• Journal of Advanced Navigation Technology
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• v.18 no.4
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• pp.364-370
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• 2014

In this paper, high reliable trench formation technique and a novel fabrication techniques for trench gate MOSFET is proposed which is a key to expend application of power MOSFET in the future. Trench structure has been employed device to improve Ron characteristics by shrinkage cell pitch size in DMOSFET and to isolate power device part from another CMOS device part in some power integrated circuit. A new process method for fabricating very high density trench MOSFETs using mask layers with oxide spacers and self-align technique is realized. This technique reduces the process steps, trench width and source and p=body region with a resulting increase in cell density and current driving capability and decrease in on resistance.

• Journal of Surface Science and Engineering
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• v.51 no.2
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• pp.87-94
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• 2018

Various sealing techniques were applied to the anodized 5083 aluminum alloy for marine environment to reduce corrosion and cavitation erosion damage. Electrochemical experiments and cavitation erosion tests were conducted to evaluate the corrosion resistance and cavitation resistance of the anodic oxide film treated with sealing in natural seawater solution. Then, damaged surface morphology was analyzed by scanning electron microscope(SEM) and 3D microscope. As the results of the electrochemical experiments, it was observed that the surface damage of all the experimental conditions in the anodic polarization experiment was locally grown by the combination of crack and corrosion damage. In the Tafel analysis, the corrosion resistance of all sealing treatment conditions was improved compared to the anodizing. On the other hand, cavitation erosion tests showed that the anodizing and all the sealing treatment conditions generated local pit damage by cavitation erosion attack and grew to crater damage in the observation of damaged surface by SEM. Also, the weight loss and the surface damage depth measured with the experiment time presented that most of the sealing treatment conditions showed better cavitation erosion resistance than the anodizing, and they had an incubation period at the beginning of the experiment.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.6-6
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• 2010

Indium Tin Oxide (ITO)를 포함한 Transparent Conduction Oxide (TCO)는 LCD, OLED와 같은 Display, 그리고 Solar Cell 등 광신호와 전기신호간 변환이 필요한 모든 Device에 반드시 필요한 핵심 물질로, 특히 고특성 Display의 투명전극에서 요청되는 95% 이상의 투과도와 $15\;{\Omega}/{\square}$ 이하의 면저항 특성을 동시에 만족할 수 있는 기술은 현재까지 Plasma Sputtering 공정으로 $160^{\circ}C$ 이상에서 증착된 ITO 박막이 유일하다. 그러나, 최근 차세대 기술로서 Plastic Film을 기반으로 하는 Flexible Display 및 Flexible Solar Cell 구현에 대한 요구가 급증하면서, Plastic Film 기판위에 Plasma Damage이 없이 상온에 가까운 저온 ($100^{\circ}C$ 이하)에서 특성이 우수한 ITO 투명전극을 형성 할 수 있는 기술의 확보가 중요한 현안이 되고 있다. 지난 10년 동안 $100^{\circ}C$이하 저온에서 고특성의 ITO 또는 TCO 박막을 얻기위한 다양한 연구와 구체적인 공정이 활발히 연구되어 왔으나, ITO의 결정화 온도 (통상 $150{\sim}180^{\circ}C$)이하에서 증착된 ITO박막은 비정질 상태의 물성적 특성을 보여 원하는 전기적, 광학적 특성확보가 어려웠다. 본 논문에선 기본적으로 절연체 특성을 가져야 하는 산화물인 TCO가 반도체 또는 도체의 물리적 특성을 보여주는 기본원리의 고찰을 토대로, 재료학적 특성상 Crystalline 구조를 보여야 하는 ITO (Complex Cubic Bixbyte Structure)가 Plasma Sputtering 공정으로 저온에서 증착될 때 비정질 구조를 갖게 되는 원인을 규명하고, 이를 바탕으로 저온에서 증착된 ITO가 Crystalline 구조를 유지 할 수 있게 하고, Stress Control에 유리한 Nano-Crystalline 박막을 형성하면서 Crystallinity를 임의로 조절 할 수 있는 새로운 기술인 Magnetic Field Shielding Sputtering (MFSS) 공정과 최근 성과를 소개한다. 한편, 또 다른 새로운 저온 TCO 박막형성 기술로서, 유기반도체와 같은 Process Damage에 매우 취약한 유기물 위에 Plasma Damage 없이 TCO 박막을 직접 형성할 수 있는 Neutral Beam Assisted Sputtering (NBAS) 기술의 원리를 설명하고, 본 공정을 적용한 Top Emission OLED 소자의 결과를 소개한다. 또한, 고온공정이 수반되는 Solar Cell용 투명전극의 경우, 통상의 TCO박막이 고온공정을 거치면서 전기적 특성이 열화되는 원인을 규명하고, 이에 대한 근본적 해결 방법으로 ITO 박막의 Dopant인 Tin (Sn) 원자의 활성화를 증가시킨 Inductively Coupled Plasma Assisted DC Magnetron Sputtering (ICPDMS)의 원리와 박막의 물성적 특성과 내열 특성을 소개한다.

