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http://dx.doi.org/10.4313/JKEM.2003.16.6.515

Fabrication Technology for Improving Pattern Quality in Two-Dimensional Photonic Crystal Structure  

김해성 (동국대학교 밀리미터파 신기술 연구 센터)
신동훈 (동국대학교 밀리미터파 신기술 연구 센터)
김순구 (동국대학교 밀리미터파 신기술 연구 센터)
이진구 (동국대학교 밀리미터파 신기술 연구 센터)
이범석 ((주)LG 전자 기술원)
김혜원 ((주)LG 전자 기술원)
이재은 ((주)LG 전자 기술원)
한영수 ((주)LG 전자 기술원)
최영호 ((주)LG 전자 기술원)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.16, no.6, 2003 , pp. 515-521 More about this Journal
Abstract
There are now many theoretical investigations and real manufactures for numerous applications of photonic crystals (PCs) associated with photonic band gap and photonic integrated circuits. However, there are some difficulties to design and fabricate the desired pattern quality. It is not easy to satisfy accurate critical dimension (CD) for patterns with arbitrary shapes and pitch sizes aligned in various directions. In this work, we report the optimum conditions to better fabricate and design, and greatly improve pattern quality in delineating two-dimensional (2D) PCs in the nanometer range using single- step e-beam lithography system with conventional exposure mode.
Keywords
Two-dimensional photonic crystals; Photonic band gap; Electron-beam lithography; Critical dimension(CD); Beam step size;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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