• Title/Summary/Keyword: $TiO_2-SiO_2$

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Structural and Dielectric Properties of the (Ba,Sr)$TiO_3$Thin Films Prepared by Sol-Gel Method (Sol-Gel법으로 제조한 (Ba,Sr)$TiO_3$ 박막의 구조 및 유전특성)

  • 이문기;정장호;이성갑;이영희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.9
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    • pp.711-717
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    • 1998
  • BST(70/30) and BST(50/50) thin films were prepared by Sol-Gel method and studied about the microstructural and dielectric properties with Pt and ITO bottom electrodes. The stock solution was synthesized and spin coated on the Pt/Ti$SiO_2$/Si and Indium Tin Oxide(ITO)/ glass substrate. the coated films were dries at 350$^{\circ}C$ for 10 minutes and annealed at $750^{\circ}C$ for 1 hour for the crystallization. The thin films coated on ITO substrate were crystallized easily and the packing density and roughness of surface were better that those of films coated on Pt substrates. In the BST(50/50) composition the structural properties were similar to the BST(70/30) composition and grain size were decreased with increasing the contents of Sr. The dielectric constant was higher in the BST(50/50) composition compared with the BST(70/30) composition. Using the ITO substrate, the dielectric constant was higher than the Pt substrate while the dielectric loss was showed a reverse trend. The dielectric constant with and increase of temperature was decreased slowly.

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Synthesis and Characterization of Langastie-type Materials

  • An, Jin-Ho;Yoon, Won-Ki;Kynug Joo;Auh, Keun-Ho
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.06a
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    • pp.115-119
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    • 1998
  • Possibilities of substitution was investigated in the Langadite({{{{ {La }_{3 } {Ga }_{ 5}{SiO }_{14 }}}}}) system.{{{{{TiO}_{2 }}}}} was substitutes for{{{{{SiO}_{2 }}}}} followed by the substitution of{{{{{Nd}_{2 }{O}_{3}}}}}fo{{{{{La}_{2 }{O}_{3}}}}}. An effort to replace GeO2, which is reported to have been substitution for{{{{{SiO}_{2 }}}}} in the Langasit e system, for{{{{{TiO}_{2 }}}}} i n{{{{{ Nd}_{ 3} {Ga }_{5 } {TiO }_{14 } }}}} was also undertaken. In another experiment,{{{{{ Y}_{ 2}{ O}_{3 } }}}} was substituted for{{{{{ La}_{2 } {O }_{ 3} }}}}. All of substitution possibilities were investigated through solid state reactions and analyzed with XRD. Further analysis was carried out with an SEM. Lastly, the dielectric constants of the sintered body were measured.

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The structural properties of the (Bi,Ba,Sr)$TiO_3$[BBST] thin films with Ar/$O_2$ rates (Ar/$O_2$비에 따른 (Bi,Ba,Sr)$TiO_3$[BBST] 박막의 구조적 특성)

  • Kim, Jung-Tae;Lee, Sang-Chul;Lee, Sung-Gap;Bae, Seon-Ki;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.1488-1490
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    • 2002
  • The (Bi,Ba,Sr)$TiO_3$[BBST] thin films were fabricated on Pt/Ti/$SiO_2$/Si substrate by RF sputtering method. We investigated the effects of Ar/$O_2$ rates on the structural properties of BBST thin films. Decreasing the $O_2$ rates, the intensity of $BaBi_4Ti_4O_{15}$ and $Bi_4Ti_3O_{12}$ peaks were increased but the $(Ba_{0.5}Sr_{0.5})TiO_3$ peak was decreased. In the case of BBST thin films deposited with condition of 90/10 (Ar/$O_2$) ratio, the composition of Ba/Sr/Bi was 0.35/0.4/0.25. Also, in the BBST thin films deposited with condition of 80/20(Ar/$O_2$) ratio, the composition of Br,Sr and Ti were relatively uniform. But the component of Bi and Ti were diffused into the Pt layers.

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Fabrication of $La_2Ti_2O_{7}$ Film by Metalorganic Deposition (금속유기물증착법에 의한 $La_2Ti_2O_{7}$ 박막의 제조)

  • 조경호;우동찬;박철우;이희영;남효덕
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.122-125
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    • 1995
  • Using metalorganic deposition technique, $La_2Ti_2O_{7}$ precursor solution was deposited on platinium coated SiO$_2$/SI(100) substrates by spin-coating process. Crystalline and crack-free films of ∼0.2$\mu\textrm{m}$ thickness were successfully fabricated on the above substrate from four different types of $La_2Ti_2O_{7}$ precursor solutions by proper heat treatment in the temperature range of $700^{\circ}C$$1200^{\circ}C$. Microstructure and X-ray diffraction analysis of $La_2Ti_2O_{7}$ thin film showed that the crystallization temperature and the preferred orientation of $La_2Ti_2O_{7}$ thin film were strongly dependent on the precursor used.

