• 제목/요약/키워드: Arc plasma

검색결과 556건 처리시간 0.032초

GlidArc 플라즈마를 이용한 메탄의 개질 특성 및 수소 생산에 관한 연구 (Study on Characteristic of Methane Reforming and Production of Hydrogen using GlidArc Plasma)

  • 김성천;전영남
    • 대한기계학회논문집B
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    • 제31권11호
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    • pp.942-948
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    • 2007
  • Popular techniques for producing hydrogen by converting methane include steam reforming and catalyst reforming. However, these are high temperature and high pressure processes limited by equipment, cost and difficulty of operation. Low temperature plasma is projected to be a technique that can be used to produce high concentration hydrogen from methane. It is suitable for miniaturization and fur application in other technologies. In this research, the effect of changing each of the following variables was studied using an AC GlidArc system that was conceived by the research team: the gas components ratio, the gas flow rate, the catalyst reactor temperature and voltage. Results were obtained for methane and hydrogen yields and intermediate products. The system used in this research consisted of 3 electrodes and an AC power source. In this study, air was added fur the partial oxidation reaction of methane. The result showed that as the gas flow rate, the catalyst reactor temperature and the electric power increased, the methane conversion rate and the hydrogen concentration also increased. With $O_2/C$ ratio of 0.45, input flow rate of 4.9 l/min and power supply of 1 kW as the reference condition, the methane conversion rate, the high hydrogen selectivity and the reformer energy density were 69.2%, 32.6% and 35.2% respectively.

플라즈마 에칭 후 게이트 산화막의 파괴 (Pinholes on Oxide under Polysilicon Layer after Plasma Etching)

  • 최영식
    • 한국정보통신학회논문지
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    • 제6권1호
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    • pp.99-102
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    • 2002
  • 다결정 실리콘층 아래의, 게이트 산화막이라고 불리는 높은 온도에서 형성된 산화막에서 핀홀이 관찰되었으며 그 메카니즘이 분석되었다. 다결정 실리콘층 아래의 산화막은 다른 다결정 실리콘층의 플라즈마 에칭 과정 동안에 파괴되어진다. 두 개의 다결정 실리콘층은 CVD증착에 의해 만들어진 0.8$\mu\textrm{m}$의 두꺼운 산화막에 의해 분리되어 있다. 파괴된 산화막들이 아크가 발생한 부분을 중심으로 흩어져 있으며 아크가 발생한 부분에서 생성된 극도로 강한 전계가 게이트 산화막을 파괴 시켰다고 가정된다. 아크가 발생한 부분은 Alignment key에서 관찰되었고 그리고 이것이 발견된 웨이퍼는 낮은 수율을 보여주었다. 아크가 발생한 부분이 칩의 내부가 아니더라도 게이트 산화막의 파괴에 의해 칩이 정상적으로 동작하지 않았다.

신장 회전아크 반응기에서 방전모드에 따른 암모니아 분해특성 (Characteristics of NH3 Decomposition according to Discharge Mode in Elongated Rotating Arc Reactor)

  • 김관태;강희석;이대훈;조성권;송영훈;김인명
    • 대한환경공학회지
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    • 제35권5호
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    • pp.356-362
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    • 2013
  • 암모니아 처리용 플라즈마 스크러버 공정 최적화 연구를 수행하였다. 여러 반도체공정 중 확산과 이온주입공정에서는 불가피하게 부산물로서 암모니아가 배출되며, 따라서 효율적인 건식처리공정기술이 필요하다. 플라즈마 처리공정은 연소공정에서 배출되는 NOx가 발생하지 않으며, 촉매공정에서 나타나는 비활성문제가 없다. 그러나 전기에너지를 사용하기 때문에 실제 적용을 위한 최적화 연구가 필요하며, 본 연구에서는 공정 최적화를 위한 해결책으로 회전아크 반응기의 모드제어에 대한 연구를 수행하였다. 기존 회전아크 반응기에 대한 스케일 업 및 그에 대한 모드 매핑을 수행하였다. 설계 반응기를 이용하여 암모니아 분해특성을 평가하였고, 최적화 설계가 가능한 것으로 나타났다. 또한 열교환기를 포함한 전체 스케일의 스크러버 실험에서 암모니아 분해공정이 보다 안정적이고, 효율적인 것으로 나타났다.

