• 제목/요약/키워드: Au thin film

검색결과 302건 처리시간 0.032초

PRAM을 위한 Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) 박막의 상변환 특성 (Phase Change Characteristics of Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) Thin Film for PRAM)

  • 신재호;백승철;김병철;이현용
    • 한국전기전자재료학회논문지
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    • 제24권5호
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    • pp.404-409
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    • 2011
  • An amorphous $Ge_2Sb_2Te_5$ thin film is one of the most commonly used materials for phase-change data storage. In this study, $Au_x(Ge_2Sb_2Te_5)_{1-x}$ thin film amorphous-to-crystalline phase-change rate were evaluated in using 658 nm laser beam. The focused laser beam with a diameter <10 ${\mu}m$ was illuminated in the power (P) and pulse duration (t) ranges of 1-17 mW and 10-460 ns, respectively, with subsequent detection of the responsive signals reflected from the film surface. We also evaluated the material characteristics, such as optical absorption and energy gap, crystalline phases, and sheet resistance of as-deposited and annealed films. The result of experiments showed that the thermal stability of the $Ge_2Sb_2Te_5$ film is largely improved by adding Au.

실리카 코팅 AuNPs의 Langmuir-Blodgett 박막 제조 (Preparation of Langmuir-Blodgett Film of Silica Coated Gold Nanoparticles)

  • 박민성;최재유;정재연;정걸;현진호
    • 접착 및 계면
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    • 제11권4호
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    • pp.144-148
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    • 2010
  • 본 연구에서는 플라즈몬 공명 신호 증폭을 위한 AuNPs의 실리카 표면 개질 및 나노 입자의 안정적인 표면 박막 형성을 목표로 하였다. 직경 10 nm의 AuNPs를 수용액 상에서 제조하였으며, AuNPs 표면에 실리카 층을 단계별로 형성시켰다. Tetraethlyorthosilicate 농도를 조절함으로써 실리카 박막 두께를 조절하였으며, 얻어진 나노 입자들을 수용액 표면에 분산시켜 Langmuir-Blodgett 박막을 제조하였다. 흡광스펙트럼의 변화를 관찰함으로써 AuNPs의 크기 변화를 확인하였으며, 원자 힘 현미경으로 LB 박막의 형성 여부와 표면 균일도를 살펴보았다.

Au Deposition Effect on Amorphous In-Ga-Zn-O Thin Film Investigated by High-Resolution x-ray Photoelectron Spectroscopy

  • 강세준;백재윤;신현준
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.301-301
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    • 2012
  • Amorphous In-Ga-Zn-O (a-IGZO)는 광학적으로 투명하고 높은 전자이동도를 가지고 있어서 차세대 thin-film-transistor의 channel layer 물질로 각광받고 있다. 이러한 a-IGZO를 TFT channel layer로 사용하기 위해서는 소스 드레인 전극물질과 IGZO박막의 계면에서 ohmic contact을 만드는 것도 중요하다. 하지만 산화물 반도체의 특성상 금속물질을 증착시킬 때 산화금속계면을 형성하기 때문에 ohmic contact이 형성되기 어려운 것으로 알려져 있다. Au는 보통 전극물질로 많이 사용되는데, 이는 전기전도도가 매우 높고, 독특한 산화환원반응 특성을 보이지만, 화학반응을 잘 일으키지 않는 안정성을 가지는 성질에 기인한다. 본 연구진은 Au가 a-IGZO에 증착 시에 일어나는 표면의 화학적 상태변화를 이해하기 위해 방사광을 이용한 고분해능 광전자 분광법을 이용하여 표면변화를 분석하였다. Au는 (Au 4f) 증착 초기엔 약간의 gold oxide가 함께 형성되지만, 주로 metal gold의 형태로 존재하였다. In 3d, Ga 3d, O 1s, Zn 3d 각각의 스펙트럼에서는 Au 증착으로 인해 낮은 결합에너지에 새로운 state가 나타났다. 한편, In은 상대적으로 다른 원소들에 비해 Au와 좀 더 결합을 잘 하는 것으로 나타났는데 이는, In 5s 전자궤도가 전도메커니즘에서 중요한 역할을 하기 때문에, In-Au의 상대적인 강한 결합은 a-IGZO의 전기적 특성 변화에 기여할 수 있음을 의미한다.

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Highly sensitive gas sensor using hierarchically self-assembled thin films of graphene oxide and gold nanoparticles

  • Ly, Tan Nhiem;Park, Sangkwon
    • Journal of Industrial and Engineering Chemistry
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    • 제67권
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    • pp.417-428
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    • 2018
  • In this study, we fabricated hierarchically self-assembled thin films composed of graphene oxide (GO) sheets and gold nanoparticles (Au NPs) using the Langmuir-Blodgett (LB) and Langmuir-Schaefer (LS) techniques and investigated their gas-sensing performance. First, a thermally oxidized silicon wafer ($Si/SiO_2$) was hydrophobized by depositing the LB films of cadmium arachidate. Thin films of ligand-capped Au NPs and GO sheets of the appropriate size were then sequentially transferred onto the hydrophobic silicon wafer using the LB and the LS techniques, respectively. Several different films were prepared by varying the ligand type, film composition, and surface pressure of the spread monolayer at the air/water interface. Their structures were observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM), and their gas-sensing performance for $NH_3$ and $CO_2$ was assessed. The thin films of dodecanethiol-capped Au NPs and medium-sized GO sheets had a better hierarchical structure with higher uniformity and exhibited better gas-sensing performance.

