• Title/Summary/Keyword: 화염가수분해증착

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Measurements of Temperature and OH Radical Distributions in Flame Hydrolysis Deposition Process (화염 가수분해 증착공정에서 온도 및 OH 분포측정)

  • Hwang, Jun-Yeong;Gil, Yong-Seok;Kim, Jeong-Ik;Choe, Man-Su;Jeong, Seok-Ho
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.24 no.11
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    • pp.1464-1469
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    • 2000
  • The effects of SiCl$_4$addition on flame structures have been studied in flame hydrolysis deposition (FHD) processes using Coherent anti-Stokes Raman spectroscopy (CARS) and planar laser induced fluorescence (PLIF) to measure temperatures and OH concentrations, respectively. The results demonstrate that even a small amount of SiCl$_4$ addition can change thermal and chemical structures of H$_2$/O$_2$ diffusion flames. When SiCl$_4$ is added to a flame temperature decreases in non-reacting zone due to the increases in both specific heat and density of the gas mixture, while flame temperature increase in particle formation zone due to the heat release through hydrolysis and oxidation reactions of SiCl$_4$. It is also found that OH concentration decreases dramatically in particle formation zone where temperatures increase. This can be attributed to consumption of oxidative species and generation of HCl during silica formation.

Refractive Index Control by Dopant for Thick Silica films Deposited by FHD (FHD법에 의해 증착된 실리카막의 도펀트 첨가에 의한 굴절률 제어)

  • 김용탁;서용곤;윤형도;임영민;윤대호
    • Journal of the Korean Ceramic Society
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    • v.40 no.6
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    • pp.589-593
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    • 2003
  • Silica based Planar Lightwave Circuits (PLC) have been applied to various kinds of wave-guided optical passive devices. SiO$_2$ (buffer) and GeO$_2$-SiO$_2$ (core) thick films have been deposited by Flame Hydrolysis Deposition (FHD). The SiO$_2$ films were produced by the flame hydrolysis reaction of halide materials such as SiCl$_4$, POCl$_3$ and BCl$_3$ into an oxy-hydrogen torch. The P concentration increased from 2.0 to 2.8 at% on increasing the POCl$_3$/BCl$_3$ flow ratio. The refractive index increased from 1.4584 to 1.4605 on increasing the POC1$_3$/BC1$_3$ flow ratio from 0.6 to 2.6. The refractive index of GeO$_2$-SiO$_2$ films was controlled by the GeCl$_4$ flow rate. The refractive index increased from 1.4615 to 1.4809 on increasing the GeCl$_4$ flow rate from 30 to 120 sccm.

An Experimental Study of Silica Particle Growth in a Coflow Diffusion Flame Utilizing Light Scattering and Local Sampling Technique (I) - Effects of Flame Temperature - (광산란과 입자포집을 이용한 동축류 확산화염 내의 실리카 입자의 성장 측정(I) - 화염온도의 영향 -)

  • Cho, Jaegeol;Lee, Jeonghoon;Kim, Hyun Woo;Choi, Mansoo
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.23 no.9
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    • pp.1139-1150
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    • 1999
  • The evolution of silica aggregate particles in coflow diffusion flames has been studied experimentally using light scattering and thermophoretic sampling techniques. The measurements of scattering cross section from $90^{\circ}$ light scattering have been utilized to calculate the aggregate number density and volume fraction using with combination of measuring the particle size and morphology through the localized sampling and a TEM image analysis. Aggregate or particle number densities and volume fractions were calculated using Rayleigh-Debye-Gans and Mie theory for fractal aggregates and spherical particles, respectively. Of particular interests are the effects of flame temperature on the evolution of silica aggregate particles. As the flow rate of $H_2$ increases, the primary particle diameters of silica aggregates have been first decreased, but, further increase of $H_2$ flow rate causes the diameter of primary particles to increase and for sufficiently larger flow rates, the fractal aggregates finally become spherical particles. The variation of primary particle size along the upward jet centerline and the effect of burner configuration have also been studied.

Low Temperature Consolidation of Silica Film by Flame Hydrolysis Deposition (FHD 공정으로 제조한 실리카 막의 저온 고밀화)

  • Kim, Tae-Hong;Yoon, Ki-Hyun
    • Journal of the Korean Ceramic Society
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    • v.39 no.3
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    • pp.278-285
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    • 2002
  • For planar optical devices, silica film deposited by FHD was fabricated at low temperature. To prepare silica film at low temperature, we have changed B, P amounts and investigated consolidation effect with varying consolidation temperature and atmosphere on microstructural change, and also observed optical property. The optimum consolidation temperature in He was lower than that of other atmosphere, its temperature could be lowered to 1050$^{\circ}C$. As a result, the roughness of flat silica film prepared at 1050$^{\circ}C$ showed 5, 6nm.

