• Title/Summary/Keyword: Argon plasma

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Application of Methane Mixed Plasma for the Determination of Ge, As, and Se in Serum and Urine by ICP/MS

  • Park, Kyung-Su;Kim, Sun-Tae;Kim, Young-Man;Kim, Yun-je;Lee, Won
    • Bulletin of the Korean Chemical Society
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    • v.24 no.3
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    • pp.285-290
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    • 2003
  • An analytical method for the simultaneous determination of trace Ge, As and Se in biological samples by inductively coupled plasma/mass spectrometry has been investigated. The effects of added organic gas into the coolant argon gas on the analyte signal were studied to improve the detection limit, accuracy and precision. The addition of a small amount of methane (10 mL/min.) into the coolant gas channel improved the ionization of Ge, As and Se. The analytical sensitivity of the proposed Ar/CH₄system was superior by at least two-fold to that of the conventional Ar method. In the present method, the detection limits obtained for Ge, As and Se were 0.014, 0.012 and 0.064 ㎍/L, respectively. The analytical reliability of the proposed method was evaluated by analyzing the certified standard reference materials (SRM). Recoveries of 99.9% for Ge, 103% for As, 96.5% for Se were obtained for NIST SRM of freeze dried urine sample. The proposed method was also applied to the biological samples.

Deposition of Al Doped ZnO Films Using ICP-assisted Sputtering on the Plastic Substrate (유도결합 플라즈마 스퍼터링을 이용한 플라스틱 기판 상의 Al이 도핑된 ZnO 박막 증착)

  • Jung, Seung-Jae;Han, Young-Hun;Lee, Jung-Joong
    • Journal of the Korean institute of surface engineering
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    • v.39 no.3
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    • pp.98-104
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    • 2006
  • Al-doped ZnO (AZO) films were deposited on the plastic substrate by inductively coupled plasma (ICP) assisted DC magnetron sputtering. The AZO films were produced by sputtering a metallic target (Zn/Al) in a mixture of argon and oxygen gases. AZO films with an electrical resistivity of ${\sim}10^3\;{\Omega}cm$ and an optical transmittance of 80% were obtained even at a low deposition temperature. In-situ process control methods were used to obtain stable deposition conditions in the transition region without any hysteresis effect. The target voltage was controlled either at a constant DC power. It was found that the ratio of the zinc to oxygen emission intensity, I (O 777)/I (Zn 481) decreased with increasing the target voltage in the transition region. The $Ar/O_2$ plasma treatment improve the adhesion strength between the polycarbonate substrate and AZO films.

Spectroscopy of visible light emitted from plasma occurred by pulse discharge(II) (펄스형 방전플라스마에서 발생하는 가시광선의 분광(II))

  • Choi, Woon Sang;Jung, Soo Ja;Kim, Yong Hun;Jang, Jun Kyu;Jung, Jung Bok;Shin, Jang Cheol
    • Journal of Korean Ophthalmic Optics Society
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    • v.5 no.2
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    • pp.163-165
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    • 2000
  • We investigated visible light radiated from Plasma Focus device by time-integrated analyzed method. Plasma focus is a device that translated from electric energy into visible light by electric discharge. Spectral analysis is using Monochromator(focal length = 0.5 m). Time-integrated spectrum is analyzed with densitometer the film which developed a constant range of wavelength. The condition of visible emission was that the discharging voltage was 13 kV and the working gas were Argon and Helium.

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Molecular Emission Spectrometric Detection of Low Level Sulfur Using Hollow Cathode Glow Discharge

