Fabrication Technology for Improving Pattern Quality in Two-Dimensional Photonic Crystal Structure |
김해성
(동국대학교 밀리미터파 신기술 연구 센터)
신동훈 (동국대학교 밀리미터파 신기술 연구 센터) 김순구 (동국대학교 밀리미터파 신기술 연구 센터) 이진구 (동국대학교 밀리미터파 신기술 연구 센터) 이범석 ((주)LG 전자 기술원) 김혜원 ((주)LG 전자 기술원) 이재은 ((주)LG 전자 기술원) 한영수 ((주)LG 전자 기술원) 최영호 ((주)LG 전자 기술원) |
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Dose contribution of heating in electron-beam lithography
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DOI |
2 |
Existence of a photonic band gap in two dimensions
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DOI |
3 |
Multilevel diffractive elements in SiO₂by electron beam lithography and proportional etching with analogue negative resist
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DOI ScienceOn |
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A dielectric omnidirectional reflector
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A metamaterial for directive emission
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DOI ScienceOn |
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7 |
Inhibited spontaneous emission in solid state physics and electronics
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DOI ScienceOn |
8 |
Charging and discharging of electron beam resist films
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DOI ScienceOn |
9 |
Photonic band structures: The face-centered cubic case employing non-spherical atoms
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DOI ScienceOn |
10 |
Electric and electrochemical characteristic of PMMA-PEO gel electrolyte for rechargeable Lithium battery
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과학기술학회마을 |
11 |
Physical approximants to electron scattering
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DOI ScienceOn |
12 |
On the influence of the e-beam writer address grid on the optical quality of high-frequency gratings
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DOI ScienceOn |
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14 |
Microcavities in photonic crystals: mode symmetry, tenability, and coupling efficiency
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15 |
A study on the e-beam resist characteristics of plasma polymerized styrene
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과학기술학회마을 |
16 |
Photonic band structures: The face-centered cubic case
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DOI ScienceOn |
17 |
Optimizing electron beam lithography writing strategy subject to electron, optical, pattern, and resist constraints
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DOI |
18 |
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