• Title/Summary/Keyword: Annealing treatment

Search Result 978, Processing Time 0.032 seconds

Effect of Pre/Post-Treatment on the Performance of Cu(In,Ga)(S,Se)2 Absorber Layer Manufactured in a Two-Step Process (KCN 에칭 및 CdS 후열처리가 Cu(In,Ga)(S,Se)2 광흡수층 성능에 미치는 영향)

  • Kim, A-Hyun;Lee, GyeongA;Jeon, Chan-Wook
    • New & Renewable Energy
    • /
    • v.17 no.4
    • /
    • pp.36-45
    • /
    • 2021
  • To remove the Cu secondary phase remaining on the surface of a CIGSSe absorber layer manufactured by the two-step process, KCN etching was applied before depositing the CdS buffer layer. In addition, it was possible to increase the conversion efficiency by air annealing after forming the CdS buffer layer. In this study, various pre-treatment/post-treatment conditions wereapplied to the S-containing CIGSSe absorber layerbefore and after formation of the CdS buffer layer to experimentally confirm whether similareffects as those of Se-terminated CIGSe were exhibited. Contrary to expectations, it was noted that CdS air annealing had negative effects.

Effect of Microstructure Control on the Tensile and Erosion Properties of 3527/4343 Aluminum Clad (3527/4343 알루미늄 클래드재의 인장 및 침식특성에 미치는 미세조직 제어의 영향)

  • Euh, K.;Kim, S.H.;Kim, H.W.;Kim, D.B.;Oh, Y.M.
    • Transactions of Materials Processing
    • /
    • v.22 no.5
    • /
    • pp.264-268
    • /
    • 2013
  • Aluminum clad sheets for brazing materials in the automotive heat exchangers are required to exhibit both high strength and excellent erosion resistance. In this study, the effects of microstructural changes on the property of clad sheets due to thermomechanical treatment were investigated. The clad sheets were fabricated by roll bonding of twin-roll-cast AA3527 and AA4343 alloys followed by cold rolling down to a thickness of 0.22mm. Partial or full annealing was conducted at the final thickness in order to improved the erosion resistance while keeping the proper strength. Since full annealing was achieved for a temperature of $400^{\circ}C$, annealing treatments were performed at 360, 380, and $400^{\circ}C$, respectively. The tensile strength of 3527/4343 clad material was found to be inversely proportional to the annealing temperature before the brazing heat treatment. After this latter treatment, however, the tensile strength of the clad material was about 195~200MPa regardless of the annealing temperature. The erosion depth ratio of the clad annealed at $400^{\circ}C$ was 8.8% (the lowest), while that of the clad annealed at $380^{\circ}C$ was 17% (the highest). The effect of annealing temperature on the tensile and erosion properties of 3527/4343 aluminum clad sheets was elucidated by means of microstructural analyses.

Effect of Annealing Heat Treatment to Corrosion Resistance of a Copper (구리의 내식성에 미치는 어닐링 열처리의 영향)

  • Kim Jin-Kyung;Moon Kyung-Man;Lee Jin-Kyu
    • Journal of Advanced Marine Engineering and Technology
    • /
    • v.29 no.6
    • /
    • pp.654-661
    • /
    • 2005
  • Copper is a well known alloying element that is used to improve the resistance to general corrosion of stainless steel And also Cu cation have the anti-fouling effect to inhibit adhesion of the marine algae and shellfish to the surface of heat exchanger cooling pipe or outside wall of the ship, Therefore there are some anti-fouling methods such as anti-fouling Paint mixed with copper oxide or MGPS(Marine Growth Preventing System) by using Cu cation dissolved to the sea wather solution. Cu cation can be dissolved spontaneously by galvanic current due to Potential difference between Cu and cooling pipe of heat exchanger with Ti material, which may be one of the anti-fouling designs. In this study the effect of annealing heat treatment to galvanic current and Polarization behavior was investigated with a electrochemical points of view such as measurement of corrosion Potential, anodic polarization curve. cyclic voltammetric curve, galvanic current etc The grain size of the surface in annealed at $700^{\circ}C$ was the smallest than that of other annealing temperatures. and also the corrosion Potential showed more positive potential than other annealing temperatures. The galvanic current between Ti and Cu with annealed at $700^{\circ}C$ was the largest value in the case of static condition. However its value in the case of flow condition was the smallest than the other temperatures. Therefore in order to increase anti-fouling effect by Cu cation, the optimum annealing temperature in static condition of sea water is $700^{\circ}C$, however non- heat treated specimen in the case of flow condition may be desirable.

