• Journal of the Korean Society for Precision Engineering
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• v.23 no.5 s.182
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• pp.59-67
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• 2006

Chemical Mechanical Polishing(CMP) in semiconductor production is characterized its output property by Removal Rate(RR) and Non-Uniformity(NU). Some previous works show that RR is determined by production of pressure and velocity and NU is also largely affected by velocity of flowfield during CMP. This study is about the direct measurement of velocity of slurry during CMP and whole flowfield upon the non-groove pad by Particle Image Velocimetry(PIV). Typical PIV system is modified adequately for inspecting CMP and slurry flowfield is measured by changing both pad rpm and carrier rpm. We performed measurement with giving some variation in the kinds of pad. The results show that the flowfield is majorly determined not by Carrier but by Pad in the case of non-groove pad.

• 한국가시화정보학회:학술대회논문집
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• 2004.11a
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• pp.48-51
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• 2004

Chemical Mechanical Polishing(CMP) is popularly used in production of semiconductor because of large area polishing ability probability of improvement for more integrated circuit. However, present CMP processing causes some non-uniformity errors which can be critical for highly integrated circuit. Previous studies predict that flow-field of slurry during CMP can create non-uniformity, but no quantitative measurement has conducted. In this study, using PIV, slurry velocity flow-field during CMP is measured by changing the ratio of RPM of pad and carrier with tuned PIV system adequate for small room in CMP machine and Cabot's non-groove pad Epad-A100. The result show that velocity of slurry is majorly determined by pad-rpm and the ratio of between carrier and pad rpm make some changes in streamlines.

• Journal of the Mineralogical Society of Korea
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• v.20 no.1 s.51
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• pp.1-6
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• 2007

Hectorite was synthesized by a two-step hydrothermal process from $Mg(OH)_{2}$, water glass (${\sim}30\;wt%\;SiO_{2}$) and Li-compound at $90{\pm}5^{\circ}C$. The product shows excellent dispersion and swelling properties. The mixture of the starting materials was heated in a glass vessel for the first reaction with continuous stirring and the pH of the solution was adjusted to $6{\sim}8$, resulting in the formation of a precursor of hectorite. The excess salt components were washed out from the resulting slurry and then was matured in the glass vessel for the 2nd reaction. Li compound was added during the reaction. After a 10 h retention, the gel of hectorite was formed. The XRD pattern of the synthesized one was coincided with that of natural hectorite and SEM study revealed uniform grains 50 m in diameter. The d001 basal spacing of the product moved from 12 to $17.4\;{\AA}$ after glycolation treatment. The measured value of CEC and the swelling capacity was 90 cmol/kg and $60{\sim}70\;mL/2\;g$, respectively.