• Title/Summary/Keyword: Alloy target

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Effects of Deposition Conditions on Properties of CuNi thin Films Fabricated by Co-Sputtering of Dual Targets (이중 타겟의 동시 스퍼터링을 이용한 CuNi 박막 제작시 증착변수가 박막의 물성에 미치는 영향)

  • Seo, Soo-Hyung;Lee, Jae-Yup;Park, Chang-Kyun;Park, Jin-Seok
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.50 no.1
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    • pp.11-16
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    • 2001
  • CuNi alloy films are deposited by co-sputtering of dual targets (Cu and Ni, respectively). Effects of the co-sputtering conditions, such as powers applied to the targets, deposition pressures, and substrate temperatures, on the structural and electrical properties of deposited films are systematically investigated. The composition ratio of Ni/Cu is almost linearly decreased by increasing the DC power applied to the Cu target from 25.6 W to 69.7 W with the RF power applied to the Ni target unchanged(140 W). it is noted that the chamber pressure during deposition and the film thickness give rise to a change of the Ni/Cu ratio within the films deposited. The former may be due to a higher sputtering yield of Cu atom and the latter due to the re-sputtering phenomenon of Cu atoms on the surface of deposited film. The film deposited at higher pressures or at lower substrate temperatures have a smaller crystallite size, a higher electrical resistivity, and much more voids. This may be attributed to a lower surface mobility of sputtered atoms over the substrate.

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Characteristics of Ta-Ti Gate Electrode for NMOS Device (NMOS 소자의 Ta-Ti 게이트 전극 특성)

  • Kang, Young-Sub;Seo, Hyun-Sang;Noh, Young-Gin;Lee, Chung-Keun;Hong, Shin-Nam
    • Journal of Advanced Navigation Technology
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    • v.7 no.2
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    • pp.211-216
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    • 2003
  • In this paper, characteristics of Ta-Ti alloy was studied as a gate electrode for NMOS devices to replace the widely used polysilicon. Ta-Ti alloy was deposited directly on $SiO_2$ by a co-sputtering method using two of Ta and Ti targets. The sputtering power of each metal target was 100W. To compare with Ta-Ti, Ta deposited with a 100W sputtering power was fabricated as well. In order to investigate the thermal/chemical stability of the Ta-Ti alloy gate, the alloy was annealed at $600^{\circ}C$ with rapid thermal annealer. No appreciable degradation of the device was observed. Also the results of electrical analysis showed that the work function of Ta-Ti metal alloy was about 4.1eV which was suitable for NMOS devices and sheet resistance of alloy was lower than that of polysilicon.

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Characterization of the Vanadium Alloy Thin Films Coated by Sputtering (스퍼터링을 이용한 바나듐 합금 박막화에 관한 연구)

  • Yoon, Yongho;Jung, Jihoon
    • Korean Chemical Engineering Research
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    • v.54 no.5
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    • pp.598-605
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    • 2016
  • V-Cr-Y alloy is a material for hydrogen separation membrane possessing high transmittance and selectivity. In order to increase the rate of hydrogen permeation flux through the membrane, V-Cr-Y thin film was prepared using a sputtering technique and was investigated focusing on its basic properties. Thin film was deposited on a silicon wafer using a target including V (89.8%), Cr (10.0%) and Y(0.2%), and results of EDS analysis confirm that the ratio of metal in thin film agrees with that in the target. Higher sputtering temperature and power resulted in more rapid growth rate of the thin film and larger size of the crystals, and denser and finer crystal structure was observed when lower pressure was applied. An optimal sputtering condition was found with RF, 2mTorr, 300W and ambient temperature, and a suitable V-Cr-Y thin film for hydrogen separation was obtained upon heat treatment of the thin film prepared in this way.

Dynamic numerical simulation of plastic deformation and residual stress in shot peening of aluminium alloy

