• Title/Summary/Keyword: 분극곡선

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Study on the Degradation of MEA Using Sulfonated Poly(ether ether ketone) Membrane in Proton Exchange Membrane Fuel Cells (고분자 전해질 연료전지에서 sPEEK 막을 이용한 전극과 막 합체(MEA)의 열화에 관한 연구)

  • Lee, Hye-Ri;Lee, Se-Hoon;Hwang, Byung-Chan;Na, Il-Chai;Lee, Jung-Hun;Oh, Sung-June;Park, Kwon-Pil
    • Korean Chemical Engineering Research
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    • v.54 no.3
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    • pp.305-309
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    • 2016
  • Recently, there are many efforts focused on development of more economical non-fluorinated membranes for PEMFCs (Proton Exchange Membrane Fuel Cells). In this study, to test the durability of sPEEK MEA (Membrane and Electrode Assembly), ADT (Accelerated Degradation Test) of MEA degradation was done at the condition that membrane and electrode were degraded simultaneously. Before and after degradation, I-V polarization curve, hydrogen crossover, electrochemical surface area, membrane resistance and charge transfer resistance were measured. Although the permeability of hydrogen through sPEEK membrane was low, sPEEK membrane was weaker to radical evolved at low humidity and OCV condition than fluorinated membrane such as Nafion. Performance after MEA degradation for 144 hours and 271 hours were reduced by 15% and 65%, respectively. It was showed that the main cause of rapid decrease of performance after 144 hours was shorting due to Pt/C particles in the pinholes.

Simulataneous X-ray Diffraction Measurements of the Antiferroelectric-ferroelectric Phase Transition of PLZT under Electric Field (전장하에서 PLZTd의 반강유전-강유전 상전이의 동시적 X-선 회절 측정)

  • 고태경;조동수;강현구
    • Journal of the Korean Ceramic Society
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    • v.33 no.11
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    • pp.1292-1300
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    • 1996
  • In-site X-ray diffraction measurements under electric field up to 20kV/ cm were carried out on PLZT (x/70/30) with x=7.5, 8.0, 8.5, and 10.5 All of PLZT belonged to cubic phases. At x=7.5, 8.0 and 8.5 PLZT behaved as an antiferroelectric under low electric fields up to 4-8 kV/cm. PLZT became ferroelectric at the higher electric fields. The high-temperature measurements on the dielectric constants of PLZT with x=7.5, 8.0 and 8.5 showed that they were similar to relaxor ferroelectrics and underwent a diffuse phase transition from antiferroelectrics to paraelectrics at 50-7$0^{\circ}C$. Their P-E hysteresis curves confirmed that they were antifer-roelectrics. The broad distribution of Curie points suggests that there is a significant disorder of cations and vacances in the crystal structure of those PLZT due to La-substitution. The variation of the lattice strain of PLZT(10.5/70/30) with electic field was very small and did not show any hysteresis confirming that it was paraelectric. The degree of the electric-induced strain variation decreased as La doping increased. In PLZT(7.5/70/30) the intensity of 110 reflection changes sensitively by applying electric field. Some domains with polarization parallel to [110] appeared to be developed in the field-induced ferroelectric phase of the PLZT.

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Preparation of a Bi$_{4}$Ti$_{3}$O$_{12}$ Thin Film and Its Electrical Properties (Bi$_{4}$Ti$_{3}$O$_{12}$ 박막의 제작과 그 특성에 관한 연구)

