• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.26.2-26.2
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• 2011

최근 주목 받고 있는 산화아연(ZnO)은 레이저 다이오드, 가스 센서, 자외선 센서, 투명전극 등으로 다양하게 사용될 수 있어 연구개발이 폭 넓게 이루어지고 있는 상황이다. 특히, 3.3 eV의 direct bandgap 에너지를 가지고 있는 ZnO은 현재 자외선센서로 많이 적용되고 있는 물질인 GaN계열을 대체할 수 있는 유망한 물질로 주목 받고 있다. 공기중의 산소나 수분의 표면반응에 의한 자외선 측정을 하는 ZnO을 나노선으로 만들게 되면, 표면대비 부피비가 박막에 비해 급격히 증가하기 때문에 민감도가 커지고 반응시간이 짧아지게 된다. 본 연구에서는 자외선센서의 민감도와 반응성을 향상시키기 위해 전기화학적 합성법을 통해 ZnO의 박막과 나노선을 제조하였다. 사진공정을 통해 3 ${\mu}m$의 간격을 가진 금(Au) 전극을 만든 후, 전기화학적 합성법을 통해 아연이온이 포함된 용액에서 정전류를 흘려보내 아연 또는 ZnO을 증착시킬 수 있었다. 첫 번째로 ZnO을 양쪽 Au 전극에서 동시에 증착하여 두 박막이 접합하였고, 두 번째는 100nm의 지름을 가진 Ni 나노선를 전극 양쪽에서 자석을 통해 자기장을 형성해 정렬시키고 ZnO을 Au 전극과 Ni 나노선에 증착한 후, Ni 나노선를 산화시킴으로써, ZnO 나노구조를 형성하였다. 세 번째로는 Au 전극 양쪽에 아연을 전기화학적 합성을 하여 박막으로 증착하고 고온에서 산화과정을 통해 100 nm 이하의 지름을 가진 ZnO 나노선를 형성하였다. 이렇게 만들어진 세가지 구조의 ZnO의 나노구조와 결정성은 주사전자현미경과 X선 회절 분석기를 통해 측정하였으며, 자외선에 대한 민감도와 반응성은 365 nm의 파장을 가진 자외선발생기와 소스미터장치를 통해 측정하였다. 박막에서 100 nm 이하의 지름을 가진 ZnO 나노선로 갈 수록 자외선에 대한 민감도와 반응성이 향상되었다.

• Korean Journal of Materials Research
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• v.23 no.8
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• pp.435-440
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• 2013

Transparent and conducting thin films of Ta-doped $SnO_2$ were fabricated on a glass substrate by a pulse laser deposition(PLD) method. The structural, optical, and electrical properties of these films were investigated as a function of doping level, oxygen partial pressure, substrate temperature, and film thickness. XRD results revealed that all the deposited films were polycrystalline and the intensity of the (211) plane of $SnO_2$ decreased with an increase of Ta content. However, the orientation of the films changed from (211) to (110) with an increase in oxygen partial pressure (40 to 100 mTorr) and substrate temperature. The crystallinity of the films also increased with the substrate temperature. The electrical resistivity measurements showed that the resistivity of the films decreased with an increase in Ta doping, which exhibited the lowest resistivity (${\rho}{\sim}1.1{\times}10^{-3}{\Omega}{\cdot}cm$) for 10 wt% Ta-doped $SnO_2$ film, and then increased further. However, the resistivity continuously decreased with the oxygen partial pressure and substrate temperature. The optical bandgap of the 10 wt% Ta-doped $SnO_2$ film increased (3.67 to 3.78 eV) with an increase in film thickness from 100-700 nm, and the figure of merit revealed an increasing trend with the film thickness.

