• Title/Summary/Keyword: %24V_2O_5%24

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A Study of Gamma-ray Distribution around the $^{99}Mo-^{99m}TcO_4$ Generator ($^{99}Mo-^{99m}TcO_4$ Generator의 감마선량 분포에 관한 연구)

  • Park, Soung-Ock
    • Journal of radiological science and technology
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    • v.24 no.1
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    • pp.49-53
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    • 2001
  • A number of radionuclides of interest in nuclear medicine are short lived isotopes that emit only gamma ray. The most of all Dept. of Nuclear Medicine in the hospt. are using the $^{99}Mo-^{99m}Tc$ generator for elution of the short lived isotope $^{99m}TcO_4$. A $^{99}Mo-^{99m}Tc$ generator consists of an alumina column on which $^{99}Mo$ is bound. The parent isotope($^{99}Mo$ : half life 67 hr.) decays to its daughter $^{99m}TcO_4^-$ which is a different element with a shorter half-life. $^{99}Mo$ emitted 41-keV(1.3%), 141-keV(5.6%) 181-keV(6.6%) and 366-keV(1.5%) gamma rays. But $^{99m}TcO_4$ emitted only 140-keV gamma ray. We study about the gamma ray distribution around the $^{99}Mo$ generator. And obtained the result as follows ; 1. Total counted gamma ray from generator smaller in front side than back. 2. The gamma ray emitted from $^{99}Mo$ generator without $^{99m}TcO_4$ vial increased in the back side(Mo column posited side) 3. The gamma ray only from the $^{99m}TcO_4$ vial increased in the front side. 4. Apron can protect gamma ray above 60% of total radiation from the $^{99}Mo$ generator.

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Design and Fabrication of Multilayer Chip Band Pass Filter for Mob ice Communication (이동통신용 적층형 칩 대역통과 필터의 설계 및 제작)

  • 윤중락;박종주;이석원;이헌용
    • Journal of the Microelectronics and Packaging Society
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    • v.6 no.3
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    • pp.19-24
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    • 1999
  • The multilayer chip band pass filter for mobile communication is fabricated and designed. The size, insertion loss, center frequency and band width of multilayer chip filter are 4.5$\times$4.4$\times$1.8[mm], 3.0[dB] and 700[MHz]$\pm$15[MHz] respectively. The chip filter using $BiNbO_4$with CuO 0.06wt% +$V_2O_5$.lwt% was fabricated by screen printing with Ag electrode after tape casting. Insertion loss and center frequency of the fabricated chip filter are 2.58[dB] and 692.5$\pm$15[MHz] respectively. The center frequency was lower 7.5[MHz] than design result, but other characteristics of chip filter were similar to the ruts ultras of design result.

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Formation of Al2O3 Film by Activated Reactive Evaporation Method (활성화 반응 증발법에 의한 Al2O3 박막 형성)

  • Park, Yong-Gwon;Choi, Jae-Ha
    • Journal of the Korean Society for Heat Treatment
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    • v.14 no.5
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    • pp.292-296
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    • 2001
  • In this work, an ultra-high vacuum activated reactive evaporation equipment was built. With reaction of Al and oxygen plasma, $Al_2O_3$ was deposited on the surface of etched Al foil. The chamber was evacuated down to $2{\times}10^{-7}$ torr initially. The Ar and $O_2$ gas introduced into the chamber to maintain $5{\times}10^{-5}$ torr during deposition. Ar gas prevents recombining of the ionized oxygen. Evaporation was maintained by electron beam evaporator continuously. Heating filament and electrode were used in order to generate plasma. The substrate bias of -300V was introduced to accelerate deposition of evaporated Al atoms. The composition and morphology of deposited $Al_2O_3$ films were analyzed by x-ray photoelectron spectroscopy(XPS) and atomic force microscopy (AFM), respectively. The Al oxide was formed on the surface of etched Al foil. According to AFM results, the surface morphology of $Al_2O_3$ film indicates uniform feature. Dielectric characteristic was measured as a function of frequency. Measured withstanding voltage and capacitance were 52V and $24{\mu}F/cm^2$, respectively. The obtained $Al_2O_3$ film shows clean condition without contaminants, which could be adapted to capacitor production.

