• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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• pp.562-564
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• 2001

Transformation of molecular film occurs only usually in air-water interface, 2 dimensions domain's growth and crash are achieved. Organic matter thin film that accumulate molecular film in archaism board only that consist of growth of domain can understand correct special quality of accumulation film supplying information about fine structure and properties of matter of device observing information and so on that is surface forward player and optic enemy using AFM one of SPM application by nano electronics. The stable images are probably due to a strong interaction between the monolayer film and glass substrate. We are unable to obtain molecule resolution in images of the films but did see a marked contrast between images of the bare substrate and those with the network structure film deposited onto it. Formation that prevent when gas phase state and liquid phase state measure but Could know organic matter that molecules form equal and stable film when molecules were not distributed evenly. and accumulated in solid state only.

• 한국표면공학회지
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• 제29권6호
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• pp.753-759
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• 1996

The artificial construction of well-defined low-dimensional (low-D) quantum structures, such as quantum wire (QWR) still attracts attention of many researchers due to their applications in room-temperature optoelectronic devices. In this work, the migration enhanced epitaxial growth (MEE) and the analysis of InAs/ AlAs QWR are reported. On the vicinal semi-insulating InP substrate of $3^o$ tilted cut from (100) surface towards (010) direction, InAs/ AlAs QWR superlattices have been successfully grown by MEE with the introduction of growth interruption at each shutter operation of MBE cell. The in-situ RHEED analyses show that MEE gives superior step-flow growth (SFG) and sharper interface formation over a conventional MBE growth. We have grown 4 samples in series varying the growth temperature. The QWR samples are analyzed by photoluminescence (PL) and atomic force microscopy (AFM). From the AFM images, we can get the definitely resolved 1-D structures. This structure is believed to be due to the MEE method and its separation is better than any other data from others. We are now studying the dependence of the structure on the growth temperature.

• 열처리공학회지
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• 제14권5호
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• pp.292-296
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• 2001

In this work, an ultra-high vacuum activated reactive evaporation equipment was built. With reaction of Al and oxygen plasma, $Al_2O_3$ was deposited on the surface of etched Al foil. The chamber was evacuated down to $2{\times}10^{-7}$ torr initially. The Ar and $O_2$ gas introduced into the chamber to maintain $5{\times}10^{-5}$ torr during deposition. Ar gas prevents recombining of the ionized oxygen. Evaporation was maintained by electron beam evaporator continuously. Heating filament and electrode were used in order to generate plasma. The substrate bias of -300V was introduced to accelerate deposition of evaporated Al atoms. The composition and morphology of deposited $Al_2O_3$ films were analyzed by x-ray photoelectron spectroscopy(XPS) and atomic force microscopy (AFM), respectively. The Al oxide was formed on the surface of etched Al foil. According to AFM results, the surface morphology of $Al_2O_3$ film indicates uniform feature. Dielectric characteristic was measured as a function of frequency. Measured withstanding voltage and capacitance were 52V and $24{\mu}F/cm^2$, respectively. The obtained $Al_2O_3$ film shows clean condition without contaminants, which could be adapted to capacitor production.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.329-329
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• 2011

We investigated the thin films of poly(3-hexylthiophene) (P3HT) and C61-butyric acid methylester (PCBM) prepared by ultrahigh vacuum (UHV) electrospray depositioin (ESD) by using in-situ XPS, UPS and ambient-pressure AFM. The morphology, chemical structures, and interface properties of these materials, most widely used for bulk heterojunction organic solar cells, were studied depending on the ESD solution compositions and concentrations. We found that the solution conductivity and flow rate as well as applied voltage are the important parameters for stable electrospray and film formation. These results suggest that UHV ESD is a viable method for the deposition of multilayers of polymers under UHV condition. We also discuss the energy level alignment for the various deposition conditions at the interface, which is one of the most important operating parameters of the bulk heterojunction organic solar cells.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2001년도 추계학술대회 논문집
• /
• pp.562-564
• /
• 2001

Transformation of molecular film occurs only usually in air-water interface, 2 dimensions domain's growth and crash are achieved. Organic matter thin film that accumulate molecular film in archaism board only that consist of growth of domain can understand correct special quality of accumulation film supplying information about fine structure and properties of matter of device observing information and so on that is surface forward player and optic enemy using AFM one of SPM application by nano electronics. The stable images are probably due to a strong interaction between the monolayer film and glass substrate. We are unable to obtain molecule resolution in images of the films but did see a marked contrast between images of the bare substrate and those with the network structure film deposited onto it. Formation that prevent when gas phase state and liquid phase state measure but Could know organic matter that molecules form equal and stable film when molecules were not distributed evenly, and accumulated in solid state only.

• 한국전기전자재료학회논문지
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• 제13권7호
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• pp.636-641
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• 2000

The purpose of this study is assessing the characteristics of surface aging and recovery of hydrophobicity for silicone rubber which takes a great interest as outdoor insulation recently subjected to the combined stressed of salt fog and AC power. The methods for assessing are contact angle ATR-FRIR, AFM and XRD. In addition salt fog method is adopted as the artificial contamination experiment and AC power is applied 24 hour on and 24 hour off repeatedly for 5 cycles. The results suggest that degraded surface was more rough than virgin but was restored water repellency through the off cycle. It was due to not only the formation of fractal surface but also maintenance of hydrophobic surface by diffusion of low molecular oil. Although surface recovers initial hydropohbicity there are possibilities of decreasing electrical performance due to irreversable changes such as depolymerization of surface and loss of filler particles. This fact is confirmed by surface conductivity measurement showing that the degradation is significant and the recovery of hydrophobicity is imperfect as the energized cycle increases.

