• 제목/요약/키워드: Argon Discharge

검색결과 124건 처리시간 0.035초

방전시스템(Discharged Water Generator)을 이용한 난분해성 물질의 생분해능 향상에 관한 연구 (Enhancement of biodegradability of the Refractory Organic Substances in Aqueous Solution with Discharged Water Generating (DWG) System)

  • 여인호;류승민;박희경
    • 상하수도학회지
    • /
    • 제20권1호
    • /
    • pp.79-85
    • /
    • 2006
  • Innovated technique to oxidize pollutants has been developed. The technique for this study uses plasma discharge in 2-phase (Air-Water) and is called Discharged Water Generating (DWG) system. It produces electric arc which generates not only the physical decomposing power against the pollutants but also oxidants to sterilize pollutants depending on the inlet gas species. These physical and chemical products play an important role in COD decrease and biodegradability enhancement. The enhancement of biodegradability for the refractory organic substances in aqueous solution was estimated in this study. Argon discharge reduced NBDCOD of EDTA from 58.7mg/L to 38.8mg/L, but oxygen discharge and ozonation reduced it to 37.74mg/L and 38.73mg/L respectively. Furthermore, Argon discharge changed 1181mg/L of NBDCOD of dye effluent into 606mg/L but oxygen discharge and ozonation changed it into 888mg/L and 790mg/L respectively.

Analytical Application of Glow Discharge Atomic Absorption Spectroscopy (GD-AAS) Using Three Types of Jet Configurations Under Power Mode

  • Hwang, Jun Ho;Lee, Ki Beom;Kim, Min Su;Lee, Seong Ro;Kim, Hasuck;Kim, Hyo Jin;Lee, Gae Ho
    • 분석과학
    • /
    • 제8권4호
    • /
    • pp.443-448
    • /
    • 1995
  • Three anode configurations of six-jet, cone-jet and cylindrical-jet are tested for their analytical performance under power mode operation. The effect of pressure, power and gas flow rate on atomic absorption signals have been studied. The increase of atomic absorption signal of sample element is observed at a fixed pressure in all configurations as the gas flow rate increase up to 300-600 seem, and as the power dissipated in the glow discharge cell increase. The lower the pressure is in the glow discharge cell at a fixed discharge power and argon flow rate, the greater the absorbance of sample element is. The optimum conditions are taken from these data and a calibration curve of Cu in low-alloy steel sample is obtained. In this calibration curve, six-jet configuration shows the best analytical results varies as the sample element.

  • PDF

글로우방전을 이용한 액체크로마토그라피 검출기 개발을 위한 기초특성연구 (Fundamental Studies of the Electrical Characteristics of the Glow Discharge for the Development of HPLC Detector)

  • 이현주;김효진
    • 약학회지
    • /
    • 제39권4호
    • /
    • pp.427-432
    • /
    • 1995
  • The plasma oscillation has been observed in an argon pressure between a tungsten anode and cathode consisting of an aqueous conducting solution. The effects of experimental parameters on the electrical characteristics of the glow discharge have been studied. The experimental parameters include the anode-cathode distance, pressure, methanol flow rate, and cathode materials. The glow discharge with liquid cathode and solid anode showed the potential sensitive detector for HPLC

  • PDF

Hollow Cathode Discharge Tube에서의 광검류 신호 측정 (Measurement of Optogalvanic Signal in Hollow Cathode Discharge Tube)

  • 이준회;윤만영;김송강
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
    • /
    • pp.874-877
    • /
    • 2002
  • The optogalvanic signals were measured using hollow cathode discharge tube with argon as buffer gas at change of discharge currents. A change of ionization rate due to electron collision causes an increase or decrease of the electric conductivity. This change in electric conductivity generates the optogalvanic signal. We conclude that optogalvanic signal has close relation with the lowest metastable atoms density at low current.