Effect of Annealing Temperature on the Electrical Performance of SiZnSnO Thin Film Transistors Fabricated by Radio Frequency Magnetron Sputtering

  • Kim, Byoungkeun;Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
    • /
    • v.18 no.1
    • /
    • pp.55-57
    • /
    • 2017
  • Amorphous oxide thin film transistors (TFTs) were fabricated with 0.5 wt% silicon doped zinc tin oxide (a-0.5SZTO) thin film deposited by radio frequency (RF) magnetron sputtering. In order to investigate the effect of annealing treatment on the electrical properties of TFTs, a-0.5SZTO thin films were annealed at three different temperatures ($300^{\circ}C$, $500^{\circ}C$, and $700^{\circ}C$ for 2 hours in a air atmosphere. The structural and electrical properties of a-0.5SZTO TFTs were measured using X-ray diffraction and a semiconductor analyzer. As annealing temperature increased from $300^{\circ}C$ to $500^{\circ}C$, no peak was observed. This provided crystalline properties indicating that the amorphous phase was observed up to $500^{\circ}C$. The electrical properties of a-0.5SZTO TFTs, such as the field effect mobility (${\mu}_{FE}$) of $24.31cm^2/Vs$, on current ($I_{ON}$) of $2.38{\times}10^{-4}A$, and subthreshold swing (S.S) of 0.59 V/decade improved with the thermal annealing treatment. This improvement was mainly due to the increased carrier concentration and decreased structural defects by rearranged atoms. However, when a-0.5SZTO TFTs were annealed at $700^{\circ}C$, a crystalline peak was observed. As a result, electrical properties degraded. ${\mu}_{FE}$ was $0.06cm^2/Vs$, $I_{ON}$ was $5.27{\times}10^{-7}A$, and S.S was 2.09 V/decade. This degradation of electrical properties was mainly due to increased interfacial and bulk trap densities of forming grain boundaries caused by the annealing treatment.

Effects of Heat Treatment Conditions on Microstructure and Corrosion Resistance of Cu-contained Zr-Nb Alloy (Cu 첨가된 Zr-Nb계 합금에서 열처리조건이 미세조직과 내식성에 미치는 영향)

  • Choi, Byung Kwon;Baek, Jong Hyuk;Jeong, Yong Hwan
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.17 no.4
    • /
    • pp.223-229
    • /
    • 2004
  • The effects of the cooling and annealing conditions on the microstructures and corrosion properties were investigated for the Cu-contained Zr-Nb alloy (Zr-1.1Nb-0.07Cu). After annealing at $1050^{\circ}C$ for 15 min, the specimens were cooled by three methods of water quenching, air cooling, and furnace cooling. Widmanstatten structures were developed in both air- and furnace-cooled specimens, and the Widmanstatten plate width of the furnace-cooled specimens was wider than that of the air-cooled ones. The weight gain in the furnace-cooling case was higher than that in the air-cooling case. This could be the reason why the diffusion time was more enough during the furnace cooling than the air cooling. The oxide of the furnace-cooled specimen was nonunformly formed just beneath the Widmanstatten plate boundaries, where ${\beta}_{Zr}$ phases were exised concentrately. Compared with the $640^{\circ}C$ annealing after the water quenching, the $570^{\circ}C$ annealing could make the ${\beta}_{Nb}$ phases and a concomitant reduction of the Nb in the matrix, and then it could improve the corrosion resistance with the increase of the annealing time. It would be concluded that the corrosion resistance of the Zr-1.1Nb-0.07Cu was good when the Nb concentration in the matrix was reached at an equilibrium level and then the ${\beta}_{Nb}$ phase was formed.

Influence of Annealing treatment on the properties of B doped ZnO:Ga transparent conduction films (열처리 효과에 따른 GZOB 투명 전도막의 특성)

  • Lee, Jong-Hwan;Lee, Kyu-Il;Yu, Hyun-Kyu;Lee, Tae-Yong;Kang, Hyun-Il;Kim, Eung-Kwon;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.132-132
    • /
    • 2008
  • Boron doped ZnO:Ga(GZOB) thin films were prepared on glass substrates by DC magnetron sputtering. Influence of the annealing treatment on the electrical and optical properties of GZOB thin films were investigated. The west resistivity of $9.6\times10^{-4}\Omega$-cm was obtained at an annealing temperature of $400^{\circ}C$. The average transmittance of the films is over 80% in the visible range. It was also shown that by introducing boron impurity into GZO system improve the uniformity, the resistivity, and thermal stability of ZnO-based conducting thin films.