  • Gang, Seong-Jun;Jang, Dong-Hun;Min, Gyeong-Jin;Kim, Seong-Jin;Jeong, Yang-Hui;Yun, Yeong-Seop
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.4
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    • pp.7-14
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    • 2000
  • A Bi$_{4}$Ti$_{3}$O$_{12}$ (BIT) thin film is prepared by sol-gel method using acetate precursors and evaluated whether it could be applied to NVFRAM (Non-Volatile Ferroelectric RAM). The drying and the annealing temperature are 40$0^{\circ}C$ and $650^{\circ}C$, respectively and they are determined from the DT-TG (Differential Thermal-Thermal Gravimetric) analysis. The BIT thin film deposited on Pt/Ta/SiO$_{2}$/Si substrate shows orthorhombic perovskite phase. The grain size and the surface roughness are about 100 nm and 70.2$\AA$, respectively. The dielectric constant and the loss tangent at 10 KHz are 176 and 0.038, respectively, and the leakage current density at 100 ㎸/cm is 4.71 $mutextrm{A}$/$\textrm{cm}^2$. In the results of hysteresis loops measured at $\pm$250 ㎸/cm, the remanent polarization (Pt) and the coercive field (Ec) are 5.92 $\mu$C/$\textrm{cm}^2$ and 86.3 ㎸/cm, respectively. After applying 10$^{9}$ square pulses of $\pm$5V, the remanent polarization of the BIT thin film decreases as much as about 33% from 5.92 $\mu$C/$\textrm{cm}^2$ of initial state to 3.95 $\mu$C/$\textrm{cm}^2$.

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Fatigue Characteristics of PLZT(x/30/70) Thin Films with Various La Concentrations (La 농도에 따른 PLZT(x/30/70) 박막의 피로 특성에 관한 연구)

  • Kang, Seong-Jun;Chung, Yeun-Gun;Joung, Yang-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.9 no.5
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    • pp.1066-1072
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    • 2005
  • The effects of La concentration in PLZT (z/30/70) thin film prepared by sol-gel method are investigated for the NVFRAM application. As the La concentration increases, the dielectric constants at 10 kHz increase from 450 to 600, while the loss tangent and the leakage current density at 100 kV/cm decrease from 0.075 to 0.025 and from $5.83{\times}10^{-7}\;to\;1.38{\times}10^{-7}\;A/cm^2,$ respectively. In the results of hysteresis loops measured at 175 kV/cm, the remanent polarization and the coercive field decrease from 20.8 to $10.5{\mu}C/cm^2$ and from 54.48 to 32.12 kV/cm, respectively, with the increase of La concentration from 0 to $10mol\%.$ After applying for $10^9$ cycles of square pulses with ${\pm}5V$ height, the remanent polarization of the PLZT (10/30/70) thin film decreases $40\%$ from the initial state, while that of the PLZT (10/30/70) thin film decreases $64\%.$.

Ferroelectric, Leakage Current Properties of BiFeO3/Pb(Zr0.52Ti0.48)O3 Multilayer Thin Films Prepared by Chemical Solution Deposition (Chemical Solution Deposition 방법을 이용한 BiFeO3/Pb(Zr0.52Ti0.48)O3 다층박막의 전기적 특성에 대한 연구)

  • Cha, J.O.;Ahn, J.S.;Lee, K.B.
    • Journal of the Korean Vacuum Society
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    • v.19 no.1
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    • pp.52-57
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    • 2010
  • $BiFeO_3/Pb(Zr_{0.52}Ti_{0.48})O_3$(BFO/PZT) multilayer thin films have been prepared on a Pt/Ti/$SiO_2$/Si(100) substrate by chemical solution deposition. BFO single layer, BFO/PZT bilayer and multilayer thin films were studied for comparison. X-ray diffraction analysis showed that the crystal structure of all films was multi-orientated perovskite phase without amorphous and impurity phase. The leakage current density at 500 kV/cm was reduced by approximately four and five orders of magnitude by bilayer and multilayer structure films, compared with BFO single layer film. The low leakage current density leads to saturated P-E hysteresis loops of bilayer and multilayer films. In BFO/PZT multlayer film, saturated remanent polarization of $44.3{\mu}C/cm^2$ was obtained at room temperature at 1 kHz with the coercive field($2E_c$) of 681.4 kV/cm.

