• Title/Summary/Keyword: B-C-N

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Characteristics and Thermal Stabilities of W-B-C-N Diffusion Barrier by Using the Incorporation of Boron Impurities (Boron 불순물에 의한 W-B-C-N 확산방지막의 특성 및 열적 안정성 연구)

  • Kim, Soo-In;Lee, Chang-Woo
    • Journal of the Korean Magnetics Society
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    • v.18 no.1
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    • pp.32-35
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    • 2008
  • Thermally stable diffusion barrier of tungsten carbon nitride(W-C-N) and of tungsten boron carbon nitride(W-B-C-N) thin films have studied to investigate the impurity behaviors of boron and nitrogen. In this paper we newly deposited tungsten boron carbon nitride(W-B-C-N) thin film for various $W_2B$ target power on silicon substrate. The impurities of the 100nm-thick W-C-N and W-B-C-N thin films provide stuffing effect for preventing the inter-diffusion between W-C-N or W-B-C-N thin films and silicon during the high temperature($700^{\circ}C{\sim}1000^{\circ}C$) annealing process.

COMPOSITION OPERATORS ON THE PRIVALOV SPACES OF THE UNIT BALL OF ℂn

  • UEKI SEI-ICHIRO
    • Journal of the Korean Mathematical Society
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    • v.42 no.1
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    • pp.111-127
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    • 2005
  • Let B and S be the unit ball and the unit sphere in $\mathbb{C}^n$, respectively. Let ${\sigma}$ be the normalized Lebesgue measure on S. Define the Privalov spaces $N^P(B)\;(1\;<\;p\;<\;{\infty})$ by $$N^P(B)\;=\;\{\;f\;{\in}\;H(B) : \sup_{0 where H(B) is the space of all holomorphic functions in B. Let ${\varphi}$ be a holomorphic self-map of B. Let ${\mu}$ denote the pull-back measure ${\sigma}o({\varphi}^{\ast})^{-1}$. In this paper, we prove that the composition operator $C_{\varphi}$ is metrically bounded on $N^P$(B) if and only if ${\mu}(S(\zeta,\delta)){\le}C{\delta}^n$ for some constant C and $C_{\varphi}$ is metrically compact on $N^P(B)$ if and only if ${\mu}(S(\zeta,\delta))=o({\delta}^n)$ as ${\delta}\;{\downarrow}\;0$ uniformly in ${\zeta}\;\in\;S. Our results are an analogous results for Mac Cluer's Carleson-measure criterion for the boundedness or compactness of $C_{\varphi}$ on the Hardy spaces $H^P(B)$.

Microstructure and mechanical properties of superhard Ti-B-C-N films deposited by dc unbalanced magnetron sputtering

  • Jeong, Da-Un;Kim, Kwang-Ho
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.10a
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    • pp.163-164
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    • 2009
  • dc unbalanced magnetron sputtering 방법으로 superhard quarternary Ti-B-C-N films을 합성하였다. XPS, XRD 분석 결과 Ti-B-C-N films은 solid-solution (Ti,C,N)$B_2$와 Ti(C,N) 결정이 amorphous BN에 분포된 나노 복합체를 형성하였다. 여기에서는 film내 N의 양에 따라 강도가 증가하다가 그 후 감소하는 경향을 보였다.

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W-B-C-N 확산방지막에서 질소농도에 따른 Stress 에 대한 연구

  • So, Ji-Seop;Lee, Channg-U
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.72-73
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    • 2005
  • Stress behavior was studied to investigate the internal behaviors of boron, carbon, and nitrogen in the 1000${\AA}$-thick tungsten boron carbon nitride (W-B-C-N) thin films. The impurities in the W-B-C-N thin films provide stuffing effects that were very effective for preventing the interdiffusion between interconnection metal and silicon substrate during the subsequent high temperature annealing process. The resistivity of W-B-C-N thin film decreases as an annealing temperature increase. The W-B-C-N thin films have compressive stress, and the stress value decreased up to $4.11\times10^{10}dyne/cm^2$ as an $N_2$ flow rate increases up to 3 sccm.

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Structure Behavior of Sputtered W-B-C-N Thin Film for various nitrogen gas ratios (PVD법으로 증착한 W-B-C-N 박막의 질소량에 따른 구조변화 연구)

  • Song, Moon-Kyoo;Lee, Chang-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.109-110
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    • 2005
  • We have suggested sputtered W-C-N thin film for preventing thermal budget between semiconductor and metal. These results show that the W-C-N thin film has good thermal stability and low resistivity. In this study we newly suggested sputtered W-B-C-N thin diffusion barrier. In order to improve the characteristics, we examined the impurity behaviors as a function of nitrogen gas flow ratio. This thin film is able to prevent the interdiffusion during high temperature (700 to $1000^{\circ}C$) annealing process and has low resistivity ($\sim$200$\mu{\Omega}-cm$). Through the analysis of X-Ray diffraction, resistivity and XPS, we studied structure behavior of W-B-C-N diffusion barrier.

