• Title/Summary/Keyword: 광공도

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Study of the Reflector Shape of a Test Lamp for a Flame Detector with Little Influence of Error in Optical-system Fabrication (광학계 제작 시 오차 영향이 적은 불꽃감지기용 테스트램프 반사경 형상에 관한 연구)

  • Park, Hye-Jin;Kang, Dong-Hwa;Kong, Mi-Seon;Kim, Eun-Ji;Lee, Ye-Eun;Jo, Ye-Ji;Jung, Mee-Suk
    • Korean Journal of Optics and Photonics
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    • v.29 no.6
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    • pp.233-240
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    • 2018
  • In this paper, a design method to reduce fabrication errors in reflector shape of a test lamp for a flame detector is carried out. Although the test lamp should be operated in parallel with a high-intensity light, it is difficult to fix the small reflector that controls the central light during fabrication. To solve these problems, a small spherical reflector is designed to minimize the performance degradation for a light loss factor of less than 5%, even during tilt and decenter, and a spherical shape is proposed for a small reflector with little effect on the error when designing the optical system.

Reflector Design to Improve the Uniformity of an Irradiated Area Using a Xenon Flash Lamp (제논 플래시 램프 사용 시 조사 영역 균일도 개선을 위한 반사경 설계)

  • Kim, Seo-Young;Lee, Han-Yul;Jun, Won-Kyoun;Kang, Dong-Hwa;Jo, Ye-Ji;Jung, Mee-Suk
    • Korean Journal of Optics and Photonics
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    • v.30 no.5
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    • pp.197-203
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    • 2019
  • In this paper, we studied a reflector design that can improve the illuminance uniformity when using a xenon flash lamp in the photonic sintering process. To achieve complete sintering of substrates in the irradiated area, the light efficiency and illuminance uniformity were set to target performance. Existing elliptical reflectors or parabolic reflectors make it easy to satisfy the target light efficiency, but have difficulty satisfying the illuminance uniformity. In this paper, a twin-concave feature has been added to the center of the parabolic reflector to satisfy the illuminance uniformity. It was confirmed that the illuminance uniformity of the parabolic reflector with a twin-concave feature was improved, compared to that of the traditional reflector.

A Study of Lens Design Technique for Proximity Exposure Using a UVA LED (UVA LED를 이용한 근접 노광용 렌즈 설계 기술 연구)

  • Lee, Jeong-Su;Jo, Ye-Ji;Lee, Hyun-Hwa;Kong, Mi-Seon;Kang, Dong-Hwa;Jung, Mee-Suk
    • Korean Journal of Optics and Photonics
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    • v.30 no.4
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    • pp.146-153
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    • 2019
  • The exposure system is a device that transfers a circuit pattern to a desired location. To display patterns on a substrate without deforming the optical characteristics, the characteristics of the optical exposure system are very important. Therefore, to form a microcircuit pattern, a small divergence angle should impinge on the irradiation area. Also, since the light from the source must react uniformly with the photosensitizer, it must have high luminance efficiency and uniformity of illumination. In this paper a parabolic reflector and an aspherical lens were designed to solve the problem of narrow-angle implementation, and it was confirmed by simulation analysis after their arrangement that the beam angle, uniformity, and maximum illuminance satisfied the target performance.

Zou Si Cong's Work (주사총(周思聰)의 작품세계)

  • Oh Se-Kwon
    • Journal of Science of Art and Design
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    • v.7
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    • pp.128-149
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    • 2005
  • Zou Si Cong is a very significant female artist from the period when China was forming its modern arts and culture. Zou Si Cong, who was influenced by China's political and social upheaval, was born in 1939 and died in 1996. Her actual work period was after China's 'Cultural Revolution' and lasted only 13 years, from 1978 to 1990. Her passion for art never stopped, even when she was suffering from severe arthritis with its torturing pain. There were big changes that occurred in her work; 'Early Work', 'Realistic Work', 'Mine Worker Painting', 'Yi Tribe' Painting', 'Lotus Paintings'. 'Mine Worker Painting', which represented a new figure by abandoning traditional techniques, dividing picture space, and changing and distorting forms, was the one that had the greatest impact of all on a lot of people and strongly influenced modern Chinese figurative painting. The characteristics of Zou Si Cong's work are in its 'Traditionalism', 'Realism, and 'Historical' aspects. Zou Si Cong developed her uniqueness, along with Western expressions, based on traditional Chinese painting techniques. Realism, through realistic rendering, appeared in her figurative paintings during the Cultural Revolution Period. 'Yi Tribe' paintings lively illustrated their lives. She creatively reinterpreted history in the composition of Mine Workers, which is based on the historical record of Chinese barbarity.

