• Title/Summary/Keyword: Bias-stress

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Stress Estimation of a Drain Current in Sub-threshold regime of amorphous Si:H

  • Lee, Do-Young;Lee, Kyung-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1172-1175
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    • 2007
  • We have investigated the threshold voltage shifts(${\Delta}Vth$) and drain current level shift (${\Delta}Ids$) in subthreshold region of a-Si:H TFTs induced by DC Bias (Vgs and Vds) - Temperature stress (BTS) condition. We plotted the transfer curves and the ${\Delta}Vth$ contour maps as Vds-Vds stress bias and Temperature to examine the severe damage cases on TFTs. Also, by drawing out the time-dependent transfer curve (Ids-Vgs) in the region of $10^{-8}\;{\sim}\;10^{-13}$ (A) current level, we can estimate the failure time of TFTs in a operating condition.

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Importance of Gate $SiN_x$ Properties Related to a-Si:H TFT Instability

  • Tsai, Chien-Chien;Lee, Yeong-Shyang;Shih, Ching-Chieh;Hsu, Chung-Yi;Liang, Chung-Yu;Lin, Y.M.;Gan, Feng-Yuan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.711-714
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    • 2006
  • Properties of silicon nitride ($SiN_x$) film including physical and electrical characteristics have been studied for improving the stability of hydrogenated amorphous silicon thin-film transistors (a-Si TFTs) in active-matrix liquid-crystal displays (AMLCDs). The instability of a-Si:H TFTs is estimated by accelerated stress test of both bias-temperature stress and bias-illumination stress. The results show that the deposition conditions of $SiN_x$ films with higher power and lower pressure are the best choice for improving the on-current and stability of TFTs.

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Diamond-Like Carbon Films Prepared by Magnetized Inductively Coupled Plasma (자화된 유도 결합형 플라즈마를 이용한 다이아몬드성 탄소박막 증착)

  • Kim, Joong-Kyun;Lee, Ho-Jun;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1995.11a
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    • pp.323-325
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    • 1995
  • An Inductively Coupled Plasma(ICP) was employed to prepare the Diamond-Like Carbon film with $CH_4$ gas. We observed the changes of mechanical, optical properties and internal stress of the films according to the variation of discharge power and negative-self bias. When weak magnetic field is applied, the properties of film are observed to change drastically. In magnetized case, the micro-hardness and the internal stress increase up to critical point and droped down in marked contrast to unmagnetized case. It suggests that large amount of ion flux exists due to high dissociation rate of the reactive radicals in plasma with magnetic field as reported elsewhere. As a result of FT-IR absorption measurement it could be confirmed that the $CH_x$ bonding and the micro-hardness and the internal stress decreased with the increase of negative-self bias.

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The GIDL Current Characteristics of P-Type Poly-Si TFT Aged by Off-State Stress (오프 상태 스트레스에 의한 에이징된 P형 Poly-Si TFT에서의 GIDL 전류의 특성)

  • Shin, Donggi;Jang, Kyungsoo;Phu, Nguyen Thi Cam;Park, Heejun;Kim, Jeongsoo;Park, Joonghyun;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.6
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    • pp.372-376
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    • 2018
  • The effects of off-state bias stress on the characteristics of p-type poly-Si TFT were investigated. To reduce the gate-induced drain leakage (GIDL) current, the off-state bias stress was changed by varying Vgs and Vds. After application of the off-state bias stress, the Vgs causing GIDL current was dramatically increased from 1 to 10 V, and thus, the Vgs margin to turn off the TFT was improved. The on-current and subthreshold swing in the aged TFT was maintained. We performed a technology computer-aided design (TCAD) simulation to describe the aged characteristics. The aged-transfer characteristics were well described by the local charge trapping. The activation energy of the GIDL current was measured for the pristine and aged characteristics. The reduced GIDL current was mainly a thermionic field-emission current.

Multi-field Coupling Simulation and Experimental Study on Transformer Vibration Caused by DC Bias

  • Wang, Jingang;Gao, Can;Duan, Xu;Mao, Kai
    • Journal of Electrical Engineering and Technology
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    • v.10 no.1
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    • pp.176-187
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    • 2015
  • DC bias will cause abnormal vibration of transformers. Aiming at such a problem, transformer vibration affected by DC bias has been studied combined with transformer core and winding vibration mechanism use multi-physical field simulation software COMSOL in this paper. Furthermore the coupling model of electromagnetic-structural force field has been established, and the variation pattern of inner flux density, distribution of mechanical stress, tension and displacement were analyzed based on the coupling model. Finally, an experiment platform has been built up which was employed to verify the correctness of model.

A Study on the Characteristics of TiN film deposited using Reactive Magnetron Sputter ion Plating (Reactive Magnetron Sputter ion Plating법으로 증착된 TiN 박막의 특성에 관한 연구)

  • 이민구;김흥회;김선재;이창규;김영석
    • Journal of the Korean institute of surface engineering
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    • v.33 no.2
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    • pp.115-125
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    • 2000
  • TiN films were deposited onto Stellite 6B alloy (Co base) by the reactive magnetron sputter ion plating. As the bias increases, TiN film changes from columnar structure to dense structure with great hardness and smooth surface due to densification and resputtering by ion bombardment. The content of oxygen and carbon impurities in the TiN film decreases greatly when the substrate bias is applied. The preferred orientation of the TiN films changes from (200) to (111) with decreasing $N_2$/Ar ratio, and from (200) to (111) and then (220) with increasing the substrate bias. The change of the preferred orientation is discussed in terms of surface energy and strain energy which are related to the impurity contents and the ion bombardment damage. The hardness of the TiN film increases with increasing compressive stress generated in the film by virtue of ion bombardment. It becomes as high as up to 3500kgf/mm$^2$ when an appropriate substrate bias is applied.

