Theoretical Calculation and Experimental Verification of the Hf/Al Concentration Ratio in Nano-mixed Films Prepared by Atomic Layer Deposition |
Kil, Deok-Sin
(Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.)
Yeom, Seung-Jin (Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.) Hong, Kwon (Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.) Roh, Jae-Sung (Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.) Sohn, Hyun-Cheol (Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.) Kim, Jin-Woong (Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.) Park, Sung-Wook (Advanced Process-FEP, Research & Development Division, Hynix Semiconductor Inc.) |
1 | D. Hausmann, J. Becker, S. Wang and Roy Gordon, Science 298, 402(2002) DOI ScienceOn |
2 | R. Gordon, D. Hausmann, E. Kim and J. Shepard, Chem. Vap. Deposition, Vol. 9, No.2, 73(2003) DOI ScienceOn |
3 | M. D. Groner, J. W. Elam, F. H. Fabreguette, and S.M. George, Thin Solid Films 413, 186(2002) DOI ScienceOn |
4 | K. Kukli, J. Aarik, A. Aidla, O. Kohan, T. Uustare, and V. Sammelselg, Thin Solid Films 260, 135(1995) DOI ScienceOn |
5 | H. B. Park, M. Cho, J. Park, S.W. Lee, and C. S. Hwang, Journal Applied Physics, Vol. 94, No.5, 3641(2003) DOI ScienceOn |
6 | W. Nam, and S. W. Rhee, Chem. Vap. Deposition, 10, No.4,201(2004) DOI ScienceOn |
7 | W. Nam, and S. W. Rhee, Electrochem. Solid-state Lett., Vol.7(4), C55(2004) DOI ScienceOn |
8 | D. S. Kil et al., VLSI Tech. Dig.(2004), p.126-127 |
9 | D. S. Kil, J M. Lee and J. S. Roh, Chem. Vap. Deposition, Vol. 8, No.2, 73(2002) DOI |
10 | W.F.A. Besling, E. Young, T. Conard, C. Zhao, R. Carter. W. Vandervorst, M. Caymax, S. De. Gendt, M. Heyns, J. Maes, M. Tuominen, and S. Haukka, Journal of Non-Cystalline Solids 303, 123(2002) DOI ScienceOn |
11 | Y. J. Lee, and S. W. Kang, J. Vac. Sci. Techno. A 21(5), L13-L15(2003) DOI ScienceOn |