (F), setback, and time to peak viscosity decreased with increasing Houttuynia cordata Thunb. powder content; however, breakdown and temperature to peak viscosity were not significantly different among the samples. Hardness and gumminess decreased with increasing Houttuynia cordata Thunb. powder content, and adhesiveness, cohesiveness, chewiness, and resilience also tended to decrease; however, springiness was not significantly different among the samples. In the consumer acceptance test, as the content of Houttuynia cordata Thunb. powder increased, the scores of all evaluated characteristics decreased; while the characteristic intensity ratings showed the reverse effect, and the 2 and 4% Houttuynia cordata Thunb. powder samples obtained fairly good scores. In conclusion, the results indicate that adding $2{\sim}4%$ Houttuynia cordata Thunb. powder to Sulgidduk is optimal, providing good physiological properties and reasonably high overall consumer acceptability.

• 대한한의학방제학회지
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• 제24권3호
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• pp.153-161
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• 2016

Chronic alcoholic myopathy is one of the most common skeletal muscle disorders. It is characterized by a reduction in the entire skeletal musculature, skeletal muscle weakness, and difficulties in gait. Patients with alcoholic hepatitis and cirrhosis have severe muscle loss that contributes to worsening outcome. Although the myopathy selectively affects Type II (fast twitch, glycolytic, anaerobic) skeletal muscle fibers, total skeletal musculature is reduced. The severity of the muscle atrophy is proportional to the duration and amount of alcohol consumed and leads to decreased muscle strength. The mechanisms for the myopathy are generally unknown but it is not due to overt nutritional deficiency, nor due to either neuropathy or severe liver disease. Skeletal muscle mass and protein content are maintained by a balance between protein synthesis and breakdown and in vivo animal models studies have shown that ethanol inhibits skeletal muscle protein synthesis. Daekumeumja is a traditional Korean medicine that is widely employed to treat various alcohol-induced diseases. Muscle diseases are often related to liver diseases and conditions. The main objective of this study was to assess that Daekumeumja extract could have protective effect against alcoholic myopathy in a Sprague-Dawley rat model. Rats were orally given 25% ethanol (5ml/kg, body weight) for 8 weeks. After 30 minutes, rats were administrated with Daekumeumja extract. Controls were similarly administrated with the vehicle alone. The weights of gastrocnemius, soleus and plantaris muscles were assessed and the morphologic changes of gastrocnemius and plantaris muscles were also assessed by hematoxylin and eosin staining. In results, The muscles from ethanol treated rats displayed a significant reduction in muscle weight and average cross section area compared to Normal group. Daekumeumja extract treated group showed increased muscle weight and muscle fiber compared to the ethanol treated group. It was concluded that Daekumeumja extract showed ameliorating effects on chronic alcohol myopathy in skeletal muscle.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권5호
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• pp.185-190
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• 2002

Capacitor material utilized in the downsizing passive devices and dynamic random access memory(DRAM) requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. Common capacitor materials, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$,TaN and et al., used until recently have reached their physical limits in their application to several hundred angstrom scale capacitor. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25 ~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism, design and fabrication for $Ta_2O_{5}$ film capacitor. This study presents the structure-property relationship of reactive-sputtered $Ta_2O_{5}$ MIM capacitor structure processed by annealing in a vacuum. X-ray diffraction patterns skewed the existence of amorphous phase in as-deposited condition and the formation of preferentially oriented-$Ta_2O_{5}$ in 670, $700^{\circ}C$ annealing. On 670, $700^{\circ}C$ annealing under the vacuum, the leakage current decrease and the enhanced temperature-capacitance characteristic stability. and the leakage current behavior is stable irrespective of applied electric field. The results states that keeping $Ta_2O_{5}$ annealed at vacuum gives rise to improvement of electrical characteristics in the capacitor by reducing oxygen-vacancy and the broken bond between Ta and O.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권5호
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• pp.319-325
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• 1999