• Korean Journal of Materials Research
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• v.29 no.12
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• pp.790-797
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• 2019

To improve photocatalytic performance, CdS nanoparticle deposited TiO₂ nanotubular photocatalysts are synthesized. The TiO₂ nanotube is fabricated by electrochemical anodization at a constant voltage of 60 V, and annealed at 500 for crystallization. The CdS nanoparticles on TiO₂ nanotubes are synthesized by successive ionic layer adsorption and reaction method. The surface characteristics and photocurrent responses of TNT/CdS photocatalysts are investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), UV-Vis spectrometer and LED light source installed potentiostat. The bandgaps of the CdS deposited TiO₂ photocatalysts are gradually narrowed with increasing of amounts of deposited CdS nanoparticles, which enhances visible light absorption ability of composite photocatalysts. Enhanced photoelectrochemical performance is observed in the nanocomposite TiO₂ photocatalyst. However, the maximum photocurrent response and dye degradation efficiency are observed for TNT/CdS30 photocatalyst. The excellent photocatalytic performance of TNT/CdS30 catalyst can be ascribed to the synergistic effects of its better absorption ability of visible light region and efficient charge transport process.

• Journal of the Institute of Electronics and Information Engineers
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• v.52 no.2
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• pp.106-111
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• 2015

Since most reference voltage generator circuits have bi-stable characteristics, it is important to employ a proper start-up circuit to operate a reference generator in the desired state. In this paper, we propose a start-up circuit for a low voltage reference generator. This start-up circuit determines the state of the circuit reliably by measuring the current drawn by BJTs in the circuit, which is well-defined in the desired state. To measure the current using CMOS-compatible devices only, a comparator with an internal offset voltage is used. The reliability of the proposed circuit is confirmed by Monte-Carlo simulations of the start-up operation, which show that, with the proposed start-up circuit, the low voltage reference generator starts reliably with supply voltages over 850mV even in the presence of device mismatches.

• Bulletin of the Korean Chemical Society
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• v.35 no.3
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• pp.913-918
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• 2014

Five mol % tungsten-doped tin oxide ($W_{0.05}Sn_{0.95}O_2$, TTO5) was prepared by co-precipitation of $SnCl_4{\cdot}5H_2O$ and $WCl_4$, followed by calcination at $1000^{\circ}C$. The as-prepared TTO5 was in the pure cassiterite phase with a particle size of ~50 nm and optical bandgap of 2.51 eV. Herein it was applied for the formation of TTO5/$TiO_2$ heterojunctions by covering the TTO5 surface with $TiO_2$ by sol-gel method. Under visible-light irradiation (${\lambda}{\geq}420$ nm), TTO5/$TiO_2$ showed a significantly high photocatalytic activity in removing gaseous 2-propanol (IP) and evolving $CO_2$. It is deduced that its high visible-light activity is caused by inter-semiconductor holetransfer between the valence band (VB) of TTO5 and $TiO_2$, since the TTO5 nanoparticle (NP) exhibits the absorption edge at ~450 nm and its VB level is located more positive side than that of $TiO_2$. The evidence for the hole-transport mechanism between TTO5 and $TiO_2$ was also investigated by monitoring the holescavenging reaction with 1,4-terephthalic acid (TA).

• Bulletin of the Korean Chemical Society
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• v.32 no.9
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• pp.3453-3458
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• 2011

The $Mg_xZn_{1-x}O$ thin films with the various content ratio ranging from 0 to 0.4 were prepared by sol-gel spincoating method. To investigate the effects of content ratio on the structural and optical properties of the $Mg_xZn_{1-x}O$ thin films, scanning electron microscopy (SEM), X-ray diffraction (XRD), and photoluminescence (PL) were carried out. With increase in the content ratio, the grain size of the $Mg_xZn_{1-x}O$ thin films was increased, however, at the content ratio above 0.2, MgO particles with cubic structure were formed on the surface of the $Mg_xZn_{1-x}O$ thin films, indicating that the Mg content exceeded its solubility limit in the thin films. The residual stress of the $Mg_xZn_{1-x}O$ thin films is increased with increase in the Mg mole fraction. In the PL investigations, the bandgap and the activation energy of the $Mg_xZn_{1-x}O$ thin films was increased with the Mg mole fraction.