  • Koo, Il-Gyo;Lee, Woong-Moo
    • Bulletin of the Korean Chemical Society
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    • v.25 no.1
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    • pp.73-78
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    • 2004
  • A highly sensitive detecting method has been developed for determining part per billion of sulfur in $H_2S$/Ar plasma. The method is based on the excitation of Ar/$H_2S\;or\;Ar/H_2S/O_2$ mixture in hollow cathode glow discharge sustained by radiofrequency (RF) or 60 Hz AC power and the spectroscopic measurement of the intensity of emission lines from electronically excited $S_2^*\;or\;SO_2^*$ species, respectively. The RF or AC power needed for the excitation did not exceed 30 W at a gas pressure maintained at several mbar. The emission intensity from the $SO_2^*$ species showed excellent linear response to the sulfur concentration ranging from 5 ppbv, which correspond to S/N = 5, to 500 ppbv. But the intensity from the $S_2^*$ species showed a linear response to the $H_2S$ only at low flow rate under 20 sccm (mL/min) of the sample gas. Separate experiments using $SO_2$ gas as the source of sulfur demonstrated that the presence of $O_2$ in the argon plasma is essential for obtaining prominent $SO_2^*$ emission lines.

Laser- Plume Effects on Radiation Energy Transfer in Materials Processing (레이저 가공시 에너지 전달과 Plume 효과)

  • Kang, Kae-Myung;Kim, Kwang-Ryul
    • Korean Journal of Materials Research
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    • v.12 no.1
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    • pp.27-35
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    • 2002
  • In laser materials processing, localized heating, melting and evaporation caused by focused laser radiation forms a vapor on the material surface. The plume is generally an unstable entity, fluctuating according to its own dynamics. The beam is refracted and absorbed as it traverses the plume, thus modifying its power density on the surface of the condensed phases. This modifies material evaporation and optical properties of the plume. A laser-produced plasma plume simulation is completed using axisymmetric, high-temperature gas dynamic model including the laser radiation power absorption, refraction, and reflection. The physical properties and velocity profiles are verified using the published experimental and numerical results. The simulation results provide the effect of plasma plume fluctuations on the laser power density and quantitative beam radius changes on the material surface. It is proved that beam absorption, reflection and defocusing effects through the plume are essential to obtain appropriate mathematical simulation results. It is also found that absorption of the beam in the plume has much less direct effect on the beam power density at the material surface than defocusing does and helium gas is more efficient in reducing the beam refraction and absorption effect compared to argon gas for common laser materials processing.

Improvement of adhesion strength of Butadiene Rubber using Atmospheric Plasma (대기압 플라즈마를 이용한 부타디엔고무 소재의 접착력 개선)

  • Seul, Soo Duk
    • Korean Chemical Engineering Research
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    • v.48 no.5
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    • pp.556-560
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    • 2010
  • An atmospheric surface modification using plasma treatment method was applied to butadiene rubber to improve its adhesion strength by plate type reactor. In order to investigate the optimum reaction condition of plasma treatment, type of reaction gas(nitrogen, argon, oxygen, air), gas flow rate(30~100 mL/min), treated time(0~30 s) and primer modification method(GMA, 2-HEMA) were examined in a plate type plasma reactor. The results of the surface modification with respect to the treatment procedure was characterized by using SEM and ATR-FTIR. As the gas flow rate and treated time increases the contact angle decreases. The greatest adhesion strength was achieved at optimum condition such as flow rate of 60 mL/min, treated time 5 s and modification primer containing 2-HEMA for air. Due to the atmospheric surface modification using plate plasma method consequently reduced the wettability of butadiene rubber and resulted in the improvement of the adhesion.

A study on the characteristics of axially magnetized capacitively coupled radio frequency plasma (축 방향으로 자화된 용량 결합형 RF 플라즈마의 특성 연구)

  • 이호준;태흥식;이정해;신경섭;황기웅
    • Journal of the Korean Vacuum Society
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    • v.10 no.1
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    • pp.112-118
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    • 2001
  • Magnetic field is commonly used in low temperature processing plasmas to enhance the performance of the plasma reactors. E$\times$B magnetron or surface multipole configuration is the most popular. However, the properties of capacitively coupled rf plasma confined by axial static magnetic field have rarely been studied. With these background, the effect of magnetic field on the characteristics of capacitively coupled 13.56 MHz/40 KHz argon plasma was studied, Ion saturation current, electron temperature and plasma potential were measured by Langmuir probe and emissive probe. At low pressure region (~10 mTorr), ion current increases by a factor of 3-4 due to reduction of diffusion loss of charged particles to the wall. Electron temperature slightly increases with magnetic field for 13.56 MHz discharge. However, for 40 KHz discharge, electron temperature decreased from 1.8 eV to 0.8 eV with magnetic field. It was observed that the magnetic field induces large temporal variation of the plasma potential. Particle in cell simulation was performed to examine the behaviors of the space potential. Experimental and simulation results agreed qualitatively.

