• 제목/요약/키워드: A2O process

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화학기상응축 공정으로 제조한 TiO2 나노분말의 광촉매 특성 (Photocatalytic Properties of TiO2 Nanopowder Synthesized by Chemical Vapor Condensation Process)

  • 임성순;남희영;윤성희;이창우;유지훈;이재성
    • 한국분말재료학회지
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    • 제10권2호
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    • pp.123-128
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    • 2003
  • $TiO_2$ nanopowder was synthesized by chemical vapor condensation (CVC) process and its photocatalytic property depending on microstructure was considered in terns of decomposition rate of organic compound. In order to control microstructure of $TiO_2$ nanopowder such as particle size and degree of agglomeration, precursor flow rate representing number concentration was changed as a process variable. In TEM observation, spherical $TiO_2$ nanoparticles with average size of 20 nm showed gradual increases in particle size and degree of agglomeration with increase of precursor flow rate. Also decomposition rate of organic compound increased with decreasing precursor flow rate. Thus, it was concluded that photocatalytic property was enhanced by targe surface area of disperse $TiO_2$ nanoparticles synthesized at lower precursor flow rate condition in CVC process.

전기펜톤공정을 이용한 석유화학공장 폐활성슬러지의 감량화 가능성 평가 (A study on reduction of excess sludge in activated sludge system from a petrochemical plant using electro fenton process)

  • 정종민;김경일;심나타리아;박철희;이상협
    • 상하수도학회지
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    • 제23권5호
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    • pp.669-678
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    • 2009
  • The reduction of excess activated sludge from petrochemical plant was investigated by the electro fenton (E-Fenton) process using electrogenerated hydroxyl radicals which lead to mineralization of activated sludge to $CO_2$, water and inorganic ions. Factors affecting the disintegration efficiency of excess activated sludge in E-Fenton process were examined in terms of five criteria: pH, $H_2O_2/Fe^{2+}$ molar ratio, current density, initial MLSS (mixed liquid suspended solids) concentration, $H_2O_2$ feeding mode. TSS total suspended solid and $TCOD_{cr}$ reduction rate increased with the increasing $H_2O_2/Fe^{2+}$ molar ratio and current density until 42 and $6.7 mA/cm^2$, respectively but further increase of $H_2O_2/Fe^{2+}$ molar ratio and current density would reduce the reduction rate. On the other hand, as expected, increasing pH and initial MLSS concentration of activated sludge decreas TSS and $TCOD_{cr}$ reduction rate. The E-Fenton process was gradually increased during first 30 minutes and then linearly proceed till 120 minutes. The optimal E-Fenton condition showed TSS reduction rate of 62~63% and $TCOD_{cr}$ (total chemical oxygen demand) reduction rate of 55~56%. Molar ratio $H_2O_2/Fe^{2+} = 42$ was determined as optimal E-Fenton condition with initial $Fe^{2+}$ dose of 5.4 mM and current density of $6.7{\sim}13.3 mA/cm^2$, initial MLSS of 7,600 mg/L and pH 2 were chosen as the most efficient E-Fenton condition.

졸-겔법을 이용하여 제조한 Al2O3-ZrO2 세라믹스에 미치는 하소온도의 영향 (Effect of Calcination Temperature on Al2O3-ZrO2 Ceramic Prepared by Sol-Gel Process)

  • 우상국;김종희
    • 한국세라믹학회지
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    • 제24권5호
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    • pp.423-430
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    • 1987
  • Characteristics of Al2O3-ZrO2 powders prepared by sol-gel process and their sintering behavior were investigated as a function of calcination temperature. The sol-gel processed powders were calcined at 800, 900, 1000, 1100, 1200$^{\circ}C$, and analyzed by X-ray diffraction technique. Pore size and distribution of green compact of the calcined powders were measured by mercury porosimeter. It is suggested that the optimal temperature of calcination for the sintering of Al2O3-ZrO2 powder prepared by sol-gel process is 1100$^{\circ}C$. In the Al2O3-17vol.% ZrO2 sintered specimen, which was sintered at 1600$^{\circ}C$ for 2hrs in air, 69vol.% tetragonal phse existed.

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Synthesis and Characterization of SnO2 Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition Using SnCl4 Precursor and Oxygen Plasma

  • 이동권;김다영;권세훈
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.254-254
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    • 2016
  • Tin dioxide (SnO2) thin film is one of the most important n-type semiconducting materials having a high transparency and chemical stability. Due to their favorable properties, it has been widely used as a base materials in the transparent conducting substrates, gas sensors, and other various electronic applications. Up to now, SnO2 thin film has been extensively studied by a various deposition techniques such as RF magnetron sputtering, sol-gel process, a solution process, pulsed laser deposition (PLD), chemical vapor deposition (CVD), and atomic layer deposition (ALD) [1-6]. Among them, ALD or plasma-enhanced ALD (PEALD) has recently been focused in diverse applications due to its inherent capability for nanotechnologies. SnO2 thin films can be prepared by ALD or PEALD using halide precursors or using various metal-organic (MO) precursors. In the literature, there are many reports on the ALD and PEALD processes for depositing SnO2 thin films using MO precursors [7-8]. However, only ALD-SnO2 processes has been reported for halide precursors and PEALD-SnO2 process has not been reported yet. Herein, therefore, we report the first PEALD process of SnO2 thin films using SnCl4 and oxygen plasma. In this work, the growth kinetics of PEALD-SnO2 as well as their physical and chemical properties were systemically investigated. Moreover, some promising applications of this process will be shown at the end of presentation.