An Experimental Study of Silica Particle Growth in a Coflow Diffusion Flame Utilizing Light Scattering and Local Sampling Technique (II) - Effects of Diffusion - (광산란과 입자포집을 이용한 동축류 확산화염 내의 실리카 입자의 성장 측정(II) - 확산의 영향 -)

  • Cho, Jaegeol;Lee, Jeonghoon;Kim, Hyun Woo;Choi, Mansoo
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.23 no.9
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    • pp.1151-1162
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    • 1999
  • The effects of radial heat and $H_2O$ diffusion on the evolution of silica particles in coflow diffusion flames have been studied experimentally. The evolution of silica aggregate particles in coflow diffusion flames has been measured experimentally using light scattering and thermophoretic sampling techniques. The measurements of scattering cross section from $90^{\circ}$ light scattering have been utilized to calculate the aggregate number density and volume fraction using with combination of measuring the particle size and morphology through the localized sampling and a TEM image analysis. Aggregate or particle number densities and volume fractions were calculated using Rayleigh-Debye-Gans and Mie theory for fractal aggregates and spherical particles, respectively. Flame temperatures and volumetric differential scattering cross sections have been measured for different flame conditions such as inert gas species, $H_2$ flow rates, and burner injection configurations to examine the relation between the formation of particles and radial $H_2O$ diffusion. The comparisons of oxidation and flame hydrolysis have also been made for various $H_2$ flow rates using $N_2$ or $O_2$ as a carrier gas. Results indicate that the role of oxidation becomes dominant as both carrier gas($O_2$) and $H_2$ flow rates increases since the radial heat diffusion precedes $H_2O$ diffusion in coflow flames used in this study. The effect of carrier gas flow rates on the evolution of silica particles have also been studied. When using $N_2$ as a carrier gas, the particle volume fraction has a maximum at a certain carrier gas flow rate and as the flow rate is further increased, the hydrolysis reaction Is delayed and the spherical particles finally evolves into fractal aggregates due to decreased flame temperature and residence time.

Effect of Substrate Temperature on Multi-component Particle Deposition and Consolidation in Flame Hydrolysis Deposition (화염가수분해 증착 공정에서 기판온도의 변화에 따른 다성분 입자의 부착 및 소결특성에 관한 연구)

  • Shin, Hyung-Soo;Baek, Jong-Gab;Choi, Man-Soo
    • Proceedings of the KSME Conference
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    • 2000.04b
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    • pp.428-433
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    • 2000
  • The consolidation behavior of multicomponent particles prepared by the flame hydrolysis deposition process is examined to identify the effects of Si substrate temperature. To fabricate multi-component particles, a vapor-phase ternary mixture of $SiCl_4(100 cc/min),\;BCl_3(30cc/min)\;and\;POCl_3,(5cc/min)$ was fed into a coflow diffusion oxy-hydrogen flame burner. The doped silica soot bodies were deposited on silicon substrates under various deposition conditions. The surface temperature of the substrate was measured by an infrared thermometer. Changes in the chemical states of the doped silica soot bodies were examined by FT-IR(Fourier-transformed infrared spectroscopy). The deposited particles on the substrate were heated at $1300^{\circ}C$ for 3h in a furnace at a heating rate of 10K/min. Si-O-B bending peak has been found when surface temperature exceeds $720^{\circ}C$. Correspondingly, the case with substrate temperatures above loot produced good consolidation result.

