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UV/Thermal Hybrid Nanoimprint System for Flexible Substrates  

Lim, Hyung-Jun (한국기계연구원 나노융합시스템연구본부)
Lee, Jae-Jong (한국기계연구원 나노융합시스템연구본부)
Choi, Kee-Bong (한국기계연구원 나노융합시스템연구본부)
Kim, Gee-Hong (한국기계연구원 나노융합시스템연구본부)
Ahn, Hyun-Jin (한국기계연구원 나노융합시스템연구본부)
Ryu, Ji-Hyeong (과학기술연합대학원대학교 나노메카트로닉스학과)
Publication Information
Journal of the Korean Society of Manufacturing Technology Engineers / v.20, no.3, 2011 , pp. 245-250 More about this Journal
Abstract
An UV/thermal hybrid nanoimprint lithography system was designed and implemented for the pattern transfer to flexible substrates. This system can utilize a plate stamp, roll stamp, and film stamp. For all cases of using those stamps, this system is also switchable an UV or thermal nanoimprint lithography mode. This paper shows how to design the heating and UV curing plates and proposes how to change them easily. Because the pressure condition and the speed of the press roller varies by the characteristics of the stamp and substrate, all the parameters related to the nanoimprint lithography have to adjustable. Some transferred patterns are shown in this paper to verify the performance of the hybrid nanoimprint lithography system. The flexible substrates with nano-scale patterns on them will be key components for next generation technologies such as flexible displays, bendable semi-conductors, and solar cells.
Keywords
Nanoimprint Lithography; Roller; Flexible Substrate; Hybrid;
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Times Cited By KSCI : 1  (Citation Analysis)
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