• Title/Summary/Keyword: 전계방출

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Field-emission characteristics of carbon nanotube emitters in terms of tip angles of conical-type metal substrates (원추형 금속 기판의 팁 각도에 따른 탄소 나노튜브 이미터의 전계방출 특성)

  • Kim, Jong-Pil;Noh, Young-Rok;Chang, Han-Beet;Park, Jin-Seok
    • Journal of the Semiconductor & Display Technology
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    • v.10 no.2
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    • pp.115-119
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    • 2011
  • A tip-type carbon nanotube(CNT)-based field emitter was studied to consider it as electron source for micro-focused x-ray tube. The CNT was grown directly on a metal (tungsten) substrate by using an inductively coupled plasma-chemical vapor deposition (ICP-CVD) method. Prior to CNT growth, the metal substrate was etched to have various tip angles from $10^{\circ}$ to $180^{\circ}C$ (flat-type). The morphologies and microstructures of all the grown CNTs were analyzed via field-emission SEM. Furthermore, the effects of substrate tip-angles on the emission properties of CNT-based field emitters were characterized to estimate the maximum current density, the turn-on voltage, and the spatial distribution of electron beams. Prolonged long-term stability testing of the CNT emitters was also performed. All the experiment results obtained from this study indicated why a tip-type CNT emitter, compared with a flat-type CNT emitter, would be more desirable for a micro-focused x-ray system, in terms of the emission current level, the focused beam area, and the emission stability.

Field emission properties of CNT-W tips as a function of the composition ratio of Ni and Co catalysts in CNT growth (CNT 성장시 Ni 및 Co 촉매의 조성비에 따른 CNT-W 팁의 전계방출 특성 분석)

  • Kim, Won;Yun, Sung-Jun;Kim, Young-Kwang;Kim, Jong-Pil;Park, Chang-Kyun;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1269-1270
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    • 2007
  • Carbon nanotubes (CNTs) are directly grown on W-tips at $700^{\circ}C$ using an ICP-CVD method. Sharpening of W-tip is done by electrochemical etch and their diameters are limited to range from $3{\mu}m$ to $5{\mu}m$. Catalysts for CNTs growth are formed by RF and DC co-sputtering systems using Ni and Co. The composition ratio of Ni and Co has been evaluated by energy dispersive x-ray spectroscopy (EDS). The micro-images of CNTs are monitored by field emission scanning electron microscope (FESEM). It is observed from Raman study that the intensity of the D-peak is increased by increasing the amount of Co catalyst. Furthermore, the measurement of field emission properties of CNTs show that the CNT grown on a single Co catalyst possess the greatest performance such as $V_{th}$=1,115V and $I_{max}=164{\mu}A$.

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Effects of Component Change of Bonding Materials on Field Emission Properties of CNT-Cathodes (본딩재료의 성분 변화가 탄소나노튜브 캐소드의 전계방출 특성에 미치는 영향)

  • Shin Heo-Young;Seong Myeong-Seok;Kim Tae-Sik;Oh Jeong-Seob;Jung Seung-Jin;Lee Ji-Eon;Cho Young-Rae
    • Korean Journal of Materials Research
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    • v.15 no.11
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    • pp.711-716
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    • 2005
  • The effects of change in the component of bonding materials in carbon nanotube cathode (CNT-cathode) on field enhancement and field emission characteristics were investigated. The field enhancement factor$\beta$ was dependent on the electrical conductivity of the bonding materials. The use of frit glass as a bonding material showed a higher field enhancement factor and better field emission characteristics than an Ag paste. The reason for why the frit glass showed better field emission characteristics can be summarized as follows. First, a frit glass improves the real aspect ratio of CNTs compared to an Ag paste. Second, the number of CNTs in CNT-cathodes is considerably reduced because the CNTs were extensively oxidized during $390^{\circ}C$ heat treatment in air atmosphere in the case of Ag paste.

