• 대한기계학회논문집B
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• 제39권6호
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• pp.541-548
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• 2015

본 논문에서는 순차적 화학기상증착법에 기반하여 다양한 구조적 특성을 갖는 산화아연 나노구조체를 탄소나노튜브 상에 3 차원 혼성구조로 형성하는 공정을 개발하고 그 형성 메커니즘을 논한다. 이어서 나노와이어, 나노로드, 나노플레이트, 다결정 나노박막 등 다양한 형상의 산화아연 나노구조를 온도, 압력, 개스유량 등 주요 파라미터들의 조절을 통해 형성할 수 있음을 보이며, 이의 형성 원리에 대해 기본적인 형성 메커니즘과 연계하여 고찰한다. 본 연구 결과를 통해, 압전 및 광전 에너지변환 특성 등 풍부한 기능성을 보유하되 다소 높은 전기저항을 갖는 산화아연 나노구조체를 다양한 포맷으로 양전도성의 탄소나노튜브와 혼성화 함으로써, 각각의 포맷 별로 특화된 보다 폭넓은 응용 분야로의 활용을 구현해 나갈 수 있을 것이다.

• 비파괴검사학회지
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• 제28권5호
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• pp.421-426
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• 2008

스핀밸브 GMR(giant magnetoresistance) 구조를 갖는 Ta/NiFe/CoFe/Cu/NiFe/IrMn/Ta재료의 자유층에 의한 PHR (planar hall resistance) 특성을 이용한 자기 바이오센서를 제작하였다. PHR 소자는 사진식각 및 건식에칭 공정을 통하여 마이크로 사이즈로 제작되었다. 직경이 $2.8\;{\mu}m$인 단일 자기비드가 있는 경우와 자기비드가 없는 경우 자기장의 세기에 다른 PHR 신호를 측정하였으며, 직경이 $2.8\;{\mu}m$인 단일 자기비드 측정에 성공하였다. 따라서 본 연구에서 제작한 PHR센서는 자기비드 입자의 유무에 따른 출력 특성의 차이를 이용하여 단일 자기비드 측정이 가능한 고분해능 자기 바이오센서에 응용될 수 있다.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.185-188
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• 1999

Biepitaxial Y$_1Ba_2Cu_3O_{7-x}$ (YBCO) and La$_{0.2}Sr_{0.8}MnO_3$ (LSMO) thin films have been prepared on SrTiO$_3$ buffer layer and MgO seed layer grown on Al$_2O_3$(11${\bar{2}}$0)substrates by dc-sputtering with hollow cylindrical targets, respectively. We charaterized Josephson properties and significantly large magnetoresistance in YBCO and LSMO films with 45$^{\circ}$ grain boundary junction, respectively. The observed working voltage (I$_cR_n$) at 77 K in grain boundary junction was below 10${\mu}$V, which is typical I$_cR_n$ value of single biepitaxial Josephson junction. The field magnetoresistance ratio (MR) of LSMO grain boundary juncoon at 77K was enhanced to 13%, which it was significant MR value with high magnetic field sensitivity at a low field of 250 Oe. These results indicate that inserting the insulating layer instead of the grain boundary layer with metallic phase can be possible to apply a new SIS Josephson junction and a novel magnetic device using spin-polarized tunneling junction.

• 한국결정성장학회지
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• 제12권4호
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• pp.215-221
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• 2002

$SiH_2Cl_2/H_2$ 기체혼합물을 원료로 사용하여 (100) Si 기판 위에 고온벽 화학기상증착법(hot-wall CVD)으로 에피 실리콘을 증착시켰다. 공정변수(증착온도, 반응기 압력, 입력 기체의 조성비($H_2/SiH_2Cl_2$)등)가 실리콘 증착에 미치는 영향을 조사하기 위해 열화학적 전산모사를 수행하였으며, 전산모사를 통해 얻은 공정조건의 범위를 바탕으로 실험한 결과, 전산모사의 결과와 실험이 잘 일치함을 알 수 있었다. 실험을 통해 얻은 최적 증착 조건은 증착온도가 850~$950^{\circ}C$, 반응기 압력은 2~5 Torr, $H_2/SiH_2Cl_2$비는 30~70 정도임을 알 수 있었고, 증착된 에피 실피콘은 두께 및 비저항의 균일도가 우수하고 불순물 함량이 낮은 양질의 박막임을 확인할 수 있었다.

