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http://dx.doi.org/10.5370/KIEE.2018.67.4.543

Ferroelectric Properties of Bi4Ti3O12 Thin Films Deposited on Si and SrTiO3 Substrates According to Crystal Structure and Orientation  

Lee, Myung-Bok (Dept. of Mechanical and Metallic Mold Engineering, Gwangju University)
Publication Information
The Transactions of The Korean Institute of Electrical Engineers / v.67, no.4, 2018 , pp. 543-548 More about this Journal
Abstract
Ferroelectric $Bi_4Ti_3O_{12}$ films were deposited on $SrTiO_3(100)$ and Si(100) substrate by using conductive $SrRuO_3$ films as underlayer, and their ferroelectric and electrical properties were investigated depending on crystal structure and orientation. C-axis oriented $Bi_4Ti_3O_{12}$ films were grown on well lattice-matched pseudo-cubic $SrRuO_3$ films deposited on $SrTiO_3(100)$ substrate, while random-oriented polycrystalline $Bi_4Ti_3O_{12}$ films were grown on $SrRuO_3$ films deposited on Si(100) substrate. The random-oriented polycrystalline film showed a good ferroelectric hysteresis property with remanent polarization ($P_r$) of $9.4{\mu}C/cm^2$ and coercive field ($E_c$) of 84.9 kV/cm, while the c-axis oriented film showed $P_r=0.64{\mu}C/cm^2$ and $E_c=47kV/cm$ in polarizaion vs electric field curve. The c-axis oriented $Bi_4Ti_3O_{12}$ film showed a dielectric constant of about 150 and lower thickness dependence in dielectric constant compared to the random-oriented film. Furthermore, the c-axis oriented $Bi_4Ti_3O_{12}$ film showed leakage current lower than that of the polycrystalline film. The difference of ferroelectric properties in two films was explained from the viewpoint of depolarization effect due to orientation of spontaneous polarization and layered crystal structure of bismuth-base ferroelectric oxide.
Keywords
Ferroelectric oxide; $Bi_4Ti_3O_{12}$; Pulsed laser deposition; Remanent polarization; Coercive field;
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