• Title/Summary/Keyword: 10GE

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A 5.5 GHz VCO with Low-Frequency Noise Suppression (저주파 잡음이 억압된 5.5 GHz 전압제어발진기)

  • Lee J.Y;Bae B.C.;Lee S.H.;Kang J.Y;Kim B.W.;Oh S.H
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.465-468
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    • 2004
  • In this paper, we describe the design and implementation of the new current-current negative feedback (CCNF) voltage-controlled oscillator (VCO), which suppresses 1/f induced low-frequency noise. By means of the CCNF, the high-frequency noise as well as the low-frequency noise is prevented from being converted into phase noise. The proposed CCNF VCO shows 11-dB reduction in phase noise at 10 kHz offset, compared with the conventional differential VCO. The phase noise of the proposed VCO is -87 dBc/Hz at 10 kHz offset frequency from 5.5-GHz carrier. The proposed VCO consumes 14.0 mA at 2.0 V supply voltage, and shows single-ended output power of -12.0 dBm.

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A Study on the Phase Change Characteristics of Si-doped Ge2Sb2Te5 Thin Films for PRAM (PRAM을 위한 Si-doped Ge2Sb2Te5 박막의 상변화 특성 연구)

  • Baek, Seung-Cheol;Song, Ki-Ho;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.4
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    • pp.261-266
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    • 2010
  • In this paper, we report the changes of electrical, structural and optical characteristics in $Ge_2Sb_2Te_5$ thin films according to an increase of Si content. The Si-doped $Ge_2Sb_2Te_5$ thin films were prepared by rf-magnetron co-sputtering method. Isothermal annealing was carried out at $N_2$ atmosphere. The crystallization speed (v) of amorphous thin films was evaluated by detecting the reflection response signals using a nano-pulse scanner (wavelength = 658 nm) with illumination power of 1~17 mW and pulse duration of 10~460 ns. Structural phase changes were evaluated by XRD, and the optical transmittance was measured in the wavelength range of 300~3000 nm using UV-vis-NIR spectrophotometer. The sheet resistance (RS) of the thin films was measured using 4 point probe. Conclusivlely, the v-value decreased with an increase of Si content, while the RS-values of both crystalline and amorphous phases were increased. In particular, fcc-to-hexagonal transition was suppressed by the added Si atoms.

Effect of NaBH4 and HCl on signal intensity of As, Se, Ge with on-line hydride generation system and E-O-V ICP-AES (수소화물 발생장치와 유도 결합 플라스마 원자화 방출 분광법 이용 시 비소와 셀레늄 및 게르마늄의 신호세기에 대한 NaBH4와 HCl의 영향)

  • Nam, Sang-Ho;Han, Soung-Sim
    • Analytical Science and Technology
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    • v.15 no.5
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    • pp.439-444
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    • 2002
  • DE-O-V ICP-AES has been studied for the analytical characteristics of As, Se, and Ge with PN, USN and HG. Effect of $NaBH_4$ and HCl on the signal intensity of As, Se and Ge with HG and E-O-V ICP-AES were closely investigated. The sensitivities of As, Se and Ge with HG were much greater than those with PN and USN. Accordingly, the detection limits of the elements with HG were lower by a factor of 100 and 10 than PN and USN, respectively.

Growth mode of epitaxial $Si_{0.5}Ge_{0.5}$ alloy layer grown on Si(100) by ion beam assisted deposition (이온선보조증착에 의한 Si(100)기판에 정합성장된 $Si_{0.5}Ge_{0.5}$박막의 성장방식)

  • Park, Sang-Uk;Baek, Hong-Gu
    • Korean Journal of Materials Research
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    • v.5 no.3
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    • pp.297-309
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    • 1995
  • 본 연구에서는 이온선보조증착법에 의해 Si(100)기판위에 정합성장된 $Si_{0.5}$Ge_{0.5}$층의 핵성성과 성장을 고찰하였다. 성장층에 대한 AFM(Atomic Force Microscopy), RHEED(Reflection High Energy Electron diffraction) 등의 분석결과 Si(100)기판위에 이온선보조증착에 의하여 성장된 $Si_{0.5}$Ge_{0.5}$층은 Stranski-Kranstanov(SK)기구로 성장되며, 300eV, 10 $\mu$A/$cm^{2}$의 Ar이온선을 조사시키는 경우 결정성이 향상되었고, SK 성장 방식의 임계두께가 증가하였다. Ar 이온선 조사에 의해 MBE에 의한 정합성장온도(55$0^{\circ}C$-$600^{\circ}C$)보다 훨씬 낮은 20$0^{\circ}C$에서 정합성장이 가능하였으며, $x_{mn}$값은 10.5%로 MBE에 의한 정합성장시 보고된 $x_{mn}$ 값보다 낮았다. 이온충돌에 의해 발생한 3차원 island의 분해와 표면확산의 증가가 $Si_{0.5}$Ge_{0.5}$층의 성장에 현저한 영향을 미쳤으며, 이온충돌의 영향은 3차원 island의 생성보다 3차원 island의 분해가 더 안정한 낮은 증착온도에서만 관찰되었다.