• 한국재료학회지
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• 제20권5호
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• pp.241-245
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• 2010

One of the weak points of the Cr-doped SZO is that until now, it has only been fabricated on perovskite substrates, whereas NiO-ReRAM devices have already been deposited on Si substrates. The fabrication of RAM devices on Si substrates is important for commercialization because conventional electronics are based mainly on silicon materials. Cr-doped ReRAM will find a wide range of applications in embedded systems or conventional memory device manufacturing processes if it can be fabricated on Si substrates. For application of the commercial memory device, Cr-doped $SrZrO_3$ perovskite thin films were deposited on a $SrRuO_3$ bottom electrode/Si(100)substrate using pulsed laser deposition. XRD peaks corresponding to the (112), (004) and (132) planes of both the SZO and SRO were observed with the highest intensity along the (112) direction. The positions of the SZO grains matched those of the SRO grains. A well-controlled interface between the $SrZrO_3$:Cr perovskite and the $SrRuO_3$ bottom electrode were fabricated, so that good resistive switching behavior was observed with an on/off ratio higher than $10^2$. A pulse test showed the switching behavior of the Pt/$SrZrO_3:Cr/SrRuO^3$ device under a pulse of 10 kHz for $10^4$ cycles. The resistive switching memory devices made of the Cr-doped $SrZrO_3$ thin films deposited on Si substrates are expected to be more compatible with conventional Si-based electronics.

• 한국재료학회지
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• 제20권5호
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• pp.257-261
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• 2010

A non-volatile resistive random access memory (RRAM) device with a Cr-doped $SrZrO_3/SrRuO_3$ bottom electrode heterostructure was fabricated on $SrTiO_3$ substrates using pulsed laser deposition. During the deposition process, the substrate temperature was $650^{\circ}C$ and the variable ambient oxygen pressure had a range of 50-250 mTorr. The sensitive dependences of the film structure on the processing oxygen pressure are important in controlling the bistable resistive switching of the Cr-doped $SrZrO_3$ film. Therefore, oxygen pressure plays a crucial role in determining electrical properties and film growth characteristics such as various microstructural defects and crystallization. Inside, the microstructure and crystallinity of the Cr-doped $SrZrO_3$ film by oxygen pressure were strong effects on the set, reset switching voltage of the Cr-doped $SrZrO_3$. The bistable switching is related to the defects and controls their number and structure. Therefore, the relation of defects generated and resistive switching behavior by oxygen pressure change will be discussed. We found that deposition conditions and ambient oxygen pressure highly affect the switching behavior. It is suggested that the interface between the top electrode and Cr-doped $SrZrO_3$ perovskite plays an important role in the resistive switching behavior. From I-V characteristics, a typical ON state resistance of $100-200\;{\Omega}$ and a typical OFF state resistance of $1-2\;k{\Omega}$, were observed. These transition metal-doped perovskite thin films can be used for memory device applications due to their high ON/OFF ratio, simple device structure, and non-volatility.

