• 한국염색가공학회지
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• 제8권3호
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• pp.59-65
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• 1996

Cotton fabrics were treated by low temperature plasma and/or cellulase, and its physical and dyeing properties were investigated. All the pretreatments of the cotton with low temperature plasma of oxygen, nitrogen and argon slowed down the rate of weight loss of cotton in cellulase solution. Plasma pretreatment did not show any strength retention effect on cotton fiber in the subsequent cellulase treatment. Pretreatment of cotton with low temperature oxygen plasma decreased the rate of dyeing in direct dye bath, while cellulase or plasma/cellulase pretreatment increased the rate. Equilibrium dye uptake of cotton was not changed greatly by the pretreatments except the normal untreated cotton showed more or less high uptake. The pretreatment of cellulase with a water-soluble carbodiimide reduced the enzymatic activity, and did not show any strength retention of cotton in enzymatic weight loss.

• 전기학회논문지
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• 제63권10호
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• pp.1417-1422
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• 2014

Using a parallel plate DC plasma system was prepared. Using this equipment, we investigated the basic discharge characteristics of DC argon plasma in terms of electron density, temperature, voltage and current waveforms and plasma potential. The effects of the electrode gap distance, input voltage, ballast resistance and pressure were measured using electrostatic probe. Plasma simulation using fluid approximation has been performed. External circuit effects was included in the simulation. Measured and calculated current voltage characteristics show similar tendencies.

• 한국표면공학회지
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• 제45권4호
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• pp.174-180
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• 2012

Low pressure inductively coupled plasma characteristics of argon and oxygen are numerically simulated for a 400 mm rectangular type system with a plasma fluid model. The results showed lower power absorption profile at the corner than a circular one in a 13.56 MHz driven 1.5 turn antenna system with a drift-diffusion and quasi-neutrality assumption. Ions controlled by electric field are more non-uniform than metastables and the power absorption profile of oxygen plasma is affected by horizontal gas flow pattern to show 25% lower power absorption at the pumping flange side. Oxygen negative ions which are generated in electron collisional dissociation of oxygen molecules was calculated as 0.1% of oxygen atoms with similar spatial profile.

• 한국광학회:학술대회논문집
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• 한국광학회 1989년도 제4회 파동 및 레이저 학술발표회 4th Conference on Waves and lasers 논문집 - 한국광학회
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• pp.65-69
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• 1989

Mather type dense plasma focus device was develooped for the feasibili쇼 study in its application to the x-ray lithography. To etermine the electrical characteristics,the temporal begavior of the discharge current and the voltage was measured by using the Rogowski coil and the high voltage probe respectively. The results are 9 $\mu\textrm{s}$ of the period, 18m$\Omega$ of resistance and 0.16$\mu$Η of inductance. The average current sheath velocity was measured by the light signal emitted at the moving plasma sheath. The light signal was detected through two fiber bundles. When the applied voltage was 13 kV and the initial jpressure of argon was 21.8 Pa, the best plasma focus was occurred. The x-ray emission characteristics from the plasma focus was determined by the x-ray pictures taken by pinhole camera. It is focus that the plasma was focused at 1.4 cm distant position above the center electrode and its diameter was about 1.0 m.

• 한국전기전자재료학회논문지
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• 제34권2호
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• pp.85-89
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• 2021

High reliability thin film transistors are important factors for next-generation displays. The reliability of transparent a-IGZO semiconductors is being actively studied for display applications. A plasma treatment can fill the oxygen vacancies in the channel layer and the channel layer/insulating layer interface so that the device can work stably under a bias voltage. This paper studies the effect of plasma treatment on the performance of a-IGZO TFT devices. The influence of different plasma gases on the electrical parameters of device and its working reliability are reviewed. The article mentions argon, fluorine, hydrogen and several ways of processing in the atmosphere. Among these methods, F (fluorine) plasma treatment can maximize equipment reliability. It is expected that the presented results will form a basis for further research to improve the reliability of a-IGZO TFT.

