• Title/Summary/Keyword: B-doping

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Photoemission Electron Micro-spectroscopic Study of the Conductive Layer of a CVD Diamond (001)$2{\times}1$ Surface

  • Kono, S.;Saitou, T.;Kawata, H.;Goto, T.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.7-8
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    • 2010
  • The surface conductive layer (SCL) of chemical vapor deposition (CVD) diamonds has attracting much interest. However, neither photoemission electron microscopic (PEEM) nor micro-spectroscopic (PEEMS) information is available so far. Since SCL retains in an ultra-high vacuum (UHV) condition, PEEM or PEEMS study will give an insight of SCL, which is the subject of the present study. The sample was made on a Ib-type HTHP diamond (001) substrate by non-doping CVD growthin a DC-plasma deposition chamber. The SCL properties of the sample in air were; a few tens K/Sq. in sheet resistance, ${\sim}180\;cm^2/vs$ in Hall mobility, ${\sim}2{\times}10^{12}/cm^2$ in carrier concentration. The root-square-mean surface roughness (Rq) of the sample was ~0.2nm as checked by AFM. A $2{\times}1$ LEED pattern and a sheet resistance of several hundreds K/Sq. in UHV were checked in a UHV chamber with an in-situ resist-meter [1]. The sample was then installed in a commercial PEEM/S apparatus (Omicron FOCUS IS-PEEM) which was composed of electro-static-lens optics together with an electron energy-analyzer. The presence of SCL was regularly monitored by measuring resistance between two electrodes (colloidal graphite) pasted on the two ends of sample surface. Figure 1 shows two PEEM images of a same area of the sample; a) is excited with a Hg-lamp and b) with a Xe-lamp. The maximum photon energy of the Hg-lamp is ~4.9 eV which is smaller that the band gap energy ($E_G=5.5\;eV$) of diamond and the maximum photon energy of the Xe-lamp is ~6.2 eV which is larger than $E_G$. The image that appear with the Hg-lamp can be due to photo-excitation to unoccupied states of the hydrogen-terminated negative electron affinity (NEA) diamond surface [2]. Secondary electron energy distribution of the white background of Figs.1a) and b) indeed shows that the whole surface is NEA except a large black dot on the upper center. However, Figs.1a) and 1b) show several features that are qualitatively different from each other. Some of the differences are the followings: the two main dark lines A and B in Fig.1b) are not at all obvious and the white lines B and C in Fig.1b) appear to be dark lines in Fig.1a). A PEEMS analysis of secondary electron energy distribution showed that all of the features A-D have negative electron affinity with marginal differences among them. These differences can be attributed to differences in the details of energy band bending underneath the surface present in SCL [3].

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Determination of Thermoluminescence Properties of MgB4O7 Doped with Dy3+, La3+ and Ho3+ for a Light Tracer Application (비화공식 예광탄 응용을 위한 Dy3+, La3+ 그리고 Ho3+이 도핑된 MgB4O7의 열 발광 특성 분석)

  • Park, Jinu;Kim, Nakyung;Choi, Jiwoon;Koh, Jaehyuk;Chin, Hee Sik;Jung, Duck Hyeong;Shin, Byungha
    • Korean Journal of Materials Research
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    • v.32 no.1
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    • pp.9-13
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    • 2022
  • Bullets flying with a light from the back are called "tracers". Tracers are ignited by the combustion gas of the propellant and emit bright light that allows the shooter to visually trace the flight path. Therefore, tracers mark the firing point for allies to assist shooters to hit target quickly and accurately. Conventional tracers are constructed with a mixture of an oxidizing agent, raw metal, and organic fuel. Upon ignition, the inside of the gun can be easily contaminated by the by-products, which can lead to firearm failure during long-term shooting. Moreover, there is a fire risk such as forest fires due to residual flames at impact site. Therefore, it is necessary to develop non-combustion type luminous material; however, this material must still use the heat generated from the propellant, so-called "thermoluminescence (TL)". This study aims to compare the TL emission of Dy3+, La3+ and Ho3+ doped MgB4O7 phosphors prepared by solid state reaction. The crystal structures of samples were determined by X-ray diffraction and matched with the standard pattern of MgB4O7. Luminescence of various doses (200 ~ 15,000 Gy) of gamma irradiated Dy3+, La3+ and Ho3+ (at different concentrations of 5, 10, 15 and 20 %) doped MgB4O7 were recorded using a luminance/color meter. The intensity of TL yellowish (CIE x = 0.401 ~ 0.486, y = 0.410 ~ 0.488) emission became stronger as the temperature increased and the total gamma-ray dose increased.

