• Title/Summary/Keyword: Aluminum

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Simulation and Design of Optimized Three-Layer Radiation Shielding to Protect Electronic Boards of Satellite Revolving in Geostationary Earth Orbit (GEO) Orbit against Proton Beams

  • Ali Alizadeh;Gohar Rastegarzadeh
    • Journal of Astronomy and Space Sciences
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    • v.41 no.1
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    • pp.17-23
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    • 2024
  • The safety of electronic components used in aerospace systems against cosmic rays is one of the most important requirements in their design and construction (especially satellites). In this work, by calculating the dose caused by proton beams in geostationary Earth orbit (GEO) orbit using the MCNPX Monte Carlo code and the MULLASSIS code, the effect of different structures in the protection of cosmic rays has been evaluated. A multi-layer radiation shield composed of aluminum, water and polyethylene was designed and its performance was compared with shielding made of aluminum alone. The results show that the absorbed dose by the simulated protective layers has increased by 35.3% and 44.1% for two-layer (aluminum, polyethylene) and three-layer (aluminum, water, polyethylene) protection respectively, and it is effective in the protection of electronic components. In addition to that, by replacing the multi-layer shield instead of the conventional aluminum shield, the mass reduction percentage will be 38.88 and 39.69, respectively, for the two-layer and three-layer shield compared to the aluminum shield.

Fabrication of Aluminum Matrix Composite Reinforced with Al0.5CoCrCuFeNi High-Entropy Alloy Particles

  • Min Sang Kim;Han Sol Son;Gyeong Seok Joo;Young Do Kim;Hyun Joo Choi;Se Hoon Kim
    • Archives of Metallurgy and Materials
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    • v.67 no.4
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    • pp.1543-1546
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    • 2022
  • The aluminum composite with dispersed high entropy alloy were developed by stir casting involving the powder-in-tube method. First, Al0.5CoCrCuFeNi high entropy alloy (HEA) powder was made by mechanical alloying, and the powder was extruded in a tube-type aluminum container to form HEA precursor. The extruded HEA precursor was then dispersed in the aluminum matrix via stir casting. As a result, Fe-Cr-Ni based high-entropy phases was uniformly formed in the aluminum matrix, revealing ~158, 166, 235% enhancement of tensile strength by incorporating 1, 3, and 5 wt% HEA particles, respectively.

Fabrication of Porous Aluminum Oxide Using Flexible Thin Aluminum Foils (유연하고 얇은 알루미늄 포일을 사용한 다공성 알루미나 막 제작)

  • Park, Young-Ok;Kim, Seung-Woo;Kouh, Tae-Joon
    • Journal of the Korean Magnetics Society
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    • v.17 no.2
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    • pp.90-94
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    • 2007
  • We have fabricated porous aluminum oxide using flexible and thin aluminum foils with thickness of 0.025 and 0.2 mm. These foils were anodized with 0.3 M oxalic acid solution after being electropolished with ethanol/perchloric acid. During the anodization, the temperature of the electrolyte was maintained at $9^{\circ}C$ and the anodization voltage was varied between 0.4 and 40 V The surface of the anodized aluminum oxide was studied with a scanning electron microscope. From the scanning electron micrograph, we observed that when the voltage applied was above 1 V for a long period of time, due to a strong electrolysis reaction in electrolyte, the surface of the anodized oxide was destroyed. However, when the anodization voltage was less than 1 V, the anodization process was very stable and lasted much longer. Our results show that for a thin aluminum foil, unlike a thick plate, one requires small anodization voltage less than 1 V to form a porous aluminum oxide for long anodization time.

Effects of Ni layer as a diffusion barrier on the aluminum-induced crystallization of the amorphous silicon on the aluminum substrate (알루미늄 기판 상의 Ni layer가 a-Si의 AIC(Aluminum Induced Crystallization)에 미치는 영향)

  • Yun, Won-Tae;Kim, Young-Kwan
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.22 no.2
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    • pp.65-72
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    • 2012
  • Aluminum induced crystallization of amorphous silicon was attempted by the aluminum substrate. To avoid the layer exchange between silicon and aluminum layer, Ni layer was deposited between these two layers by sputtering. To obtain the bigger grain of the crystalline silicon, wet blasted silica layer was employed as windows between the nickel and a-Si layer. Ni obtained after the annealing treatment at $520^{\circ}C$ was found to be a promising material for the diffusion barrier between silicon and aluminum. One way to obtain bigger grain of crystalline silicon layer applicable to solar cell of higher performance was envisioned in this investigation.

Synthesis of high purity aluminum nitride nanopowder by RF induction thermal plasma (유도결합 열 플라즈마를 이용한 고순도 질화알루미늄 나노 분말 합성)

  • Kim, Kyung-In;Choi, Sung-Churl;Han, Kyu-Sung;Hwang, Kwang-Taek;Kim, Jin-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.1
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    • pp.1-7
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    • 2014
  • Aluminum nitride, which has outstanding properties such as high thermal conductivity and electrical resistivity, has been received a great attention as a substrate and packaging material of semiconductor devices. Since aluminum nitride has a high sintering temperature of 2173 K and its properties depends on the impurity level, it is necessary to synthesize high-purity and nano-sized aluminum nitride powders for the applications. In this research, we synthesized high purity aluminum nitride nanopowders from aluminum using RF induction thermal plasma system. Sheath gas (NH3) flow was controlled to establish the synthesis condition of high purity aluminum nitride nanopowders. The obtained aluminum nitride nanopowders were evaluated by XRD, SEM, TEM, BET, FTIR and N-O analysis.

