• Environmental Engineering Research
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• v.24 no.3
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• pp.389-396
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• 2019

The electrical energy consumption (EEC) in removal of NO by a $UV/H_2O_2$ oxidation process was introduced and related to removal efficiency of this gas. The absorption-reaction of NO was conducted in a bubble column reactor in the presence of $SO_2$. The variation in NO removal efficiency was investigated for various process parameters including NO and $SO_2$ inlet concentrations, initial concentration of $H_2O_2$ solution and gas flow rate. EEC values were obtained in these different conditions. The removal efficiency was increased from about 22% to 54.7% when $H_2O_2$ concentration increased from 0.1 to 1.5 M, while EEC decreased by about 70%. However, further increase in $H_2O_2$ concentration, from 1.5 to 2, had no significant effect on NO absorption and EEC. An increase in NO inlet concentration, from 200 to 500 ppm, decreased its removal efficiency by about 10%. However, EEC increased from $2.9{\times}10^{-2}$ to $3.9{\times}10^{-2}kWh/m^3$. Results also revealed that the presence of $SO_2$ had negative effect on NO removal percentage and EEC values. Some experiments were conducted to investigate the effect of $H_2O_2$ solution pH. The changing of pH of oxidation-absorption medium in the ranges between 3 to 10, had positive and negative effects on removal efficiency depending on pH value.

• Journal of Environmental Science International
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• v.31 no.8
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• pp.677-689
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• 2022

In order to photocatalytically treat organic matter (COD_Cr) and chromaticity effectively, chemical coagulation and sedimentation processes were employed as a pretreatment of the leachate produced from landfill in Jeju Island. This was performed using FeCl₃·6H₂O as a coagulant. For the treated leachate, UV/TiO₂ and UV/TiO₂/H₂O₂ systems were investigated, using 4 types of UV lamps, including an ozone lamp (24 W), TiO₂ as a photocatalyst, and/or H₂O₂ as an initiator or inhibitor for photocatalytic degradation. In the chemical coagulation and sedimentation process using FeCl₃·6H₂O, optimum removal was achieved with an initial pH of 6, and a coagulant dosage of 2.0 g/L, culminating in the removal of 40% COD_Cr and 81% chromaticity. For the UV/TiO₂ system utilizing an ozone lamp and 3 g/L of TiO₂, the optimum condition was obtained at pH 5. However, the treated COD_Cr and chromaticity did not meet the emission standards (COD_Cr: 400 mg/L, chromaticity: 200 degrees) in a clean area. However, for a UV/TiO₂/H₂O₂ system using 1.54 g/L of H₂O₂ in addition to the above optimum UV/TiO₂ system, the results were 395 mg/L and 160 degrees, respectively, which were within the emission standard limits. The effect of the UV lamp on the removal of COD_Cr, and chromaticity of the leachate decreased in the order of ozone (24 W) lamp > 254 nm (24 W) lamp > ozone (14 W) lamp > 254 nm (14 W) lamp. Only COD_Cr and chromaticity treated with the ozone (24 W) lamp met the emission standards.

• Journal of the Korean Vacuum Society
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• v.9 no.2
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• pp.102-109
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• 2000

It is difficult to meet the cleanliness requirement of $10^{10}/\textrm{cm}^2$ for the giga level device fabrication with mechanical cleaning techniques like scrubbing which is widely used to remove the particles generated during Chemical Mechanical Polishing (CMP) processes. Therefore, the second cleaning process is needed to remove metallic contaminants which were not completely removed during the mechanical cleaning process. In this paper the experimental results for the removal of the metallic contaminants existing on the wafer surface using remote plasma $H_2$ cleaning and UV/$O_3$ cleaning techniques are reported. In the remote plasma $H_2$ cleaning the efficiency of contaminants removal increases with decreasing the plasma exposure time and increasing the rf-power. Also the optimum process conditions for the removal of K, Fe and Cu impurities which are easily found on the wafer surface after CMP processes are the plasma exposure time of 1min and the rf-power of 100 W. The surface roughness decreased by 30-50 % after remote plasma $H_2$ cleaning. On the other hand, the highest efficiency of K, Fe and Cu impurities removal was achieved for the UV exposure time of 30 sec. The removal mechanism of the metallic contaminants like K, Fe and Cu in the remote plasma $H_2$ and the UV/$O_3$ cleaning processes is as follows: the metal atoms are lifted off by $SiO^*$ when the $SiO^*$is evaporated after the chemical $SiO_2$ formed under the metal atoms reacts with $H^+ \; and\; e^-$ to form $SiO^*$.