  • PDF

Effect of annealing on the properties of zinc doped indium oxide(IZO) films (후열처리에 따른 Indium Zinc Oxide(IZO) 박막의 특성변화)

  • Kim, Dae-Hyun;Kim, Sang-Mo;Choi, Hyung-Wook;Kim, Kyung-Hwan;Rim, You-Seong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.260-261
    • /
    • 2008
  • In this study, we investigated the properties of Indium Zinc Oxide (IZO) films prepared in facing targets sputtering (FTS) system at room temperature as function of oxygen contents. As as-deposited films were rapidly thermal annealing on air atmosphere of $400^{\circ}C$ for 30s. As a result, the transmittance of IZO films increased with increasing oxygen flow in the visible range. After rapidly thermal annealing to films, the optical properties of films improved than films deposited at R.T, but the electrical properties decreased. Before RTA treatment, the lowest resistivity IZO is $5.4\times10^{-4}[\Omega{\cdot}cm]$ at oxygen gas flow. But, after RTA treatment, IZO films have the value of lowest resistivity at the lower oxygen gas ratio in compare with before RTA treatment. The resistivity of IZO films is $7.29\times10^{-4}[\Omega{\cdot}cm]$ at pure argon atmosphere.

  • PDF

Effects of Heat-treatment Parameters on Mechanical Properties of A3003 Al Alloy Tubes for Heat-exchangers by High Frequency Induction Welding (고주파유도 용접된 A3003 알루미늄합금 튜브의 기계적 특성에 미치는 열처리조건의 영향)

  • Gook, Jin-Seon;Yoon, Dong-Ju;Kim, Byung-Il
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.19 no.3
    • /
    • pp.156-162
    • /
    • 2006
  • The aim of this study is to investigate the full annealing parameter for A3003 Al alloy welded tubes. The A3003 Al alloy tubes with 34 mm in external diameter and 1.3 mm in thickness for OPC drum were manufactured by high frequency induction welding with the V shaped convergence angle $6.7^{\circ}$ and power input 50 kW. The tensile and yield strength decreased with increasing the annealing temperature and time remarkably, but elongation increased remarkably. Vickers hardness in welds and base metal decreased with increasing the annealing temperature and time remarkably. In a certain experimental condition, the welds line in A3003 alloys disappeared at $520^{\circ}C$ for 4hr because of the same mechanical properties and structures between welds and base metal.

Influence of Annealing treatment on the properties of B doped ZnO:Al transparent conduction films (열처리 효과에 따른 AZOB 투명 전도막의 특성)

  • Lee, Jong-Hwan;Lee, Kyu-Il;Yu, Hyun-Kyu;Lee, Tae-Yong;Kang, Hyun-Il;Jeong, Kyu-Won;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.06a
    • /
    • pp.194-194
    • /
    • 2008
  • Boron doped ZnO:Al(AZOB) thin films were prepared on glass substrates by dc magnetron sputtering. Influence of the annealing treatment on the electrical and optical properties of AZOB thin films were investigated. The lowest resistivity of $1.6\times10^{-3}\Omega$-cm was obtained at an annealing temperature of $400^{\circ}C$. The average transmittance of the films is over 80% in the visible range. It was also shown that by introducing boron impurity into AZO system improve the uniformity, the resistivity, and thermal stability of ZnO-based conducting thin films.

  • PDF

The Effect of Calcium on Microstructure of AZ61 Magnesium Alloy during Annealing Heat Treatment (AZ61 마그네슘 합금의 어닐링 중 Ca의 첨가에 따른미세조직 변화에 미치는 영향)

  • Kim, Kibeom;Jeon, Joonho;Kim, Kwonhoo
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.34 no.2
    • /
    • pp.53-59
    • /
    • 2021
  • Due to high specific strength and low density, AZ series magnesium alloys have been receiving high interest as a lightweight material. However, their industrial application is limited due to the phenomenon that the strength decreases at elevated temperature by the occurrence of softening effect because of the Mg17Al12 phase decomposition. To solve this problem, many research were conducted to increase the high-temperature strength by forming a thermal stable second-phase component by adding new elements to the AZ magnesium. Especially, adding Ca to AZ magnesium has been reported that Ca forms the new second-phase. However, studies about the analysis of decomposition or precipitation temperature, formation composition, and components to understand the formation behavior of these precipitated phases are still insufficient. Therefore, the effect of Ca addition to AZ61 on the phase change and microstructure of the alloy during annealing was investigated. As a result of analysis of the initial and heat-treated specimen, AZ61 formed α-Mg matrix and precipitated phase of Mg17Al12, and AZX611 formed one more type of precipitated phase, Al2Ca. Also, Al2Ca was thermal stable at high temperatures. And after annealing, the laves phase was decomposed to under 10 ㎛ size and distributed in matrix.