• 전기학회논문지
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• 제67권4호
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• pp.543-548
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• 2018

Ferroelectric $Bi_4Ti_3O_{12}$ films were deposited on $SrTiO_3(100)$ and Si(100) substrate by using conductive $SrRuO_3$ films as underlayer, and their ferroelectric and electrical properties were investigated depending on crystal structure and orientation. C-axis oriented $Bi_4Ti_3O_{12}$ films were grown on well lattice-matched pseudo-cubic $SrRuO_3$ films deposited on $SrTiO_3(100)$ substrate, while random-oriented polycrystalline $Bi_4Ti_3O_{12}$ films were grown on $SrRuO_3$ films deposited on Si(100) substrate. The random-oriented polycrystalline film showed a good ferroelectric hysteresis property with remanent polarization ($P_r$) of $9.4{\mu}C/cm^2$ and coercive field ($E_c$) of 84.9 kV/cm, while the c-axis oriented film showed $P_r=0.64{\mu}C/cm^2$ and $E_c=47kV/cm$ in polarizaion vs electric field curve. The c-axis oriented $Bi_4Ti_3O_{12}$ film showed a dielectric constant of about 150 and lower thickness dependence in dielectric constant compared to the random-oriented film. Furthermore, the c-axis oriented $Bi_4Ti_3O_{12}$ film showed leakage current lower than that of the polycrystalline film. The difference of ferroelectric properties in two films was explained from the viewpoint of depolarization effect due to orientation of spontaneous polarization and layered crystal structure of bismuth-base ferroelectric oxide.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.168-171
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• 2003

Bismuth layered structure, Cerium-substituted $Bi_4Ti_3O_{12}$ ($(Bi,Ce)_4Ti_3O_{12}$) thin films were prepared on the $Pt/TiO_2/SiO_2/Si$ substrates by the pulsed laser deposition method. We investigated the Ce-subsitituted effect on the grain orientation and ferroelectric properties. $Ce^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of BTO decreased the deeree of c-axis orientation and increased the remanent polariation (2Pr). The structure and morphology of the films were characterized using X-ray diffraction and atomic force microscopy. The $(Bi,Ce)_4Ti_3O_{12}$ (BCT) thin films, which were annealed $700^{\circ}C\;and\;800^{\circ}C$ for 10min and 30min, showed a perovskite phase and dense microstructure. As the thickness of the BCT film was decresed that the ferroelectric properties of the BCT thin films were good.

• 한국재료학회지
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• 제13권5호
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• pp.317-322
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• 2003

Bismuth layered structure ferroelectric thin films, $Bi_4$$Ti_3$$O_{12}$ / (BTO) and Nb-doped BTO (BTN) were prepared on the Pt(111)/Ti/$SiO_2$/Si(100) substrates by a sol-gel route. We investigated the Nb-doping effect on the grain orientation and ferroelectric properties. $Nb^{5＋}$ ion substitution for $Ti^{4＋}$ ion in perovskite layers of BTO decreased the degree of c-axis orientation and increased the remanent polarization (2Pr). The fatigue resistance of Nb-doped BTO thin film was shown to be superior to that of BTO, and the leakage current of Nb-doped BTO thin film was decreased about 1 order of magnitude compared with BTO. The improvement of ferroelectric properties with $Nb^{5＋}$ doping in BTO could be attributed to the changes in space charge densities and grain orientation in the thin film.

• 한국재료학회지
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• 제14권10호
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• pp.701-706
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• 2004

Bismuth layered structure ferroelectric thin films, La-substituted $Bi_{4}Ti_{3}O_{12}$ ($Bi_{1-x}La_{x}Ti_{3}O_{12}$, x=0.75, BLT) were prepared on the $Pt(111)/Ti/SiO_2/Si(100)$ substrates by a sol-gel spin coating process. The thin films were annealed in various conditions, i.e., oxygen, nitrogen and vacuum atmospheres for various annealing time. We investigated the annealing condition effects on the grain orientation and ferroelectric properties. The measured XRD patterns revealed that the BLT thin films showed only $Bi_{4}Ti_{3}O_{12}$-type phase with random orientation. $La^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of $Bi_{4}Ti_{3}O_{12}$ decreased the degree of c-axis orientation and increased the remanent polarization ($2P_{r}$). The remanent polarization ($2P_{r}$) and the coercive field ($2E_{c}$) of the BLT thin film annealed at $650^{\circ}C$ for 5 min in oxygen atmosphere were $87{\mu}C/cm^2$ and 182 kV/cm, respectively, at an applied electric field of 240 kV/cm. For all of the BLT thin films annealed in various conditions, the fatigue resistance was shown. The improvement of ferroelectric properties with La substitution in $Bi_{4}Ti_{3}O_{12}$ could be attributed to the changes in space charge densities and grain orientation in the thin film.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.346-347
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• 2006

기계적 품질계수(Qm)를 향상시키기 위해 $Y_2O_3$와 $MnO_2$를 첨가함에 따른 $SrBi_2Nb_2O_9$ 세라믹스의 강유전 특성을 알아보았다. 합성분말의 입도를 분석 한 결과 $SrBi_2Nb_2O_9$의 경우 781.27nm였고, $Y_2O_3$와 $MnO_2$를 첨가한 경우 각 각 830.4nm와 981.1nm로 particle size는 증가하였고, 소결 후 소결밀도는 차이가 거의 없었으며, grain size는 $SrBi_2Nb_2O_9$과 $Y_2O_3$를 첨가했을 경우 $1{\mu}m$이하이며 반면, $MnO_2$를 첨가하였을 때 결정립이 성장하여 $3{\sim}4{\mu}m$로 나타났다. 또한, 모두가 $450^{\circ}C$ 이상의 상전이온도를 갖았다.