Fast liquid crystal switching performance on indium zinc oxide films with low curing temperature via ion-beam irradiation (이온빔 조사된 저온 소성 인듐 아연 산화막을 이용한 액정의 고속 스위칭 특성 연구)

  • Oh, Byeong-Yun
    • Journal of IKEEE
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    • v.23 no.3
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    • pp.904-909
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    • 2019
  • Using the ion-beam irradiated indium zinc oxide (IZO) films which was cured at $100^{\circ}C$, uniform LC and homogeneous alignment of liquid crystal (LC) molecules was achieved. The IZO film was deposited on the glass substrate at the curing temperature of $100^{\circ}C$ and irradiated by the ion-beam which is an LC alignment method. To verify the LC alignment characteristics, polarizing optical microscope and the crystal rotation method were used. Additionally, it was confirmed that the LC cell with the IZO films had an enough thermal budget for high-quality LC applications. Field emission scanning electron microscope was conducted as a surface analysis to evaluate the effect of the ion-beam irradiation on the IZO films. Through this, it was revealed that the ion-beam irradiation induced rough surface with anisotropic characteristics. Finally, electro-optical (EO) performances of the twisted-nematic cells with the IZO films were collected and it was confirmed that this cell had better EO performances than the conventional rubbed polyimide. Furthermore, the polar anchoring energy was measured and a suitable value for stable LC device operation was achieved.

Electron Field Emission Characteristics of Silicon Nanodots Formed by the LPCVD Technique (LPCVD로 형성된 실리콘 나노점의 전계방출 특성)

  • An, Seungman;Yim, Taekyung;Lee, Kyungsu;Kim, Jeongho;Kim, Eunkyeom;Park, Kyoungwan
    • Korean Journal of Metals and Materials
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    • v.49 no.4
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    • pp.342-347
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    • 2011
  • We fabricated the silicon nanodots using the low pressure chemical vapor deposition technique to investigate their electron field emission characteristics. Atomic force microscope measurements performed for the silicon nanodot samples having various process parameters, such as, deposition time and deposition pressure, revealed that the silicon nanodots with an average size of 20 nm, height of 5 nm, and density of $1.3\;{\times}\;10^{11}\;cm^{-2}$ were easily formed. Electron field emission measurements were performed with the silicon nanodot layer as the cathode electrode. The current-voltage curves revealed that the threshold electric field was as low as $8.3\;V/{\mu}m$ and the field enhancement factor reached as large as 698, which is compatible with the silicon cathode tips fabricated by other techniques. These electron field emission results point to the possibility of using a silicon-based light source for display devices.

Field Emission Property of Double-walled Carbon Nanotubes Related to Purification and Transmittance (이중벽 탄소나노튜브의 정제와 투과도에 따른 전계방출 특성 평가)

  • Ahn, KiTae;Jang, HyunChul;Lyu, SeungChul;Lee, Hansung;Lee, Naesung;Han, Moonsup;Park, Yunsun;Hong, Wanshick;Park, Kyoungwan;Sok, Junghyun
    • Korean Journal of Metals and Materials
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    • v.49 no.1
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    • pp.79-84
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    • 2011
  • Double-walled carbon nanotubes (DWCNTs) with high purity were produced by the catalytic decomposition of tetrahydrofuran (THF) using a Fe-Mo/MgO catalyst at $800^{\circ}C$. The as-synthesized DWCNTs typically have catalytic impurities and amorphous carbon, which were removed by a two-step purification process consisting of acid treatment and oxidation. In the acid treatment, metallic catalysts were removed in HCl at room temperature for 5 hr with magnetic stirring. Subsequently, the oxidation, using air at $380^{\circ}C$ for 5 hr in the a vertical-type furnace, was used to remove the amorphous carbon particles. The DWCNT suspension was prepared by dispersing the purified DWCNTs in the aqueous sodium dodecyl sulfate solution with horn-type sonication. This was then air-sprayed on ITO glass to fabricate DWCNT field emitters. The field emission properties of DWCNT films related to transmittance were studied. This study provides the possibility of the application of large-area transparent CNT field emission cathodes.

EMC Measurements above 1 GHz Using an Offset Parabola Antenna System (옵셋 파라볼라 안테나를 이용한 1 GHz 이상에서의 전자파 적합성 평가)

  • Chung, Yeon-Choon
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.21 no.10
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    • pp.1184-1193
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    • 2010
  • The upper frequency of international EMC regulations is being expanded above 1 GHz. Radiated emissions above 1 GHz are different from those below 1 GHz that is existing upper regulation frequency, and which have lower field strength and sharper and tilted beam-width, relatively. In this paper, an effective evaluation method to be used above 1 GHz is studied using an offset parabola antenna system having a double-ridged horn antenna as a feed. First, simple model is proposed for calculating antenna factor and field uniformity of the parabola antenna system, and then real radiated emission and radiated susceptibility measurements are performed using a constant noise emitter and the suggested antenna system. The results show that the proposed antenna system has higher gain and power efficiency, and wider field uniformity relative to a conventional double-ridged horn antenna. Therefore, it is confirmed that the proposed system can be effectively used for EMC measurements above 1 GHz.