  • Ullah, Himayat;Ullah, Baseer;Muhammad, Riaz
    • Structural Engineering and Mechanics
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    • v.63 no.1
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    • pp.1-9
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    • 2017
  • Shot peening is a cold surface treatment employed to induce residual stress field in a metallic component beneficial for increasing its fatigue strength. The experimental investigation of parameters involved in shot peening process is very complex as well as costly. The most attractive alternative is the explicit dynamics finite element (FE) analysis capable of determining the shot peening process parameters subject to the selection of a proper material's constitutive model and numerical technique. In this study, Ansys / LS-Dyna software was used to simulate the impact of steel shots of various sizes on an aluminium alloy plate described with strain rate dependent elasto-plastic material model. The impacts were carried out at various incident velocities. The influence of shot velocity and size on the plastic deformation, compressive residual stress and force-time response were investigated. The results exhibited that increasing the shot velocity and size resulted in an increase in plastic deformation of the aluminium target. However, a little effect of the shot velocity and size was observed on the magnitude of target's subsurface compressive residual stress. The obtained results were close to the published ones, and the numerical models demonstrated the capability of the method to capture the pattern of residual stress and plastic deformation observed experimentally in aluminium alloys. The study can be quite helpful in determining and selecting the optimal shot peening parameters to achieve specific level of plastic deformation and compressive residual stress in the aluminium alloy parts especially compressor blades.

X-band RADAR Reflected Signal Measurement of Gallium-based Liquid Metal (갈륨에 기초한 액체금속 X밴드 레이더 반사신호 측정)

  • Minhyeok Kim;Sehyeok Kang;Seok-Joo Doo;Daeyoung Kim
    • Journal of the Korea Institute of Military Science and Technology
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    • v.26 no.3
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    • pp.246-251
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    • 2023
  • RADAR(Radio Detection and Ranging) is an important system for surveillance and reconnaissance by detecting a reflected signal which obtains the range from the radar to the target, and the velocity of the target. The magnitude of the reflected signal varies due to the radar cross section of the target, characteristic of the transmission and reception antenna, distance between the radar and the target, and power and wavelength of the transmitted signal. Thus, the RCS is the important characteristic of the target to determine if the target can be observed by the RADAR system. It is based on the material and shape of the target. We have measured the reflection signal of a simple square-shaped (20 × 20 cm) target made of a new material, a gallium-based liquid metal alloy and compared that of well-known metals including copper, aluminum. The magnitude of reflected signal of the aluminum target was the largest and it was 2.4 times larger than that of the liquid metal target. We also investigated the effect of the shape by measuring reflectance of the F-22 3D model(~1/95 ratio) target covered with/without copper, aluminium, and liquid metal. The largest magnitude of the reflected signal measured from side-view with the copper-covered F-22 model was 2.6 times greater than that of liquid metal. The reflectance study of the liquid metal would be helpful for liquid metal-based frequency selective surface or metamaterials.

Spatial Distributions of Alloying Elements Obtained from Atom Probe Tomography of the Amorphous Ribbon Fe75C11Si2B8Cr4

  • Shin, Jinkyung;Yi, Seonghoon;Pradeep, Konda Gokuldoss;Choi, Pyuck-Pa;Raabe, Dierk
    • Korean Journal of Materials Research
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    • v.23 no.3
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    • pp.190-193
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    • 2013
  • Spatial distributions of alloying elements of an Fe-based amorphous ribbon with a nominal composition of $Fe_{75}C_{11}Si_2B_8Cr_4$ were analyzed through the atom probe tomography method. The amorphous ribbon was prepared through the melt spinning method. The macroscopic amorphous natures were confirmed using an X-ray diffractometer (XRD) and a differential scanning calorimeter (DSC). Atom Probe (Cameca LEAP 3000X HR) analyses were carried out in pulsed voltage mode at a specimen base temperature of about 60 K, a pulse to base voltage ratio of 15 %, and a pulse frequency of 200 kHz. The target detection rate was set to 5 ions per 1000 pulses. Based on a statistical analyses of the data obtained from the volume of $59{\times}59{\times}33nm^3$, homogeneous distributions of alloying elements in nano-scales were concluded. Even with high carbon and strong carbide forming element contents, nano-scale segregation zones of alloying elements were not detected within the Fe-based amorphous ribbon. However, the existence of small sub-nanometer scale clusters due to short range ordering cannot be completely excluded.