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A Study for Oxidants Generation on Oxygen-plasma Discharging Process Discharging System (산소-플라즈마 공정에서 산화제의 생성에 대한 연구)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
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    • v.22 no.12
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    • pp.1561-1569
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    • 2013
  • This study carried out a laboratory scale plasma reactor about the characteristics of chemically oxidative species (${\cdot}OH$, $H_2O_2$ and $O_3$) produced in dielectric barrier discharge plasma. It was studied the influence of various parameters such as gas type, $1^{st}$ voltage, oxygen flow rate, electric conductivity and pH of solution for the generation of the oxidant. $H_2O_2$ and $O_3$.) $H_2O_2$ and $O_3$ was measured by direct assay using absorption spectrophotometry. OH radical was measured indirectly by measuring the degradation of the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical). The experimental results showed that the effect of influent gases on RNO degradation was ranked in the following order: oxygen > air >> argon. The optimum $1^{st}$ voltage for RNO degradation were 90 V. As the increased of $1^{st}$ voltage, generated $H_2O_2$ and $O_3$ concentration were increased. The intensity of the UV light emitted from oxygen-plasma discharge was lower than that of the sun light. The generated hydrogen peroxide concentration and ozone concentration was not high. Therefore it is suggested that the main mechanism of oxidation of the oxygen-plasma process is OH radical. The conductivity of the solution did not affected the generation of oxidative species. The higher pH, the lower $H_2O_2$ and $O_3$ generation were observed. However, RNO degradation was not varied with the change of the solution pH.

Development and Characterization of Helium Microwave Plasma Torch (헬륨 마이크로파 플라즈마 토치의 개발과 특성에 관한 연구)

  • Jo, Kyung Hyun;Pak, Yong Nam
    • Journal of the Korean Chemical Society
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    • v.44 no.6
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    • pp.573-580
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    • 2000
  • MPT, which has been developed recently, is very tolerant to aqueous samples. Several types of MPT have been investigated and is found that the double concentric tube could sustain a stable plasma at a low plasma gas flow rate. However, the tip of torch is easily ruined. Triple concentric torch has shown the best stability and the plasma shape, much like that of ICP, especially when the central channel is quartz. The plasma is exposed and mixed with air as is suggested from the background spectrum, which leads to quenching of He MPT. Sensitivity of helium MPT equipped with a membrane desolvator has shown 10 times lower than that of Argon MPT for most of elements except for the ones with relatively high excitation energy. He MPT requires small plasma flow rate (about 1.6 L/min), stable and simple to use. Excitational temperature and electron number density measured are 4950 K and 3.28 ${\times}$ $10^{14}cm^{-3}$, respectively.

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Study on CO2 Decomposition using Ar/CO2 Inductively Coupled Plasma (아르곤/이산화탄소 혼합가스의 유도 결합 플라즈마를 이용한 이산화탄소 분해 연구)

  • Kim, Kyung-Hyun;Kim, Kwan-Yong;Lee, Hyo-Chang;Chung, Chin-Wook
    • KEPCO Journal on Electric Power and Energy
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    • v.1 no.1
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    • pp.135-140
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    • 2015
  • Decomposition of carbon dioxide is studied using $Ar/CO_2$ mixture inductively coupled plasmas (ICP). Argon gas was added to generate plasma which has high electron density. To measure decomposition rate of $CO_2$, optical emission actinometry is used. Changing input power, pressure and mixture ratio, the plasma parameters and the spectrum intensity were measured using single Langmuir probe and spectroscope. The source characteristic of Carbon dioxide ICP observed from the obtained plasma parameters. The decomposition rate is evolved depending on the reaction and discharge mode. This result is analyzed with both the measurement of the plasma parameters and the dissociation mechanism of $CO_2$.