• 한국초전도ㆍ저온공학회논문지
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• 제10권4호
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• pp.6-8
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• 2008

$Y_{2}O_{3}$ nanodots have been deposited on top of the substrate surface using rf-sputtering method. This approach was adopted to be able to modulate the substrate surface with nanodots used as a seed for the flux pinning sites in the superconducting films. The nanodot density of $Y_{2}O_{3}$ was controlled mainly using the deposition time, rf-power, and substrate temperature. $Y_{2}O_{3}$ nanodots with ${\sim}\;50\;nm$ in diameter and ${\sim}\;3\;nm$ in height were obtained at rf-sputtering time of about 15 seconds using 400 watts of rf-power and $630^{\circ}C$ of substrate temperature. As deposition time increased up to about 30 seconds, the interconnected islands of $Y_{2}O_{3}$ nanodots formed, which can be clearly observed with AFM surface image. The substrate surface was covered entirely with $Y_{2}O_{3}$ layer above the deposition time of 60 seconds. The modulated surface morphologies and cross section analysis of deposited $Y_{2}O_{3}$ nanodots at various experimental conditions have been examined using AFM and discussed with respect to the flux pinning sites for the practical application.

• 한국건축시공학회:학술대회논문집
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• 한국건축시공학회 2021년도 가을 학술논문 발표대회
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• pp.27-28
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• 2021

The search for new corrosion inhibitors for different corrosive mediums is a never-ending task. In the present work, the corrosion inhibition behavior and adsorption mechanism of two novel synthetic thiazolidinedione derivatives noted MTZD and ATZD in 3.5 wt.% NaCl solution on copper were investigated. Electrochemical, scanning electron microscope (SEM), atomic force microscopy (AFM) techniques were used along with first-principles DFT calculations. At maximum inhibitor concentration i.e., 300 ppm corrosion inhibition efficiency reached maximum up to 90% and 96% for MTZD and ATZD, respectively, and thereby followed the order of ATZD > MTZD. The inhibition efficiency increased up to 24 h of immersion, and then decreased after 48h immersion. The potentiodynamic curves suggested that the inhibition action of tested compounds is a mixed type of inhibitor. The first-principles DFT calculations suggested that compounds under investigation formed covalent bonds with Cu(111) surface via reactive sites. SEM and AFM results confirmed the formation of protective barrier that prevent corrosion attack.

• 한국응용과학기술학회지
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• 제34권3호
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• pp.525-535
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• 2017

내열성이 우수하며, 태양광 모듈의 유리 표면에 방담성(antifogging) 및 방오성(antifouling)을 동시에 부여하여 효율을 향상시키기 위한 친수성 코팅액을 제조하기 위해 초친수성과 우수한 방담효과를 나타내는 Tween 20과 데카플루오로부탄과 폴리에틸렌글리콜 성분으로 구성된 불소계면활성제 수용액에 방오성 부여를 위하여 나노실리카를 분산하였다. 고온 처리에서 나노실리카의 함량에 따른 방담 효과는 모든 코팅액이 우수하였으나, 방오 효과는 나노실리카의 함량이 6 wt%일 때부터 나타났다. 불소계면활성제의 함량이 증가할수록 초기 접촉각이 증가하며 방담 효과도 500회 wiping까지 잘 유지되었다. 방오 효과 역시 불소계면활성제의 함량에 상관없이 우수하여 불소계면활성제의 적절한 첨가량은 0.1 wt%이상 이면 충분하였다. AFM 결과로부터 불소계면활성제가 0.1 wt%에서 0.3 wt%가 첨가된 경우 코팅 표면의 프랙탈구조가 확실히 나타나 방오성 향상에 기여하였다. 코팅된 유리의 투과도는 불소계면활성제가 0.1 wt% 첨가된 TL-1의 경우가 가장 높았으며 더 많은 양의 불소계면활성제를 첨가할 경우 오히려 투과도 향상은 미미하였다. 이러한 결과는 앞의 AFM 결과에서 나타난 표면 조도가 높으며 프랙탈구조 형성도 잘 일어난 TL-1 코팅액의 결과와 잘 일치하는 것이다.

• 한국진공학회지
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• 제6권4호
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• pp.364-371
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• 1997

MERIE 플라즈마 장비를 사용하여 실리콘의 트렌치 식각을 HBr, He-$O_2,SiF_4,CF_4$ 등의 가스를 주입하여 수행하였으며 식각 속도, 식각 프로파일 변화, 잔류물 생성 및 표면 상태 등을 관찰하였다. HBr만을 이용한 플라즈마 식각시에는 트렌치 하부 영역에 상당한 횡방향 식각이 일어나 항아리 모양의 식각 프로파일이 관찰되었으며, HBr에 He-$O_2$가스와 $SiF_4$나 $CF_4$등의 주입량을 변화시켜 벽면 기울기와 횡방향 식각의 정도를 제어할 수 있었다. 표면 잔류물 특성 및 표면 거칠기(roughness)등은 HBr/He-$O_2$/$SiF_4$가스를 동시에 주입하여 식각하였을 때 가장 양호한 식각 특성을 나타내었으며, 첨가 가스로 $SiF_4$를 이용함으로써 기존의 C-F계 플라즈마를 이용한 트렌치 식각 특성들보다 우수한 공정 결과를 얻었다. 또 한 $SiF_4$를 이용함으로써 $CF_4$ 첨가시보다 C의 잔류물을 크게 줄이고 표면 손상을 개선할 수 잇음을 X-선 광전자 분석과 주사전자현미경(scanning electron microscopy) 및 AFM(atomic force microscopy)의 결과로써 확인하였다.