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a-Si Gate Driver with Alternating Gate Bias to Pull-Down TFTs

  • Kim, Byeong-Hoon;Pi, Jae-Eun;Oh, Min-Woo;Tao, Ren;Oh, Hwan-Sool;Park, Kee-Chan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1243-1246
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    • 2009
  • A novel a-Si TFT integrated gate driver circuit which suppresses the threshold voltage shift due to prolonged positive gate bias to pull-down TFTs, is reported. Negative gate-to-drain bias is applied alternately to the pull-down TFTs to recover the threshold voltage shift. Consequently, the stability of the circuit has been improved considerably.

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Filtered Vacuum Arc Source의 Plasma Duct-Bias 변화에 다른 막 물성 연구

  • Gang, Yong-Jin;Jang, Yeong-Jun;Kim, Jong-Guk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.170.2-170.2
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    • 2016
  • DLC(Diamond like Carbon)는 Diamond와 유사한 물리화학적 특성을 보유한 막으로 고경도 및 우수한 내마모성, 화학적 안정성의 특성을 가지고 있다. DLC는 크게 카본의 막 형성 공정에서 카본 소스에 따라 수소가 포함된 DLC와 무수소DLC로 구분된다. Tetrahedral amorphous carbon (ta-C) 박막은 DLC 박막 중에서 가장 다이아몬드와 유사한 특성을 가지는 박막으로, a:C-H에 비해 높은 열적안정성, 경도(50~60 GPa) 및 내마모 특성이 우수하여, 현재 다양한 응용분야에 적용하고 있다. 본 연구에서는 무수소 DLC 형성을 위해 자장필터가 장착된 Filtered Vacuum Arc Source(FVAS)를 자체적으로 개발하여 연구를 진행하였다. FVAS 장비는 카본 이온 발생부와 Plasma Duct 부위, 전자석부위 구성되어 있으며, 본 연구에서는 Plasma Duct 부위의 Bias 제어를 통해 음극에서 기판으로 이동하는 카본이온의 에너지와 flux 변화를 통한 박막 증착 거동 및 물성 연구를 진행하였다. Plasma Duct Bias 변화는 각 0, 5, 10, 15, 20 V 조건으로 진행하였으며, 물성 평가는 경도(Hardness), 마찰계수, 응력(Stress), 전기전도 특성에 대한 분석을 진행하였다. 박막의 증착 거동에서는 Plasma Duct bias 변화에 따라10 V에서 가장 높은 증착 거동을 가지다 감소하는 경향을 확인 하였으며, 박막의 물성 특성 평가 시에도 이와 유사하게 특성의 차이를 관찰하였다. 이는 음극부위에서 형성된 카본이온이 기판에 도달 시에 Plasma Duct Bias 변화에 따라 이온의 Flux 및 에너지 변화로 인해 박막의 밀도 및 ta-C 막의 물성 변화로 예상되며, 이를 분석하기 위해 라만분석 및 기판 도달 에너지 분석을 진행하였다

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Effect of Microstructure of hBN Thin Films on the Nucleation of cBN Phase Deposited by RF UBM Sputtering System (RF UBM Sputtering에 의해 증착된 hBN 박막의 미세구조가 cBN 상의 핵형성에 미치는 영향)

  • Lee Eun-Ok;Park Jong-Keuk;Lim Dae-Soon;Baik Young-Joon
    • Journal of the Korean Vacuum Society
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    • v.13 no.4
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    • pp.150-156
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    • 2004
  • Boron nitride thin films were deposited on Si(100) substrate by RF (Radio-frequency) UBM (Unbalanced Magnetron) sputtering system. The effect of working pressure and substrate bias voltage on microstructure and compressive stress of boron nitride thin films has been investigated. In high working pressure, the alignment of hBN laminates increased with substrate bias voltage, in low working pressure, however, it was high in low substrate bias voltage. Compressive stress evolution and surface morphology of deposited BN films are closely related with the alignment of hBN laminates. The cBN phase without high compressive stress could be nucleated on hBN thin film by controlling the alignment of hBN laminates.

Effect of Tire Contact Stresses on Tensile Strains in the Surface of Thin Asphalt Pavement (접지압력이 앎은 아스팔트포장 표층 인장 변형률에 미치는 영향 분석)

  • Park, Dae-Wook;Park, Joon-Kyu
    • International Journal of Highway Engineering
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    • v.10 no.2
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    • pp.47-55
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    • 2008
  • In this paper, comparisons are presented on the predicted tensile strains which can affect the fatigue life of a thin asphalt concrete (AC) pavement near the surface of pavement from three-dimensional (3D) finite element (FE) using 3D measured tire contact stresses of a radial tire and a bias ply tire and a layered linear elastic program (BISAR). The objective was to analyze the stress distributions for a 11R22.5 radial tire and a $10{\times}20$ bias ply tire, and to compare the predicted tensile strains at the top and bottom of AC surface using different analysis methods. The results show that the stress distributions of two tires are similar but the 11R22.5 radial tire has much higher vertical contact stress than that of the $10{\times}20$ bias ply tire. The predicted tensile strains at the bottom of AC layer under the center of tire showed higher value by BM (BISAR with the measured contact area) method, which the measured tire contact area is used in a layered elastic program, while the tensile strain at the top of AC surface of 3.5cm offset distance from tire edge by 3D FE analysis showed the highest values among three analysis methods.

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