• Proceedings of the Korean Nuclear Society Conference
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• 1999.05a
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• pp.320-320
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• 1999

• Journal of Korea Technical Association of The Pulp and Paper Industry
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• v.40 no.5
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• pp.53-59
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• 2008

This study was carried out to investigate the effect of photocatalysis using $TiO_2$ and UV applied for the COD reduction of wastewater in linerboard mill. Trials were done to obtain the optimum addition amounts of $TiO_2$ and $H_2O_2$ to the wastewater and find an appropriate pH condition for photocatalysis on $TiO_2$ for degrading COD. The photocatalytic reaction was applied to the wastewater collected after secondary activated sludge treatment in WWTP of linerboard mill. The optimum application of photocatalysis reaction was obtained under the addition conditions of 2 g/L of $TiO_2$ and 200 mg/L of $H_2O_2$ at pH 3.0, respectively. The removal efficiency of $SCOD_{Cr}$ by photocatalytic treatment was 86.4 % and higher than Fenton treatment in which removal efficiency was 67.4 %. It was concluded that the photocatalytic process using $TiO_2$ and UV could be applied to the wastewater treatment in linerboard mill and also to the dramatic drop-off in NBDCOD load from wastewater of tertiary treatment in WWTP.

• Analytical Science and Technology
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• v.13 no.5
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• pp.659-665
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• 2000

The changes in $UV_{254}$ and concentrations of $H_2O_2$ formed by ozonation of aqueous humic acid in ozone/high pH, peroxone process and in the presence of radical scavenger, $HCO_3{^-}$ were investigated. This study confirmed that the formation of $H_2O_2$ by ozonation may undergo different reaction pathways compared to those of $UV_{254}$ reduction in the degradation of the humic acid. The concentration of $H_2O_2$ produced by ozonation was found to be increased with decreasing pH of the sample solution due to the higher stability of ozone molecules at acidic conditions. On the while, $UV_{254}$ reduction was found to be higher at alkaline conditions or larger amount of $H_2O_2$ additions as a radical promoter in which the producing of ${\cdot}OH$, ${\cdot}HO_2$ radicals can be more favorable. From the results, it has been suggested that the formation of $H_2O_2$ by ozonation depends mainly on the direct reactions of ozone with humic acid molecules, while $UV_{254}$ reduction is affected by both the indirect reactions of the radicals and direct reactions of ozone with humic acid.

• Journal of the Korean Ceramic Society
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• v.40 no.3
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• pp.279-285
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• 2003

Ferroelectric S $r_{0.9}$B $i_{2.1}$T $a_{1.8}$N $b_{0.2}$ thin films with 200 nm thicknesses were deposited on Pt/Ti $O_2$/ $SiO_2$/Si Substrates by a sol-gel method. In these experiments, Sr(O $C_2$ $H_{5}$)$_2$, Bi(TMHD)$_3$, Ta(O $C_2$ $H_{5}$)$_{5}$ and Nb(O $C_2$ $H_{5}$)$_{5}$ were used as precursors, which were dissolved in 2-methoxyethanol. After UV-irradiation and RTA processes, the remanent polarization value (2 $P_{r}$) of SBTN thin films with annealed at $650^{\circ}C$ was 8.49 and 11.94 $\mu$C/$\textrm{cm}^2$ at 3 V and 5 V, respectively.