Surface Characteristics of Dental Casting Palladium Alloy for Replacement of Gold Alloy (금대체를 위한 치과주조용 파라듐 합금의 표면특성)

  • Park, Seon-Yeong;Hwang, In-Jo;Yu, Ji-Min;Park, Min-Gyu;Im, Sang-Gyu;Bae, Ho-Seong;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.196-196
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    • 2016
  • 치과나 기공소로부터 높은 원가로 인한 재료선택에 어려움을 겪고 있어 귀금속 금합금의 물성을 가질 수 있도록 하면서 가격급등으로 인한 문제 해결하기 위한 비귀금속 합금으로 대체가 필요하기에 이에 따른 연구가 이루어져 국산 제품의 상품화를 위해 파라듐을 이용하여 적합한 새로운 합금을 개발하는 것이 필요하다. 치과용 골드합금은 미국치과의사 협회의 구정에 의하면 1형부터 4형까지 분류하고 있으며 3형에 해당하는 강도와 기계적인 특성을 갖도록 파라듐으로 대체하는 연구가 진행중이거나 시판되고 있다. 따라서 본 연구에서는 2형, 3형 및 4형을 대체가능하도록 팔라듐을 기반으로 한 새로운 합금을 설계하고 합금의 성분원 소인 Au(1~5), Pd(20~25), Ag(70~75), In(1.5) 및 Zn(2)등으로 조성을 변화시켜 측량 후 합금을 제조하기 위하여 아르곤 분위기하의 진공아크용해로를 이용하여 용해하였다. 정량된 금속을 진공아크 용해로에 장입하고 용해는 균질한 합금이 되도록 최소한 6회 이상 용융을 실시하며 합금성분의 손실이 발행하지 않도록 보정을 하였다. 합금의 미세조직 관찰을 위하여 샘플을 고속 다이아몬드 정밀 절단기(Acculom-5, STRUERS, Denmark)를 이용하여 절단한 후 2000 grit의 Sic 연마지에서 단계적으로 $0.3{\mu}m$ 알루미나 분말까지 연마한 후 초음파 세척을 하였다. 준비한 시편은 KCN과 $(NH_4)_2S_2O_8$을 1:1로 혼합한 부식액으로 에칭한 후 OM과 SEM을 이용하여 조직을 관찰하였으며 각 샘플의 성분변화는 EDS 분석을 통해 확인하고 결정구조는 XRD를 사용하여 분석하였다. 경도시험은 비커스경도시험기를 이용하여 5kg의 하중을 30초간 작동시켜 압흔을 연결된 micron으로 평균값을 측정하였다. 각 시편의 부식거동은 POTENTIOSTAT(Model PARSTAT 2273, EG&G, USA)을 이용하여 구강 내환경화 유사한 $36.5{\pm}1^{\circ}C$의 0.9% NaCl에서 실시하였다. 인가전위는 -1500mV에서 1000mV까지 1.67 mV/min의 주사속도로 인가하여 시험을 수행하였으며 분극곡선으로부터 부식전위와 부식전류밀도 및 부동태영역의 전류밀도로 금속의 용출거동을 조사하였으며 부식이 끝난 시편은 FE-SEM과 EDS를 사용하여 조사하였다. 기계적인 특성은 Pd-Ag에 3wt%의 Au를 첨가한 합금이 Pd-Ag에 1.5wt%합금을 첨가한 경우에 비하여 기계적인 특성이 증가하고 내식성이 크게 증가하였다. 이들 합금에 Cu를 11wt%를 첨가한 경우는 비커스경도가 200이상으로 높게 나타났지만 내식성이 크게 감소하였다.