Fabrication of uniform micropattern arrays using nonionic surfactant-based wet etching process of high purity aluminum (비이온계 계면활성제기반 고순도 알루미늄 습식식각을 통한 균일한 마이크로패턴 어레이 제작)

  • Jang, Woong-Ki;Jeon, Eun Chae;Choi, Doo Sun;Kim, Byeong Hee;Seo, Young Ho
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.13 no.4
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    • pp.13-20
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    • 2014
  • In this paper, the effects of a nonionic surfactant on the etch uniformity and the etch profile during the wet-etching process of high-purity aluminum were investigated for the fabrication of uniform micropattern arrays. To improve the surface roughness of a high-purity aluminum plate, a mechanical lapping process and an electrolytic polishing process were used. After electrolytic polishing process, the surface roughness, Ra, of the high-purity aluminum plate was improved from $1.25{\mu}m$ to $0.02{\mu}m$. A photoresist was used as an etching mask during the aluminum etching process, where the mixture of phosphoric acid, acetic acid, nitric acid, a nonionic surfactant and water was used as the aluminum etchant. Different amounts of the Triton X-100 nonionic surfactant were added to the aluminum etchant to investigate the effect of a nonionic surfactant during the wet-etching process of high-purity aluminum. The etch rate and the etch profile were measured by an optical interferometer and a scanning electron microscope.

Preparation of Castable Refractories by Recycling of Aluminum Dross (알루미늄드로스를 재활용한 캐스타블내화물 제조)

  • Park Hyungkyu;Lee Hooin;Lee Jinyoung
    • Resources Recycling
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    • v.12 no.3
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    • pp.46-53
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    • 2003
  • Recycling of aluminum dross is an important issue in the secondary aluminum industries. In this study, aluminum dross generated in the domestic secondary aluminum industry was processed to use it as raw material for producing alumina refractories. Sample dross was classified according to its size. The dross smaller than 1 mm was leached with sodium hydroxide solution to extract the remained aluminum from the dross into the solution. and then aluminum hydroxide precipitate was recovered from the leach liquor. The waste residue in the leaching was washed, dried and roasted. Most remained metallic components in the residue was changed into oxide through the processes. The roasted dross was made into alumina castable refractories by mixing with aggregates and a binder. Bending strength of the tested castable specimen was over $25\;kg/\textrm{m}^2$ and compressive strength over $80\;kg/\textrm{cm}^2$, which satisfied the Korean Standard value respectively. From the results, it was suggested that this process could be applicable to recycling of aluminum dross.

Isolation and Expression of Aluminum Induced Protein(ClAIP) Gene from Codonopsis lanceolata (더덕에서 Aluminum Induced Protein (ClAIP) 유전자의 분리 및 발현분석)

  • 양덕춘;김종학;인준교;이범수;이강
    • Korean Journal of Plant Resources
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    • v.17 no.3
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    • pp.289-296
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    • 2004
  • A cDNA clone (GenBank accession no. CF924621) homologous to aluminum induced protein gene was isolated and characterized from Codonopsis lanceolata (ClAIP). The ClAIP is 906 nucleotides long and has an open reading frame of 711 bp with a deduced amino acid sequence of 236 residues. The ClAIP shows high homology to A. marina (84%), G. hirsutum(83%), V. radiata (83%), A. thaliana (80%), B. nap us (78%) and T. aestivum (68%). The deduced amino acid sequence of ClAIP also has homology to the N-terminal end of plant Asn synthetase. This region does not contain the active sites of the enzyme and the significance of this conservation is currently not clear. To investigate the expression of ClAIP against several heavy metal stresses, we treated the sliced tap root of C. lanceolata with various heavy metals. The expression of ClAIP was increased by 25 uM $Al_2$(SO$_3$)$_4$ in proportion to incubation time and also increased by 50 uM CdCl$_2$.

Effects of Aluminum purity and surface condition for fabricate Nano-sized Porous using Anodic Oxidation (알루미늄 순도 및 표면처리가 나노기공의 형성에 미치는 영향)

  • Lee, Byoung-Wook;Lee, Jae-Hong;Jang, Suk-Won;Kim, Chang-Kyo
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1573-1575
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    • 2004
  • An alumina membrane with nano-sized pores was fabricated by anodic oxidation. The shape and structure of the pore on alumina membrane were changed according to the roughness of aluminum surface. The shape and structure of the nano-sized pre were investigated according to purity of aluminum substrate for the anodization process. The aluminum substrates with 99.5% and 99.999% purities were used. The aluminum substrate(99.5%) was anodized after the processes of pressing, mechanical polishing, chemical polishing, and electrochemical polishing. The nano-sized pores with the pore size of 50 - 100nm, the cell size of 20-50nm and the thickness of $10{\mu}m{\sim}45{\mu}m$ were obtained. Even though the electrochemical polishing was used for the aluminum substrate (99.999%), the same characteristics as the aluminum substrate (99.5%) was obtained. The alumina membrane prepared by anodization for 5 min using fixed voltage method shows the pore with irregular shape. The pore shape was changed to regular shape after pore widening process.

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