• Journal of the Mineralogical Society of Korea
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• v.25 no.3
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• pp.123-130
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• 2012

Leaching experiments of gold and silver from roasted concentrate were carried out using a chlorine-hypochlorite solution. The leaching rate of gold was 75% at 1.5:1 ratio of chlorine and hypochlorite and increased to 81% with adding 1 M NaCl. However, at 1% pulp density and at $65^{\circ}C$, the leaching rates of Au were close to 100%. XRD analysis identified quartz in the solid residues after digestion of roasted concentrate with aqua regia or chlorine-hypochloride leaching solution. This suggests that the gold may not be leached out of the quartz in aqua regia or chlorine-hypochlorite solution. In order to leach the gold from the quartz, the concentrate will have to be pre-treated through ultra-fine grinding or treated with stronger oxidative agents.

• Journal of Powder Materials
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• v.24 no.4
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• pp.292-297
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• 2017

A metallic oxide layer of a heat-resistant element contributes to the high-temperature oxidation resistance by delaying the oxidation and has a positive effect on the increase in electrical resistivity. In this study, green compacts of Fecralloy powder mixed with amorphous and crystalline silica are oxidized at $950^{\circ}C$ for up to 210 h in order to evaluate the effect of metal oxide on the oxidation and electrical resistivity. The weight change ratio increases as per a parabolic law, and the increase is larger than that observed for Fecralloy owing to the formation of Fe-Si, Fe-Cr composite oxide, and $Al_2O_3$ upon the addition of Si oxide. Si oxides promote the formation of $Al_2O_3$ and Cr oxide at the grain boundary, and obstruct neck formation and the growth of Fecralloy particles to ensure stable electrical resistivity.

• Journal of Advanced Marine Engineering and Technology
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• v.37 no.5
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• pp.484-492
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• 2013

With the industrial acceleration in a lot of countries of the world, the demand for anti-corrosion and anti-abrasion material increases continuously. Particularly, stainless steel with the fine surface and excellent corrosion resistance is widely used in various industrial fields including ship, offshore structures tidal power plant, and etc. In marine environment, however, it is easy to generate by the corrosion damage by $Cl^-$ ion and cavitation damage due to high rotation speed on stainless steel. Therefore, in this research, the cavitation erosion-corrosion test (Hybrid test) was performed for 304 stainless steel specimen used in the high flow rate seawater environment. And the cavitation damage behavior in the corrosive environment was analyzed overall. The high hardness was shown due to the formation of compressive residual stress by the water cavitation peening effect in cavitation condition. However, high current density in the potentiodynamic polarization experiment presented with the breakdown of the passive film caused by physical impact. Therefore, both electrochemical characteristics and mechanical properties must be taken into account to improve the cavitation resistance in seawater.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.85-85
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• 2007

