• 한국정밀공학회지
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• 제26권11호
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• pp.47-54
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• 2009

Spin coaters are the essential instruments in micro-fabrication processes, which apply uniform thin films to flat substrates. In this research, a spin coater diagnosis system is developed to detect the abnormal operation of TFT-LCD process in real time. To facilitate the real-time data acquisition and analysis, the circular-buffered continuous data transfer and the short-time Fourier transform are applied to the fault diagnosis system. To determine whether the system condition is normal or not, a steady-state detection algorithm and a frequency spectrum comparison algorithm using confidence interval are newly devised. Since abnormal condition of a spin coater is rarely encountered, algorithm is tested on a CD-ROM drive and the developed program is verified by a function generator. Actual threshold values for the fault detection are tuned in a spin coater in process.

• 한국정밀공학회지
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• 제20권2호
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• pp.209-217
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• 2003

In this paper, the dynamic system modeling and the state sensitivity analysis of the spin-coater system are proposed for the reduction of the vibration. In the respect of modeling, the spin-coater system is considered to be composed of servomotor, spindle, supporting base and so on. Each component of model is combined and derived to 3 dimensional equations. The combined model is verified by experimental values of actual system in the frequency domain. By direct differentiation of the constraint equations with respect to kinematic design variables, such as eccentricity of spindle, moment of inertia, rotational stiffness and damping of supported base, sensitivity equations are derived to the verified state equations. Sensitivity of design variables could be used for vibration reduction and natural frequency shift in the frequency domain. Finally, dominant design variables are selected from the sensitivity analysis.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2009년도 춘계학술대회 논문집
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• pp.608-609
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• 2009

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.464-464
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• 2013

그래핀 옥사이드(Graphene Oxide)는 그래핀과 마찬가지로 많은 분야로의 응용 가능성을 보이는 소자중 하나로 각광받고 있다. 그래핀 옥사이드가 가지는 유전체 특징은 전하 트랩층(charge trap layer)으로 사용을 가능하게 하고 또한 물에 녹는 수용성 특징은 스핀코터(spin coator)를 이용한 간단한 도포과정을 통하여 저비용으로 간단하게 소자를 제작 가능하게 한다. 이 연구에서 우리는 금속-절연체-반도체 구조를 가지는 메모리 소자를 제작하여 0.4 mg/ml의 농도로 DI에 용해된 그래핀 옥사이드가 플로팅게이트(floating gate)로써 사용되었을 때의 특성을 알아보기 위해 Boonton 720를 사용하여 C-V (hysteresis) 커브와 C-T(Capacitance-Time)를 측정하여 그래핀 옥사이드의 유무에 따른 메모리 윈도우 폭의 증가 및 저장된 정보가 손실되지 않고 얼마나 길게 유지 되는지를 살펴봄으로 플로팅게이트로써 그래핀 옥사이드의 특성을 살펴보았다. 먼저 터널링층으로 쓰이는 SiO2가 5 nm 증착된 P타입 Si기판위에 플로팅게이트로 쓰이는 그래핀 옥사이드층을 쉽게 쌓기 위하여 APTES 자기조립 단분자막 코팅을 한 후 그래핀 옥사이드를 3,000 rpm으로 40초간 스핀코팅을 하였다. 그 후 블로킹층으로 쓰이는 400 nm 두께의 폴리비닐페놀(PVP)를 3,000 rpm으로 40초간 스핀코팅을 하고 $130^{\circ}C$에서 열처리를 하였으며 $10^{-5}$ Torr의 압력에서 진공 열증착으로 알루미늄 게이트 전극을 증착했다.

• 한국기계가공학회지
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• 제10권6호
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• pp.146-151
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• 2011

Wax spin coating is a part of several wafer handling processes in the silicon wafer polishing station. It is important to ensure the wax layer free of contamination to achieve the high degree of planarization on wafers after wafer polishing. Three-dimensional air flow characteristics in a wax spin coater are numerically investigated using computational fluid dynamics techniques. When the bottom of the wax spin coater is closed, there exists a significant recirculation zone over the rotating ceramic block. This recirculation zone can be the source of wax layer contamination at any rotational speed and should be avoided to maintain high wafer polishing quality. Thus, four air suction ducts are installed at the bottom of the wax spin coater in order to control the air flow pattern over the ceramic block. Present computational results show that the air suction from the bottom is quite an effective method to remove or minimize the recirculation zone over the ceramic block and the wax coating layer.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 춘계학술대회 논문집
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• pp.503-507
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• 2002

Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.

• 반도체디스플레이기술학회지
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• 제19권1호
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• pp.17-22
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• 2020

Recently, the decrease in thin film thickness has been actively studied by changing several physical elements such as the increase in revolution velocity of lower substrate equipped with AC or DC motor. In this paper, we propose a novel spin coater control system that changes AC or DC motor and common use software with limitation of velocity and position control into step motor and LABVIEW software based on GUI to control revolution velocity and position more precisely. By determining six input values of rotation velocity 1, 5, 10, 25, 50, 100 PPS, we fabricated six samples using coating target, TA(tantalum) on silicon substrate and measured their thin film thickness by SEM. Hence, this research can be applied to inferring thin film thickness of tantalum regarding any value of revolution velocity without additional experiments and for linear reference model via property analysis of thin film thickness using other thin-film materials.

• 한국정밀공학회지
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• 제22권1호
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• pp.199-206
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• 2005

Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

• 한국정밀공학회지
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• 제22권2호
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• pp.180-187
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• 2005

This paper is focused on the development of the flexible electrode for disc-type polymer actuators using Segmented Polyurethane(SPU). This paper consists of two parts. The one is about the mechanical property such as elastic modulus. these parameters mainly affect behaviors of polymer actuators and the other is about the electro-chemical property such as the surface resistance of the composite electrode affects the strength of electrostatic force, results in the deformation of polymer actuators. The Young's modulus was measured by UTM. As result, by increasing the modulus of a body of polymer actuators, the maximum displacement of polymer actuators are decreased. The surface resistance of the electrode was measured by 4 point probe system. Compared with the conductive silver grease, the displacement of polymer actuators using carbon black(CB) composite electrodes is comparably small but CB composite electrode should be the practical approach for the improvement of the performance of all-solid actuators, compared with another types of electrode materials.

• 반도체디스플레이기술학회지
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• 제15권1호
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• pp.6-11
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• 2016

For high volume manufacturing using extreme ultraviolet (EUV) lithography, mask protection from contamination during lithography process must be solved, and EUV pellicle is the strongest solution. Based on the technical requirements of EUV pellicle, EUV pellicle should have large membrane area ($110{\times}140mm^2$) with film transmittance over 90% and mechanical stability. Even though pellicle that satisfies size standard with high transmittance has been reported, its mechanical stability has not been confirmed, nor is there a standard to evaluate the mechanical stability. In this study, we suggest a rather simple method evaluating mechanical stability of pellicle membrane using spin-coater which can emulate the linear accelerated motion. The test conditions were designed by simulating the acceleration distribution inside pellicle membrane through correlating the linear acceleration and centripetal acceleration, which occurs during linear movement and rotation movement, respectively. By these simulation results, we confirmed the possibility of using spin-coater to evaluate the mechanical stability of EUV pellicle.