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http://dx.doi.org/10.4191/KCERS.2002.39.3.278

Low Temperature Consolidation of Silica Film by Flame Hydrolysis Deposition  

Kim, Tae-Hong (Information Technology Research Group, Electronics and Telecommunication Research Institute)
Yoon, Ki-Hyun (Department of Ceramic Engineering, Yonsei University)
Publication Information
Journal of the Korean Ceramic Society / v.39, no.3, 2002 , pp. 278-285 More about this Journal
Abstract
For planar optical devices, silica film deposited by FHD was fabricated at low temperature. To prepare silica film at low temperature, we have changed B, P amounts and investigated consolidation effect with varying consolidation temperature and atmosphere on microstructural change, and also observed optical property. The optimum consolidation temperature in He was lower than that of other atmosphere, its temperature could be lowered to 1050$^{\circ}C$. As a result, the roughness of flat silica film prepared at 1050$^{\circ}C$ showed 5, 6nm.
Keywords
Flame hydrolysis deposition; Consolidation; Silica film;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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