최근 귀금속중의 하나인 Ruthenium(Ru)은 높은 일함수, 누설전류에 대한 높은 저항성등의 톡성으로 인해 캐패시터의 하부전극으로 각광받고 있다. 하부전극으로 증착된 Ru은 일반적으로 각 캐패시터의 분리와 평탄화를 위해 건식식각이 이루어진다. 하지만, 건식식각 공정중 유독한 $RUO_4$ 가스가 발생할 수 있으며, 불균일한 캐패시터 표면을 유발할 수 있다. 이러한 문제점들을 해결하기 위해 CMP 공정이 필요하게 되었다. 하지만, Ru은 화학적으로 매우 안정하기 때문에 Ru CMP 슬러리에 대한 연구가 필요하게 되었으며, 이에 대한 연구가 활발히 진행되고 있다. 본 연구에서는 Ru CMP 공정에서 Chemical A가 에칭제 및 산화제로 사용된 슬러리의 pH 변화와 pH 적정제에 따른 영향을 살펴보았다. Ru wafer를 이용하여 static etch rate, passivation film thickness와 wettability를 pH와 pH 적정제에 따라 비교해 보았다. 또한, pH 적정제로 $NH_4OH$와 TMAH를 이용하여 pH별 슬러리를 제작하고 CMP 공정을 실시하여 Ru의 removal rate을 측정하였다. $NH_4OH$와 TMAH의 경우 각각 130. 100 nm/min의 연마율이 측정된 pH 6에서 가장 높은 연마률을 보였으며, TMAH의 경우가 pH 전 구간에서 $NH_4OH$에 비해 낮은 연마율이 측정되었다. TEOS 에 대한 Ru의 선택비를 측정해 본 결과, $NH_4OH$의 경우 pH 8~9. TMAH의 경우 pH 6~7에서 높은 selectivity를 얻을 수 있었다.

• Korean Journal of Metals and Materials
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• v.48 no.8
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• pp.741-748
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• 2010

We studied the corrosion and oxidation properties of Fe-18Cr-0.4Nb-(0.1~0.6)Ti-(1~3)Si-(0.5~2)Mo stainless steel. The resistance to general and pitting corrosion was evaluated and the results were analyzed by Response Surface Methodology (RSM) as a function of alloy composition. The effects of alloy composition and heat treatment on the oxidation resistance were also examined. Mo increased both general corrosion resistance and pitting corrosion resistance. Si improved the resistance of the alloys to pitting corrosion. Si was also beneficial for general corrosion resistance of the alloys containing Mo at more than 1 wt.%. However, Mo was detrimental when its content was lower. Effects of Ti on general corrosion properties appeared to be weak and a high concentration of Ti appeared to deteriorate pitting resistance. The thickness of the oxidation scale increased and adhesion of the scale worsened as the temperature increased from $800^{\circ}C$ to $900^{\circ}C$. Weight gain of the alloys due to oxidation at $900^{\circ}C$ clearly showed that the resistance to oxidation is improved by annealing at $860^{\circ}C$ and an increase of Si content.

• New & Renewable Energy
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• v.18 no.2
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• pp.40-49
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• 2022

In this study, the phase and electrochemical properties of Co and Ti substituted layered perovskites SmBaCo_2-xTi_xO_5+d (x=0.5, 0.7, 1.0, 1.1, 1.3, and 1.5) were analyzed, and their application as electrodes in solid oxide fuel cells (SOFCs) were evaluated. After calcination at 1300℃ for 6 h, a single phase was observed for two compositions of the SmBaCo_2-xTi_xO_5+d oxide system, SmBaCoTiO_5+d (x=1.0) and SmBaCo_0.9Ti_1.1O_5+d (x=1.1). However, the phases of SmBaCoTiO_5+d (SBCTO) and SmTiO₃ coexisted for compositions with x≥1.3 (Ti content). In contrast, for compositions of x≤0.7, the SmBaCo₂O_5+d phase was observed instead of the SmTiO₃ phase. To evaluate the applicability of these materials as SOFC electrodes, the electrical conductivities were measured under various atmospheres (air, N₂, and H₂). SBCTO exhibited stable semi-conductor electrical conductivity behavior in an air and N₂ atmosphere. However, SBCTO showed insulator behavior at temperatures above 600℃ in a H₂ atmosphere. Therefore, SBCTO may only be used as cathode materials. Moreover, SBCTO had an area specific resistance (ASR) value of 0.140 Ω·cm² at 750℃.

• Journal of IKEEE
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• v.26 no.3
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• pp.500-505
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• 2022

In this study, we designed oxide thin-film transistors (TFTs) with dual gate and tri layered split channels, and investigated the structural effect of the TFTs on the electrical characteristics. The dual gates played a key role in increasing the driving current, and the channel structure of tri layers and split form contributed to the increase in the carrier mobility. The tri layered channels consisting of the a-ITGZO and two ITO layers inserted between the gate dielectric and a-ITGZO led to the increase in the on-current by using ITO layers with high conductivity, and the split channels lowered series resistance of the channels. Compared with the mobility (15 cm²/V·s) of the single gate a-ITGZO TFT, the mobility (134 cm²/V·s) of the dual gate tri-layer split channel TFT was remarkably enhanced by the structural effect.