• 한국방사선학회논문지
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• 제11권7호
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• pp.547-553
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• 2017

현재 의료분야에서는 방사선 차폐체로서 납(Pb)이 널리 쓰이고 있다. 하지만 납은 무게가 매우 무거워 납치마 등의 방호복은 장시간 착용이 어려우며, 인체에 치명적인 납 중독의 위험이 상시 가지고 있다는 문제점을 가지고 있다. 이러한 문제점을 해결하고자 납을 대체 할 수 있는 물질에 대한 많은 연구가 진행되고 있다. 현재 납의 대체물질로써 대표적인 바륨(Ba)과 요오드(I) 등은 우수한 차폐능을 가지고 있지만, 30keV 근처의 에너지 영역에서 특성 X선을 방출하는 특성을 가지고 있다. 환자나 방사선 종사자의 경우 차폐체를 인체에 접촉하고 있는 경우가 많으므로 차폐체에서 발생되는 특성 X선이 인체에 직접 조사되어 방사선 피폭을 증가시킬 위험이 매우 높다. 본 연구에서는 바륨(Ba)과 요오드(I)등에서 발생되는 특성 X선을 제거하기에 적절한 이중구조 차폐체를 방사선 수송코드 중 하나인 FLUKA 수송코드를 개발하여 선행연구로서 진행된 MCNPX 시뮬레이션과 비교 분석하여 이중구조 차폐체의 차폐율에 대한 신뢰성을 검증하고자 하였다. MCNPX와 FLUKA를 이용하여 황산바륨($BaSO_4$)과 산화비스무스($Bi_2O_3$)로 이루어진 다양한 두께조합의 이중구조 차폐체를 설계하였으며, IEC61331-1에 제시된 모식도를 기하학적으로 동일하게 시뮬레이션 상에 구현하였다. 또한, 120 kVp의 연속 X선 스펙트럼에 대한 차폐체의 투과스펙트럼과 흡수선량을 납과 비교 평가하였다. 평가결과, $0.3mm-BaSO_4/0.3mm-Bi_2O_3$ 와 $0.1mm-BaSO_4/0.5mm-Bi_2O_3$ 구조에서는 33 keV와 37 keV의 특성 X선을 모두 흡수하였으며, 90 keV 이상의 고에너지 X선에 대해서도 납과 거의 유사한 차폐효율을 보였다. 또한, FLUKA의 수송코드는 33 keV 이하에서는 cut-off 가 발생하여 저에너지 X선 광자에 대한 전산모사에 제약이 있지만, 40 keV 이상의 고에너지 영역에서 MCNPX와의 상대오차가 6 % 이내로 신뢰성이 매우 우수하다는 것을 확인할 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.284-284
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• 2016

Topological insulator (TI) is a bulk-insulating material with topologically protected Dirac surface states in the band gap. In particular, $Bi_2Se_3$ attracted great attention as a model three-dimensional TI due to its simple electronic structure of the surface states in a relatively large band gap (~0.3 eV). However, experimental efforts using $Bi_2Se_3$ have been difficult due to the abundance of structural defects, which frequently results in the bulk conduction being dominant over the surface conduction in transport due to the bulk doping effects of the defect sites. One promising approach in avoiding this problem is to reduce the structural defects by heteroepitaxially grow $Bi_2Se_3$ on a substrate with a compatible lattice structure, while also preventing surface degradation by encapsulating the pristine interface between $Bi_2Se_3$ and the substrate in a clean growth environment. A particularly promising choice of substrate for the heteroepitaxial growth is hexagonal boron nitride (h-BN), which has the same two-dimensional (2D) van der Waals (vdW) layered structure and hexagonal lattice symmetry as $Bi_2Se_3$. Moreover, since h-BN is a dielectric insulator with a large bandgap energy of 5.97 eV and chemically inert surfaces, it is well suited as a substrate for high mobility electronic transport studies of vdW material systems. Here we report the heteroepitaxial growth and characterization of high quality topological insulator $Bi_2Se_3$ thin films prepared on h-BN layers. Especially, we used molecular beam epitaxy to achieve high quality TI thin films with extremely low defect concentrations and an ideal interface between the films and substrates. To optimize the morphology and microstructural quality of the films, a two-step growth was performed on h-BN layers transferred on transmission electron microscopy (TEM) compatible substrates. The resulting $Bi_2Se_3$ thin films were highly crystalline with atomically smooth terraces over a large area, and the $Bi_2Se_3$ and h-BN exhibited a clear heteroepitaxial relationship with an atomically abrupt and clean interface, as examined by high-resolution TEM. Magnetotransport characterizations revealed that this interface supports a high quality topological surface state devoid of bulk contribution, as evidenced by Hall, Shubnikov-de Haas, and weak anti-localization measurements. We believe that the experimental scheme demonstrated in this talk can serve as a promising method for the preparation of high quality TI thin films as well as many other heterostructures based on 2D vdW layered materials.