Fabrication of Alloy Target for Formation of Ti-Al-Si-N Composite Thin Film and Their Mechanical Properties (Ti-Al-Si-N 박막 제작을 위한 합금 타겟 제조 및 박막의 기계적 특성)

  • Lee, Han-Chan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.10
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    • pp.665-670
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    • 2016
  • Prevailing dissemination of machine tools and cutting technology have caused drastic developments of high speed dry machining with work materials of high hardness, and demands on the high-hardness-materials with high efficiency have become increasingly important in terms of productivity, cost reduction, as well as environment-friendly issue. Addition of Si to TiAlN has been known to form nano-composite coating with higher hardness of over 30 GPa and oxidation temperature over $1,000^{\circ}C$. However, it is not easy to add Si to TiAlN by using conventional PVD technologies. Therefore, Ti-Al-Si-N have been prepared by hybrid process of PVD with multiple target sources or PVD combined with PECVD of Si source gas. In this study, a single composite target of Ti-Al-Si was prepared by powder metallurgy of MA (mechanical alloying) and SPS (spark plasma sintering). Properties of he resulting alloying targets were examined. They revealed a microstructure with micro-sized grain of about $1{\sim}5{\mu}m$, and all the elements were distributed homogeneously in the alloying target. Hardness of the Ti-Al-Si-N target was about 1,127 Hv. Thin films of Ti-Al-Si-N were prepared by unbalanced magnetron sputtering method by using the home-made Ti-Al-Si alloying target. Composition of the resulting thin film of Ti-Al-Si-N was almost the same with that of the target. The thin film of Ti-Al-Si-N showed a hardness of 35 GPa and friction coefficient of 0.66.

Sintering and Rolling Behavior of Cu-50In-13Ga Ternary Alloy Powder for Sputtering Target (스퍼터링 타겟용 Cu-50In-13Ga 3원계 합금 분말의 소결 및 압연 거동)

  • Kim, Dae-Won;Kim, Yong-Ho;Kim, Jung-Han;Kim, Dae-Guen;Lee, Jong-Hyeon;Choi, Kwang-Bo;Son, Hyeon-Taek
    • Journal of Powder Materials
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    • v.19 no.4
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    • pp.264-270
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    • 2012
  • In this study, we mainly focus on the study of densification of gas-atomized Cu-50 wt.%In-13 wt.%Ga alloy powder without occurrence of crack during the forming process. Cu-50 wt.%In-13 wt.%Ga alloy powder was consolidated by sintering and rolling processes in order to obtain high density. The phase and microstructure of formed materials were examined by X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical microscopy (OM), respectively. Warm rolling using copper can result in the improvement of density. The specimen obtained with 80% of rolling reduction ratio at $140^{\circ}C$ using cooper can have the highest density of $8.039g/cm^3$.

Synthesis and Properties of a Ge2Sb2Te5 Sputtering for Use as a Target by Spark Plasma Sintering (방전 플라즈마 소결에 의한 Ge2Sb2Te5 스퍼터링 타겟 제조 및 특성)

  • Bang, C.W.;Kim, K.B.;Lee, J.K.
    • Journal of Powder Materials
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    • v.21 no.2
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    • pp.137-141
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    • 2014
  • In this study, we report the sintering behavior and properties of a $Ge_2Sb_2Te_5$ alloy powders for use as a sputtering target by spark plasma sintering. The effect of various sintering parameters, such as pressure, temperature and time, on the density and hardness of the target has been investigated in detail. Structural characterization was performed by scanning electron microscopy and X-ray diffraction. Hardness and thermal properties were measured by differential scanning calorimetry and micro-vickers hardness tester. The density and hardness of the sintered $Ge_2Sb_2Te_5$ materials were 5.8976~6.3687 $g/cm^3$ and 32~75 Hv, respectively.

EXPERIMENTAL VALIDATION OF THE BACKSCATTERING GAMMA-RAY SPECTRA WITH THE MONTE CARLO CODE

  • Hoang, Sy Minh Tuan;Yoo, Sang-Ho;Sun, Gwang-Min
    • Nuclear Engineering and Technology
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    • v.43 no.1
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    • pp.13-18
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    • 2011
  • In this study, simulations were done of a 661.6 keV line from a point source of $^{137}Cs$ housed in a lead shield. When increasing the scattering angle from 60 to 120 degrees with a 6061 aluminum alloy target placed at angles of 30 and 45 degrees to the incident beam, the spectra showed that the single scattering component increases and that the multiple scattering component decreases. The investigation of the single and multiple scattering components was carried out using a MCNP5 simulation code. The component of the single Compton scattering photons is proportional to the target electron density at the point where the scattering occurs. The single scattering peak increases according to the thickness of the target and saturates at a certain thickness. The signal-to-noise ratio was found to decrease according to the target thickness. The simulation was experimentally validated by measurements. These results will be used to determine the best conditions under which this method can be applied to testing electron densities or to assess the thickness of samples to locate defects in them.