Direct current(d.c.)leakage current voltage characteristics of radio-frequencymagnetron sputtered BaTa\sub 2\O\sub 6\ film capacitors with aluminum(A1) top and indium tin oxide (ITO) bottom electrodes have been investigatedas a function of applied field and temperature. In order to study surfacetreatment effect on the electrical characteristics of as-deposited film weperformed exposure of oxygen plasma on $BaTa_2O_6$ surface. d. c.current-voltage (I-V), bipolar pulse charge-voltage (Q-V), d. c. current-time (I-t) andcapacitance-frequency (C-f) analysis were performed on films. All ofthe films exhibita low leakage current, a high breakdown field strength (3MV/cm-4.5MV/cm), and high dielectric constant (20-30). From the temperature dependence of leakage current,we can conclude that the dominant conduction mechanism is ascribed toSchottky emission at high electric field (>1MV/cm) and hopping conduction at lowelectric field (<1MV/cm). According to our results, the oxide plasma surfacetreatmenton as-deposited $BaTa_2O_6$ resulted in lowering interfacebarrier height and thus, leakage current when a negative voltage applied to the A1 electrode. This can be explained by reduction of surface contamination via etching surface and filling defects such as oxygen vacancies.

• Transactions on Electrical and Electronic Materials
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• 제13권3호
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• pp.116-120
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• 2012

In this paper, ZnO-Epoxy nanocomposites (NEP) were prepared and epoxy composites that contain 5 wt% micro ZnO (MEP) and deliberately not well dispersed nano ZnO (NDNEP) were also prepared for purpose of comparison. The effects of the particle size and dispersion of ZnO on dielectric properties of epoxy resin were chiefly studied. Test results showed that: at a loading of 5 wt%, the three epoxy composites seem to have no significant difference on resistivity compared to epoxy resin; Dielectric constants of all the epoxy composites are also basically the same but they are bigger compared to that of the pure epoxy resin (unfilled); Dielectric dissipation factors ($tan{\delta}$) of NDNEP is greater than that of NEP and MEP. NEP has the minimum dielectric loss factor, whereas dielectric loss factors of the three epoxy composites are larger than that of the pure epoxy resin. The decreasing order of electrical breakdown strength for the three epoxy composites and for the pure epoxy resin is as follows: NEP>MEP>NDNEP>EP. Finally, in order to explain the experimental results the aggregation interface phase was proposed. Furthermore, addition of well dispersed nano filler has proved to have a positive effect on the improvement of the dielectric properties of epoxy resin.

• 한국재료학회지
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• 제25권3호
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• pp.138-143
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• 2015

Aluminum nitride, a compound semiconductor, has a Wurtzite structure; good material properties such as high thermal conductivity, great electric conductivity, high dielectric breakdown strength, a wide energy band gap (6.2eV), a fast elastic wave speed; and excellent in thermal and chemical stability. Furthermore, the thermal expansion coefficient of the aluminum nitride is similar to those of Si and GaAs. Due to these characteristics, aluminum nitride can be applied to electric packaging components, dielectric materials, SAW (surface acoustic wave) devices, and photoelectric devices. In this study, we surveyed the crystallization and preferred orientation of AlN thin films with an X-ray diffractometer. To fabricate the AlN thin film, we used the magnetron sputtering method with $N_2$, NH3 and Ar. According to an increase in the partial pressures of $N_2$ and $NH_3$, Al was nitrified and deposited onto a substrate in a molecular form. When AlN was fabricated with $N_2$, it showed a c-axis orientation and tended toward a high orientation with an increase in the temperature. On the other hand, when AlN was fabricated with $NH_3$, it showed a-axis orientation. This result is coincident with the proposed mechanism. We fabricated AlN thin films with an a-axis orientation by controlling the sputtering electric power, $NH_3$ pressure, deposition speed, and substrate temperature. According to the proposed mechanism, we also fabricated AlN thin films which demonstrated high a-axis and c-axis orientations.

• 대한금속재료학회지
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• 제50권1호
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• pp.78-85
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• 2012

Aluminum nitride(AlN) is a compound (III-V group) of hexagonal system with a crystal structure. Its Wurzite phase is a very wide band gap semiconductor material. It has not only a high thermal conductivity, a high electrical resistance, a high electrical insulating constant, a high breakdown voltage and an excellent mechanical strength but also stable thermal and chemical characteristics. This study is on the preferred orientation characteristics of AlN thin films by reactive evaporation using $NH_3$. We have manufactured an AlN thin film and then have checked the crystal structure and the preferred orientation by using an X-ray diffractometer and have also observed the microstructure with TEM and AlN chemical structure with FT-IR. We can manufacture an excellent AlN thin film by reactive evaporation using $NH_3$ under 873 K of substrate temperature. The AlN thin film growth is dependent on Al supplying and $NH_3$ has been found to be effective as a source of $N_2$. However, the nuclear structure of AlN did not occur randomly around the substrate a particle of the a-axis orientation in fast growth speed becomes an earlier crystal structure and is shown to have an a-axis preferred orientation. Therefore, reactive evaporation using $NH_3$ is not affected by provided $H_2$ amount and this can be an easy a-axis orientation method.