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Theoretical Calculation and Experimental Verification of the Hf/Al Concentration Ratio in Nano-mixed $Hf_xAl_yO_z$ Films Prepared by Atomic Layer Deposition

  • Kil, Deok-Sin;Yeom, Seung-Jin;Hong, Kwon;Roh, Jae-Sung;Sohn, Hyun-Cheol;Kim, Jin-Woong;Park, Sung-Wook
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제5권2호
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    • pp.120-126
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    • 2005
  • We have proposed a characteristic method to estimate real composition when multi component oxide films are deposited by ALD. Final atomic concentration ratio was theoretically calculated from the film densities and growth rates for $HfO_2$ and $Al_2O_3$ using ALD processed HfxAhOz mms.W e have transformed initial source feeding ratio during deposition to fins] atomic ratio in $Hf_xAl_yO_z$ films through thickness factors ($R_{HFO_2}$ ami $R_{Al_2O_3}$) ami concentration factor(C) defined in our experiments. Initial source feeding ratio could be transformed into the thickness ratio by each thickness factor. Final atomic ratio was calculated from thickness ratio by concentration factor. It has been successfully confirmed that the predicted atomic ratio was in good agreement with the actual measured value by ICP-MS analysis.

용매열 공정을 이용한 세리아(CeO2) 나노분말의 합성 및 분산거동 (Synthesis and Dispersion of Ceria(CeO2) Nanoparticles by Solvothermal Process)

  • 임태섭;옥지영;최연빈;김봉구;손정훈;정연길
    • 한국재료학회지
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    • 제30권7호
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    • pp.376-382
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    • 2020
  • CeO2 nanoparticles, employed in a lot of fields due to their excellent oxidation and reduction properties, are synthesized through a solvothermal process, and a high specific surface area is shown by controlling, among various process parameters in the solvothermal process, the type of solvent. The synthesized CeO2 nanoparticles are about 11~13 nm in the crystallite size and their specific surface area is about 65.38~84.65 ㎡/g, depending on the amount of ethanol contained in the solvent for the solvothermal process; all synthesized CeO2 nanoparticles shows a fluorite structure. The dispersibility and microstructure of the synthesized CeO2 nanoparticles are investigated according to the species of dispersant and the pH value of the solution; an improvement in dispersibility is shown with the addition of dispersants and control of the pH. Various dispersing properties appear according to the dispersant species and pH in the solution with the synthesized CeO2 nanoparticles, indicating that improved dispersing properties in the synthesized CeO2 nanoparticles can be secured by applying dispersant and pH control simultaneously.

광산화시스템을 이용한 염색폐수의 유기물 처리효율 및 잔류미생물의 독성 평가 (Organic Removal Efficiency and Toxicity Evaluation of Persistent Microorganism from Dye Wastewater Treatment using a Photooxidation system)

  • 정호준;이동석
    • 산업기술연구
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    • 제29권A호
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    • pp.83-88
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    • 2009
  • The removal efficiency of organic compounds and the toxicity evaluation of microorganism have been studied in dye wastewater treatment using $UV/TiO_2$ and $UV/H_2O_2$ photooxidation system. Sample waters tested in this work were raw dye wastewater and dye wastewater treated in $UV/TiO_2$ and $UV/H_2O_2$ photooxidation system respectively. Total organic carbon(TOC) removal rate was 50% in $UV/TiO_2$ process and 80% in $UV/H_2O_2$ process. It has been investigated with colony counting agar method and paper disk method whether the type of treatment process has affected the microorganism growth. In the raw wastewater, more than four types of microorganisms have survived. But, little of microorganisms were alive at TOC removal rate of 50% in $UV/TiO_2$ system. In contrast to that, two types of microorganisms were found at TOC removal rate of 80% in $UV/H_2O_2$ system.