• Korean Chemical Engineering Research
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• 제48권3호
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• pp.355-358
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• 2010

유도 결합 저온 플라즈마를 사용하여 폴리카보네이트 시료를 처리한 후 표면 특성 변화를 분석하였다. 표면 거칠기는 플라즈마 공정조건에 상관없이 표면 처리 후에 모두 증가하였으나, 산소 분위기에서 플라즈마 처리했을 때 가장 크게 증가하였다. 표면의 화학 결합 분석에서 플라즈마 처리 전 시료의 산소 함량이 산소 플라즈마 처리 후에 43% 증가하여 표면에 친수성 극성기의 형성이 촉진되었다. 공정 변수 중, 처리 시간에 따른 접촉각 변화는 산소 분위기에서 가장 낮은 접촉각 $9.17^{\circ}$을 얻을 수 있었고, 방전 전력의 증가는 같은 처리 시간에서 빠르게 접촉각의 감소를 보여 플라즈마 표면처리 시간을 단축시키는 효과를 주었다. 그러나 방전기체 유량의 증가에 대한 접촉각 변화에 대한 영향성이 크지 않았다.

• 접착 및 계면
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• 제4권1호
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• pp.28-34
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• 2003

강철 타이어 코드의 접착력 향상을 위하여 아세틸렌 플라즈마 중합 코팅, 아르곤 에칭+아세틸렌 플라즈마 중합 코팅, 그리고 아르곤 에칭+담채를 이용한 아세틸렌 플라즈마 중합 코팅을 실시하였으며, 접착력은 TCAT시편으로 측정하였다. 플라즈마 중합 코팅된 타이어 코드의 내구성을 고찰하기 위하여 제 1 단계로 아세틸렌 플라즈마 중합 코팅된 타이어코드를 상온에서 1, 3, 5, 10, 15일 동안 방치한 후 TCAT 시편을 제조하여 접착력변화를 측정하였으며, 제 2 단계로는 플라즈마 중합 코팅된 코드로 TCAT 시편을 제조한 후 증류수, 10% NaCl 수용액에서 또는 $100^{\circ}C$ 오븐에서 1, 2, 3, 4주간 노화시키면서 접착력 변화를 측정하였다. SEM/EDX을 이용하여 코드의 파괴표면을 분석하였으며, 황동코팅과 비교 분석하였다. 아르곤 에칭+담채를 이용한 아세틸렌 플라즈마 중합으로 코팅된 강철 타이어 코드의 접착력은 황동코팅된 시편의 접착력과 거의 같은 수준이었다. 타이어 코드의 상온 노화시험에서 황동코팅된 시편이 아세틸렌 플라즈마 중합 코팅된 시편에 비하여 우수 내구성을 보여주었으나, TCAT 시편의 노화에서는 아세틸렌 플라즈마 중합 코팅이 황동코팅에 비하여 우수하거나 비슷한 결과를 보였다.

• 대한전기학회논문지
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• 제39권5호
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• pp.516-518
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• 1990

We have derived the equation which involves the variation of electron energy with time in a lowly ionized plasma when a low alternating electric field is applied. We consider only elastic collisions between electrons and neutral atoms. This equation is solved using the 4th-order Runge-Kutta method, and applied to argon gas discharge which is driven by source frequency of 100, 1K, 10K, 100K, and 1M (Hz). The results show that the variation of electron energy becomes flat with higher frequencies.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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• pp.282-285
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• 2000

Four helical resonators are distributed in a 2 ${\times}$ 2 array by modifying upper part of the conventional reactive ion etching(RIE) type LCD etcher in order to prepare a large area plasma source. Since the resonance condition of the RF signal to the helical antenna, one RF power supply is used for delivering the power efficiently to all four helical resonators without an impedance matching network Previous work of 2 ${\times}$ 2array inductively coupled plasma(ICP)requires one matching circuit to each ICP antenna for more efficient power deliverly Distributions of ion density and electron temperature are measured in terms of chamber pressure, gas flow rate and RF power . By adjusting the power distribution among the four helical resonator units, argon plasma density of higher than 10$\^$17/㎥ with the uniformity of better than 7％ can be obtained in the 620 ${\times}$ 620$\textrm{mm}^2$ chamber.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1991년도 추계학술대회 논문집 학회본부
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• pp.419-422
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• 1991

A mathematical model was developed to predict the temperature, the density, and the velocity distribution of an inductively coupled thermal plasma. It was for an atmospheric pressure argon thermal plasma generated by a 4 MHz radio frequency power. It has been shown that the hottest region can be moved toward centrial region by applying an external magnetic field. Based on the results of the simulation. an ICP(Inductively Coupled thermal Plasma) system was constructed and thermal plasma was generated.