• Title/Summary/Keyword: 탈이온수

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탈이온수를 절연액으로 사용한 깊은 구멍 가공

  • 서동우;이상민;주종남
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.05a
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    • pp.244-244
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    • 2004
  • 다양한 산업 분야에서 세장비가 높은 구멍 가공의 필요성이 증가하고 있다. 방전 가공은 세장비가 높은 미세 구멍을 가공하는데 매우 효과적인 방법이다. 그러나 일반적인 방전 가공으로는 세장비가 5이상 되는 깊은 구멍을 가공하기가 쉽지 않다 구멍을 가공할 때에 일정 깊이 이상으로 가공이 진행되면 가공 부스러기가 쉽게 배출되지 못하여 방전 집중 현상과 아크 방전이 일어나게 된다. 이로 인해 깊은 구멍 가공이 불가능하게 된다. 그러나 절연액에 초음파를 부가하여 가공을 하면 공구와 가공물 사이의 기공 부스러기가 분산되어 방전 집중 현상과 아크 방전 현상이 사라지고 가공이 원활히 이루어진다.(중략)

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Micro Electrical Discharge Milling Using Deionized Water (탈이온수를 이용한 미세 방전 밀링)

  • Chung Do-Kwan;Chu Chong-Nam;Kim Bo-Hyun
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.3 s.180
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    • pp.69-75
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    • 2006
  • In this paper, micro electrical discharge milling using deionized water as dielectric fluid was investigated. In EDM, dielectric fluid is an important factor which affects machining characteristics. When deionized water was used as dielectric fluid, machining characteristics were investigated according to voltage, capacitance, and resistivity of deionized water. Machining gap increased with increasing voltage and capacitance. As the resistivity of deionized water decreased, the machining gap increased. The wear of a tool electrode and machining time can be reduced by using deionized water instead of EDM oil. Surface roughness was also improved when deionized water was used.

반도체제조의 생산성 제고를 위한 반도체 공정 주변기술

  • Lee, Yong-Il;Bae, Nam-Jin
    • Electronics and Telecommunications Trends
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    • v.3 no.1
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    • pp.53-64
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    • 1988
  • 소자의 집적도가 향상됨에 따라 공정조건 제어의 중요성이 부각되고 있다. 따라서 제조환경의 엄격한 제어가 요구되고, 사용되는 화학약품 및 탈이온수의 순도가 중요해지고 있다. 즉, 반도체 제조공정의 주변기술에 대한 중요성이 높아지는 추세이다. 본고에서는 이러한 주변기술의 발전동향에 대해 간략하게 기술하였다.

Micro EDM Milling Using Deionized Water as Dielectric Fluid (탈수이온수를 절연액으로 사용한 미세 방전 밀링)

  • Chung, Do-Kwan;Kim, Bo-Hyun;Chu, Chong-Nam
    • 한국신재생에너지학회:학술대회논문집
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    • 2005.06a
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    • pp.546-549
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    • 2005
  • Micro EDM milling using deionized water as dielectric fluid was investigated. After machining micro grooves using deionized water with different voltage. capacitance. and resistivity of deionized water, machining characteristics were investigated. The wear of a tool electrode and the machining time can be reduced by using deionized water instead of kerosene. Micro hemispheres were machined in deionized water and kerosene and their machining characteristics were compared.

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Machining Characteristics of Micro-EDMed Holes According to Dielectric Fluid, Capacitance and Ultrasonic Vibrations (방전가공을 이용한 미세구멍 가공 시 절연액, 축전용량과 초음파 부가에 따른 가공특성)

  • Seo, Dong-Woo;Yi, Sang-Min;Chu, Chong-Nam;Park, Min-Soo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.12
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    • pp.42-49
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    • 2007
  • When micro holes are machined by EDM, machining characteristics of machined holes are changed according to the machining conditions. Typical machining conditions are the kind of dielectric fluids, capacitance and ultrasonic vibrations. They influence electrode wear, machining time, radial clearance and taper angle. In this paper, machined holes whose depths are 300, 500, $1000\;{\mu}m$ are observed for each machining conditions. Using deionized water as a dielectric fluid makes electrode wear small, machining time short, radial clearance large and taper angle small. High capacitance makes electrode wear high. Ultrasonic vibrations make electrode wear large, machining time short, radial clearance small and taper angle small. From the results of experiments, the optimal machining conditions were obtained to machine highly qualified micro holes.

The study of manufacturing the oxidizer(Hydrogen Peroxide) feeding system of liquid rocket engine (액체로켓엔진 산화제(과산화수소) 공급계 구축에 관한 연구)

  • Jeon, Jun-Su;Jeong, Jae-Hoon;Kim, Yoo;Ko, Young-Sung;Kim, Sun-Jin
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2009.05a
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    • pp.33-36
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    • 2009
  • This study suggests manufacturing and cleaning the feeding system of hydrogen peroxide to use oxidizer of liquid rocket. We established the process of cleaning and passivation in order to minimize the pollution of Hydrogen Peroxide feeding system. And, we verified stability of the manufactured feeding system by leak test & hot test.

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Internal flow visualization of an evaporating droplet placed on heated metal plate (가열된 금속표면에 놓인 증발하는 액적의 내부유동 가시화)

  • Park, Chang-Seok;Lim, Hee-Chang
    • Journal of the Korean Society of Visualization
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    • v.15 no.1
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    • pp.25-31
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    • 2017
  • This study aims to visualize the Marangoni flow inside a droplet placed on heated hydrophobic surface and to measure its internal velocity field. The experimental result shows that the internal velocity increases with the increase of the plate temperature. In addition, the temperature difference induces the initial flow and drives the Marangoni circulation inside the droplet as soon as the evaporation starts (i.e. the thermal Marangoni flow). The fluorescence particles in the droplet trace two large-scale counter-rotating vortex pairs yielding the downwards flow along the vertical central axis. These vortex pairs gradually become small and move towards the contact line as time goes by, and this Marangoni flow sustains only for a half of the total evaporation time.

Chemical Mechanical Polishing Characteristics of Mixed Abrasive Slurry by Adding of Alumina Abrasive in Diluted Silica Slurry (탈이온수로 희석된 실리카 슬러리에 알루미나 연마제가 첨가된 혼합 연마제 슬러리의 CMP 특성)

  • 서용진;박창준;최운식;김상용;박진성;이우선
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.6
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    • pp.465-470
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    • 2003
  • The chemical mechanical polishing (CMP) process has been widely used for the global planarization of multi-layer structures in semiconductor manufacturing. The CMP process can be optimized by several parameters such as equipment, consumables (pad, backing film and slurry), process variables and post-CMP cleaning. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, the slurry dominates more than 40 %. In this paper, we have studied the CMP characteristics of diluted silica slurry by adding of raw alumina abrasives and annealed alumina abrasives. As an experimental result, we obtained the comparable slurry characteristics compared with original silica slurry in the view-point of high removal rate and low non-uniformity. Therefore, we can reduce the cost of consumables(COC) of CMP process for ULSI applications.