• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 춘계학술대회 논문집
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• pp.909-910
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• 2009

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.976-979
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• 한국전기전자재료학회논문지
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• 제15권6호
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• pp.518-523
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• 2002

The influences of ion beam energy and reactive oxygen partial pressure on the physical and crystallographic characteristics of transition metal oxide compound(CrOx) film were studied in this paper. Chromium oxide films were deposited onto a cover-glass using ion Beam Sputter Deposition(IBSD) technique according to the various processing parameters. Crystallinity and grain size of as-deposited films were analyzed using XRD analysis. Thickness and Resistivity of the films were measured by $\alpha$-step and 4-point probe measurement. According to the XRD, XPS and resistivity results, the deposited films were the cermet type films which had crystal structure including amorphous oxide(a-oxide) phase and metal Cr phase simultaneously. The increment of the ion beam energy during the deposition process led to decreasing of metal Cr grain size and the rapid change of resistivity above the critical $O_2$ partial pressure.

• 한국통신학회논문지
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• 제29권5C호
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• pp.673-682
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• 2004

적응 빔포밍(beam-forming)기법은 디지털보청기 시스템에서 노이즈를 제거하기 위한 적절한 방식이다. 적응 빔포밍 기법은 디지털 신호처리프로세서의 발전과 더불어 최근에 주목을 받고 있는 방식으로 신호처리 과정에서 일반적으로 LMS(Least Mean Square)알고리즘을 사용하여 웨이트 벡터를 업데이트 시킨다. 본 논문에서는 신호의 환경에 따라 적응상수가 변화하는 가변스텝사이즈 알고리즘을 적용한 고속 웨이블렛 기반 적응알고리즘를 제안한다. 제안한 알고리즘을 적응 빔포머 방식인 디지털보청기 시스템에 적용하여 기존 시간영역 알고리즘과 그 특성을 비교하여 그 결과 제안한 알고리즘이 디지털보청기 시스템에 적합함을 입증한다. 그리고 제안한 알고리즘은 계산량에서도 시스템의 환경변화에도 안정하게 수렴한다는 장점이 있는 것을 보인다.

• 한국의학물리학회지:의학물리
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• 제11권1호
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• pp.49-57
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• 2000

방사선 치료에 따른 방사선량 최적화 문제를 풀기 위한 새로운 방법이 제시되었다. 기존의 2차원 치료계획과는 달리 3차원 문제에서는 모든 조건이 훨씬 복잡하고 관련된 변수도 많아지기 때문에 문제를 해결하기가 쉽지 않다. 본 연구에서는 3차원 선량최적화 문제를 접근하는데 있어서, 해가 존재할 수 있는 범위를 줄여주고, 중요한 파라미터들을 미리 구해주어서 치료계획에 관련된 변수를 줄이는 방법을 연구하였다. 먼저 선형가속기와 환자좌표계사이의 좌표변환을 이용하여 두부 내의 중요기관을 피하는 빔 위치를 찾았다 그리고 임의의 빔 위치에 대해 병소를 완전히 감싸는 빔 크기와 콜리메이터 회전각을 구하였다. 그 결과 가능한 빔 위치를 줄여줄 수 있었고, 빔 크기와 회전각에 대한 의존성을 없앨 수 있었다. 따라서 고려해야할 변수의 조합이 크게 줄어들게 되었고, 목적함수를 이용한 선량최적화에 있어서 최소한의 변수로만 계산이 가능하게 되었다. 위의 결과를 이용하여 임상에 널리 쓰이는 2차원 방사선치료계획의 선량최적화 문제를 해결하였다. 선량기울기, 중요기관의 선량, 선량분포 균일도를 조합한 목적함수를 최소화하는 최적해를 step search 방법을 이용하여 구하였다. 그리고 이 최적해를 이용한 선량분포로부터 새로운 방법에 의한 선량최적화의 가능성을 확인할 수 있었고, 후속 연구를 통하여 상용 방사선 치료계획 시스템에 적용함으로써 임상에 쓰일 수 있을 것으로 사료된다.

• 소성∙가공
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• 제13권3호
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• pp.216-224
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• 2004

In this study, we have developed a new UV$({\lambda}=355nm)$ laser micromachining technology by direct ablation method without masks. This technology allows that 3D micro parts can be fabricated rapidly and efficiently with a low price. And it has a benefit of reducing fabricating process simply. Due to micro parts' fabrication, such technologies need the control of XYZ stages with high precision, the design of optical devices to maintain micron spot sizes of laser beam and the control technology of laser focus. The developed laser manufacturing process for laser micromachining is that, after extracting coordinates of shape data from CAD model data, a beam path considering manufacturing features of laser beam is created by using genetic algorithm. This generated manufacturing process is sent to stage controller. In order to improve the surface quality of micro parts, we have carried out experiments on iteration manufacturing and beam step-over by using a minimum focus size. Moreover, we have fabricated a micro-channel through the developed laser micromachining technology and verified it through the results.

• 한국전기전자재료학회논문지
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• 제16권6호
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• pp.515-521
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• 2003

There are now many theoretical investigations and real manufactures for numerous applications of photonic crystals (PCs) associated with photonic band gap and photonic integrated circuits. However, there are some difficulties to design and fabricate the desired pattern quality. It is not easy to satisfy accurate critical dimension (CD) for patterns with arbitrary shapes and pitch sizes aligned in various directions. In this work, we report the optimum conditions to better fabricate and design, and greatly improve pattern quality in delineating two-dimensional (2D) PCs in the nanometer range using single- step e-beam lithography system with conventional exposure mode.

• Transactions on Electrical and Electronic Materials
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• 제3권1호
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• pp.30-37
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• 한국콘크리트학회:학술대회논문집
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• 한국콘크리트학회 1997년도 봄 학술발표회 논문집
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• pp.515-520
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• 1997

This research is aimed at the development of the composite beam-column connection system by which the steel beam can be connected to the R/C column with smooth stress transfer. As the first step of the structural performance tests of the system, bearing resistance test has been carried out for actual size specimen. From the test, the connection system has been proved to take good bonding and stress transfer to the surrounding concrete with negligible relative displacements.

• 대한방사선기술학회지:방사선기술과학
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• 제14권1호
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• pp.45-48
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• 1991

Recently developed new step wedge has a small size as $10{\times}10\;cm^2$. It can use central beam, and is affected little by scattered rays emmitted from the neighboring step wedges. It's characteristics are same as the intensity scale method, and are excellent compared with conventional boot strap methods. Moreover, the method using new step wedge is simple in operation, and the characteristics are excellent. Now, the above method using new step wedge can supercede the distance method.