Linearity-Distortion Analysis of GME-TRC MOSFET for High Performance and Wireless Applications

  • Malik, Priyanka;Gupta, R.S.;Chaujar, Rishu;Gupta, Mridula
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.11 no.3
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    • pp.169-181
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    • 2011
  • In this present paper, a comprehensive drain current model incorporating the effects of channel length modulation has been presented for multi-layered gate material engineered trapezoidal recessed channel (MLGME-TRC) MOSFET and the expression for linearity performance metrics, i.e. higher order transconductance coefficients: $g_{m1}$, $g_{m2}$, $g_{m3}$, and figure-of-merit (FOM) metrics; $V_{IP2}$, $V_{IP3}$, IIP3 and 1-dB compression point, has been obtained. It is shown that, the incorporation of multi-layered architecture on gate material engineered trapezoidal recessed channel (GME-TRC) MOSFET leads to improved linearity performance in comparison to its conventional counterparts trapezoidal recessed channel (TRC) and rectangular recessed channel (RRC) MOSFETs, proving its efficiency for low-noise applications and future ULSI production. The impact of various structural parameters such as variation of work function, substrate doping and source/drain junction depth ($X_j$) or negative junction depth (NJD) have been examined for GME-TRC MOSFET and compared its effectiveness with MLGME-TRC MOSFET. The results obtained from proposed model are verified with simulated and experimental results. A good agreement between the results is obtained, thus validating the model.

Characterization of PSCF3737 for intermediate temperature solid oxide fuel cell (IT-SOFC) (중.저온형 고체 산화물 연료전지의 공기극으로 사용되는 PSCF3737 물질의 특성에 관한 연구)

  • Park, Kwang-Jin;Bae, Joong-Myeon
    • 한국신재생에너지학회:학술대회논문집
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    • 2008.05a
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    • pp.61-64
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    • 2008
  • $Pr_{0.3}Sr_{0.7}Co_{0.3}Fe_{0.7}O_{3-\delta}$ (PSCF3737) was prepared and characterized as a cathode material for intermediate temperature-operating solid oxide fuel cell (IT-SOFC). X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), extended X-ray absorption fine structure (EXAFS), and electrical property measurement were carried out to study cathode performance of the material. XPS and EXAFS results proved that oxygen vacancy concentration was decreased and lattice constants of the perovskite structure material were increased by doping Fe up to 70 mol% at B-site of the crystal structure, which also extended the distance between oxygen and neighbor atoms. Thermal expansion coefficient (TEC) of PSCF3737 is smaller than that of $Pr_{0.3}Sr_{0.7}CoO_{3-\delta}$(PSC37) due to lower oxygen vacancy concentration. PSCF3737 showed better cathode performance than PSC37. It might be due good adhesion by a smaller difference of TEC between $Gd_{0.1}Ce_{0.9}O_2$ (CGO91) and electrode. Composite material PSCF3737-CGO91 showed better compatibility of TEC than PSCF3737. However, PSCF3737-CGO91 did not represent higher electrochemical property than PSCF3737 due to decreased reaction sites by CGO91.

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Electronic Structure Studies on $Ba(Fe_{1-x}Ru_x)_2As_2$ by Photoemission (광전자 분석 실험을 이용한 $Ba(Fe_{1-x}Ru_x)_2As_2$ 물질의 전자구조분석)

  • Jung, W.S.;Kim, Y.K.;Kim, B.Y.;Matsunami, M.;Kimura, S.;Eom, M.J.;Kim, J.S.;Kim, C.
    • Progress in Superconductivity
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    • v.12 no.2
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    • pp.99-103
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    • 2011
  • We performed angle resolved photoelectron spectroscopy (ARPES) studies on Ru doped $BaFe_2As_2$ with various Ru contents. Ru, which is doped into a parent compound $BaFe_2As_2$ and substitute Fe, does not donate or accept electrons. However, it induces superconductivity. From ARPES data along the high symmetry cuts and Fermi surface maps, we investigate the electron correlation and carrier density at the Fermi level. We observe that the Fermi velocity increases with Ru doping, suggesting reduction in electron correlation. In addition, we address issues on local vs. itinerant pictures for the magnetism in $BaFe_2As_2$.

A study on boron and phosphrous doping profile by RTA using 1MeV high energy ion implantaiton (1MeV 고에너지로 붕소(boron)와 인(phosphorus)을 이온주입 시급속 열처리에 따른 도핑 프로파일)