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Measurement Emission of Greenhouse Gases from Composting Process for Pig Slurry (돈 슬러리 발효증발 퇴비화 시스템의 온실가스 배출량 측정)

  • 박치호;윤태한;감재환
    • Journal of Animal Environmental Science
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    • v.7 no.2
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    • pp.111-118
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    • 2001
  • This study was performed for measuring the emission of greenhouse gases, $CH_4,\;N_2O$, from the composting process for pig slurry. For the experiment the benchscale pilot plant was designed by 1$m^3$ volume reactor with a closed type and operated; sawdust 142kg filled before input slurry, slurry about 10~20l inputed per day (total 380l), air supplied 5l/min for 24 hours, mixing time 10 min./day and 1 time a day. From the total experiment period(30days), the amount of VS degradation and emission $CH_4$, $N_2O$ were 10.9kg-VS and 1,582.4g-$CH_4$, 68.1g-$N_2O$ respectively. Based on VS inputed the emission of $CH_4$, $N_2O$ were 15.3(g-$CH_4$/kg-V $S_{input}$), 0.7(g-$N_2O$ /kg-V $S_{input}$), and based on VS degradated were 145.2(g-$CH_4$/kg-V $S_{removed}$), 6.2(g-$N_2O$ /kg-V $S_{removed}$).

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Structural Study of Oxygen Vacancy in CaO Stabilized Cubic-HfO2 Using Density Functional Theory (Density Functional Theory를 이용한 CaO 안정화 Cubic-HfO2의 산소 공공 구조 연구)

  • Kim, Jong-Hoon;Kim, Dae-Hee;Lee, Byeong-Eon;Hwang, Jin-Ha;Kim, Yeong-Cheol
    • Korean Journal of Materials Research
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    • v.18 no.12
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    • pp.673-677
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    • 2008
  • Calcia (CaO) stabilized cubic-$HfO_2$ is studied by density functional theory (DFT) with generalized gradient approximation (GGA). When a Ca atom is substituted for a Hf atom, an oxygen vacancy is produced to satisfy the charge neutrality. The lattice parameter of a $2{\times}2{\times}2$ cubic $HfO_2$ supercell then increases by $0.02\;{\AA}$. The oxygen atoms closest to the oxygen vacancy are attracted to the vacancy as the vacancy is positive compared to the oxygen ion. When the oxygen vacancy is located at the site closest to the Ca atom, the total energy of $HfO_2$ reaches its minimum. The energy barriers for the migration of the oxygen vacancy were calculated. The energy barriers between the first and the second nearest sites, the second and the third nearest sites, and the third and fourth nearest sites are 0.2, 0.5, and 0.24 eV, respectively. The oxygen vacancies at the third and fourth nearest sites relative to the Ca atom represent the oxygen vacancies in undoped $HfO_2$. Therefore, the energy barrier for oxygen migration in the $HfO_2$ gate dielectric is 0.24 eV, which can explain the origin of gate dielectric leakage.

High Performance Liquid Chromatographic Analysis of a New Proton Pump Inhibitor KR60436 and Its Active Metabolite O-Demethyl-KR60436 in Rat Plasma Samples Using Column-Switching

  • Lee, Hyun-Mee;Lee, Hee-Yong;Choi, Joong-Kwon;Lee, Hye-Suk
    • Archives of Pharmacal Research
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    • v.24 no.3
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    • pp.207-210
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    • 2001
  • A fully automated high performance liquid chromatography with column-switching was developed for the simultaneous determination of KR60436, a new reversible proton pump inhibitor, and its active metabolite O-Demethyl-KR60436 from rat plasma samples. Plasma sample (50$\mu$l) was directly introduced onto a Capcell Pak MF Ph-1 column ($10{\times}4$ mm I.D.) where primary separation was occurred to remove proteins and concentrate target Substances Using acetonitrile-Potassium Phosphate (PH 7, 0.1 M) (2 : 8, v/v). The drug molecules eluted from MF Ph-1 column were focused in an intermediate column ($10{\times}2$ I.D.) by the valve switching step. The substances enriched in intermediate column were eluted and separated on a Vydac 218MR53 column ($250{\times}3.2$ I.D.) using acetonitrilepotassium phosphate (pH 7, 0.02 M) (47:53, v/v) at a flow rate of 0.5 ml/min when the valve status was switched back to A position. The method showed excellent sensitivity (detection limit of 2 ng/ml) with small volume of samples ($50{\mu}$l), good precision and accuracy, and speed (total analysis time 24 min) without any loss in chromatographic efficiency. The response was linear ($r^2{\geq}0.797$) over the concentration range of 5-500 ng/ml.

