• Title/Summary/Keyword: Al-doped 2nO

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Self-textured Al-doped ZnO transparent conducting oxide for p-i-n a-Si:H thin film solar cell

  • 김도영;이준신;김형준
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 추계학술발표대회
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    • pp.50.1-50.1
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    • 2009
  • Transparent conductive oxides (TCOs) play an important role in thin-film solar cells in terms of low cost and performance improvement. Al-doped ZnO (AZO) is a very promising material for thin-film solar cellfabrication because of the wide availability of its constituent raw materials and its low cost. In this study, AZO films were prepared by low pressurechemical vapor deposition (LPCVD) using trimethylaluminum (TMA), diethylzinc(DEZ), and water vapor. In order to improve the absorbance of light, atypical surface texturing method is wet etching of front electrode using chemical solution. Alternatively, LPCVD can create a rough surface during deposition. This "self-texturing" is a very useful technique, which can eliminate additional chemical texturing process. The introduction of a TMA doping source has a strong influence on resistivity and the diffusion of light in a wide wavelength range.The haze factor of AZO up to a value of 43 % at 600 nm was achieved without an additional surface texturing process by simple TMA doping. The use of AZO TCO resulted in energy conversion efficiencies of 7.7 % when it was applied to thep-i-n a-Si:H thin film solar cell, which was comparable to commercially available fluorine doped tin oxide ($SnO_2$:F).

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Al3+와 Y3+ 동시치환 SnO2 투명전극 박막의 전기적 특성 (Electrical Properties of Al3+ and Y3+ Co-doped SnO2 Transparent Conducting Films)

  • 김근우;서용준;성창훈;박근영;조호제;허시내;구본흔
    • 한국전기전자재료학회논문지
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    • 제25권10호
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    • pp.805-810
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    • 2012
  • Transparent conducting oxides (TCOs) have wide range of application areas in transparent electrode for display devices, Transparent coating for solar energy heat mirrors, and electromagnetic wave shield. $SnO_2$ is intrinsically an n-type semiconductor due to oxygen deficiencies and has a high energy-band gap more than 3.5 eV. It is known as a transparent conducting oxide because of its low resistivity of $10^{-3}{\Omega}{\cdot}cm$ and high transmittance over 90% in visible region. In this study, co-doping effects of Al and Y on the properties of $SnO_2$ were investigated. The addition of Y in $SnO_2$ was tried to create oxygen vacancies that increase the diffusivity of oxygen ions for the densification of $SnO_2$. The addition of Al was expected to increase the electron concentration. Once, we observed solubility limit of $SnO_2$ single-doped with Al and Y. $\{(x/2)Al_2O_3+(x/2)Y_2O_3\}-SnO_2$ was used for the source of Al and Y to prevent the evaporation of $Al_2O_3$ and for the charge compensation. And we observed the valence changes of aluminium oxide because generally reported of valence changes of aluminium oxide in Tin - Aluminium binary system. The electrical properties, solubility limit, densification and microstructure of $SnO_2$ co-doped with Al and Y will be discussed.

RF magnetron sputtering법으로 제조한 Al doped ZnO 박막의 산소함량과 압력변화에 따른 전기적 특성 변화 (Electrical properties of the Al doped ZnO thin films fabricated by RF magnetron sputtering system with working pressure and oxygen contents)

  • 김종욱;김홍배
    • 반도체디스플레이기술학회지
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    • 제9권4호
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    • pp.77-81
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    • 2010
  • The AZO thin films were deposited on the corning 1737 glass plate by the RF magnetron sputtering and effects of working pressure and oxygen contents on the electrical properties were investigated. XRD spectra showed a preferred orientation along the c-axis and a minimum FWHM for the 70mTorr. From the surface analysis (AFM), the number of crystal grain of AZO thin film increased as working pressure increased. The film deposited with 70mTorr of working pressure showed n-type semiconductor characteristic having suitable resistivity $-1.59{\times}10^{-2}{\Omega}cm$, carrier concentration $-10.1{\times}10^{19}cm^{-3}$, and mobility $-4.35cm^2V^{-1}s^{-1}$ while other films by 7 mTorr, 20 mTorr of working pressure closed to metallic films. The films including the oxygen represent stoichiometric composition similar to the oxide. The transmittance of the film was over 85% in the visible light range regardless of the changes in working pressure and oxygen contents.