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Effect of Nitrite and Nitrate as the Source of OH Radical in the O3/UV Process with or without Benzene

  • Son, Hyun-Seok;Ahammad, A.J. Saleh;Rahman, Md. Mahbubur;Noh, Kwang-Mo;Lee, Jae-Joon
    • Bulletin of the Korean Chemical Society
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    • 제32권spc8호
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    • pp.3039-3044
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    • 2011
  • This study suggests the prediction model for the concentration variation of $NO_2{^-}$ and $NO_3{^-}$ along with the rate constants of all reactions during ozonation under UV radiation ($O_3$/UV process). While $NO_2{^-}$ was completely converted into $NO_3{^-}$ during the $O_3$-only process, the production of $NO_2$ radical or $N_2O_4$ was expected in the $O_3$/UV process. In addition, the quenching of OH radicals, by $NO_2$ radical in the $O_3$/UV process, resulted in regeneration of $NO_2{^-}$. However, the regeneration of $NO_2{^-}$ was not observed in the $O_3$/UV process in the presence of $C_6H_6$ where the concentrations of $NO_2{^-}$ and $NO_3{^-}$ were significantly reduced compared to in the process without $C_6H_6$. The pseudo-first order rate constants of all species were calculated with and without the presence of $C_6H_6$ to predict the variation of concentrations of all species during the $O_3$/UV process. It was suggested that $NO_2{^-}$ and $NO_3{^-}$ in the $O_3$/UV process can be more effectively removed from an aqueous system with an OH radical scavenger such as $C_6H_6$.

오존과 과산화수소를 이용한 이취미 물질 산화 제거 (Removal of Odorous Compounds Using Ozone and Hydrogen Peroxide)

  • 이화자;손희종;노재순;이상원;지기원;유평종;강임석
    • 대한환경공학회지
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    • 제28권12호
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    • pp.1323-1330
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    • 2006
  • 오존/과산화수소 공정을 이용한 급속 모래여과 처리수 중의 geosmin 제거에서 오존만 20 mg/L 투입한 경우보다 오존 5 mg/L와 과산화수소 0.2 mg/L를 투입하여 처리한 경우가 더 높은 제거율을 보였으며, 오존/과산화수소 공정에 의해 원수 중에 함유된 geosmin의 경우는 급속 모래여과 처리수보다 $12{\sim}27%$ 정도 낮은 제거율을 나타내었다. 급속 모래여과 처리수 중에 함유된 geosmin과 IPMP에 대해 오존 투입농도별로 투입된 과산화수소와 오존의 비($H_2O_2/O_3$)에 따른 제거율을 살펴본 결과, 오존농도가 1 mg/L 이하의 경우에서는 $H_2O_2/O_3$ 비가 적정 비율 이상으로 높아지면 geosmin과 IPMP 제거율이 감소하였으며, 적정 $H_2O_2/O_3$ 비는 실제 정수장에서 사용하고 있는 후오존 투입농도인 $1{\sim}2$ mg/L에서 geosmin의 경우 $0.5{\sim}1$, IPMP의 경우 $0.2{\sim}1$로 나타났으며, 원수 중에 함유된 geosmin 제거를 위한 적정 $H_2O_2/O_3$ 비는 오존 투입농도 $1{\sim}2$ mg/L 범위에서 $1{\sim}3$ 정도로 광범위하게 나타났다. 급속 모래여과 처리수에 함유된 이취미 물질 5종에 대한 오존(0.5, 1.0, 2.0 mg/L) 투입농도별 잔존율을 살펴본 결과, IPMP의 제거율이 60% 이상으로 가장 높게 나타났으며, 오존/과산화수소 공정이 오존 단독공정 보다 제거율이 전반적으로 높게 나타났다. 오존/과산화수소 공정을 이용한 BDOC 생성능을 오존 투입농도 $0.5{\sim}2$ mg/L에서 과산화수소 투입농도별로 조사한 실험에서 오존/과산화수소 공정이 오존 단독공정보다 추가적으로 0.9 정도의 BDOC/DOC 비가 상승하여 0.34까지 증가하였다.

Crude N2O로부터 정제된 N2O 분리공정에 관한 연구 (A Study on the N2O Separation Process from Crude N2O)

  • 조정호;이택홍;박종기
    • Korean Chemical Engineering Research
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    • 제43권4호
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    • pp.467-473
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    • 2005
  • 액상의 아산화질소($N_2O$) 혼합물은 주요 불순물로써 공기, 일산화탄소, 수분, 이산화탄소와 NOx 성분을 포함하고 있다. 저온에서 고체화하여 고 순도의 $N_2O$를 얻어내는 것은 위험하다고 알려져 있다. 본 연구에서는 연속식 증류공정에 기초하여 고 순도의 $N_2O$ 제품을 얻어내는 새로운 방법을 소개하였다. 99.999% 이상의 고 순도의 $N_2O$ 제품을 얻어낼 수 있는 연속식 증류공정을 모델화하기 위하여 intalox wire guaze 타입의 SCH-80S의 충진탑을 사용하였다. Peng-Robinson 상태방정식을 사용하여 연속식 증류탑과 냉동 사이클을 모사하였다. 본 연구에서 수행한 전산모사 결과는 상용성 화학공정모사기인 Aspen Plus로 모사한 결과와 매우 잘 일치함을 알 수 있었다.