• Title/Summary/Keyword: Beam step size

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Fabrication technology of the focusing grating coupler using single-step electron beam lithography (Single-step 전자빔 묘화 장치를 이용한 Focusing Grating Coupler 제작 연구)

  • Kim, Tae-Youb;Kim, Yark-Yeon;Sohn, Yeung-Joon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.976-979
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

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The Electrical Characteristics of Chromium Oxide Film Produced by Son Beam Sputter Deposition (이온선 스퍼터 증착법에 의하여 제조된 CrOx의 전기적 특성)

  • 조남제;이규용
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.6
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    • pp.518-523
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    • 2002
  • The influences of ion beam energy and reactive oxygen partial pressure on the physical and crystallographic characteristics of transition metal oxide compound(CrOx) film were studied in this paper. Chromium oxide films were deposited onto a cover-glass using ion Beam Sputter Deposition(IBSD) technique according to the various processing parameters. Crystallinity and grain size of as-deposited films were analyzed using XRD analysis. Thickness and Resistivity of the films were measured by $\alpha$-step and 4-point probe measurement. According to the XRD, XPS and resistivity results, the deposited films were the cermet type films which had crystal structure including amorphous oxide(a-oxide) phase and metal Cr phase simultaneously. The increment of the ion beam energy during the deposition process led to decreasing of metal Cr grain size and the rapid change of resistivity above the critical $O_2$ partial pressure.

Improvement for Hearing Aids System Using Adaptive Beam-forming Algorithm (적응 빔포밍 기법을 적용한 보청기 시스템의 성능 향상에 관한 연구)

  • 이채욱;오신범
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.29 no.5C
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    • pp.673-682
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    • 2004
  • The adaptive beam-forming is promising approach for noise reduction in hearing aids. This approach has come in the focus of interest only recently, because of the availability of new and powerful digital signal processors. The adaptation U using usually a Least Mean Squares algorithm, updates the weight vector. In this Paper, we propose a fast wavelet based adaptive algorithm using variable step size algorithm which varies adaptive constant by the change of signal environment. We compared the performance of the proposed algorithm with the known adaptive algorithm using computer simulation of multi channel adaptive bemformer in hearing aids. As the result the proposed algorithm is suitable for adaptive signal processing area using hearing aids and has advantages reducing computational complexity. And we show the beam-forming system using proposed algorithm converges stably in a sudden change of system environment.

The Determination of Optimum Beam Position and Size in Radiation Treatment (방사선치료시 최적의 빔 위치와 크기 결정)

  • 박정훈;서태석;최보영;이형구;신경섭
    • Progress in Medical Physics
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    • v.11 no.1
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    • pp.49-57
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    • 2000
  • New method about the dose optimization problem in radiation treatment was researched. Since all conditions are more complex and there are more relevant variables, the solution of three-dimensional treatment planning is much more complicate than that of current two-dimensional one. There(ore, in this study, as a method to solve three-dimensional dose optimization problem, the considered variables was minized and researched by reducing the domain that solutions can exist and pre-determining the important beam parameters. First, the dangerous beam range that passes critical organ was found by coordinate transformation between linear accelerator coordinate and patient coordinate. And the beam size and rotation angle for rectangular collimator that conform tumor at arbitrary beam position was also determined. As a result, the available beam position could be reduced and the dependency on beam size and rotation angle, that is very important parameter in treatment planning, totally removed. Therefore, the resultant combinations of relevant variables could be greatly reduced and the dose optimization by objective function can be done with minimum variables. From the above results, the dose optimization problem was solved for the two-dimensional radiation treatment planning useful in clinic. The objective function was made by combination of dose gradient, critical organ dose and dose homogeniety. And the optimum variables were determined by applying step search method to objective function. From the dose distributions by optimum variables, the merit of new dose optimization method was verified and it can be implemented on commercial radiation treatment planning system with further research.

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Micro Channel Fabrication Technology Using UV Laser Micromachining (UV 레이저 마이크로머시닝을 이용한 마이크로 채널 제작기술)

  • 양성빈;장원석;김재구;신보성;전병희
    • Transactions of Materials Processing
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    • v.13 no.3
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    • pp.216-224
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    • 2004
  • In this study, we have developed a new UV$({\lambda}=355nm)$ laser micromachining technology by direct ablation method without masks. This technology allows that 3D micro parts can be fabricated rapidly and efficiently with a low price. And it has a benefit of reducing fabricating process simply. Due to micro parts' fabrication, such technologies need the control of XYZ stages with high precision, the design of optical devices to maintain micron spot sizes of laser beam and the control technology of laser focus. The developed laser manufacturing process for laser micromachining is that, after extracting coordinates of shape data from CAD model data, a beam path considering manufacturing features of laser beam is created by using genetic algorithm. This generated manufacturing process is sent to stage controller. In order to improve the surface quality of micro parts, we have carried out experiments on iteration manufacturing and beam step-over by using a minimum focus size. Moreover, we have fabricated a micro-channel through the developed laser micromachining technology and verified it through the results.

Fabrication Technology for Improving Pattern Quality in Two-Dimensional Photonic Crystal Structure (2차원 광결정 제작에 패턴 특성을 향상시키기 위한 공정 기술)

  • 김해성;신동훈;김순구;이진구;이범석;김혜원;이재은;한영수;최영호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.6
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    • pp.515-521
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    • 2003
  • There are now many theoretical investigations and real manufactures for numerous applications of photonic crystals (PCs) associated with photonic band gap and photonic integrated circuits. However, there are some difficulties to design and fabricate the desired pattern quality. It is not easy to satisfy accurate critical dimension (CD) for patterns with arbitrary shapes and pitch sizes aligned in various directions. In this work, we report the optimum conditions to better fabricate and design, and greatly improve pattern quality in delineating two-dimensional (2D) PCs in the nanometer range using single- step e-beam lithography system with conventional exposure mode.

Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography

  • Kim, Tae-Youb;Kim, Yark-Yeon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Lim, Byeong-Ok;Kim, Sung-Chan;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.30-37
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

A Study on the Development and Test on Bearing Resistance of R/C Column-Steel Girder Connection (철근콘크리트 기둥과 철골보의 접합부 개발 및 지압성능에 관한 시험적 연구)

  • 최광호;이세웅;김재순;김상식
    • Proceedings of the Korea Concrete Institute Conference
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    • 1997.04a
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    • pp.515-520
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    • 1997
  • This research is aimed at the development of the composite beam-column connection system by which the steel beam can be connected to the R/C column with smooth stress transfer. As the first step of the structural performance tests of the system, bearing resistance test has been carried out for actual size specimen. From the test, the connection system has been proved to take good bonding and stress transfer to the surrounding concrete with negligible relative displacements.

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X-ray Sensitometry by Bootstrap Method Using New Step Wedge (새로운 step wedge의 Bootstrap법에 의한 X선 sensitometry)

  • Ahn, Bong-Seon;Huh, Joon
    • Journal of radiological science and technology
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    • v.14 no.1
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    • pp.45-48
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    • 1991
  • Recently developed new step wedge has a small size as $10{\times}10\;cm^2$. It can use central beam, and is affected little by scattered rays emmitted from the neighboring step wedges. It's characteristics are same as the intensity scale method, and are excellent compared with conventional boot strap methods. Moreover, the method using new step wedge is simple in operation, and the characteristics are excellent. Now, the above method using new step wedge can supercede the distance method.

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