• Title/Summary/Keyword: Blocking device

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A Study on the Electrical Characteristics in the Static Induction Transistor with Trench Oxide (트렌치 산화막을 갖는 정전유도트랜지스터의 전기적 특성에 관한 연구)

  • Kang, Ey-Goo;Kim, Je-Yoon;Hong, Seung-Woo;Sung, ManYoung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.1
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    • pp.6-11
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    • 2005
  • In this paper, two types of vertical SIT(Static Induction Transistor) structures are proposed to improve their electrical characteristics including the blocking voltage. Besides, the two dimensional numerical simulations were carried out using ISE-TCAD to verify the validity of the device and examine the electrical characteristics. First, a trench gate region oxide power SIT device is proposed to improve forward blocking characteristics. Second, a trench gate-source region power SIT device is proposed to obtain more higher forward blocking voltage and forward blocking characteristics at the same size. The two proposed devices have superior electrical characteristics when compared to conventional device. In the proposed trench gate oxide power SIT, the forward blocking voltage is considerably improved by using the vertical trench oxide and the forward blocking voltage is 1.5 times better than that of the conventional vertical power SIT. In the proposed trench gate-source oxide power SIT, it has considerable improvement in forward blocking characteristics which shows 1500V forward blocking voltage at -10V of the gate voltage. Consequently, the proposed trench oxide power SIT has the superior stability and electrical characteristics than the conventional power SIT.

Study on Design and Fabrication of Power SIT (전력 SIT 소자의 설계 및 제작에 관한 연구)

  • Kang, Ey-Goo;Park, Sang-Won;Jung, Min-Cheol;Yoo, Woo-Jang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.196-197
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    • 2006
  • In this paper, two types of vertical SIT(Static Induction Transistor) structures are proposed to improve their electrical characteristics including the blocking voltage. Besides, the two dimensional numerical simulations were carried out using ISE-TCAD to verify the validity of the device and examine the electrical characteristics. First, a trench gate region oxide power SIT device is proposed to improve forward blocking characteristics. Second, a trench gate-source region power SIT device is proposed to obtain more higher forward blocking voltage and forward blocking characteristics at the same size. The two proposed devices have superior electrical characteristics when compared to conventional device. In the proposed trench gate oxide power SIT, the forward blocking voltage is considerably improved by using the vertical trench oxide and the forward blocking voltage is 1.5 times better than that of the conventional vertical power SIT. In the proposed trench gate-source oxide power SIT, it has considerable improvement in forward blocking characteristics which shows 1500V forward blocking voltage at -10V of the gate voltage. Consequently, the proposed trench oxide power SIT has the superior stability and electrical characteristics than the conventional power SIT.

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Optimal Design of ESD Protection Device with different Channel Blocking Ion Implantation in the NSCR_PPS Device (NSCR_PPS 소자에서 채널차단 이온주입 변화에 따른 최적의 정전기보호소자 설계)

  • Seo, Yong-Jin;Yang, Jun-Won
    • Journal of Satellite, Information and Communications
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    • v.11 no.4
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    • pp.21-26
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    • 2016
  • The ESD(electrostatic discharge) protection performance of PPS(PMOS pass structure) embedded N-type silicon controlled rectifier(NSCR_PPS) device with different implant of channel blocking region was discussed for high voltage I/O applications. A conventional NSCR standard device shows low on-resistance, low snapback holding voltage and low thermal breakdown voltage, which may cause latch-up problem during normal operation. However, our proposed NSCR_PPS devices with modified channel blocking structure demonstrate the improved ESD protection performance as a function of channel implant variation. Therefore, the channel blocking implant was a important parameter. Since the modified device with CPS_PDr+HNF structure satisfied the design window, we confirmed the applicable possibility as a ESD protection device for high voltage operating microchips.

A Lateral Trench Electrode Power MOSFET with Improved Blocking Characteristics (개선된 항복 특성을 갖는 수평형 트렌치 전극 파워 MOSFET)

  • Kim, Dae-Jong;Kim, Sang-Sig;Sung, Man-Young;Kang, Ey-Goo;Rhie, Dong-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.323-326
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    • 2003
  • In this paper, a new small size Lateral Trench Electrode Power MOSFET is proposed. This new structure, called "LTEMOSFET"(Lateral Trench Electrode Power MOSFET), is based on the conventional MOSFET. The entire electrode of LTEMOSFET is placed in trench oxide. The forward blocking voltage of the proposed LTEMOSFET is improved by 1.6 times with that of the conventional MOSFET. The forward blocking voltage of LTEMOSFET is 250V. At the same size, a increase of the forward blocking voltage of about 1.6 times relative to the conventional MOSFET is observed by using TMA-MEDICI which is used for analyzing device characteristics. Because the electrodes of the proposed device are formed in trench oxide, the electric field in the device are crowded to trench oxide. We observed that the characteristics of the proposed device was improved by using TMA-MEDICI and that the fabrication of the proposed device is possible by using TMA-TSUPREM4.

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LIGBT with Dual Cathode for Improving Breakdown Characteristics

  • Kang, Ey-Gook;Moon, Seung-Hyun;Sung, Man-Young
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.4
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    • pp.16-19
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    • 2000
  • Power transistors to be used in Power Integrated Circuits(PIC) are required to have low on resistance, fast switching speed, and high breakdown voltage. The lateral IGBTs(LIGBTs)are promising power devices for high voltage PIC applications, because of its superior device characteristics. In this paper, dual cathode LIGBT(DCIGBT) for high voltage is presented. We have verified the effectiveness of high blocking voltage in the new device by using two dimensional devices simulator. We have analyzed the forward blocking characteristics , the latch up performance and turn off characteristics of the proposed structure. Specially, we have focused forward blocking of LIGBT. The forward blocking voltage of conventional LIGBT and the proposed LIGBT are 120V and 165V, respectively. . The forward blocking characteristics of the proposed LIGBT is better than that of the conventional LIGBT. This forward blocking comparison exhibits a 1.5 times improvement in the proposed LIGBT.