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Formation of $Nb_2O_5$ Thin Films by Sol-Gel Technique and Analysis of Their Crystalline Phases and Dielectric Characteristics (졸-겔법에 의한 $Nb_2O_5$ 유전박막의 형성 및 박막의 결정상과 유전특성의 분석)

  • 조남희;강희복;이전국;김윤호
    • Journal of the Korean Ceramic Society
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    • v.30 no.1
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    • pp.17-24
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    • 1993
  • Sol-gel spin-coating technique was used to produce Nb2O5 thin films on silicon substrates from Nb(OC2H5)5 precursor. The films were heat-treated at temperatures between $600^{\circ}C$ and 100$0^{\circ}C$ in oxygen atmosphere and their crystalline phases, chemical states, and dielectric characteristics were investigated by X-ray diffractometry (XRD), Auger electron spectroscopy (AES), and C-V measurements, respectively. After 1 hour heat-treatment at 80$0^{\circ}C$, T-type Nb2O5 was formed, and its chemical composition was homogeneous with no appreciable SiO2 oxide at interfaces between the films and substrates. The films heat-treated at temperatures between $600^{\circ}C$ and 80$0^{\circ}C$ exhibit dielectric constant of less than 20 while the films heat treated at 100$0^{\circ}C$ show dielectric constant of 28.

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Characteristics and Fabrication of Complementary Electrochromic Device ( I ) (상보형 일렉트로크로믹 소자의 제조 및 특성 ( I ))

  • Lee, S.Y.;Seo, D.K.;Kim, Y.H.;Cho, T.Y.;Chun, H.G.
    • Journal of Sensor Science and Technology
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    • v.6 no.1
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    • pp.24-34
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    • 1997
  • In this study, two different types of complementary electrochromic devices using amorphous $WO_{3}$ films as a working electrode, $V_{2}O_{5}$ film and NiO film as counter electrodes respectively were investigated. For the devices using amorphous and crystalline $V_{2}O_{5}$ films of $100{\sim}150nm$ thickness with $ITO/WO_{3}/LiClO_{4}-PC/V_{2}O_{5}/ITO$ structure, an optical modulation of $50{\sim}60%$ were obtained at a potential range of $1{\sim}2V$. It has been shown that transmittance and reflectance of light could be electrically controlled by low applied voltage. For the devices with $ITO/WO_{3}/LiClO_{4}-PC/NiO/ITO$ structure in which NiO film was deposited by a RF reactive sputtering, the optical modulation in visible light region (${\lambda}=550nm$) and in near infrared light region (${\lambda}=850nm$) were 25% and 30%, respectively.

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Microstructure and Varistor Properties of ZVMND Ceramics with Sintering Temperature

  • Nahm, Choon-Woo
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.4
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    • pp.221-225
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    • 2015
  • The sintering effect on the microstructure, electrical properties, and dielectric characteristics of ZnO-V2O5-MnO2-Nb2O5-Dy2O3-based ceramics was investigated. With the increase of sintering temperature from 875 to 950℃, the density of the sintered pellets decreased from 5.57 to 5.45 g/cm3 and the average grain size increased from 4.3 to 10.9 μm. The breakdown field decreased noticeably from 6,095 to 996 V/cm with the increase of sintering temperature. The varistor ceramics sintered at 900℃ exhibited the best nonlinear properties: 39.2 in the nonlinear coefficient and 0.24 mA/cm2 in the leakage current density. The dielectric constant increased sharply from 658.6 to 2,928.8 with the increase of sintering temperature. On the whole, the dissipation factor exhibited a fluctuation with the increase of the sintering temperature, and a minimum value of 0.284 at 900℃.

Electrical and Dielectric Properties, and Accelerated Aging Characteristics of Lanthania Doped Zinc Oxide Varistors

  • Nahm, Choon-Woo
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.4
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    • pp.189-195
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    • 2006
  • The microstructure, electrical and dielectric properties, and stability against DC accelerated aging stress of the varistors, which are composed of quaternary system $ZnO-Pr_6O_{11}CoO-Cr_2O_3-based$ ceramics, were investigated for different $La_2O_3$ contents. The increase of $La_2O_3$ content led to more densified ceramics, whereas abruptly decreased the nonlinear properties by incorporating beyond 1.0mol%. The highest nonlinearity was obtained from 0.5mol% $La_2O_3$, with the nonlinear coefficient of 81.6 and the leakage current of $0.1{\mu}A$. The varistors doped with 0.5mol% $La_2O_3$ exhibited high stability, in which the variation rates of breakdown voltage, nonlinear coefficient, leakage current, dielectric constant, and dissipation factor were -1.1%, -3.7%, +100%, +1.4%, and +8.2%, respectively, for stressing state of $0.95V_{1mA}/150^{\circ}C/24h$.