• Journal of the Korean Chemical Society
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• v.53 no.1
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• pp.42-50
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• 2009

The dielectric-spectroscopic and ac conductivity studies firstly carried out on layered manganese doped Sodium Lithium Trititanates ($Na_{1.9}Li_{0.1}Ti_3O_7$). The dependence of loss tangent (Tan$\delta$), relative permittivity ($\varepsilon_r$) and ac conductivity ($\sigma_{ac}$) in temperature range 373-723K and frequency range 100Hz-1MHz studied on doped derivatives. Various conduction mechanisms are involved during temperature range of study like electronic hopping conduction in lowest temperature region, for MSLT-1 and MSLT-2. The hindered interlayer ionic conduction exists with electronic hopping conduction for MSLT-3. The associated interlayer ionic conduction exists in mid temperature region for all doped derivatives. In highest temperature region modified interlayer ionic conduction along with the polaronic conduction, exist for MSLT-1, MSLT-2, and only modified interlayer ionic conduction for MSLT-3. The loss tangent (Tan$\delta$) in manganese-doped derivatives of layered $Na_{1.9}Li_{0.1}Ti_3O_7$ ceramic may be due to contribution of electric conduction, dipole orientation, and space charge polarization. The corresponding increase in the values of relative permittivity may be due to increase in number of dipoles in the interlayer space while the corresponding decrease in the values of relative permittivity may be due to the increase in the leakage current due to the higher doping.

• Applied Chemistry for Engineering
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• v.7 no.5
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• pp.999-1005
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• 1996

Pt catalyst on carbon black was prepared by colloidal method, ion exchanging method and methanol reducing method. The colloidal method has been used generally. At ion exchanging method, $H^+$ of functional group on carbon surface made by oxidation treatment was exchanged with Pt ion. At methanol reducing method, Pt was impregnated on carbon to reduce by methanol contained with surfactants. With TEM and XRD, Pt particle size impregnated on carbon by various methods was $30{\sim}50{\AA}$. Loading yield was about 100%, loading yield of ion exchanging method was 99.92% by DCP analysis and 99.87% by combustion method. Within 60 hour, current density of oxygen reduction was $460mA/cm^2$ at 0.7V(vs. RHE) at colloidal method. It was the better performance than catalyst prepared by ion exchanging, methanol reducing method. But, it was shown some decrease of performance for long operation time(after 100hour), catalyst prepared by methanol reducing method was shown stable performance.

• Applied Chemistry for Engineering
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• v.5 no.5
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• pp.764-771
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• 1994

Electrochemical synthesis of conductive polypyrrole films was carried out in nucleophilic solvent containing p-toluenesulfonic acid or bezensulfonic acid as supporting electrolyte and dopant. Also characteristics of degradation and improvement of mechanical properties were studied. The conductivity, tensile strength and elongation of the films obtained in dimethyformamide/p-toluenesulfonic acid had the highest value of 10-40S/cm, $25N/mm^2$ and 10%, respectively. The optimum condition of electrochemical synthesis was $2mA/cm^2$ for constant current method and 0.9V for constant potential method containing 0.5M pyrrole and 0.5M p-TSA. The obtained films showed good stability in air and electrode characteristics of secondary battery by reversibility in doping and undoping. The degradation process was 1st order reaction at various temeprature. The activation energy and rate constant of degradation reaction were $1.01JK^{-1}mol^{-1}$ and $3.1{\times}10^{-7}min^{-1}$ respectively at $25^{\circ}C$. For the improvement of mechanical properties, composition of polypyrrole films with various host polymer were investigated and increase of tensile strength and elongation was confirmed.

• Journal of the Korean Vacuum Society
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• v.22 no.5
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• pp.245-249
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• 2013

The $HfO_X$ thin film was deposited what it has been paid attention to the next generation oxide thin layer of MOSFET (metal-Oxide semiconductor field-effect-transistor) by rf magnetron sputter on Si (100) substrate. The $HfO_X$ thin film was deposited using a various oxygen gas flows (5, 10, 15 sccm). After deposition, $HfO_X$ thin films were annealed from 400 to $800^{\circ}C$ for 20 min in nitrogen ambient. The electrical characteristics of the $HfO_X$ thin film was improved by leakage current properties, depending on the increase of oxygen gas flow and annealing temperature. In particular, the properties of nano-mechanics of $HfO_X$ thin films were measured by AFM and Nano-indenter. From the results, the maximum indentation depth at the basis of maximum indentation force was increased from 24.9 to 38.8 nm according to increase the annealing temperature. Especially, the indentation depth was increased rapidly at $800^{\circ}C$. The rapid increasement of indentation depth was expected to be due to the change of residual stress in the $HfO_X$ thin film, and this result was caused by relative flux of oxygen outgasing during the annealing process.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.19 no.12
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• pp.2899-2904
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• 2015