• Journal of Korean Society of Water and Wastewater
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• v.33 no.6
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• pp.469-480
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• 2019

This study was conducted to evaluate the degradation and mineralization of PPCPs (Pharmaceuticals and Personal Care Products) using a CBD(Collimated Beam Device) of UV/H₂O₂ advanced oxidation process. The decomposition rate of each substance was regarded as the first reaction rate to the ultraviolet irradiation dose. The decomposition rate constants for PPCPs were determined by the concentration of hydrogen peroxide and ultraviolet irradiation intensity. If the decomposition rate constant is large, the PPCPs concentration decreases rapidly. According to the decomposition rate constant, chlortetracycline and sulfamethoxazole are expected to be sufficiently removed by UV irradiation only without the addition of hydrogen peroxide. In the case of carbamazepine, however, very high UV dose was required in the absence of hydrogen peroxide. Other PPCPs required an appropriate concentration of hydrogen peroxide and ultraviolet irradiation intensity. The UV dose required to remove 90% of each PPCPs using the degradation rate constant can be calculated according to the concentration of hydrogen peroxide in each sample. Using this reaction rate, the optimum UV dose and hydrogen peroxide concentration for achieving the target removal rate can be obtained by the target PPCPs and water properties. It can be a necessary data to establish design and operating conditions such as UV lamp type, quantity and hydrogen peroxide concentration depending on the residence time for the most economical operation.

• Journal of Korean Society on Water Environment
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• v.35 no.6
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• pp.459-469
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• 2019

The ozonation of sulfamethoxazole (SMX) was performed at 20℃ using a pilot scale countercurrent bubble column reactor. Ozonation systems were combined with UV irradiation and TiO₂ addition. As the oxidation reaction proceeded in each treatment system, the pH of the sample decreased and in the O₃/UV/TiO₂ system, the pH change was the largest from 4.54 to 2.02. Under these experimental conditions, the scavenger impact of carbonate is negligible. The highest COD and TOC removal rate was observed in the O₃/UV/TiO₂ system due to the UV irradiation and the photocatalytic effect of TiO₂. Also, the highest mineralization ratio(ε) value is 0.2 in the O₃/UV/TiO₂ system, which means theoxidation capacity of the systems. The highest SMX degradation rate constants calculated by COD and TOC values (COD and TOC) were 2.15 × 10^-4 sec^-1 and 1.00 × 10^-4 sec^-1 in the O₃/UV/TiO₂ system, respectively. The activation energy (E_a) of ozone treatment follows the Arrhenius law. It was calculated based on _COD and _TOC. Each activation energy decreased in order of single O₃> O₃/TiO₂> O₃/UV > O₃/UV/TiO₂ system. The result showed that ΔH^≠ is more effective than ΔS^≠ in each SMX ozontaionsystem, that is characteristic of the common oxidation reaction.

• Journal of Korean Society of Environmental Engineers
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• v.39 no.5
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• pp.246-254
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• 2017

Microcystin-LR (MC-LR) is one of most abundant microcystins, and is derived from blue-green algae bloom. Advanced oxidation processes (AOPs) are effective process when high concentrations of MC-LR are released into a drinking water treatment system from surface water. In particular, UV-based AOPs such as UV, $UV/H_2O_2$, $UV/O_3$ and $UV/TiO_2$ have been studied for the removal of MC-LR. In this study, UV-LED was applied for the degradation of MC-LR because UV lamps have demonstrated some weaknesses, such as frequent replacements; that generate mercury waste and high heat loss. Degradation efficiencies of the MC-LR (initial conc. = $100{\mu}g/L$) were 30% and 95.9% using LED-L (280 nm, $0.024mW/cm^2$) and LED-H (280 nm, $2.18mW/cm^2$), respectively. Aromatic compounds of natural organic matter changed to aliphatic compounds under the LED-H irradiation by LC-OCD analysis. For application to raw water, the Nak-dong River was sampled during summer when blue-green algae were heavy bloom in 2016. The concentration of extracellular and total MC-LR, geosmin and 2-MIB slightly decreased by increasing the LED-L irradiation; however, the removal of MC-LR by UV-LED (${\lambda}=280nm$) was insufficient. Thus, advanced UV-LED technology or the addition of oxidants with UV-LED is required to obtain better degradation efficiency of MC-LR.