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The Improvement in the Forward Blocking Characteristics of Lateral Trench Electrode Power MOSFET by using Local Doping (로컬 도핑을 이용한 수평형 트렌치 전극 파워 MOSFET의 순방향 블로킹특성 개선)

  • Kim, Dae-Jong;Kim, Dae-Won;Sung, Man-Young;Rhie, Dong-Hee;Kang, Ey-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.19-22
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    • 2003
  • In this paper, a new small size Lateral Trench Electrode Power MOSFET with local doping is proposed. This new structure is based on the conventional lateral power MOSFET. The entire electrodes of proposed device are placed in trench oxide. The forward blocking voltage of the proposed device is improved by 3.3 times with that of the conventional lateral power MOSFET. The forward blocking voltage of proposed device is about 500V. At the same size, a increase of the forward blocking voltage of about 3.3 times relative to the conventional lateral power MOSFET is observed by using TMA-MEDICI which is used for analyzing device characteristics. Because the electrodes of the proposed device are formed in trench oxide respectively, the electric field in the device are crowded to trench oxide. And because of the structure which has a narrow drain doping width, the punch through breakdown can be occurred in higher voltage than that of conventional lateral power MOSFET. We observed that the characteristics of the proposed device was improved by using TMA-MEDICI and that the fabrication of the proposed device is possible by using TMA-TSUPREM4.

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Adaptive Filtering Scheme for Defense of Energy Consumption Attacks against Wireless Computing Devices

  • Lee, Wan Yeon
    • International journal of advanced smart convergence
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    • v.7 no.3
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    • pp.101-109
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    • 2018
  • In this paper, we propose an adaptive filtering scheme of connection requests for the defense of malicious energy consumption attacks against wireless computing devices with limited energy budget. The energy consumption attack tries to consume the battery energy of a wireless device with repeated connection requests and shut down the wireless device by exhausting its energy budget. The proposed scheme blocks a connection request of the energy consumption attack in the middle, if the same connection request is repeated and its request result is failed continuously. In order to avoid the blocking of innocuous mistakes of normal users, the scheme gives another chance to allow connection request after a fixed blocking time. The scheme changes the blocking time adaptively by comparing the message arriving ate during non-blocking period and that during blocking period. Evaluation shows that the proposed defense scheme saves up to 94% energy consumption compared to the non-defense case.

A Lateral Trench Electrode Power MOSFET with Superior Electrical Characteristics for Smart Power IC Systems (스마트 파워 IC를 위한 트렌치 파워 MOSFET의 전기적 특성에 관한 연구)

  • 성만영;김대종;강이구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.1
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    • pp.27-30
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    • 2004
  • In this paper, a new small size Lateral Trench Electrode Power MOSFET is proposed. This new structure, called "LTEMOSFET"(Lateral Trench Electrode Power MOSFET), is based on the conventional MOSFET. The entire electrode of LTEMOSFET is placed in trench oxide. The forward blocking voltage of the proposed LTEMOSFET is improved by 1.6 times with that of the conventional MOSFET. The forward blocking voltage of LTEMOSFET is 250V. At the same size, a increase of the forward blocking voltage of about 1.6 times relative to the conventional MOSFET is observed by using TMA-MEDICI which is used for analyzing device characteristics. Because the electrodes of the proposed device are formed in trench oxide, the electric field in the device are crowded to trench oxide. We observed that the characteristics of the proposed device was improved by using TMA-MEDICI and that the fabrication of the proposed device is possible by using TMA-TSUPREM4.

Electrical Characteristics of 500V LIGBT for Intelligent Power ICs (인텔리전트 파워 IC용 500V급 LIGBT의 전기적 특성에 관한 연구)

  • Kang, Ey-Goo;Sul, Won-Ji;Seo, Hyun-Ju;Kim, Hyun-Mi;Sung, Man-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.183-184
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    • 2005
  • In this paper. a new small size Lateral Trench Electrode Power IGBT is proposed. The entire electrode of proposed LIGBT is placed in trench oxide. The forward blocking voltage of the proposed LIGBT is improved by 1.6 times with that of the conventional LIGBT. The forward blocking voltage of proposed LIGBT is 500V. At the same size. a increase of the forward blocking voltage of about 1.6 times relative to the conventional LIGBT is observed by using TMA-MEDICI which is used for analyzing device characteristics. Because the electrodes of the proposed device are formed in trench oxide. the electric field in the device are crowded to trench oxide. We observed that the characteristics of i the proposed device was improved by using TMA-MEDICI and that the fabrication of the proposed device is possible by using TMA-TSUPREM4.

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A Novel EST with Trench Electrode to Immunize Snab-back Effect and to Obtain High Blocking Voltage

  • Kang, Ey-Goo;Sung, Man-Young
    • Transactions on Electrical and Electronic Materials
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    • v.2 no.3
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    • pp.33-37
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    • 2001
  • A vertical trench electrode type EST has been proposed in this paper. The proposed device considerably improves snapback which leads to a lot of problems of device applications. In this paper, the vertical dual gate Emitter Switched Thyristor (EST) with trench electrode has been proposed for improving snab-back effect. It is observed that the forward blocking voltage of the proposed device is 745V. The conventional EST of the same size were no more than 633V. Because the proposed device was constructed of trench-type electrodes, the electric field moved toward trench-oxide layer, and the punch through breakdown of the proposed EST is occurred at latest.

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