Browse > Article
http://dx.doi.org/10.3807/KJOP.2019.30.4.146

A Study of Lens Design Technique for Proximity Exposure Using a UVA LED  

Lee, Jeong-Su (Department of Nano-optical Engineering, Korea Polytechnic University)
Jo, Ye-Ji (Department of Nano-optical Engineering, Korea Polytechnic University)
Lee, Hyun-Hwa (Department of Nano-optical Engineering, Korea Polytechnic University)
Kong, Mi-Seon (Department of Nano-optical Engineering, Korea Polytechnic University)
Kang, Dong-Hwa (Department of Nano-optical Engineering, Korea Polytechnic University)
Jung, Mee-Suk (Department of Nano-optical Engineering, Korea Polytechnic University)
Publication Information
Korean Journal of Optics and Photonics / v.30, no.4, 2019 , pp. 146-153 More about this Journal
Abstract
The exposure system is a device that transfers a circuit pattern to a desired location. To display patterns on a substrate without deforming the optical characteristics, the characteristics of the optical exposure system are very important. Therefore, to form a microcircuit pattern, a small divergence angle should impinge on the irradiation area. Also, since the light from the source must react uniformly with the photosensitizer, it must have high luminance efficiency and uniformity of illumination. In this paper a parabolic reflector and an aspherical lens were designed to solve the problem of narrow-angle implementation, and it was confirmed by simulation analysis after their arrangement that the beam angle, uniformity, and maximum illuminance satisfied the target performance.
Keywords
Lithography; Reflector; Light efficiency; Illumination uniformity;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 G. S. May and S. M. Sze, "Photolithography" in Fundamentals of semiconductor fabrication, 6th Ed. (John Wiley & Sons, NY, 2003), Chapter 4.
2 M. H. Kim, "Design and analysis of compact exposure using UV LED," Dankook University, Gyeonggi (2015), p. 4.
3 S. S. Bae, Y. W. Jung, Y. R. Kim, C. H. Song, J. Y. Song, and D. H. Kim, "Design of projection optics system for FPD exposure," in Proc. KSPE Annual Meeting (KSPE, Korea, Oct. 2004), p. 2.
4 H. W. Jo, "The research of the optical focusing method using UVA LED array," Korea Polytechnic University, Gyeonggi (2017), p. 4.
5 J. H. Seo, J. S. Lee, S. Y. Kim, Y. J. Jeong, H. J. Park, D. Y. Nam, and M. S. Jung, "Design of a bar-type TIR lens having a freeform surface for forming a line beam using an LED light source," J. Opt. Soc. Korea 28, 295-303 (2017).
6 B. J. Kim, "Optimal design of LED lamp optics with a large area LED package for fulfilling a narrow beam angle," Inha University, Incheon (2014), pp. 9-11.
7 D. K. Lee, "A study on development of an aspheric lens for the semiconductor laser applications," Chonnam National University, Gwangju (2014), p. 3.