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Microstructure and Electrical Properties of $(Bi,La)_4Ti_3O_{12}$ Thin Film Fabricated by Pulsed Laser Deposition Method (펄스 레이저 증착법으로 제작한 $(Bi,La)_4Ti_3O_{12}$ 박막의 미세구조 및 전기적 특성)

  • Kim, Young-Min;Yoo, Hyo-Sun;Kang, Il;Kim, Nam-Je;Jang, Gun-Eik;Kweon, Soon-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.277-277
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    • 2007
  • $(Bi,La)_4Ti_3O_{12}$ (BLT) 물질은 결정 방향에 따른 강한 이방성의 강유전 특성을 나타낸다. 따라서 BLT 박막을 이용하여 FeRAM 소자 등을 제작하기 위해서는 결정의 방향성을 세심하게 제어하는 것이 매우 중요하다. 현재까지 연구된 BLT 박막의 방향성 조절 결과를 보면, BLT 박막을 스핀 코팅 법 (spin coating method)으로 중착하고, 핵생성 열처리 단계를 조절하여 무작위 방향성 (random orientation)을 갖는 박막을 제조하는 방법이 일반적이었다. 그런데 이러한 스핀 코팅법에서의 핵생성 단계의 제어는 공정 조건 확보가 너무 어려운 단점이 있다. 이러한 어려움을 극복할 수 있는 대안은 스퍼터링 증착법 (sputtering deposition method), PLD법 (pulsed laser deposition method) 등과 같은 PVD (physical vapor deposition) 법의 증착방법을 적용하는 것이다. PVD 법으로 증착하는 경우에는 이미 박막 내에 무수한 결정핵이 존재하기 때문에 핵생성 단계가 필요 없게 된다. PVD 증착법의 적용을 위해서는 타겟 (target)의 제조 및 평가 실험이 선행되어야 한다. 그런데 벌크 BLT 재료의 소결공정 조건과 전기적 특성에 관한 연구 결과는 거의 발표 되지 않고 있다. 본 실험에서는 $Bi_2O_3$, $TiO_2$ and $La_2O_3$ 분말을 이용하여 최적의 조성을 구하기 위하여 Bi양을 변화시키며 타겟을 제조 하였다. 혼합된 분말을 하소 후 pallet 형태로 성형하여 소결을 실시하였다. 시편을 1mm 두께로 연마하고, 표면에 silver 전극을 인쇄하여 전기적 특성을 측정하였다. Bi양이 3.28몰 첨가된 조성에서 최대의 잔류분극 (2Pr) 값을 얻었고, 이때의 값은 약 $18{\mu}C/cm^2$ 정도였다. 최적화된 조성 ($Bi_{3.28}La_{0.75}Ti_3O_{12}$)으로 BLT 타겟을 제조하여 PLD법으로 박막을 제조하였다. 박막 제조 시 압력은 $1{\times}10^{-1}\;{\sim}\;1{\times}10^{-4}\;Torr$ 범위에서 변화시켰다. $1{\times}10^{-1}\;Torr$ 압력을 제외하고는 모든 압력에서 BLT 박막이 증착되었다. 중착된 박막을 $650\;{\sim}\;800^{\circ}C$에서 30분간 열처리를 실시하고 전기적 특성을 평가한 결과, $1{\times}10^{-2}\;Torr$에서 증착한 박막에서 양호한 P-V (polarization-voltage) 이력곡선을 얻을 수 있었고, 이때의 잔류분극 (2Pr) 값은 약 $6\;{\mu}C/cm^2$ 이었다. 주사전자현미경 (SEM)을 이용하여 BLT 박막 표면의 미세구조도 관찰하였는데, 스핀코팅 법으로 증착한 경우에 관찰되었던 조대화된 입자들은 관찰되지 않았고, 상당히 양호한 입자 크기 균일도를 나타내었다.

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Area Effect on Galvanic Corrosion of Condenser Materials with Titanium Tubes in Nuclear Power Plants (Titanium 전열관을 사용하는 원전 복수기 재료의 Galvanic Corrosion에 미치는 면적의 영향)