• Journal of the Korea Institute of Military Science and Technology
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• v.1 no.1
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• pp.227-237
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• 1998

HgCdTe Is the most versatile material for the developing infrared devices. Not like III-V compound semiconductors or silicon-based photo-detecting materials, HgCdTe has unique characteristics such as adjustable bandgap, very high electron mobility, and large difference between electron and hole mobilities. Many research groups have been interested in this material since early 70's, but mainly due to its thermodynamic difficulties for preparing materials, no single growth technique is appreciated as a standard growth technique in this research field. Solid state recrystallization(SSR), travelling heater method(THM), and Bridgman growth are major techniques used to grow bulk HgCdTe material. Materials with high quality and purity can be grown using these bulk growth techniques, however, due to the large separation between solidus and liquidus line on the phase diagram, it is very difficult to grow large materials with minimun defects. Various epitaxial growth techniques were adopted to get large area HgCdTe and among them liquid phase epitaxy(LPE), metal organic chemical vapor deposition(MOCVD), and molecular beam epitaxy(MBE) are most frequently used techniques. There are also various types of photo-detectors utilizing HgCdTe materials, and photovoltaic and photoconductive devices are most interested types of detectors up to these days. For the larger may detectors, photovoltaic devices have some advantages over power-requiring photoconductive devices. In this paper we reported the main results on the HgCdTe growing and characterization including LPE and MOCVD, device fabrication and its characteristics such as single element and linear array($8{\times}1$ PC, $128{\times}1$ PV and 4120{\times}1$ PC). Also we included the results of the dewar manufacturing, assembling, and optical and environmental test of the detectors.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.14 no.6
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• pp.1375-1381
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• 2010

LED(Light Emitting Diode) is an emitting device which energy is same to the bandgap energy of p-type and n-type semiconductor junction. Recently high brightness LED is used in fish-luring light and traffic signal light alternative of normal light bulb, and widely used in the area of display pannel. Moreover nowadays LED has been used as a back light of LCD display. Recently, visible light communication(VLC) using LED, that allow two-way serial data communication between LEDs over a distance of sveral centimeters or meters, has been widely studied in the area of digital information transmission along with illumination and display. In this paper, we present LED communication system and their applications.

• Proceedings of the KIEE Conference
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• 1998.07d
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• pp.1370-1372
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• 1998

Boron doped CdS films were prepared by CBD(Chemical Bath Deposition) method using boric acid ($B_3HO_3$) as donor dopant source, and their properties were investigated. As-grown CdS films were highly adherent and specularly reflective. Boron doped CdS film which was fabricated under the condition of 0.01 $B_3HO_3/Cd(Ac)_2$ mole ratio, exhibited the lowest resistivity of $2{\Omega}cm$ and the highest optical bandgap of 2.41eV. Also, CdS/CdTe solar cells were fabricated with various doping concentration of CdS films. Using optimized CdS film as the window layer of CdS/CdTe solar cell, the characteristics of the cell were improved. ( $V_{oc}$=610mV, $J_{sc}$=37.5mA/cm, FF=0.4, $\eta$=9.1% )

• Journal of the Korean Ceramic Society
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• v.34 no.2
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• pp.209-215
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• 1997

Aluminum nitride(AIN) thin films were deposited by reactive single ion beam sputtering using N2 or NH3 as reactive gas. The structural, compositional and optical properties of AIN thin films were characterized by XRD, GAXRD, TEM, SEM, XPS UV/VIS spectrophotometer, and FT-IR. All the deposited AIN thin films were amorphous by the analysis fo XRD and GAXRD. However, TEM analysis showed that AIN nano-crystallites were uniformly distributed in the films. The presence of Al-N bonds were also confirmed by FT-IR and XPS analyses. The optical bandgap of AIN films increased up to 6.2 eV and the transmittance was a-bout 100% in visible range with approaching the stoichimetric composition. Irrespective of using N2 or NH3 as reactive gas, the deposited AIN thin films had very smooth surface morphologies. Their refractive index ranged from 1.6 to 1.7.