유기금속화학기상증착법에 의한 ZnO:Al 필름 합성에서 플라즈마 인가 효과 (Effect of Plasma Enhancement on the Al-doped ZnO Thin Film Synthesis by MOCVD)

  • 서문규
    • 한국태양에너지학회 논문집
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    • 제39권1호
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    • pp.33-40
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    • 2019
  • Al-doped ZnO (AZO) thin films were synthesized on Si(100) wafers via plasma enhanced metal organic chemical vapor deposition (PE-MOCVD) method using diethyl zinc (DEZ) and N-methylpyrrolidine alane (MPA) as precursors. Effects of Al/Zn mixing ratio, plasma power on the surface morphology, crystal structure, and electrical property were investigated with SEM, XRD and 4-point probe measurement respectively. Growth rate of the film decreased slightly with increasing the Al/Zn mixing ratio, however electrical property was enhanced and resistivity of the film decreased greatly about 2 orders from $9.5{\times}10^{-1}$ to $8.0{\times}10^{-3}{\Omega}cm$ when the Al/Zn mixing ratio varied from 0 to 9 mol%. XRD analysis showed that the grain size increased with increasing the Al/Zn mixing ratio. Growth rate and electrical property were enhanced in a mild plasma condition. Resistivity of AZO film decreased down to $7.0{\times}10^{-4}{\Omega}cm$ at an indirect plasma of 100 W condition which was enough value to use for the transparent conducting oxide (TCO) material.

고에너지 볼밀링 방법에 의해 얻어진 초미립 AlN 분말의 치밀화 및 미세구조 (Densification and Microstructure of Ultrafine-sized AlN Powder Prepared by a High Energy Ball Milling Process)

  • 박해룡;김영도;류성수
    • 한국분말재료학회지
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    • 제19권1호
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    • pp.25-31
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    • 2012
  • In this study, a high energy ball milling process was employed in order to improve the densification of direct nitrided AlN powder. The densification behavior and the sintered microstructure of the milled AlN powder were investigated. Mixture of AlN powder doped with 5 wt.% $Y_2O_3$ as a sintering additive was pulverized and dispersed up to 50 min in a bead mill with very small $ZrO_2$ beads. Ultrafine AlN powder with a particle size of 600 nm and a specific surface area of 9.54 $m^2/g$ was prepared after milling for 50 min. The milled powders were pressureless-sintered at $1700^{\circ}C-1800^{\circ}C$ for 4 h under $N_2$ atmosphere. This powder showed excellent sinterability leading to full densification after sintering at $1700^{\circ}C$ for 4 h. However, the sintered microstructure revealed that the fraction of yitttium aluminate increased with milling time and sintering temperature and the newly-secondary phase of ZrN was observed due to the reaction of AlN with the $ZrO_2$ impurity.

BaCe$_{0.9}$R$_{0.1}$O$_3$-$\delta$(R=La, Yb, Al)계 페롭스카이트 상의 전기적 특성 (Electrical Characteristics of BaCe$_{0.9}$R$_{0.1}$O$_3$-$\delta$(R=La, Yb, Al) Based Perovskite Phase)

  • 최순목;김신;이홍림
    • 한국세라믹학회지
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    • 제36권1호
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    • pp.69-76
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    • 1999
  • BaCeO3 페롭스카이트 구조의 Ce4+ 자리에 3가의 양이온 (La3+, Yb3+, Al3+)을 10 mol% 첨가하여 열처리한 후 전기적 특성을 관찰하였다. 전기전도도 측정 결과 모든 조성에서 질소분위기에서 측정한 경우보다 대기 중에서 측정한 경우의 전기전도도가 높게 측정되었으며 이러한 경향은 온도가 높아질수록 두드러졌다. 전기전도도는 BaCe0.9Yb0.1O3-$\delta$조성에서 가장 높았고 BaCe0.9Al0.9O3-$\delta$ 조성에서 가장 낮았다. proton의 수송율(transference number)을 기전력 측정법을 통해 비교한 결과 Al을 첨가한 조성에서 모든 온도에 걸쳐 가장 높은 proton의 수송율을 얻을 수 있었다.