  • 강희원;전현성;노병규;조소행;김종규;김종순;오환술
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.331-334
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    • 1998
  • p형 실리콘 기판위에 100.angs.의 초기 산화막을 성장시킨 후 붕소(B)와 인(P)을 1MeV 이온주입 에너지로 4.dec. tilting하여 붕소의 도즈량은 1*10/녀ㅔ 13/[cm/sup -2/]까지, 인은 1*10/sup 13/[cm/sup -2]로부터 1*10/sup 14/[cm/sup -2/] 까지 변화시키며 이온 주입하였다. 이온주입 후 RTA 로서 열처리 하였으며, 열처리 시간은 10초에서 40초까지,열처리 온도를 1000.deg.C에서 1100.deg.C까지 변화하였다. 이후 기파낸의 불순물의 프로파일 및 미세 결함의 분포를 분석하기 위하여, SIMS, SRP, XTEM 분석을 실시하였고, 이를 monte-carlo 모ㅓ델로서 시뮬레이션하여 비교하였다. SIMS 분석 결과 열처리 온도와 시간이 증가할수록 접합깊이가 증가하였고, 프로파일이 넓어짐을 볼수 있다. SRP 측정에서 붕소는 주해거리 (Rp)값은 1.8.mu.m~1.9.mu.m, 인의 경우는 1.1.mu.m~1.2.mu.m의 주행거리 (Rp) 값이 나타났다. XTEM 분석결과 붕소의 경우 열처리에 전후에도 결함을 볼수 없었고, 인의 경우 열처리 이후에 실리콘 결정내부에 있던 산소(O)와 인(P)우너자의 pinning효과에 의해 전위다이폴을 형성하여 표면근처로 성장함을 볼수 있었다.

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$TiO_2$ Doped Sapphire Single Crystal Growth by Verneuil Method and Study for Defects (Verneuil법에 의한 $TiO_2$를 첨가한 Sapphire 단결정 성장과 결함에 관한 연구)

  • Cho, H.;Choi, J.K.;Chun, B.S.;Orr, K.H.;Park, H.S.
    • Journal of the Korean Ceramic Society
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    • v.31 no.12
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    • pp.1423-1428
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    • 1994
  • TiO2 doped sapphire single crystals were grown by Verneuil method. The doping amount of TiO2 to Al2O3 were varied 0.1, 0.2, 0.3 wt% respectively. The grown crystals have reddish color and somewhat transparent. Optimum growth condition was established by changing growth rate and gas flow ratio. Growth condition are as follows; The flow rate range of oxygen ws 5.0~7.3 ι/min and that of hydrogen was 16~25ι/min and average growth rate was 6~8mm/hr. The basic cause of color appearence and defects in crystal were studied.

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Purification of Metallurgical Grade Silicon by Plasma Torch and E-beam Treatment (플라즈마 토치와 전자빔을 이용한 금속급 실리콘 정제)

  • Eum, Jung-Hyun;Nahm, Sahn;Hwang, Kwang-Taek;Kim, Kyung-Ja;Choi, Kyoon
    • Journal of the Korean Ceramic Society
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    • v.47 no.6
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    • pp.618-622
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    • 2010
  • Cost-effective purification methods of silicon were carried out in order to replace the conventional Siemens method for solar grade silicon. Firstly, acid leaching which is a hydrometallurgical process was preceded with grinded silicon powders of metallurgical grade (~99% purity) to remove metallic impurities. Then, plasma treatments were performed with the leached silicon powders of 99.94% purity by argon plasma at 30 kW power under atmospheric pressure. Plasma treatment was specifically efficient for removing Zr, Y, and P but not for Al and B. Another purification step by EB treatment was also studied for the 99.92% silicon lump which resulted in the fast removal of boron and aluminum. That means the two methods are effective alternative tools for removing the doping elements like boron and phosphor.

Reliability Characteristics of La-doped High-k/Metal Gate nMOSFETs

  • Kang, C.Y.;Choi, R.;Lee, B.H.;Jammy, R.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.9 no.3
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    • pp.166-173
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    • 2009
  • The reliability of hafnium oxide gate dielectrics incorporating lanthanum (La) is investigated. nMOSFETs with metal/La-doped high-k dielectric stack show lower $V_{th}$ and $I_{gate}$, which is attributed to the dipole formation at the high-k/$SiO_2$ interface. The reliability results well correlate with the dipole model. Due to lower trapping efficiency, the La-doping of the high-k gate stacks can provide better PBTI immunity, as well as lower charge trapping compared to the control HfSiO stacks. While the devices with La show better immunity to positive bias temperature instability (PBTI) under normal operating conditions, the threshold voltage shift (${\Delta}V_{th}$) at high field PBTI is significant. The results of a transconductance shift (${\Delta}G_m$) that traps are easily generated during high field stress because the La weakens atomic bonding in the interface layer.

Electrical Properties of ZnTe:Cu Films Grown by Hot-Wall Evaporation (열벽 증착(hot-wall evaporaton) 방법으로 성장한 ZnTe:Cu 박막의 전기적 특성)

  • Park, S.G.;Nam, S.G.;O, B.S.;Lee, K.S.
    • Solar Energy
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    • v.17 no.3
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    • pp.51-57
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    • 1997
  • Cu-doped ZnTe thin films have been grown by hot-wall evaporation. The electrical conductivity of the intrinsic ZnTe film was of p-type and as low as $10^{-6}({\Omega}{\cdot}cm)^{-1}$. As the doped Cu concentration was increased, the electrical conductivity was increased. up to $10^2({\Omega}{\cdot}cm)^{-1}$, but the mobility was decreased a little. The heavily doped sample shows the metal-like electrical resistivity.

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