Direct treatment on live and cancer cells & process innovation of bio-sensor using atmospheric pressure plasma system with low-temperature arc-free unit

  • Lee, Keun-Ho;Lee, Hae-Ryong;Jun, Seung-Ik;Bahn, Jae-Hoon;Baek, Seung-J.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.43-43
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    • 2010
  • We have characterized the parametric and functional properties of live cell and cancer cell according to plasma treatment conditions using Atmospheric Pressure (AP) Plasma with uniquely designed low temperature arc-free unit. AP plasma system showed very highly efficient capabilities of reacting and interfacing directly with live and cancer cells. The parametric results with the types of gases, applied power, applied gap, and process times on cells will be presented in accordance with functional studies of the works. The growth of cancer cells is directly influenced by AP plasma exposure with evaluating plasma conditions in several human cancer cells and understanding how plasma exposure alters molecular signaling pathways. The cells exhibit a slower or faster growth rates compared with untreated cells, depending on the cell types. These results strongly support the conclusion that alterations in one or more of each gene are responsible, at least in part, for plasma-induced apoptosis in cancer cells. In addition, it also will be presented that AP plasma has an important role for the improvement of sensor performance due to excellent interface property between enzyme and metal electrode for bio sensor manufacturing process.

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가시광선과 플라스마 광선에 의한 복합레진 중합시 미세누출과 미세경도에 관한 연구 (THE COMPARATIVE STUDY OF THE MICROHARDNESS AND MICROLEAKAGE IN POLYMERIZATION OF COMPOSITE RESIN CURED WITH VISIBLE LIGHT AND PLASMA ARC CURING UNITS)

  • 김상배;이광수
    • 대한소아치과학회지
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    • 제29권2호
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    • pp.180-188
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    • 2002
  • 최근에 소개된 plasma arc curing units는 비교적 높은 광 강도를 가지고 짧은 시간내에 복합레진을 적절히 중합시킨다고 한다. 이 연구는 plasma arc curing units의 강한 광도와 짧은 시간에 의한 중합이 복합레진에 미치는 영향을 평가하기 위해 기존의 가시광선 중합기를 대조군으로 하여 표면 미세경도와 5급 수복물의 변연에 나타나는 미세누출을 색소침투방법으로 측정, 분석하여 다음과 같은 결론을 얻었다. 1. 각 깊이에서의 미세경도는 AHL군이 AP3, AP6군보다 모든 깊이에서 높았고, ZHL군보다 ZP6군이 표면에서 더 높았으며(P<0.05), 1mm와 2mm에서는 차이가 없었다(P>0.05). 그 외 모든 깊이에서 ZHL군이 ZP3, ZP6군보다 높았다(P<0.05). 2. 각 중합방법내 깊이에 따른 미세경도는 AHL군의 표면-1mm와 ZHL군의 1mm-2mm를 제외하고는 모든 군에서 깊이에 따라 감소되었다(P<0.05). 3. 교합면측과 치경부측 미세누출은 모든 중합군에서 교합면측이 낮게 나타났지만 유의한 차이는 없었다(P>0.05). 4. 중합방법간 미세누출은 모든 군에서 차이가 없었다(P>0.05). 5. 각 중합방법에 따른 재료간의 미세누출은 차이가 없었다(P>0.05).

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Synthesis of Nickel and Copper Nanopowders by Plasma Arc Evaporation

  • Cho, Young-Sang;Moon, Jong Woo;Chung, Kook Chae;Lee, Jung-Goo
    • 한국분말재료학회지
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    • 제20권6호
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    • pp.411-424
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    • 2013
  • In this study, the synthesis of nickel nanoparticles and copper nanospheres for the potential applications of MLCC electrode materials has been studied by plasma arc evaporation method. The change in the broad distribution of the size of nickel and copper nanopowders is successfully controlled by manifesting proper mixture of gas ambiance for plasma generation in the size range of 20 to 200 nm in diameter. The factors affecting the mean diameter of the nanopowder was studied by changing the composition of reactive gases, indicating that nitrogen enhances the formation of larger particles compared to hydrogen gas. The morphologies and particle sizes of the metal nanoparticles were observed by SEM, and ultrathin oxide layers on the powder surface generated during passivation step have been confirmed using TEM. The metallic FCC structure of the nanoparticles was confirmed using powder X-ray diffraction method.