This paper introduces about the effect on $I_{DS}-V_{GS}$ characteristic of transistor that interface trap charge is created by damage due to heat in a 3D sequential inverter. A interface trap charge distribution in oxide layer in a 3D sequential inverter is extracted using two-dimensional device simulator. The variation of threshold voltage of top transistor according to the gate voltage variation of bottom transistor is also described in terms of Inter Layer Dielectric (ILD) length of 3D sequential inverter, considering the extracted interface trap charge distribution. The extracted interface trap density distribution shows that the bottom $HfO_2$ layer and both the bottom and top $SiO_2$ layer were relatively more affected by heat than the top $HfO_2$ layer with latest process. The threshold voltage variations of the shorter length of ILD in 3D sequential inverter under 50nm is higher than those over 50nm. The $V_{th}$ variation considering the interface trap charge distribution changes less than that excluding it.

• Journal of the Korean Vacuum Society
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• v.7 no.3
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• pp.195-200
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• 1998

We have investigated the crystal structure and electrical properties of Pt/SBT/$CeO_2$/Si(MFIS) and Pt/SBT/Si(MFS) structures for the gate oxide of ferroelectric memory. XRD spectra and SEM showed that the SBT film of SBT/$CeO_2$/Si structure had larger grain than that of SBT/Si structure. Furthermore HRTEM showed that SBT/$CeO_2$/Si had 5 nm thick $SiO_2$layer and very smooth interface but SBT/Si had 6nm thick $SiO_2$layer and 7nm thick amorphous intermediate interface. Therefore, $CeO_2$film between SBT film and Si substrate is confirmed as a good candidate for a diffusion barrier. The remanent polarization decreased and coercive voltage increased in Pt/SBT/$CeO_2/Pt/SiO_2$/Si structure. This effect may increase memory window of MFIS structure directly related to the coercive voltage. From the capacitance-voltage characteristics, the memory of Pt/SBT(140 nm)/$CeO_2$(25 nm)/Si structure were in the range of 1~2 V at the applied voltage of 4~6 V. The memory window increased with the thickness of SBT film. These results may be due to voltage applied at SBT films. The leakage currents of Pt/SBT/$CeO_2$/Si and Pt/SBT/Si were $ 10^8A/\textrm{cm}^2$ and $ 10^6 A/\textrm{cm}^2$, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.411-412
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• 2013

최근 UV LED는 생화학 및 의료 산업에서 많은 각광을 받고 있다. 특히, 360nm 이하의 파장대를 갖는 UV LED는 치료 기술, 센서, 물이나 공기 등의 정화와 같은 목적으로 특별한 관심이 쏠리고 있다 [1]. 이러한 지속적인 연구를 통하여 현재까지 UV LED는 거대한 성장을 이루어 왔다. 하지만 이러한 노력에도 불구하고, 360 nm 이하의 UV LED는 여전히 오믹 접촉과 전류 분산이 원활하지 못하다는 문제점을 가지고 있다. 이것은 UV LED의 외부 양자 효율을 감소시키고, 더 나아가 극도로 낮은 광 추출 효율을 초래한다. 최근 이러한 문제를 해결하고자, 투명 전도성 산화물(TCO)을 금속 전극과 p-AlGaN 사이에 삽입해주는데, 현재 가장 널리 사용되는 TCO 물질은 ITO 이다 [2]. 하지만 ITO 물질은 상대적으로 작은 밴드갭(3.3~4.3 eV)과 단파장 빛이 가지는 큰 에너지로 인하여 deep-UV 영역에서는 빛이 투과하지 못하고 대부분 흡수된다 [3]. 따라서 본 연구에서는 기존의 박막형 ITO 투명 전극에 비해 투과도 손실을 최소화할 수 있는 mesh, grid 기반의 투명전극을 연구하였다. Fig. 1과 같이 $5{\mu}m$, $10{\mu}m$, $20{\mu}m$ 간격으로 이루어진 mesh, grid 구조의 투명전극을 구현하여 투과도 손실을 최소화하면서 우수한 전기적 특성을 확보하기 위한 구조 최적화 연구를 진행하였다. 본 연구를 위해 mesh, grid 구조의 ITO 전극 패턴을 photolitho 공정으로 형성하였으며, e-beam 증착법으로 60 nm 두께의 ITO 전극을 형성 후 질소 분위기/$650^{\circ}$에서 30초 동안 RTA 공정을 진행하였다. Fig. 1에서 볼 수 있듯이 mesh, grid의 간격이 증가할수록 투명 전극이 차지하는 면적이 감소하여 투과도는 향상되는 반면, 투명 전극과 p-GaN과의 접촉 면적 또한 감소하므로 오믹 특성이 저하된다. 따라서 투과도 손실을 최소화하면서 우수한 전기적 특성을 확보하기 위해 mesh는 $20{\mu}m$, grid는 $10{\mu}m$ 간격의 구조로 각각 최적화하였다. 그 결과 박막 기반의 ITO 투명전극 대비 최대 약 10% 향상된 투과도를 확보하였으며, I-V Curve 결과를 통하여 p-GaN 기판과 mesh 구조의 ITO 전극 사이에 박막 기반의 투명 전극과 비슷한 수준인 $0.35{\mu}A(@5V)$의 전기적 특성을 확보하였다. 결과적으로 mesh, grid 기반 투명전극의 구조 최적화를 통하여 p-GaN과 원활한 오믹 접촉을 형성하는 동시에 기존 박막형 ITO 투명 전극 구조보다 높은 투과도를 확보할 수 있었다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.6
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• pp.2879-2887
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• 2011

