• 한국세라믹학회지
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• 제30권12호
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• pp.1023-1028
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• 1993

To obtain a single phase of Ba2Ti9O20 at lower temperature than previious other researches. We investigated the effect of Zr substitution for predetermined portions of Ti in Ba2Ti9O20. In this study, the four compounds(x=0, 0.028, 0.048, 0.068) of Ba2(Ti1-xZrx)9O20 were prepared by coprecipitation reaction of BaCl2, TiCl4 and ZrOCl2 with (NH4)2CO3 and NH4OH as the coprecipitating agents and pH regulators, in queous solution. Owing to 4.8 mol% addition, the single phase of Ba2Ti9O20 showing high Q was obtained at 115$0^{\circ}C$ which is lower by 25$0^{\circ}C$ than the temperature in case of mechanical mixtures of BaCO3 and TiO2.

• 한국표면공학회지
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• 제27권1호
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• pp.29-35
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• 1994

The effects of coating of 3$\mu\textrm{m}$ thickness on the mechanical property of alumina after heat treatment at 100$0^{\circ}C$ for 30minutes under $10^{-6}$torr vacuum was quantified in terms of modulus of rupture(MOR) using Weibull plot. While the copper coating did not change MOR of alumina due to the nonwetting behavior of Cu on $Al_2O_3$, the reactive titanium metal coating caused a noticeable 29% reduction in averaged MOr strength. This was related with the combined effects of microcracks in coating formed during heat treatment and good bonding character between Ti and $Al_2O_3$. The effect of cosputtering of Ti and Cu, bilayer coatings of Cu/Ti and Ti/Cu were also investigated. It was found that Ti, cosputtered, Cu/ti and Ti/Cu coatings reduced MOR strength of alumina in the order listed. This was correlated with the amount of Ti at coating/alumina inter-face associated with a coated layer or segregation of Ti during heat treatment.

• Bulletin of the Korean Chemical Society
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• 제20권8호
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• pp.893-896
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• 1999

Novel citric acid based Ti, Nb and Ta precursors that are highly stable in the presence of water were developed. No alkoxides of Ti, Nb and Ta were utilized in the preparation, instead much less moisture-sensitive metallic Ti, NbCl5 and TaCl5 were chosen as starting chemicals for Ti, Nb and Ta, respectively. The feasibility of these chemicals as precursors is demonstrated in the powder synthesis of BaTi4O9, Y3NbO7 and LiTaO3. The water-resistant Ti precursor was employed as a new source of water-soluble Ti in the amorphous citrate method, and phase pure BaTi4O9 in powdered form was successfully synthesized at 800 ？. The Pechini-type polymerizable complex method using the water-resistant Nb and Ta precursors was applied to the synthesis of Y3NbO7 and LiTaO3, and both the powder materials in their pure form were successfully synthesized at reduced tempera-tures, viz. 500-700 ？. The remarkable retardation of hydrolysis of these water-resistant precursors is explained in terms of the partial charge model theory.

• Journal of Ceramic Processing Research
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• 제13권spc1호
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• pp.149-153
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• 2012

Ti2AlN MAX-phase films were synthesized through the post-annealing process of as-deposited Ti-Al-N films. Near amorphous or quasi-crystalline ternary Ti-Al-N films were deposited on Si and Al2O3 substrates by sputtering a Ti2AlN MAX-phase target at room temperature, 300 ℃ and 450 ℃, respectively. A vacuum annealing of those films at 800 ℃ for 1 hour changed those films to crystalline Ti2AlN MAX-phase. The polycrystalline Ti2AlN MAX-phase films exhibited very excellent oxidation resistance due to its characteristics microstructure (nanolaminates), which has potential applications for high-temperature protective coatings. The microstructure and composition of Ti2AlN MAX-phase films were investigated using with a variety of characterization tools.

• 한국진공학회지
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• 제6권3호
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• pp.255-262
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• 1997

Ar과 $N_2$ 가스가 혼합된 분위기에서 반응성 스퍼터링 방법에 의하여 TiN 박막을 증 착하였다. $N_2$가스의 농도는 화학양론적으로 TiN이 형성되는 조건에 맞도록 조절하였으며, 기판의 온도는 실온에서부터 $700^{\circ}C$의 범위내로 유지하였다. (111)texture구조를 가지면서 화 학양론적으로 $Ti_{0.5}N){0.5}$인 박막은 기판의 온도가 $600^{\circ}C$이상에서 형성되었고, 기판의 온도가 $600^{\circ}C$에서는 형성된 박막은 N-과다형이었다. XRD, XPS 및 RBS 분석 결과 TiN 박막의 조 성비는 기판의 온도에 다소 의존하였으나 약 5% 이내에 불과하였다. TiN 박막의 면저항은 기판온도의 증가에 따라 감소하였고, 기판온도가 $600^{\circ}C$에서 증착된 TiN 박막의 면저항은 14.5$\Omega\Box$였고, Ar-가스 분위기에서 $700^{\circ}C$로 30초간 열처리한 후는 8.9$\Omega\Box$이었다. 따라서 반 응성 스퍼터링방법에 의하여 형성되는 양질의 TiN 박막은 기판온도가 $600^{\circ}C$이상이 최적조 건임을 알았다.