금선 히터가 있는 금/YBCO 박막 선에서의 퀜치 분포 (Quench Distribution in AU/YBCO Thin Film Meander Lines with a Au Meander Line Heater)

  • Kim, H. R.;J. W. Shim;O. B. Hyun;J. M. Oh
    • Progress in Superconductivity
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    • 제5권2호
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    • pp.118-123
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    • 2004
  • We investigated quench distribution in AU/YBCO thin film meander lines with a heater. Quench distribution during faults is important for superconducting fault current limter applications, because uniform quench allows application of higher voltages across the meander lines. AU/YBCO thin films grown on sapphire substrates were patterned into meander lines by photolithography. Gold films grown on the rear sides of the substrates were also patterned into meander lines, and used as heaters. Meander lines on the front and the rear sides were connected in parallel. The meander lines were subjected to simulated AC fault currents for quench measurements during faults. They were immersed in liquid nitrogen during the experiment for effective cooling. Resistance of the AU/YBCO meander lines initially increased more rapidly with the rear heater than without, and consequently the fault current was limited more. The resistance subsequently became similar, The resistance distribution was more uniform with the heater, especially during the initial quench. Quench was completed more uniformly and significantly earlier. This resulted in uniform distribution of dissipated power. These results could be explained with the concept of quench propagation, which was accelerated by heat transfer across the substrate from the rear heater.

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LIFT 방법에 의한 전도성 미세 패터닝 공정 연구 (Micro patterning of conductor line by laser induced forward transfer(LIFT))

  • 이제훈;한유희
    • 한국레이저가공학회지
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    • 제2권3호
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    • pp.52-61
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    • 1999
  • The laser induced forward transfer(LIFT) technique employs a pulsed laser to transfer parts of a thin metal film from an optically transparent target onto an arbitrary substrate in close proximity to the metal film on the target. In this work, a two-step method, the combination of LIFT process, in which a Au film deposited on the $Al_2$O$_3$ substrate by Nd:YAG laser and subsequent Au electroless metal plating on the by LIFT process generated Au seed, was presented. The influence of laser parameters, wavelength, laser power, film thickness and overlap ratio of pulse tracks, on the shapes of deposit and conductor line after electroless plating is experimentally studied. As a results, the threshold power densities for ablation, deposition and metallization were determined and comparison of threshold value between the wave length 1064nm and the second harmonic generated 532nm. In odor to determine a possible application in the electronic industry, a smallest conduct spot size, line width and isolated line space were generated.

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고분자 게이트 전극을 이용한 유기박막 트랜지스터의 제조 및 소자성능에 관한 연구 (Fabrication and Characterization of Organic Thin-Film Transistors by Using Polymer Gate Electrode)

  • 장현석;송기국;김성현
    • 폴리머
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    • 제35권4호
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    • pp.370-374
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    • 2011
  • 폴리아닐린(polyaniline, PANI) 전도성 고분자 용액을 camphorsulfonic acid(CSA)로 도핑하여 제조하였고 FTIR을 이용하여 고분자 중합 및 도핑유무를 확인하였다. 제조된 폴리아닐린을 스핀 코팅하여 유기박막 트랜지스터의 게이트 전극으로 사용하였으며, 열처리 온도변화에 따른 전기 전도도 변화를 4-probe measurement로 확인하였다. 또한 표면 특성을 이해하기 위해 atomic force microscope(AFM)와 optical microscope를 이용하였다. 폴리아닐린 게이트전극을 활용하여 얻은 유기박막 트랜지스터의 소자성능은 최고 이동도가 0.15 $cm^2$/Vs, 전류점멸비가 $2.4{\times}10^6$임을 확인하였다. 고분자 전극의 소지특성을 비교분석하기 위해, 같은 구조의 Au 전극소자를 제작하였다. Au 금속전극소자와 유사한 성능을 보인 폴리아닐렌 게이트 전극 소자는 플렉서블 유기박막 트랜지스터 전극으로 충분히 사용될 수 있다.

Etching Characteristics of Au Thin Films using Inductively Coupled CF4 / Cl2 / Ar Plasma

  • Kim Dong-Pyo;Kim Chang-Il
    • Transactions on Electrical and Electronic Materials
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    • 제4권3호
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    • pp.1-4
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    • 2003
  • The etching of Au thin films has been performed in an inductively coupled $CF_4 / Cl_2 / Ar$ plasma. The etch properties including etch rate and selectivity were examined as $CF_4$ content adds from o to $30\%$ to $Cl_2/Ar$ plasma. The $Cl_2/(Cl_2 + Ar)$ gas mixing ratio was fixed at $20\%$. Other parameters were fixed at an rf power of 700 W, a dc bias voltage of -150 V, a chamber pressure of 15 mTorr, and a substrate temperature of $30^{\circ}C$. The highest etch rate of the Au thin film was 370 nm/min at a $10\%$ additive $CF_4$ into $Cl_2/Ar$ gas mixture. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. The XPS analysis shows that the intensities of Ail peaks are changed, indicating that there is a chemical reaction between Cl and Au. Au-Cl is hard to remove on the surface because of its high melting point. However, etching products can be sputtered by Ar ion bombardment.

폴리이미드 유기초박막의 유전특성에 관한 연구 (A study on the Dielectric Characteristics of Polyimide Organic Ultra Thin Films)

  • 전동규;이경섭
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1744-1746
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    • 1999
  • In this paper, we give pressure stimulation into organic ultra thin films and detected the induced displacement current properties, and then manufacture a device under the accumulation condition. In processing of a device manufacture, we can see the process is good from the change of a surface pressure and transfer ratio of area per molecule of organic ultra thin films. The structure of manufactured device is MIM(Au/polyimide LB films/AU), the number of accumulated 19 layers. I-V characteristic of the device is measured from -5[V] to +5[V]. The maximum value of measured current is increased as the number of accumulated layers are decreased. The insulation of a thin film is better as the interval between electrodes is larger, and the insulation properties of a thin film is better as the distance between electrodes is larger.

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