• Journal of Electrical Engineering and Technology
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• v.2 no.2
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• pp.274-279
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• 2007

This study focuses on the enhancement of maskless photolithography as well as the peptide synthesis application with single crystalline silicon micromirrors. A single crystalline silicon micromirror array has been designed and fabricated in order to improve its application to the peptide synthesis. A micromirror rotates about ${\pm}\;9^{\circ}$ at the pull-in voltage, which can range from 90.7 V to 115.1 V. A $210\;{\mu}m-by-210\;{\mu}m$ micromirror device with $270\;{\mu}m$ mirror pitch meets the requirements of an adequately precise separation for peptide synthesis. Synthetic 16 by 16 peptide array corresponds to the same number of micromirrors. The large size of peptide pattern and the separation facilitate biochip experiments using fluorescence assay. The peptide pattern has been synthesized on the GPTS-PEG200 surface with BSA-blocking and thereupon the background was acetylated to reject non-specific bindings. Hence, an averaged slope at the pattern edge has been distinguishably improved in comparison to patterning results from an aluminum micromirror.

• Proceedings of the KIEE Conference
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• 1996.11a
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• pp.416-418
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• 1996

A $50{\times}50{\mu}m^2$ aluminum micromirror array is fabricated using surface micromachining technology. $50{\times}50$ micromirrors are arrayed two dimensionally. The micromirror plate is supported by a vertical spring structure that is placed underneath the mirror plate. When the mirror plates reflect a light, the micromirror array un have large effective reflecting area. Fabrication of vertical spring uses only one mask and shadow evaporation process.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.8
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• pp.487-494
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• 2000

This paper describes the design, fabrication and experiments of surface-micromachined aluminum micromirror array with hidden pin-joints. Instead of the conventional elastic spring components as connection between mirror plate and supporting structure, we used pin-joint composed of pin and staples to support the mirror plate. The placement of pin-joint under the mirror plate makes large active surface area possible. These flexureless micromirrors are driven by electrostatic force. As the mirror plate has discrete deflection angles, the device can be ap;lied to adaptive optics and digitally-operating optical applications. Four-level metal structural layers and semi-cured photoresist sacrificial layers were used in the fabrication process and sacrificial layers were removed by oxygen plasma ashing. Static characteristics of fabricated samples were measured and compared with modeling results.

• JSTS:Journal of Semiconductor Technology and Science
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• v.2 no.4
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• pp.288-294
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• 2002

This paper presents the design, fabrication and characterization of a 32 by 32 electroplated micromirror array on a glass, a low cost substrate. Approaches taken in this work for the fabrication of micromachined mirror arrays include a line addressing scheme, a seamless array design for high fill factor, planarization techniques of polymeric interlayers, a high yield methodology for the removal of sacrificial polymeric interlayers, and low temperature and chemically safe fabrication techniques. The micromirror is fabricated by aluminum and the size of a single micromirror is 200 $\mu\textrm{m}{\;}{\times}200{\;}\mu\textrm{m}$. Static deflection test of the micro-mirror has been carried out and pull-in voltage of 44V and releasing voltage of 30V was found.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.618-620
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• 1997

A $50{\times}50{\mu}m^2$ aluminum micromirror array is fabricated using shadow evaporation process. The fabrication process is very simple with use of shadow evaporation process, and the micromirror array has a high fill-factor. The static and dynamic characteristics such as deflection angle vs. applied voltage, step response, and frequency response are measured using a contact free optical measurement technique. The downward threshold voltage was 8 V, step response time was $13.5{\mu}s$ when 32 V step voltage applied, and a resonance observed at 11kHz. The lifetime of micromirror with anti-stiction coating was tested and micromirror operated successfully over 200 million cycles of touch-down operations.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.11
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• pp.748-754
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• 1999

Micromirrors supported by S-shape girders were fabricated and their angular deflections were measured using a laser-based system. A micromirror consists of a $50\mum\times50\mum$ aluminum plate, posts and an S-shape girder. Two electrodes were deposited on two corners of the substrate beneath the mirror plate. $50\times50$micromirror array were fabricated using the Al-MEMS process. The electrostatic force caused by the voltage difference between the mirror plate and one of the electrodes causes the mirror plate to tilt until the girder touches the substrate. Bial voltage of the mirror plate is between 25~35V and signal pulse voltage on both electrodes is $\pm5V$. A laser-based system capable of real-time two-dimensional angular deflection measurement of the micromirror was developed. The operation of the system is based on measuring the displacement of a HeNe laser beam reflecting off the micromirror. The resonant frequency of the micromirror is 50kHz when the girder touches the substrate and it is 25 when the micromirror goes back to flat position, since the moving mass is about twice of the former case. The measurement results also revealed that the micromirror slants to the other direction even after the girder touches the substrate.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.2
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• pp.132-139
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• 2001

We considered the uniformity of fabricated micromirror arrays by characterizing the fabrication process and calculating the appropriate driving voltages of micromirrors used as virtual photomask in maskless photolithography. The uniformity of the micromirror array in terms of driving voltage and optical characteristics is adversely affected by factors, such as the air gap between the bottom electrode and the mirror plate, the spring shape and the deformation of the mirror plate or torsion spring. The thickness deviation of the photoresist sacrificial layer, the misalignment between mirror plate and bottom electrode, the aluminum deposition condition used to produce the spring and the mirror plate, and initial mirror deflection were identified as key factors. Their importance lies in the fact that they are related to air gap deviations under the mirror plate, asymmetric driving voltages in left and right mirror directions, and the deformation of the Al sring or mirror plate after removal of the sacrificial layer. The plasma ashing conditions used for removing the sacrificial layer also contributed to the deformation of the mirror plate and spring. Driving voltages were calculated for the pixel operation of the micromirror array, and the non-uniform characteristics of fabricated micromirrors were taken into consideration to improve driving performance reliability.

• Proceedings of the KIEE Conference
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• 2007.11a
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• pp.150-151
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• 2007

We present an one-axis parallel-plate type of bulk micromachined torsional micromirror array with single crystalline silicon (SCS) fabricated on the glass substrate. Structurally, bottom electrodes (amophous silicon) in this mirror are DRIEed along the aluminum mirror patterns on SCS, which are self-aligned with mirror plates. Tracing the history of the micromirror study, we found that few papers have been published on research for uniform driving voltages based upon the tilting direction. If there is a slight misalignment during anodic bonding between top (mirror plate) and bottom electrodes, the non-uniformity of driving voltage will be led depending on two different tilting direction. This paper discusses how much the pull-in voltages can be different due to misalignment between two electrodes. Moreover, We achieve uniform pull-in voltage regardless of misalignments in photolithography and anodic-bonding between two individual layers.