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Characterization of $SiO_2-P_2O_5-B_2O_3$ Glass Soot fabricated by Flame Hydrolysis Deposition (화염 가수분해 증착에 의해 형성된 $SiO_2-P_2O_5-B_2O_3$ 유리 미립자의 특성)

  • 최춘기;정명영;최태구
    • Journal of the Korean Ceramic Society
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    • v.34 no.8
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    • pp.811-816
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    • 1997
  • SiO2-P2O5-B2O3 glass soot was fabricated by flame hydrolysis deposition and their properties by SEM, XRD, TGA-DSC were investigated., The mechanism of consolidation process of a glass soot as a function of consolidation temperature was analyzed by SEM observations. In the XRD patterns, the crystalline peaks which seem to be generated from B2O3 and BPO4 were observed. When the temperature of heat treatment exceeded 105$0^{\circ}C$, the non-crystalline state of SiO2-P2O5-B2O3 glass was observed. In the TGA-DSC curves, the evaporation of water molecule by a sudden endothermic reaction was observed at 128$^{\circ}C$ and a broad endothermic peak was seen in the temperature range of 40$0^{\circ}C$-95$0^{\circ}C$, without any weight loss. Finally, this peak was began to recover its baseline at 953$^{\circ}C$. This point is equal to the temperature at which the densification begins. Furthermore, we observed that the addition of dopants such as P2O5 and B2O3 decrease the onset of consolidation temperature till 95$0^{\circ}C$.

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The fabrication of Er-doped silica film for optical amplifier (광증폭기 응용을 위한 Er 첨가 실리카 유리 박막의 제조)

  • Kim, Jae-Seon;Sin, Dong-Uk;Jeong, Seon-Tae;Song, Yeong-Hwi
    • Korean Journal of Materials Research
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    • v.11 no.5
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    • pp.385-392
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    • 2001
  • There have been many investigations and researches on PLC type of optical amplifiers because they are convenient for mass production and also can integrate multi-functional devices into a single chip. In this research. the fabrication of optical waveguide made of Si/$Sio_2$ by FHD(Flame Hydrolysis Deposition) for passive integrated optical devices and $1.5\mu\textrm{m}$ optical amplifier by Solution Doping method, which is one of the method doping $Er^{3+}$ into the thin film, are mainly discussed.

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The Fabrication of Er/Al Co-doped Silica Films for 1.55 $\mu\textrm{m}$ Optical Amplifier (1.55 $\mu\textrm{m}$ 광증폭기용 Er/Al 첨가 광도파막의 제조)

  • 노성인;김재선;정용순;신동욱;송국현
    • Journal of the Korean Ceramic Society
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    • v.38 no.12
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    • pp.1144-1149
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    • 2001
  • In this research, the fabrication of Si/SiO$_2$optical waveguide amplifier by FHD(Flame Hydrolysis Deposition) and Solution Doping was carried out. It was observed that the reduction of fluorescence was prevented up to 0.14 wt% Er whn 0.48 wt% Al was doped and the FWHA of $1.5mutextrm{m}$ fluorescence band increased by 5 nm as increasing amount of Al. Therefore from these results, we could confirm depressing concentration quenching of Er ions and increasing FWHM of fluorescence spectrum by addition of Al.

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Effect of Temperature on Consolidation of Silica Soot Prepared by Flame Hydrolysis Deposition (FHD법에 의해 형성된 실리카 soot의 고밀화 공정에 미치는 온도의 영향)

  • Kim, Seong-Su;Yu, Ji-Beom;Sim, Jae-Gi;Jeong, Myeo-Yeong
    • Korean Journal of Materials Research
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    • v.8 no.4
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    • pp.337-344
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    • 1998
  • 화염가수분해증착법에 의해 형성된 $0.1\mu\textrm{m}$크기의 soot를 실리콘 기판위에 형성하여 $1325^{\circ}C$에서 2시간 동안 고밀화과정후 투명한 후막을 얻을 수 있었다. 고밀화 열처리는 탈수과정, 재배열 과정, 그리고 고밀화 과정으로 구성되었다. 고밀화 공정후의 두께 수축률은 초기 soot의 96%정도였으며, 급속한 두께의 감소는 $950^{\circ}C$부터 시작되었으며, 본격적인 고밀화가 시작되는 온도는 $1250^{\circ}C$임을 알 수 있었다. soot의 TGA와 DTA를 이용한 열분석 결과 탈수과정에 의하여 9/wt%의 질량감소와 $1250^{\circ}C$이상에서 인(P)의 증발에 의한 2wt%의 질량감소를 관찰하였다. DTA곡선에서는 $500^{\circ}C$, $570^{\circ}C$. $1258^{\circ}C$에서 흡열반응 피크를 나타내는데, 이는 $B_{2}$$O_{3}$, $P_{2}$$O_{5}$ 등의 도펀트들의 melting과 실리카 입자사이의 기공이 소멸되면서 입자간의 열전도도의 증가에 의해 나타난 것으로 판단된다.

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