Pulse electric field-excited electron emission from Pb$(Zr_xTi_{1-x})O_3$ ceramics prepared by conventional solid state reaction (고상 반응법에 의해 제조된 Pb$(Zr_xTi_{1-x})O_3$ 세라믹스에서 펄스 전계에 의한 전자 방출)

  • Kwak, Sang-Hee;Kim, Tae-Heui;Park, Kyung-Bong;Kim, Chang-Soo
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1867-1869
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    • 1999
  • Pulse electric field induced electron emission from ferroelectrics has been studied with Pb$(Zr_xTi_{1-x})O_3$ ceramics with varying Zr/Ti ratio from 35/65 to 65/35, Electron emission was proved to be concentrated on the electrode edge by emission profile test and emission capture photographs. The 65/35 composition showed largest emission charge in lowest field and lowest emission threshold field. The emission characteristics are closely dependent on their ferroelectric properties in hysteresis curve. Electron emission charge increases with the polarization charge and emission threshold voltage is dependent on coercive field regardless of their composition. But dielectric constant has little relation with emission property. Electron emission charge increases exponentially with pulse electric field irrespective of composition. On the assumption that the surface potential is linear with the pulse electric field, electron emission can be regarded as a field emission at the electrode edge using Fowler-Nordheim plot of ln$(Q_e/E_{fe})$ to $1/E_{fe}$.

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Fabrication of Triode Type Field Emission Device Using Carbon Nanotubes Synthesized by Thermal Chemical Vapor Deposition (열 화학 기상 증착법을 이용한 삼극관 구조의 탄소 나노 튜브 전계 방출 소자의 제조)

  • Yu W. J.;Cho Y. S.;Choi G. S.;Kim D. J.
    • Korean Journal of Materials Research
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    • v.14 no.8
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    • pp.542-546
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    • 2004
  • We report a new fabrication process for high performance triode type CNT field emitters and their superior electrical properties. The CNT-based triode-type field emitter structure was fabricated by the conventional semiconductor processes. The keys of the fabrication process are spin-on-glass coating and trim-and-leveling of the carbon nanotubes grown in trench structures by employing a chemical mechanical polishing process. They lead to strong adhesion and a uniform distance from the carbon nanotube tips to the electrode. The measured emission property of the arrays showed a remarkably uniform and high current density. The gate leakage current could be remarkably reduced by coating of thin $SiO_{2}$ insulating layer over the gate metal. The field enhancement factor(${\beta}$) and emission area(${\alpha}$) were calculated from the F-N plot. This process can be applicable to fabrication of high power CNT vacuum transistors with good electrical performance.

Fabrication and Operating Properties of Nb Silicide-coated Si-tip Field Emitter Arrays (니오비움 실리사이드가 코팅된 실리콘 팁 전계 방출 소자의 제조 및 동작 특성)

  • Ju, Byeong-Kwon;Park, Jae-Seok;Lee, Sangjo;Kim, Hoon;Lee, Yun-Hi;Oh, Myung-Hwan
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.7
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    • pp.521-524
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    • 1999
  • Nb silicide was formed on the Si micro-tip arrays in order to improve field emission properties of Si-tip field emitter array. After silicidization of the tips, the etch-back process, by which gate insulator, gate electrode and photoresist were deposited sequentially and gate holes were defined by removing gradually the photoresist by $O_2$ plasma from the surface, was applied. Si nitride film was used as a protective layer in order to prevent oxygen from diffusion into Nb silicide layer and it was identified that the NbSi2 was formed through annealing in $N_2$ ambient at $1100^{\circ}C$ for 1 hour. By the Nb silicide coating on Si tips, the turn-on voltage was decreased from 52.1 V to 32.3 V and average current fluctuation for 1 hour was also reduced from 5% to 2%. Also, the fabricated Nb silicide-coated Si tip FEA emitted electrons toward the phosphor and light emission was obtained at the gate voltage of 40~50 V.

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