JSTS:Journal of Semiconductor Technology and Science

The Institute of Electronics and Information Engineers (대한전자공학회)
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A 32 by 32 Electroplated Metallic Micromirror Array

  • Lee, Jeong-Bong (Erik Jonsson School of Engineering and Computer Science, University of Taxas)
  • Published : 2002.12.01
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Abstract

This paper presents the design, fabrication and characterization of a 32 by 32 electroplated micromirror array on a glass, a low cost substrate. Approaches taken in this work for the fabrication of micromachined mirror arrays include a line addressing scheme, a seamless array design for high fill factor, planarization techniques of polymeric interlayers, a high yield methodology for the removal of sacrificial polymeric interlayers, and low temperature and chemically safe fabrication techniques. The micromirror is fabricated by aluminum and the size of a single micromirror is 200 $\mu\textrm{m}{\;}{\times}200{\;}\mu\textrm{m}$. Static deflection test of the micro-mirror has been carried out and pull-in voltage of 44V and releasing voltage of 30V was found.

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