• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1555-1559
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• 1997

The thin films were obtained by plasma polymerization of phenyl isothiocyanate. Polymerizations were carried out in rf(13.56[MHz]) glow discharge generated in an inter-electrode capacitively coupled gas flow system. It was found that this monomer produces uniform films with a wide range of thicknesses, from hundreds of nanometers to tens of micrometers. The deposition rate appeared to be dependent on the substrate distance from the monomer inlet. The IR data revealed significant decrease in -NCS groups content in the polymer as compared with the monomer spectrum and indicated for the appearance of new absorption bands corresponding to the -CN and C-H aliphatic groups. The soluble fraction by GC was found to be composed of numerous low molecular-weight compounds.

• Proceedings of the KSR Conference
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• 2008.06a
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• pp.535-544
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• 2008

Unlike MS(Magnetic Stripe), SMART CARD is equipped with COS(Chip Operating System) consisting of the Microprocessor and Memory where information can be stored and processed, and there are two types of cards according to the contact mode; the contact type that passes through a gold plated area and the contactless one that goes through the radio-frequency using an antenna embedded in the plastic card. the contactless IC card used for the transportation card was first introduced into local area buses in Seoul, and expanded throughout the country so that it has removed the inconvenience such as possession of cash, fare payment and collection. Focusing on the Seoul metropolitan area in 2004, prepaid and pay later cards were adopted and have been used interchangeably between a bus and subway. The card terminal compatible between a bus and subway is Proximity Integrated Circuit Card(PICC) as international standards(1443 Type A,B), communicates in the 13.56MHz dynamic frequency modulation-demodulation system, and adopts the Multi Secure Application Module(SAM). In the second half of 2009, the system avaliable nationwide will be built when the payment SAM standard is implemented.

• Korean Journal of Computational Design and Engineering
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• v.14 no.6
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• pp.424-433
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• 2009

In order to improve productivity and efficiency of ship production process, production technology converged with Information Technology can be considered. Mid-term scheduling based on long-term schedule of ship building and execution planning based on short-term production schedule have an important role in ship production processes and techniques. However, data used in the scheduling are from the experiences of the past, cognitive, and often inaccurate, moreover the updates of the data by formatted documents are not being performed efficiently. This paper designs the tracking and monitoring system for the curved plates forming process with shop level. At first step to it, we redefine and analyze the curved plates forming process by using SysML. From the definition and analysis of the curved plates forming process, we design the system with respect to operational view considering operational environment and interactions between systems included and scenario about operation, and with respect to system view considering functionalities and interfaces of the system. In order to study the feasibility of the system designed, a prototype of the system has been implemented with 13.56 MHz RHD hardware and application software.

• Proceedings of the KIPE Conference
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• 2018.07a
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• pp.75-77
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• 2018

최근 다양한 산업응용분야에서 가변커패시터의 필요성은 점점 증가하고 있다. 특히 고전력 RF플라즈마 시스템에서 임피던스 정합 회로에 사용되는 가변커패시터는 빠른 고전압 차단능력이 요구된다. 본 논문에서는 RF플라즈마 시스템의 임피던스 정합 회로에 활용되는 단방향 스위치를 사용한 전기적 가변 캐패시터 (Electrical Variable Capacitor, 이하 EVC) 회로의 전압 스트레스를 저감하는 방법에 대해서 제안한다. 제안된 방법은 13.56Mhz의 주파수와 1kW이상의 고전력 RF플라즈마 시스템에서 단방향 스위치의 전압 스트레스를 양방향스위치를 사용한 EVC 회로를 활용하여 저감한다. 본 논문에서 제안된 방법으로 전압 스트레스가 감소하여 EVC 회로를 고전력 초고속 RF플라즈마 시스템의 임피던스 정합 회로에 좀 더 효과적 으로 적용할 수 있게 된다. 시뮬레이션 및 실험을 통해 EVC 회로의 스위치에 걸리는 전압 스트레스가 40%이상 저감되는 것을 검증하였다.

• Transactions on Electrical and Electronic Materials
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• v.12 no.4
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• pp.156-159
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• 2011

SiNx:H films have been widely used for anti-reflection coatings and passivation for crystalline silicon solar cells. In this study, SiNx:H films were deposited using high frequency (13.56 MHz) direct plasma enhanced chemical vapor deposition, and the optical and passivation properties were investigated. The radio frequency power, the spacing between the showerhead and wafer, the $NH_3/SiH_4$ ratio, the total gas flow, and the $N_2$ gas flow were changed over certain ranges for the film deposition. The thickness uniformity, the refractive index, and the minority carrier lifetime were then measured in order to study the properties of the film. The optimal deposition conditions for application to crystalline Si solar cells are determined from the results of this study.