  • PDF

Observation of Penning ionization using the optogalvanic effect

  • Jeong, Kee-Ju;Lee, Jun-Hoi
    • Journal of Korean Vacuum Science & Technology
    • /
    • 제7권1호
    • /
    • pp.18-22
    • /
    • 2003
  • The optogalvanic effect is proposed and demonstrated as a technique for Penning ionization in a discharge of mixtures of metal vapors and rare gases. The gadolinium and argon mixture is used as a prototype. The lowest metastable of argon, 3P$_2$ (ls$\_$5/ in Paschen notation) at 93144 cm$\^$-1/, is within kT from the excited states of Gd ion. Thus Penning ionization occurs to an excited states of the ion. This process strongly alters the optogalvanic signal and has its own signatures.

  • PDF

Development of a Plasma Training Lab kart: System Setup and Numerical Simulation

  • Joo, Junghoon
    • Applied Science and Convergence Technology
    • /
    • 제26권6호
    • /
    • pp.195-200
    • /
    • 2017
  • A mobile lab kart for plasma training is developed with a high vacuum pumping system, vacuum gauges and a glass discharge tube powered by a high voltage transformer connected to a household 60 Hz line. A numerical model is developed by using a commercial multiphysics software package, CFD-ACE+ to analyze the experimental data. Simulations for argon and nitrogen were carried out to provide fundamental discharge characteristics. Variations of the kart configuration were demonstrated: a glass tube with three electric probes, optical emission spectrometer attachment and infra red thermal imaging system to give more detailed analysis of the discharge characteristics.

Mechanisms of $Cl_2$ Molecules Dissociation in a Gas Discharge Plasma in Mixtures with Ar, $O_2.N_2$

  • Efremov, A.M.;Kwon, Kwang-Ho
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • 제1권4호
    • /
    • pp.197-201
    • /
    • 2001
  • The influence of argon, oxygen, and nitrogen admixtures on the dissociation of $Cl_2$ molecules in a glow discharge low-temperature plasma under the constant pressure conditions was investigated. For $Cl_2/Ar$ and $Cl_2/O_2$mixtures, the concentration of chlorine atoms was observed to be a practically constant at argon or oxygen concentrations up to 50%. This invariability is a most pro bably explained by relative increase in rate of $Cl_2$ direct electron impact dissociation due to the changes in electrophysical parameters of plasma such as EEDF, electron drift rate and mean energy. For all the considered mixtures, the contribution of stepwise dissociation involving active species from gas additives (metastable atoms and molecules, vibrationally excited molecules) was found to be negligible.

  • PDF

슈퍼박테리아 감염 치료를 위한 저전압 구동 플라즈마-온-칩 (Low Voltage Plasma-on-a-Chip for Inactivation of Superbacteria)

  • 임토우;황솔;김영민
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 2015년도 제46회 하계학술대회
    • /
    • pp.1249-1250
    • /
    • 2015
  • We report a plasma-on-a-chip (POC) which provides a non-thermal atmospheric plasma for superbacteria infection treatment A three-electrode configuration allows an initiation carrier injection prior to a primary discharge, leading to a significant reduction in a breakdown voltage. A stable non-thermal argon plasma is generated using a pulsed glow discharge and inactivation of anti-biotic resistant bacteria, for example MRSA, is successfully demonstrated by exposing the bacteria to the argon plasma in a couple of minutes.

  • PDF

플라즈마 중합법에 의해 제작된 폴리스틸렌의 레지스트 특성 조사 (A Study on Resist Characteristics of Polystyrene by Plasma Polymerization)

  • 박상근;박종관;이덕출;김종석;정해덕
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 1994년도 춘계학술대회 논문집
    • /
    • pp.138-140
    • /
    • 1994
  • Plasma polymerized thin film was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The effect of charge of discharge power on growth rate and etching rate of the thin films were studied. The molecular structure of thin films were investigated by FIR and then was discussed in relation to its quality as a resist. In the case of Plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing argon gas and RF power with RIE 80.

  • PDF