  • Hwang, Seong-Sik;Kim, Joung-Soo;Kim, Uh-Chul
    • Nuclear Engineering and Technology
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    • v.25 no.4
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    • pp.507-514
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    • 1993
  • Titanium tubes have recently been used in condensers of nuclear power plants since titanium has very good corrosion resistance to seawater. However, when it is connected to Cu alloys as tube sheet materials and these Cu alloys are connected to carbon steels as water box materials, it makes significant galvanic corrosion on connected materials. It is expected from electrochemical tests that the corrosion rate of carbon steel will increase when it is galvanically coupled with Ti or Cu in sea water and the corrosion rate of Cu will increase when it is coupled with Ti, if this couple is exposed to sea water for a long time. It is also expected that the surface area ratios, R$_1$(surface area of carbon steel/surface area of Ti) and R$_2$(surface area of carbon steel/surface area of Cu) are very important for the galvanic corrosion of carbon steel and that these should not be kept to low values in order to minimize the galvanic corrosion on the carbon steel of the water box. Immersed galvanic corrosion tests show that the corrosion rate of carbon steel is 4.4 mpy when the ratio of surface area of Fe/ surface area of Al Brass is 1 while it is 570 mpy when this ratio is 10$^{-2}$ . The galvanic corrosion rate of this carbon steel is increased from 4.4 mpy to 13 mpy at this area ratio, 1, when this connected galvanic specimen is galvanically coupled with a Ti tube. This can be rationalized by the combined effects of R$_1$ and R$_2$ on the polarization curve.

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Hydrogen Electrode Performance with PTFE Bonded Raney Nickel Catalyst for Alkaline Fuel Cell (라니 니켈 촉매에 대한 알칼리형 연료전지용 수소극의 전극특성)

  • Lee, Hong-Ki;Lee, Ju-Seong
    • Applied Chemistry for Engineering
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    • v.3 no.3
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    • pp.527-534
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    • 1992
  • Raney nickel was used as catalyst in the hydrogen electrode for an alkaline fuel cell. The hydrogen electrode manufactured with the Raney nickel catalyst which was sintered at $700^{\circ}C$ was found to have the highest electrode performance. Using the Raney nickel powder of average particle size $90{\AA}$ for the electrode, the current density which had been measured was $450mA/cm^2$ at $80^{\circ}C$ using 6N KOH solution as an electrolyte. The effects of PTFE addition were investigated with CO-chemisorption, polarization curves and Tafel slope. CO-chemisorption had shown the optimum value when the Raney nickel was mixed with 5wt% of PTFE, but from the current density and Tafel slope at porous Raney nickel electrode, the appropriate value of PTFE addition was 10wt%. Recommendable Ni and Al portion for Raney nickel was 60 : 40 and loading amount was $0.25g/cm^2$. Also the influence of pressing pressure for manufacturing catalytic layer and for junction with gas diffusion layer was examined. The morphology of catalyst surface was investigated with SEM. The influence of reactivation time and heat-treatment temperature were also studied.

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A Study on the Microstructure Formation of Sn Solder Bumps by Organic Additives and Current Density (유기첨가제 및 전류밀도에 의한 Sn 솔더 범프의 미세조직 형성 연구)

  • Kim, Sang-Hyeok;Kim, Seong-Jin;Shin, Han-Kyun;Heo, Cheol-Ho;Moon, Seongjae;Lee, Hyo-Jong
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.1
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    • pp.47-54
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    • 2021
  • For the bonding of smaller PCB solder bumps of less than 100 microns, an experiment was performed to make up a tin plating solution and find plating conditions in order to produce a bump pattern through tin electroplating, replacing the previous PCB solder bumps process by microballs. After SR patterning, a Cu seed layer was formed, and then, through DFR patterning, a pattern in which Sn can be selectively plated only within the SR pattern was formed on the PCB substrate. The tin plating solution was made based on methanesulfonic acid, and hydroquinone was used as an antioxidant to prevent oxidation of divalent tin ions. Triton X-100 was used as a surfactant, and gelatin was used as a grain refiner. By measuring the electrochemical polarization curve, the characteristics of organic additives in Triton X-100 and gelatin were compared. It was confirmed that the addition of Triton X-100 suppressed hydrogen generation up to -1 V vs. NHE, whereas gelatin inhibited hydrogen generation up to -0.7 V vs. NHE. As the current density increased, there was a general tendency that the grain size became finer, and it was observed that it became finer when gelatin was added.