• Transactions of the Korean Society of Mechanical Engineers A
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• v.32 no.4
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• pp.303-309
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• 2008

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.670-673
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• 2003

Fabrication of three dimensional microstructures by laser-assisted chemical vapor deposition of material is investigated. To fabricate microstructures, a thin layer of deposit in desired patterns is first written using laser direct writing technique and on top of this layer a second layer is deposited to provide the third dimension normal to the surface. By depositing many layers. a three dimensional microstructure is fabricated. Optimum deposition conditions for direct writing of initial and subsequent layers with good surface quality and profile uniformity are determined. Using an arson ion laser and ethylene as the light source and reaction gas, respectively, fabrication of three-dimensional carbon microstructures is demonstrated.

• Polymer(Korea)
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• v.29 no.4
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• pp.418-421
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• 2005

Three-dimensional (3D) microfabrication process using two-photon polymerization (TPP) is developed to fabricate the curved microstructures in a layer, which can be applied potentially to optical MEMS, nano/micro-devices, etc. A 3D curved structure can be expressed using the same height-contours that are defined by symbolic colors which consist of 14 colors. Then, the designed bitmap figure is transformed into a multi-exposure voxel matrix (MVM). In this work a multi-exposure voxel matrix scanning method is used to generate various heights of voxels according to each laser exposure time that is assigned to the symbolic colors. An objective lens with a numerical aperture of 1.25 is employed to enlarge the variation of a voxel height in the range of 1.2 to 6.4 um which can be controlled easily using the various exposure time. Though this work some 3D curved micro-shapes are fabricated directly to demonstrate the usefulness of the process without a laminating process that is generally required in a micro-stereolithography process.

• Bulletin of the Korean Chemical Society
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• v.25 no.8
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• pp.1119-1120
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• 2004

• Applied Science and Convergence Technology
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• v.25 no.5
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• pp.98-102
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• 2016

The level set method has recently become popular in the simulation of semiconductor processes such as etching, deposition and photolithography, as it is a highly robust and accurate computational technique for tracking moving interfaces. In this research, full three-dimensional level set simulation has been developed for the investigation of focused ion beam processing. Especially, focused ion beam induced nanodot formation was investigated with the consideration of three-dimensional distribution of redeposition particles which were obtained by Monte-Carlo simulation. Experimental validations were carried out with the nanodots that were fabricated using focused $Ga^+$ beams on Silicon substrate. Detailed description of level set simulation and characteristics of nanodot formation will be discussed in detail as well as surface propagation under focused ion beam bombardment.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.15-16
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• 2006

Since two-photon polymerization (TPP) emerged as a new technology over a decade ago, a large variety of micro-objects including 3-D micro-optical components, micromechanical devices, and 3-D photonic crystals have been fabricated using TPP with a high spatial resolution of approximately submicron scale to 100 nm. Recent efforts have been made to improve the fabrication efficiency and precision of micro-objects obtained with TPP; in particular, many studies have been carried out with the aim of developing efficient two-photon absorbing chromophores. In this presentation, we will discuss our efforts to develop highly efficient two-photon absorbing materials and also describe recent attempts to enhance the resolution and to improve the fabrication efficiency of nanofabrications based on TPP.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.79-79
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• 1999

The varous techniques for fabrication of si or metal tip as a field emission electron source have been reported due to great potential capabilities of flat panel display application. In this report, 240nm thermal oxide was initially grown at the p-type (100) (5-25 ohm-cm) 4 inch Si wafer and 310nm Si3N4 thin layer was deposited using low pressure chemical vapor deposition technique(LPCVD). The 2 micron size dot array was photolithographically patterned. The KOH anisotropic etching of the silicon substrate was utilized to provide V-groove formation. After formation of the V-groove shape, dry oxidation at 100$0^{\circ}C$ for 600 minutes was followed. In this procedure, the orientation dependent oxide growth was performed to have a etch-mask for dry etching. The thicknesses of the grown oxides on the (111) surface and on the (100) etch stop surface were found to be ~330nm and ~90nm, respectively. The reactive ion etching by 100 watt, 9 mtorr, 40 sccm Cl2 feed gas using inductively coupled plasma (ICP) system was performed in order to etch ~90nm SiO layer on the bottom of the etch stop and to etch the Si layer on the bottom. The 300 watt RF power was connected to the substrate in order to supply ~(-500)eV. The negative ion energy would enhance the directional anisotropic etching of the Cl2 RIE. After etching, remaining thickness of the oxide on the (111) was measured to be ~130nm by scanning electron microscopy.

• The Korean Journal of Physiology and Pharmacology
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• v.24 no.6
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• pp.441-452
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• 2020

In vivo animal models are limited in their ability to mimic the extremely complex systems of the human body, and there is increasing disquiet about the ethics of animal research. Many authorities in different geographical areas are considering implementing a ban on animal testing, including testing for cosmetics and pharmaceuticals. Therefore, there is a need for research into systems that can replicate the responses of laboratory animals and simulate environments similar to the human body in a laboratory. An in vitro two-dimensional cell culture model is widely used, because such a system is relatively inexpensive, easy to implement, and can gather considerable amounts of reference data. However, these models lack a real physiological extracellular environment. Recent advances in stem cell biology, tissue engineering, and microfabrication techniques have facilitated the development of various 3D cell culture models. These include multicellular spheroids, organoids, and organs-on-chips, each of which has its own advantages and limitations. Organoids are organ-specific cell clusters created by aggregating cells derived from pluripotent, adult, and cancer stem cells. Patient-derived organoids can be used as models of human disease in a culture dish. Biomimetic organ chips are models that replicate the physiological and mechanical functions of human organs. Many organoids and organ-on-a-chips have been developed for drug screening and testing, so competition for patents between countries is also intensifying. We analyzed the scientific and technological trends underlying these cutting-edge models, which are developed for use as non-animal models for testing safety and efficacy at the nonclinical stages of drug development.