• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 추계학술대회 논문집
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• pp.63-66
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• 2005

Nanoimprint lithography (NIL) process at room temperature has been newly proposed in recent years to overcome the shape accuracy and sticking problem induced in a conventional NIL process. Success of the room temperature NIL relies on the accurate understand of the mechanical behavior of the polymer. Since a conventional NIL process has to heat a polymer above the glass transition temperature to deform the physical shape of the polymer with a mold pattern, viscoelastic property of polymer have major effect on the NIL process. However, rate dependent behavior of polymer is important in the room temperature NIL process because a mold with engraved patterns is rapidly pressed onto a substrate coated with the polymer by the hydraulic equipment. In this paper, finite element analysis of the room temperature NIL process is performed with considering the strain rate dependent behavior of the polymer. The analyses with the variation of imprinting speed and imprinting pattern are carried out in order to investigate the effect of such process parameters on the room temperature NIL process. The analyses results show that the deformed shape and imprint force is quite different with the variation of punch speed because the dynamic behavior of the polymer is considered with the rate dependent plasticity model. The results provide a guideline for the determination of process conditions in the room temperature NIL process.

• 한국생산제조학회지
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• 제20권3호
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• pp.245-250
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• 2011

An UV/thermal hybrid nanoimprint lithography system was designed and implemented for the pattern transfer to flexible substrates. This system can utilize a plate stamp, roll stamp, and film stamp. For all cases of using those stamps, this system is also switchable an UV or thermal nanoimprint lithography mode. This paper shows how to design the heating and UV curing plates and proposes how to change them easily. Because the pressure condition and the speed of the press roller varies by the characteristics of the stamp and substrate, all the parameters related to the nanoimprint lithography have to adjustable. Some transferred patterns are shown in this paper to verify the performance of the hybrid nanoimprint lithography system. The flexible substrates with nano-scale patterns on them will be key components for next generation technologies such as flexible displays, bendable semi-conductors, and solar cells.

• 대한기계학회논문집B
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• 제41권1호
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• pp.63-67
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• 2017

일반적인 세포 배양 기술은 평평한 표면에 세포 부착을 위한 화학적, 생화학적 표면처리를 하는 것이 기본이지만, 요즘 들어 마이크로나 나노 크기의 구조체를 형성하여 세포 부착을 하는 연구들이 많이 진행되고 있다. 본 연구에서는 전도성 고분자인 피롤과 나노임프린트 기술을 이용하여 300 nm 선 패턴과 150 nm 원기둥 패턴의 나노구조체 제작 후 대표적인 암세포인 HeLa 세포를 배양하여, 주사전자현미경과 공초점 현미경을 이용하여 세포의 부착 특성을 연구하였다. 상용 페트리 접시와 평면 피롤에서는 세포들이 부정형의 형태로 부착 및 배양되었지만, 선폭 300 nm 선패턴 상에서는 길이 방향으로 세포가 부착되고 세포 내의 핵과 액틴 역시 배열되어 있고, 지름 150 nm 원기둥 패턴 상에서는 단일 세포로 고정되고 세포 내 액틴은 방사상으로 나노구조체에 고정되어 있는 것을 확인할 수 있었다.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2008년도 추계학술대회 논문집
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• pp.325-328
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• 2008

With intensive research and development to mass particular nanostructure of 10nm, Nanoimprint lithography will soon be put to practical use. This paper reviews latest research and application trend and also covers technical articles about Nanoimprint lithography technology Published since 1998, including statistical analysis of collected data(Web of Science DB) and related technical trend.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2013년도 춘계학술대회 논문집
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• pp.587-588
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• 2013

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.493-494
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• 2010

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 추계학술대회 논문집
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• pp.491-492
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• 2006

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.123-124
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• 2008

• 한국광학회:학술대회논문집
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• 한국광학회 2007년도 하계학술발표회 논문집
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• pp.319-320
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• 2007

We report on the fabrication of two-dimensional Silicon On Insulator (SOI) photonic crystal (PhC) superprism. To optimize the design of 2-D SOI PhC superprism, the photonic band structures (TE-polarization) for triangular lattices and the dispersion surfaces were calculated and analyzed by the plane wave expansion method. Dense 2-D SOI PhC superprism nanostructures with taper input and output waveguide microstructures were successfully fabricated by nanoimprint lithography, followed by inductively coupled plasma (ICP) etching.

• 한국정밀공학회지
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• 제26권6호
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• pp.7-13
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• 2009