• Journal of the Semiconductor & Display Technology
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• v.11 no.2
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• pp.7-11
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• 2012

SiNx films have been wildly used as anti-reflection coatings and passivation for crystalline silicon solar cells. In this study, the SiNx films were deposited by using high frequency (13.56MHz) PECVD and optical & passivation properties were investigated. The RF power was changed in a certain range for the film deposition. Then, the refractive index, etch rate, minority carrier lifetime and cell efficiency were measured to study the properties of the film respectively. The optimal deposition conditions for application to crystalline silicon solar cells were proposed as results of the study. Finally, the best cell efficiency of 16.98% was obtained from the solar cell with the SiNx films deposited by RF power of 550W.

• 제어로봇시스템학회:학술대회논문집
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• 1998.10a
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• pp.195-200
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• 1998

Since the neural network was introduced, significant progress has been made on data handling and learning algorithms. Currently, the most popular learning algorithm in neural network training is feed forward error back-propagation (FFEBP) algorithm. Aside from the success of the FFEBP algorithm, polynomial neural networks (PNN) learning has been proposed as a new learning method. The PNN learning is a self-organizing process designed to determine an appropriate set of Ivakhnenko polynomials that allow the activation of many neurons to achieve a desired state of activation that mimics a given set of sampled patterns. These neurons are interconnected in such a way that the knowledge is stored in Ivakhnenko coefficients. In this paper, the PNN model has been developed using the plasma enhanced chemical vapor deposition (PECVD) experimental data. To characterize the PECVD process using PNN, SiO$_2$films deposited under varying conditions were analyzed using fractional factorial experimental design with three center points. Parameters varied in these experiments included substrate temperature, pressure, RF power, silane flow rate and nitrous oxide flow rate. Approximately five microns of SiO$_2$were deposited on (100) silicon wafers in a Plasma-Therm 700 series PECVD system at 13.56 MHz.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.11
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• pp.596-602
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• 2000

Diamond thin films were synthesized on WC-Co substrate at various experimental parameters using 13.56MHz RF PACVD)radio frequency plasma-assisted chemical vapor deposition). In order to increased the nucleation density, the WC-Co substrate was polished with 3${\mu}m$ diamond paste. And the WC-Co substrate was preatreated in $HNO_3\;:\;H_2O$ = 1:1 and $O_2$ plasma. In $H_2-CH_4$ gas mixture, the crystallinity of thin film increased with decreasing $CH_4$ concentration at 800W discharge power and 20torr reaction pressure. In $H_2-CH_4-O_2$ gas mixture, the crystallinity of thin film increased with increasing $O_2$ concentration at 800W discharge power, 200torr reaction pressure and 4% $CH_4$ concentration.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.1
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• pp.30-33
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• 2006

Transparent indium tin oxide (ITO) anode surface was modified using $O_3$ Plasma and organic ultrathin buffer layers were deposited on the ITO surface using 13.56 MHz RF plasma polymerization technique. The EL efficiency, operating voltage and lifetime of the organic light-emitting device (OLED) were investigated in order to study the effect of the plasma surface treatment and role of plasma polymerized organic ultrathin buffer layer. Poly methylmethacrylate (PMMA) layers were plasma polymerized on the ITO anode as buffer layer between anode and hole transport layer (HTL). The plasma polymerization of the organic ultrathin layer were carried out at a homemade capacitive-coupled RF plasma equipment. N,N'-diphenyl-N,N'(3- methylphenyl)-1,1'-diphenyl-4,4'-diamine (TPD) as HTL, Tris(8-hydroxyquinolinato) Aluminum $(Alq_3)$ as both emitting layer (EML)/electron transport layer (ETL), and aluminum layer as cathode were deposited using thermal evaporation technique. Effects of the plasma surface treatment of ITO and plasma polymerized buffer layers on the OLED performance were discussed.

• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.371-378
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• 1996

An RF inductively coupled plasma (ICP) torch has been developed as a typical thermal plasma generator and reactor. It has been applied to various materials processings such as plasma flash evaporation, thermal plasma CVD, plasma spraying, and plasma waste disposal. The RF ICP reactor has been generally operated under one atmospheric pressure. Lately the characteristics of low pressure RF ICP is attracting a great deal of attention in the field of plasma application. In our researches of RF plasma applications, low pressure RF ICP is mainly used. In many cases, the plasma generated by the ICP torch under low pressure seems to be rather capacitive, but high density ICP can be easily generated by our RF plasma torch with 3 turns coil and a suitable maching circuiit, using 13.56 MHz RF generator. Plasma surface modification (surface hardening by plasma nitriding and plasma carbo-nitriding), plasma synthesis of AIN, and plasma CVD of BN, B-C-N compound and diamond were practiced by using low pressure RF plasma, and the effects of negative and positive bias voltage impression to the substrate on surface modification and CVD were investigated in details. Only a part of the interesting results obtained is reported in this paper.