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Optical properties of undoped and $Co^{2+}$-doped $Zn_4$$ GeSe_6$ single crystals ($Zn_4$$ GeSe_6$$Co^{2+}$를 첨가한 $Zn_4$$ GeSe_6$:$Co^{2+}$단결정의 광학적 특성)

  • 김덕태
    • Electrical & Electronic Materials
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    • v.10 no.2
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    • pp.105-112
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    • 1997
  • Undoped and Co$^{2+}$-doped Zn$_{4}$GeSe$_{6}$ single crystals were grown by the Chemical Transport Reaction method using iodine as a transporting agent. The crystal structure of these compounds determined by X-ray diffraction analysis was monoclinic structure. The direct energy gaps of these compounds were measured and the temperature dependence of the optical energy gap were closely investigated over the temperature range 10-290K. The temperature dependence of the optical energy gap is well presented by the Varshni equation. Also the optical absorption peaks of Zn$_{4}$GeSe$_{6}$ :Co$^{2+}$ single crystal observed, centered at 5437, 6079, 7142, 12950, 13462, 14786 and 15735 $cm^{-1}$ /, can be explained in terms of the electronic transitions of Co$^{2+}$ ions located at Td symmetry of the host materials. According to the crystal-field theory, the crystal-field, Racah and spin-orbit coupling parameters obtained from the absorption bands are given by Dq = 361$cm^{-1}$ /, B = 655$cm^{-1}$ / and .lambda. = 284$cm^{-1}$ / respectively.ively.

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Ion-Induced Changes in a $Se_{75}Ge_{25}$ Inoaganic Resist for Focused Ion Beam Microlithgraphy (집속 이온빔 마이크로리소그라피를 위한 비정질 $Se_{75}Ge_{25}$ 무기질 레지스터의 이온 유기 변화)

  • 이현용;박태성;정홍배;강승언;김종빈
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.05a
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    • pp.30-33
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    • 1992
  • This thesis was investigated on ion-induced characteristics in a-$Se_{75}Ge_{25}$ positive and negative resists for focused-ion-beam microlithogaphy. The exposed a-$Se_{75}Ge_{25}$ inorganic thin film shows an increase in optical absorption after exposure to~$10_{16}$ dose of Ga+. The observed shift in the absorption edge toward longer wavelengths is consistent with that in films exposed to band-gap photons(~$10^{21}$photons/cm2). This result may be related with microstructural rearrangements with in the short range of SeGe network. Due to changes in the short range order, the chemical bonding may be affected, which results in increased chemical dissolution in ion-induced film. Also, this resist exhibits good thermal stability because of its high Tg(~$220^{\circ}C$). When focused ion beams are used for direct exposure of resist over a substrate, unwanted implantation of the substrate may be an issue. A possible way to avoid this is to match the thickness of the resist to the range of ions in the resist. Thin aspect is currently under investigation.

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Phase Change Characteristics of Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) Thin Film for PRAM (PRAM을 위한 Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) 박막의 상변환 특성)

  • Shin, Jae-Ho;Baek, Seung-Cheol;Kim, Byung-Cheul;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.5
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    • pp.404-409
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    • 2011
  • An amorphous $Ge_2Sb_2Te_5$ thin film is one of the most commonly used materials for phase-change data storage. In this study, $Au_x(Ge_2Sb_2Te_5)_{1-x}$ thin film amorphous-to-crystalline phase-change rate were evaluated in using 658 nm laser beam. The focused laser beam with a diameter <10 ${\mu}m$ was illuminated in the power (P) and pulse duration (t) ranges of 1-17 mW and 10-460 ns, respectively, with subsequent detection of the responsive signals reflected from the film surface. We also evaluated the material characteristics, such as optical absorption and energy gap, crystalline phases, and sheet resistance of as-deposited and annealed films. The result of experiments showed that the thermal stability of the $Ge_2Sb_2Te_5$ film is largely improved by adding Au.

Pd/Ge/Pd/Ti/Au Ohmic Contact for Application to AlGaAs/GaAs HBT (AIGaAs/GaAs HBT 응용을 위한 Pd/Ge/Pd/Ti/Au 오믹 접촉)

  • 김일호;박성호(주)가인테크
    • Journal of the Korean Vacuum Society
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    • v.11 no.1
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    • pp.43-49
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    • 2002
  • Pd/Ge/Pd/Ti/Au ohmic contact to n-type InGaAs was investigated with rapid thermal annealing conditions. Minimum specific contact resistivity of $1.1\times10^{-6}\Omega\textrm{cm}^2$ was achieved after annealing at $400^{\circ}C$/10sec, and a ohmic performance was degraded at higher annealing temperature due to the chemical reaction between the ohmic contact materials and the InGaAs substrate. However, non-spiking planar interface and relatively good ohmic contact($high-10^{-6};{\Omega}\textrm{cm}^2$) were maintained. This ohmic contact system is expected to be a promising candidate for compound semiconductor devices.

ON CERTAIN CLASSES OF LINKS AND 3-MANIFOLDS

  • Kim, Soo-Hwan;Kim, Yang-Kok
    • Communications of the Korean Mathematical Society
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    • v.20 no.4
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    • pp.803-812
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    • 2005
  • We construct an infinite family of closed 3-manifolds M(2m+ 1, n, k) which are identification spaces of certain polyhedra P(2m+ 1, n, k), for integers $m\;\ge\;1,\;n\;\ge\;3,\;and\;k\;\ge\;2$. We prove that they are (n / d)- fold cyclic coverings of the 3-sphere branched over certain links $L_{(m,d)}$, where d = gcd(n, k), by handle decomposition of orbifolds. This generalizes the results in [3] and [2] as a particular case m = 2.