• 한국세라믹학회지
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• 제31권3호
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• pp.265-274
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• 1994

Intermetallic Ti-Si system ceramics were synthesized from stochiometric mixtures of titanium and silicone powders in vacuum by Self-propagating High-temperature Synthesis(SHS). In each cases of Ti5Si3, Ti5Si4 and TiSi, and TiSi2 synthesis, 20wt% product dilution, direct ignition and SHS chemical furnace method were employed. The combustion modes, which were observed during the synthesis process by using the high speed camera, of Ti5Si3, Ti5Si4, TiSi, and TiSi2 exhibit spin, osciallatory, steady-state, and spin combustion, respectively. With increasing Ti/Si molar ratio an decrease of combustion velocities was found. From the results on the measurement of the flexural strength, the specimen hot pressed at 135$0^{\circ}C$ for 30 min using synthesized Ti5Si4 powders showed the highest flexural strength at 215 MPa.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제50권8호
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• pp.376-381
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• 2001

The(1-x) MgTiO$_3$-xSrTiO$_3$(x=0.03~0.04) ceramics were fabricated by the conventional mixed oxide method. The structural and microwave dielectric properties were investigated by XRD, SEM, EDS and network analyzer. The sintering temperature and time were 1275$^{\circ}C$~135$0^{\circ}C$ and 2hours, respectively. In the XRD results of 0.96MgTiO$_3$-0.04SrTiO$_3$ceramics, the perovskite structure of SrTiO$_3$and ilmenite structure of MgTiO$_3$phase were coexisted. The dielectric constant($\varepsilon$(sub)${\gamma}$) and temperature coefficient of resonant frequency($\tau$(sub)f) were increased with addition of SrTiO$_3$. In thie case of 0.96MgTiO$_3$-0.04SrTiO$_3$ ceramics sintered at 13$25^{\circ}C$, the dielectric constant, quality factor(Q) and temperature coefficient of resonant frequency($\tau$(sub)f) were 20.13, 7956(at 7.27GHz), and +1.76ppm/$^{\circ}C$, respectively.

• The Korean Journal of Ceramics
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• 제5권1호
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• pp.44-49
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• 1999

In order to improve the oxidation resistance of $Ti_3Al$, Ti-25at.%Al composites containing dispersed particles of 15wt.%SiC were prepared by a tubular mixing-spark plasma sintering method. The sintered composites had $Ti_3Al$, SiC, $Ti_5Si_3$ and TiC. The presence of $Ti_5Si_3$ and TiC indicates that some of SiC particles reacted with Ti to from more stable phases. From oxidation tests at 800, 900 and $1000^{\circ}C$ under 1 atm of pure oxygen, it was found that the oxidation rate of Ti3Al was effectively reduced by the addition of SiC. The scale was primarily composed of an outer $TiO_2$ layer having some $Al_2O_3 $islands, an intermediate relatively thick $Al_2O_3 $ layer, and an inner $TiO_2+Al_2O_3+SiO_2$ mixed layer. Beneath the scale, Kirkendall voids were seen.

• 한국진공학회지
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• 제12권3호
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• pp.193-199
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• 2003

아크-마그네트론 복합 공정법에 의해 Cu, Ag 도핑된 TiN 나노 복합 화합물 박막을 합성하고 각 금속원소 종류 및 함량에 따른 기계적 특성 및 나노 구조로의 상변화 거동을 관찰하였다. 합성된 박막은 약 40 ㎬의 높은 경도치를 나타내었으며 2 at% 미만의 낮은 금속 원소 함량에서 최대 경도간을 나타내었다. 금속 원소 함량이 증가할수록 결정립 미세화 및 다결정화가 진행되어 초고경도 특성을 나타내는 나노구조 박막이 합성되었으며 도핑되는 금속원소 종류에 따라 나노 구조로의 상변화 기구가 상이함을 관찰하였다. TiN 박막내 도핑된 Cu는 Ti와 일부 결합을 이루면서 Ti의 자리를 치환하는 것으로 나타났으나, Ag는 Ti와 결합을 이루거나 Ti 격자 자리를 치환하는 것이 아니라 독립적으로 결정립계에 존재하여 charge transfer만을 발생시키는 것으로 관찰되었다.

• 한국재료학회지
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• 제14권12호
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• pp.829-834
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• 2004

Annealing of $Cu(B)/Ti/SiO_2$ in vacuum has been carried out to investigate the effects of Ti underlayer on microstructure in $Cu(B)/Ti/SiO_2$ structures. For comparison, $Cu(B)/Ti/SiO_2$ structures was also annealed in vacuum. Three different temperature dependence of Cu growth can be seen in $Cu(B)/Ti/SiO_2$; B precipitates- pinned grain growth, abnormal grain growth, normal grain growth. The Ti underlayer having a strong affinity for B atoms reacts with the out-diffused B to the Ti surface and forms titanium boride at the Cu-Ti interface. The formation of titanium boride acts as a sink for the out-diffusion of B atoms. The depletion of boron in grain boundaries of Cu films, as results of the rapid diffusion of B along the grain boundaries and the insufficient segregation of B to the grain boundaries, induces grain boundaries to migrate and causes the abnormal grain growth. The increased bulk diffusion coefficient of B within Cu grains can be responsible for the normal grain growth occurring in the annealed $Cu(B)/Ti/SiO_2\;at\;600^{\circ}C$. In contrast, the $Cu/SiO_2$ structures show only the abnormal growth of grains and their sizes increasing as the temperature increases above $400^{\circ}C$.