상압 플라즈마 용사의 공정조건에 따른 세라믹 피막의 특성 (Effect of Processing Conditions for Atmospheric Plasma Spraying on Characteristics of Ceramic Coatings)

  • 주원태;최병룡;홍상희
    • 한국표면공학회지
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    • 제26권4호
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    • pp.192-202
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    • 1993
  • The characteristics of the high-performance ceramic coatings fabricated on the optimum processings con-ditions for the atmospheric plasma spraying are evaluated by various material tests and analyses. The opti-mum processing parameters for the plasma spraying are determined by using the two-level orthogonal arrays of fractional factorial testing method as a statistical approach. Material tests for the coating specimens are carried out to evaluate microstructure, hardness, adhesion strength, and deposition efficiency. The properties of Al2O3-13%TiO2 coating are discussed with regard to the effective processings parameters. The decarburization effects of WC-12%Co coating is examined by XRD analysis in terms of the arc power and the secondary gas species. The hardness of Al2O2-13%TiO2 coating is increased with the arc power and shows the maximum value at around 40 lpm of Ar gas flowrate, which appears to be the most critical parame-ter on the deposition efficiency. For reducing the decarburization of WC-12%Co coating, the injection of inert He gas instead of reactive H2 gas as a secondary gas is more effective than the dropping of arc power to lessen the plasma enthalpy.

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Arc Ion Plating으로 증착된 CrAlN 코팅막의 표면 특성에 미치는 Al 원소의 영향 (The Effect of Aluminum Element on the Surface Properties of CrAlN Coating Film Deposited via Arc Ion Plating )

  • 김재운;임병석;윤영신;안병우;최한철
    • 한국표면공학회지
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    • 제57권1호
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    • pp.14-21
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    • 2024
  • For this study, CrAlN multilayer coatings were deposited on SKD61 substrates using a multi-arc ion plating technique. The structural characteristics of the CrAlN multilayer coatings were evaluated using X-ray diffraction (XRD) and Scanning Electron Microscopy (SEM). Additionally, the adhesion of the coatings was assessed through scratch testing, and the mechanical strength was evaluated using nanoindentation and tribometric tests for frictional properties. The results show that the CrAlN multilayer coatings possess a uniform and dense structure with excellent mechanical strength. Hardness measurements indicated that the CrAlN coatings have high hardness values, and both the coating adhesion and wear resistance were found to be improved compared to CrN. The addition of aluminum is anticipated to contribute to enhanced durability and wear resistance.

Optical In-Situ Plasma Process Monitoring Technique for Detection of Abnormal Plasma Discharge

  • Hong, Sang Jeen;Ahn, Jong Hwan;Park, Won Taek;May, Gary S.
    • Transactions on Electrical and Electronic Materials
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    • 제14권2호
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    • pp.71-77
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    • 2013
  • Advanced semiconductor manufacturing technology requires methods to maximize tool efficiency and improve product quality by reducing process variability. Real-time plasma process monitoring and diagnosis have become crucial for fault detection and classification (FDC) and advanced process control (APC). Additional sensors may increase the accuracy of detection of process anomalies, and optical monitoring methods are non-invasive. In this paper, we propose the use of a chromatic data acquisition system for real-time in-situ plasma process monitoring called the Plasma Eyes Chromatic System (PECS). The proposed system was initially tested in a six-inch research tool, and it was then further evaluated for its potential to detect process anomalies in an eight-inch production tool for etching blanket oxide films. Chromatic representation of the PECS output shows a clear correlation with small changes in process parameters, such as RF power, pressure, and gas flow. We also present how the PECS may be adapted as an in-situ plasma arc detector. The proposed system can provide useful indications of a faulty process in a timely and non-invasive manner for successful run-to-run (R2R) control and FDC.