• Progress in Superconductivity
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• 제2권2호
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• pp.86-91
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• 2001

Temperature dependences of the unloaded Ｑ(Ｑ$_{0}$) and the resonant frequency ( $f_{0}$) of YB $a_2$C $u_3$ $O_{7-{\delta}}$ (YBCO) microstrip ring resonators and rutile-loaded cylindrical cavity resonators were measured at low temperatures. Dc magnetron-sputtered YBCO films grown on Ce $O_2$-buffered r-cut sapphire (CbS) substrates were used fur this purpose. The surface resistances ( $R_{s}$) of YBCO films measured by both a microstrip ring resonator and a TE $01\delta$/ mode rutile-loaded cylindrical cavity resonator are compared with each other. It turned out that the values of $R_{s}$ measured by the microstrip resonator technique are comparable to those by the rutile-loaded resonator technique at temperatures lower than ~50 K. However, above 50 K, the $R_{s}$ measured by the microstrip resonator technique appeared higher according to the temperature. Our results show that the current crowding effects near the edge of a microstrip resonator become more significant at temperatures near the critical temperature.emperature.e.e.e.e.e.e.

• Progress in Superconductivity
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• 제8권1호
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• pp.81-86
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• 2006

We investigated resistance development in $Au/YBa_2Cu_3O_7(YBCO)$ thin film meander lines during high-power faults. The meander lines were fabricated by patterning 300 nm thick YBCO films coated with 200 nm thick gold layers into meander lines. A gold film grown on the back side of the substrate was also patterned into a meander line. The front meander line was connected to a high-power fault-test circuit and the back line to a DC power supply. Resistance of both lines was measured during the fault. They were immersed in liquid nitrogen during the experiment. Behavior of the resistance development prior to quench completion could be understood better by comparing resistance of the front meander lines with that of the back. Quench completion point could be determined clearly. Resistance and temperature at the quench completion point were not affected by applied field strength. The experimental results were analyzed quantitatively with the concept of heat transfer within the meander lines/substrate and to the surrounding liquid nitrogen. In analysis, the fault period was divided into three regions: flux-flow region, region prior to quench completion, and region after quench completion. Resistance was calculated for each region, reflecting the observation for quench completion. The calculated resistance in three regions was joined seamlessly and agreed well with data.

• Progress in Superconductivity
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• 제7권2호
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• pp.114-119
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• 2006

High critical current density, high n value, multiple faults endurances, and fast recovery characteristics of YBCO thin films are very attractive characteristics for developing resistive type superconducting fault current limiters. But due to the limited current and voltage ratings of one YBCO module, it is needed to construct series and parallel module connections for high capacity electric networks. Especially for distribution network, more than 30 units should be connected in series to meet voltage level. So in order to construct distribution-level superconducting fault current limiter, simultaneous quench in one YBCO thin films should be realized, and furthermore, quench should be occurred in all fault current limiting units equally to avoid local heating and failures. In this paper, we proposed optimum design of YBCO thin films for fault current limiting module and technical method using shunt resistor to achieve simultaneous quench between multi current limiting units. From the analytical and the experimental results, optimal current path and thickness of shunt material was determined for YBCO thin films and shunt resistor between modules was developed. Finally, 14 kV one phase resistive fault current limiter using multi YBCO thin films was constructed and it was possible to get satisfactory test results.

• Progress in Superconductivity
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• 제9권2호
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• pp.146-151
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• 2008

Measurements of surface resistance ($R_s$) of high temperature superconductor (HTS) films with accuracy are essential for microwave applications of HTS materials. In using the dielectric resonator method, uncertainties in the unloaded quality factor of the resonator cause significant errors in the measured $R_s$ of HTS films. We compare the Rs values of $YBa_2Cu_3O_{7-{\delta}}$ films calculated from the $Q_0$ as determined from the Lorentzian fit with that from the $Q_0$ as determined from the S-parameter circle-fit at temperatures between 15 K and 77 K. The two sets of values appeared to differ by 5%, 7%, 6%, and 11% at temperatures of 15, 60, 70, and 77 K, respectively, from each other, implying that careful error analysis needs to be performed in obtaining the $R_s$ of HTS films by using the Lorentzian-fit method, with the ones determined from the S-parameter circle-fit used as the reference.