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Photonic K-Band Microwave Bandpass Filter with Electrically Controllable Transfer Characteristics Based on a Polymeric Ring Resonator (전기적으로 가변되는 전달특성을 갖는 폴리머 링 광공진기를 이용한 마이크로웨이브 대역통과 필터)

  • Kim, Gun-Duk;Lee, Sang-Shin
    • Korean Journal of Optics and Photonics
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    • v.17 no.5
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    • pp.475-479
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    • 2006
  • An integrated photonic K-band microwave bandpass filter has been proposed and demonstrated by incorporating a polymeric ring resonator. Its transfer characteristics were adjusted by shilling the resonance wavelength of the ring resonator via the thermooptic effect. The achieved performance of the filter includes the center frequency of 20 GHz, the attenuation of ${\sim}15dB$, the bandwidth of 2 GHz, and the corresponding quality factor of 10. The microwave output power within the passband of the device was adjusted at the rate of about 6.7 dB/mW in the range of 27 dB. This kind of device with electrically controllable transfer characteristics can be applied to implement microwave switches and other devices.

Performance Prediction for Plenoptic Microscopy Under Numerical Aperture Unmatching Conditions (수치 구경 불일치 플렌옵틱 현미경 성능 예측 방안 연구)

  • Ha Neul Yeon;Chan Lee;Seok Gi Han;Jun Ho Lee
    • Korean Journal of Optics and Photonics
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    • v.35 no.1
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    • pp.9-17
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    • 2024
  • A plenoptic optical system for microscopy comprises an objective lens, tube lens, microlens array (MLA), and an image sensor. Numerical aperture (NA) matching between the tube lens and MLA is used for optimal performance. This paper extends performance predictions from NA matching to unmatching cases and introduces a computational technique for plenoptic configurations using optical analysis software. Validation by fabricating and experimenting with two sample systems at 10× and 20× magnifications resulted in predicted spatial resolutions of 12.5 ㎛ and 6.2 ㎛ and depth of field (DOF) values of 530 ㎛ and 88 ㎛, respectively. The simulation showed resolutions of 11.5 ㎛ and 5.8 ㎛, with DOF values of 510 ㎛ and 70 ㎛, while experiments confirmed predictions with resolutions of 11.1 ㎛ and 5.8 ㎛ and DOF values of 470 ㎛ and 70 ㎛. Both formula-based prediction and simulations yielded similar results to experiments that were suitable for system design. However, regarding DOF values, simulations were closer to experimental values in accuracy, recommending reliance on simulation-based predictions before fabrication.

캠퍼스이색학과 - 인제대 광(光)공학과

  • Jo, Gwan-Sik
    • The Science & Technology
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    • v.32 no.6 s.361
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    • pp.24-25
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    • 1999
  • 광공학이라고 하면 다소 생소하지만 빛을 연구하고 가르치고 응용하며 레이저를 다루는 학문이다. 인제대 광공학과는 98년 신설된 이색학과로 레이저와 광반도체 기술을 훈련해 필요한 광통신소자 제조업체에 필요한 인력을 양성하고 있다. 일본에서는 63년 도카이대학에 처음 설립되었으며 지금은 10여개 대학에서 유사한 학과를 개설하여 운영하고 있다.

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Four-channel Selective Photonic Microwave Filter Based on Optical Resonator Router (폴리머 광공진기 라우터 기반의 4채널 선택 포토닉 마이크로웨이브 대역통과 필터)

  • Kim, Gun-Duk;Eo, Yun-Sung;Lee, Sang-Shin
    • Korean Journal of Optics and Photonics
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    • v.19 no.3
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    • pp.242-245
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    • 2008
  • A four-channel selective microwave filter was demonstrated incorporating an optical resonator router, which is constructed by integrating a $1{\times}4$ space switch with an arrayed ring filters featuring different free spectral ranges. The center frequency of each channel was determined by the FSR of the corresponding ring resonator, and the four channels centered at 10 GHz, 16 GHz, 18 GHz and 20 GHz were individually selected to provide a bandpass filtering via the control voltage applied to the switched resonator.

Catadioptric NA 0.6 Objective Design in 193 nm with 266 nm Autofocus (이중 파장 심자외선 카타디옵트릭 NA 0.6 대물렌즈 광학 설계)

  • Do Hee Kim;Seok Young Ju;Jun Ho Lee;Hagyong Kihm;Ho-Soon Yang
    • Korean Journal of Optics and Photonics
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    • v.34 no.2
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    • pp.53-60
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    • 2023
  • We designed a catadioptric objective lens with a 0.6 numerical aperture (NA) for semiconductor inspection at 193 nm. The objective lens meets major requirements such as a spatial resolution of 200 nm and a field of view (FOV) of 0.15 mm or more. We selected a wavelength of 266 nm for autofocus based on the availability of the light source. First, we built the objective lenses of three lens groups: a focusing lens group, a field-lens group, and an NA conversion group. In particular, the NA conversion group is a group of catadioptric lenses that convert the numerical aperture of the beam focused by the prior groups to the required value, i.e., 0.6. The last design comprises 11 optical elements with root-mean-squared (RMS) wavefront aberrations less than λ/80 over the entire field of view. We also achieved the athermalization of the objective lens with focus-shift alone satisfying the performance of RMS wavefront aberration below λ/30 at a temperature range of 20 ± 1.2 ℃.