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Properties of ZnO:Al Films Prepared by Spin Coating of Aged Precursor Solution

  • Shrestha, Shankar Prasad;Ghimire, Rishi;Nakarmi, Jeevan Jyoti;Kim, Young-Sung;Shrestha, Sabita;Park, Chong-Yun;Boo, Jin-Hyo
    • Bulletin of the Korean Chemical Society
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    • 제31권1호
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    • pp.112-115
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    • 2010
  • Transparent conducting undoped and Al impurity doped ZnO films were deposited on glass substrate by spin coat technique using 24 days aged ZnO precursor solution with solution of ethanol and diethanolamine. The films were characterized by UV-Visible spectroscopy, X-ray diffraction (XRD), scanning electron microscope (SEM), electrical resistivity ($\rho$), carrier concentration (n), and hall mobility ($\mu$) measurements. XRD data show that the deposited film shows polycrystalline nature with hexagonal wurtzite structure with preferential orientation along (002) crystal plane. The SEM images show that surface morphology, porosity and grain sizes are affected by doping concentration. The Al doped samples show high transmittance and better resistivity. With increasing Al concentration only mild change in optical band gap is observed. Optical properties are not affected by aging of parent solution. A lowest resistivity ($8.5 \times 10^{-2}$ ohm cm) is observed at 2 atomic percent (at.%) Al. With further increase in Al concentration, the resistivity started to increase significantly. The decrease resistivity with increasing Al concentration can be attributed to increase in both carrier concentration and hall mobility.

1 wt% Y2O3 첨가계 AlN 세라믹스의 소결 조건에 따른 전기전도도 (Effects of Sintering Conditions on the Electrical Conductivity of 1 wt% Y2O3-Doped AlN Ceramics)

  • 이원진;이성민;심광보;김형태
    • 한국세라믹학회지
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    • 제44권2호
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    • pp.116-123
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    • 2007
  • Electrical properties of AlN ceramics sintered with 1 wt% $Y_2O_3$ have been investigated. From the impedance spectroscopy, electrical conductivity of grain boundary was found to be much lower than that of grain. DC conductivity measurement showed the electrode polarization effects caused by blocking electrode. The heat-treatment at $1700^{\circ}C$ of the specimen sintered at $1850^{\circ}C$ transformed continuous pain boundary phases along triple boundary junctions into isolated particles in grain comers. The heat-treatment induced decreases both in grain and grain boundary conductivity, and in DC electrical conductivities. From the analysis on the transference number, ionic conductivity was shown to be more dominant than electron conductivity, which was due to ion compensation mechanism during oxygen incorporation into grain.

증착 온도를 변화시켜 DC magnetron sputter로 증착한 Ga-doped ZnO 박막의 특성

  • 박지현;신범기;이민정;이태일;명재민
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 추계학술발표대회
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    • pp.41.2-41.2
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    • 2011
  • Display 산업의 확대로 인해 광학적 특성 및 전기적 특성이 우수한 TCO (Transparent conductive oxide) 연구가 활발히 진행되고 있다. 기존에는 ITO가 대부분의 분야에서 이용되었지만 In의 경제적인 단점으로 인해 새로운 대체물로써 ZnO가 떠오르고 있다. ZnO는 전형적인 n-type 반도체이며, wide band gap 물질로써 Al, Ga, B과 같은 3 족 원소를 doping 함으로써 광학적 및 전기적 특성을 향상시킬 수 있다. 최근에는 ZnO의 이온반경과 비슷한 Ga을 도핑한 Ga-doped ZnO 박막에 대한 연구가 활발히 진행되고 있다. 이는 ZnO에 Ga을 도핑함으로써 격자결함을 최소화 시키고 carrier concentration 및 hall mobility를 향상시켜 전기전도도의 향상을 이루기 때문이다. 본 연구에서는 $Ga_2O_3$이 3wt% doping 된 ZnO rotating cylindrical target 을 DC magnetron sputtering 을 이용하여 2 kW의 파워와 70 kHz의 주파수를 고정하고, 증착 온도를 변화시켜 유리 기판 위에 Ga-doped ZnO 박막을 증착 하였다. 증착 시 온도가 Ga-doped ZnO 박막에 미치는 영향을 관찰하기 위해 박막 표면의 조성을 분석하였고, 결정성 및 전기적 특성의 변화를 통해 박막의 특성을 비교 평가하였다. Ga-doped ZnO 박막의 표면과 두께는 SEM (Scanning electron microscope) 분석을 통해 관찰하였고, XRD (X-ray diffractometer) 를 이용하여 결정학적 특성을 확인하였다. 또한 Van der Pauw 방법을 이용한 hall 측정을 통해 resistivity, carrier concentration, hall mobility를 분석하였고, UV-Vis를 이용하여 박막의 투과율을 분석하였으며, 이를 토대로 투명 전도막으로써 Ga-doped ZnO 박막의 응용 가능성을 평가하였다.

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