This research is aimed for the better understanding of corrosion behavior of carbon steel in ETA or $NH_3$ solution at high temperature. To minimize the corrosion it is important to select proper pH control agent(s), which also let it maintain basic or reductive environment inside the steel pipe. This work will provide the practical guideline which can be applied to the nuclear power plant for developing the life extension method of carbon steel. Experiments were carried out by measuring the corrosion rate using the potentiodynamic polarization curve of carbon steel in ETA and NH3 at different temperatures. The corrosion rate was estimated by using the Tafel curve measured under various test conditions: i) $NH_3$ is less than ETA as a pH agent. ii) the corrosion was reduced at high pH, and iii) the corrosion was maximum in the temperature range of $150\sim200^{\circ}C$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.6
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• pp.493-501
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• 2000

The microstructure and electrical properties of ZnO-Pr$_{6}$/O$_{11}$-CoO-Er$_{2}$/O$_{3}$ based varistors were investigated with Er$_{2}$/O$_{3}$ additive content of the range 0.0 to 2.0 mol%. Most of the added Er$_{2}$/O$_{3}$ were segregated at the nodal points and grain boundaries and it coexisted with Pr$_{6}$/O$_{11}$ in the bulk intergranular layer. The average grain size was decreased in the range of 7.44 to 5.62${\mu}{\textrm}{m}$ at 130$0^{\circ}C$ and 18.36 to 9.11 at 135$0^{\circ}C$ with increasing Er$_{2}$/O sub 3/ additive content. The density of ceramics was in the range 4.87 to 5.08 g/cm$^3$ at 130$0^{\circ}C$ and 5.35 to 5.62 g/cm$^3$at 135$0^{\circ}C$. At 130$0^{\circ}C$ the varistors without Er$_{2}$/O$_{3}$ exhibited 29.66 in the nonlinear exponent and 28.23 $\mu$A in the leakage current whereas the varistors with 0.5 mol% Er$_{2}$/O$_{3}$ exhibited a high nonlinearity which is 52.78 in thenonlinear exhibited and 9.75 $\mu$A in the leakage current. At 135$0^{\circ}C$ the varistors without Er$_{2}$/O$_{3}$ exhibited a very poor nonlinearity indicating 2.08 in the nonlinear exponent and 133.79 $\mu$A in the leakage current whereas the varistors with 1.0mol% Er$_{2}$/O$_{3}$ exhibited a relatively high nonlinearity which is 36.79 in the nonlinear exponent and 5.92 $\mu$A in the leakage current. Therefore Er$_{2}$/O$_{3}$ was additive which greatly improve the nonlinearity. It is believed that ZnO-0.5 mol% Pr$_{6}$/O$_{11}$-1.0 mol% CoO-0.5 mol% Er$_{2}$/O$_{3}$ based ceramicss will be usefully used as a basic composition to develop the advanced pr$_{6}$/O$_{11}$-based ZnO varistors.ristors.ristors.

• Nuclear Engineering and Technology
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• v.26 no.3
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• pp.425-432
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• 1994

Voltammogram analysis of U(VI) reduction at electrochemically non-pretreated/pretreated Ti electrodes in nitric acid and hydrazine($N_2$H$_4$)/protonated hydrazine($N_2$H$_{5}$$^{＋}$) media was done in order to determine the effect of hydrazine form and Ti electrode condition on the reduction of U(VI) in nitric acid. In the case of non-pretreated Ti electrode, the reduction in nitric acid and hydrazine mono-hydrate solution needed a high activation overpotential and was affected by the ratio of hydrazine to nitric acid rather than by only absolute amount of hydrazine because of the decrease of solution conductivity and increase of iR drop, which were caused by proton consumption in the solution by the hydrazine. In the case of pretreated Ti electrode in nitric acid and protonated hydrazine solution, the reduction current peaks of U(VI) were clearer and higher enough to perform a kinetic analysis, compared with the case with the non-pretreated Ti electrode at the same potential, and the behavior was strongly affected by nitric acid. The presence of hydrazine was important in the reduction of U(VI) at the pretreated Ti electrode for preventing the reoxidation of U(IV), but the concentration of protonated hydrazine was not.t.