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Effects of DC Substrate Bias Power Sources and Reactant Gas Ratio on Synthesis and Tribological Properties of Ternary B-C-N Coatings (기판 바이어스 DC 전원의 종류와 반응가스 분압비가 3성분계 B-C-N 코팅막의 합성과 마찰 특성에 미치는 영향)

  • Jeong, Da-Woon;Kim, Doo-In;Kim, Kwang-Ho
    • Journal of Surface Science and Engineering
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    • v.44 no.2
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    • pp.60-67
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    • 2011
  • Ternary B-C-N coatings were deposited on Si(100) wafer substrate from $B_4C$ target by RF magnetron sputtering technique in $Ar+N_2+CH_4$ gas mixture. In this work, the effect of reactant gas ratio, $CH_4/(N_2+CH_4)$ on the composition, kinds and amounts of bonding states comprising B-C-N coatings were investigated using two different bias power sources of continuous and unipolar DCs. In addition, the tribological properties of coatings were studied with the composition and bonding state of coating. It was found that the substrate bias power had an effect on chemical composition, and all of the obtained coatings were nearly amorphous. Main bonding states of coatings were revealed from FTIR analyses to be h-BN, C-C, C-N, and B-C. The amount of C-C bonging mainly increased with increase of the reactant gas ratio. From our studies, both C-C and h-BN bonding states improved the tribological properties but B-C one was found to be harmful on those. The best coating from tribological points of view was found to be $BC_{1.9}N_{2.3}$ composition.

STRUCTURE OF THE SPIRAL GALAXY NGC 300 -1. The generalzation of Toomre's mass model-

  • Rhee, Myung-Hyun;Chun, Mun-Suk
    • Journal of Astronomy and Space Sciences
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    • v.9 no.1
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    • pp.11-29
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    • 1992
  • In 1963, Toomre built up classes of mass models for the highly flattened galaxies which have free parameters n, $a_n$ and $C_n$. In order to keep the universal dimension, we adopt parameters $b_n({C_n}^2={a_n}^{2n}+^2{b_n}^2/(n-1)!)$ insteal of $C_n$. Series of the normalized Toomre's mass models (G = $V_{max}$ =$R_{max}$ = 1, n = 1 to 7) are derived and the normalized parameters $a_n$ and $b_n$ are determined by the iteration method. Replacing parameters $a_n$ and $b_n$ to ${a_n}^l(=a_nr_{max})$ and ${b_n}^l(=b_n\cdotV_{max}/r_{max})$, we can get the generalization of Toomre's mass model.

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A S/C/X-Band GaN Low Noise Amplifier MMIC (S/C/X-대역 GaN 저잡음 증폭기 MMIC)

  • Han, Jang-Hoon;Kim, Jeong-Geun
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.28 no.5
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    • pp.430-433
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    • 2017
  • This paper presents a S/C/X-band LNA MMIC with resistive feedback structure in 0.25 um GaN HEMT process. The GaN devices have advantages as a high output power device having high breakdown voltage, energy band gap and stability at high temperature. Since the receiver using the GaN device with high linearity can be implemented without a limiter, the noise figure of the receiver can be improved and the size of receiver module can be reduced. The proposed GaN LNA MMIC based on 0.25 um GaN HEMT device is achieved the gain of > 15 dB, the noise figure of < 3 dB, the input return loss of > 13 dB, and the output return loss of > 8 dB in the S/C/X-band. The current consumption of GaN LNA MMIC is 70 mA with the drain voltage 20 V and the gate voltage -3 V.

Diffusion and Thermal Stability Characteristics of W-B-C-N Thin Film (W-B-C-N 확산방지막의 특성 및 열적 안정성 연구)

  • Kim, Sang-Yoon;Kim, Soo-In;Lee, Chang-Woo
    • Journal of the Korean Magnetics Society
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    • v.16 no.1
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    • pp.75-78
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    • 2006
  • In case of contacts between semiconductor and metal in semiconductor circuits, they become unstable because of thermal budget. To prevent these problems, we use diffusion barrier that has a good thermal stability between metal and semiconductor. So we consider the diffusion barrier to prevent the increase of contact resistance between the interfaces of metals and semiconductors, and the increase of resistance and the reaction between the interfaces. In this paper we deposited tungsten boron carbon nitride (W-B-C-N) thin film on silicon substrate. The impurities of the $1000\;{\AA}-thick$ W-B-C-N thin films provide stuffing effect for preventing the inter-diffusion between metal thin films $(Cu-2000\;{\AA})$ and silicon during the high temperature $(700\~1000^{\circ}C)$ annealing process.

THE NUMBER OF REPRESENTATIONS BY A TERNARY SUM OF TRIANGULAR NUMBERS

  • Kim, Mingyu;Oh, Byeong-Kweon
    • Journal of the Korean Mathematical Society
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    • v.56 no.1
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    • pp.67-80
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    • 2019
  • For positive integers a, b, c, and an integer n, the number of integer solutions $(x,y,z){\in}{\mathbb{Z}}^3$ of $a{\frac{x(x-1)}{2}}+b{\frac{y(y-1)}{2}}+c{\frac{z(z-1)}{2}}=n$ is denoted by t(a, b, c; n). In this article, we prove some relations between t(a, b, c; n) and the numbers of representations of integers by some ternary quadratic forms. In particular, we prove various conjectures given by Z. H. Sun in [6].