• 헤리티지:역사와 과학
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• 제46권2호
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• pp.136-149
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• 2013

보물 제499호로 지정되어 있는 낙산사 칠층석탑에 대해 표면풍화로 인한 표면균열 발달 양상을 연구하였다. 이 석탑의 석재는 흑운모 화강암과 각섬석-흑운모 화강암으로, 중립질 이상의 입자크기와 회백색을 띄며 특징적으로 거정의 장석 반정을 수반하는 반상조직이 나타난다. 석탑에 나타나는 표면균열은 기단부 및 1층 탑신에서 많이 관찰되며, 대부분 수직, 수평, 대각선 방향으로 발달하고 있다. 석탑에 사용된 석재 내부의 미세균열은 원래부터 리프트 결과 그레인 결의 방향으로 잘 발달한 것이며, 이 두 결이 균열성장과 그에 따른 손상을 야기한 것으로 판단된다. 이와 더불어 석탑에서 나타나는 수직균열은 탑의 자체 하중에 의한 압축응력과 평행하게 미세균열이 성장하였으며, 수평균열은 주 압축응력에 대한 반발 인장력이 균열의 성장을 촉진시킨 것으로 판단된다. 한편, 석탑의 남동쪽 부재 탈락은 압축과 인장에 의한 것과 더불어 거정질 알칼리장석 반정의 벽개와 쌍정면의 영향으로 인해 발생한 것으로 해석된다.

• 융합정보논문지
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• 제9권7호
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• pp.33-40
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• 2019

최근 항공 관련 산업이 활성화됨에 따라 복합재 해석 소프트웨어의 범용화가 요구되고 있다. 지금까지는 복합재 해석에 상용 소프트웨어를 주로 사용해 왔으나 고가의 가격과 제한적인 기능으로 인해 사용에 어려움을 겪어왔다. 이런 문제를 해결하기 위해 해석 절차를 모두 온라인화하고 범용화한 면내 및 코너 부외 파손 자동 해석 소프트웨어가 최근에 개발되었다. 그러나 이들은 다중의 파손 기준으로 동시에 해석할 수 없는 단점이 있었다. 본 논문에서는 CUDA 코어를 장착한 GPU에서만 동작하는 병렬 처리 플랫폼을 이용하여 다중의 파손 기준에 대한 해석을 동시에 처리하면서 처리 속도를 획기적으로 향상시키는 방법을 제안한다. 방대한 구조물 데이터에 대해서 해석 처리 속도를 실험하였을 때 만족할 만한 결과를 얻었다.

• 대한금속재료학회지
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• 제50권8호
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• pp.613-618
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• 2012

We report on electrical and mechanical properties of silicon nitride ($SiN_x$) films deposited by a plasma enhanced chemical vapor deposition (PECVD) method at $200^{\circ}C$ from $SiH_4$ highly diluted in $N_2$. The films were also prepared from $SiH_4$ diluted in He for comparison. The $N_2$ dilution was also effective in improving adhesion of the $SiN_x$ films, fascilitating construction of thin film transistors (TFTs). Metal-insulator-semiconductor (MIS) and Metal-insulator-Metal (MIM) structures were used for capacitance-voltage (C-V) and current-voltage (I-V) measurements, respectively. The resistivity and breakdown field strength of the $SiN_x$ films from $N_2$-diluted $SiH_4$ were estimated to be $1{\times}10^{13}{\Omega}{\cdot}cm$, 7.4 MV/cm, respectively. The MIS device showed a hysteresis window and a flat band voltage shift of 3 V and 0.5 V, respectively. The TFTs fabricated by using these films showed a field-effect mobility of $0.16cm^2/Vs$, a threshold voltage of 3 V, a subthreshold slope of 1.2 V/dec, and an on/off ratio of > $10^6$.