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Preparation and Electrical Properties of TiO2 Films Prepared by Sputtering for a Pulse Power Capacitor (스퍼터링에 의한 펄스파워 캐패시터용 TiO2 박막의 제조 및 전기적특성)

  • Park, Sang-Shik
    • Journal of the Korean Ceramic Society
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    • v.49 no.6
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    • pp.642-647
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    • 2012
  • $TiO_2$ thin films for a pulse power capacitor were deposited by RF magnetron sputtering. The effects of the deposition gas ratio and thickness on the crystallization and electrical properties of the $TiO_2$ films were investigated. The crystal structure of $TiO_2$ films deposited on Si substrates at room temperature changed to the anatase from the rutile phase with an increase in the oxygen partial pressure. Also, the crystallinity of the $TiO_2$ films was enhanced with an increase in the thickness of the films. However, $TiO_2$ films deposited on a PET substrate showed an amorphous structure, unlike those deposited on a Si substrate. An X-ray photoelectron spectroscopy(XPS) analysis revealed the formation of chemically stable $TiO_2$ films. The dielectric constant of the $TiO_2$ films as a function of the frequency was significantly changed with the thickness of the films. The films showed a dielectric constant of 100~110 at 1 kHz. However, the dissipation factors of the films were relatively high. Films with a thickness of about 1000nm showed a breakdown strength that exceeded 1000 kV/cm.

A Study on the Effect of the Additive the Enstatite Body (Enstatite 소지에 미치는 첨가제의 영향)

  • 이은상;오장섭
    • Journal of the Korean Ceramic Society
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    • v.21 no.2
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    • pp.105-112
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    • 1984
  • The Effect of Dditives $ZrO_2$ and $TiO_2$ on the enstatite body the composition of which was MgO.$SiO_2$ has been closely investigated on the physical properties and microstructure. $ZrO_2$ and $TiO_2$ as additives were added by weight 5, 10, 15, 20, 25% and 1, 2, 2.5, 5, 10, 20% respectively to the mixture (MgO : SiO2=1:1) and fired at the temperature ranging from 130$0^{\circ}C$ to 145$0^{\circ}C$ and 1275$^{\circ}C$ to 1375$^{\circ}C$. Increasing the add ition or $ZrO_2$ to 20% the physical property became better. In case of $TiO_2$ the sample containing 20% $TiO_2$ had a best effect on the enstastite body. The optimum firing range proved to 14$25^{\circ}C$ for $ZrO_2$ and 1325~135$0^{\circ}C$ for $TiO_2$. The effect of $ZrO_2$ and $TiO_2$ addition on the thermal expansion was observed not ot be remarkable.

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The Effect of Nucleating Agent on Zn2SiO4 Crystal Glaze (Zn2SiO4 결정유약에 미치는 핵 형성제의 영향)

  • Lee, Hyun-Soo
    • Journal of the Korean Ceramic Society
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    • v.50 no.2
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    • pp.116-121
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    • 2013
  • Zinc crystal glaze has its limits in practical use of commercial glaze due to the controlling crystal. In order to overcome this limit, and to heighten the practical usage, this study is aimed to develop artificially controlling willemite ($Zn_2SiO_4$) zinc crystalline glaze. For this purpose, it has experimented with the effect of anatase form and rutile form using $TiO_2$ known as nucleating agent. In zinc glaze, adding $TiO_2$ resulted with anatase form becoming more effective at nucleating formation and growth of willemite than the rutile form. Furthermore, it turned out that using the $TiO_2$ - anatase form, with synthetic seeds (zinc silicate), the numbers and positions of crystals can be controlled artificially.

Atomic Layer Deposition of Silicon Oxide Thin Film on $TiO_2$ nanopowders (원자층증착법에 의한 $TiO_2$ 나노파우더 표면의 실리콘 산화물 박막 증착)

  • Kim, Hee-Gyu;Kim, Hyung-Jong;Kang, In-Gu;Kim, Doe-Hyoung;Choi, Byung-Ho;Jung, Sang-Jin;Kim, Min-Wan
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.11a
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    • pp.381-381
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    • 2009
  • 염료감응형 태양전지의 효율 향상을 위한 다양한 방법들 중 $TiO_2$ 나노 파우더의 표면 개질 및 페이스트의 분산성 향상을 위한 연구가 활발하게 진행되고 있다. 기존 나노 파우더의 표면 개질법으로는 액상 공정인 졸겔법이 있으나 표면 처리 공정에서의 응집현상은 아직 해결해야 할 과제 중 하나이다. 이에 본 연구에서는 진공증착방법인 ALD법을 이용하여 염료감응형 태양전지용 $TiO_2$ 나노 파우더의 $SiO_2$ 산화물 표면처리를 통한 분산특성을 파악하였다. 기존 ALD법의 경우 reactor의 온도가 $300{\sim}500^{\circ}C$ 정도의 고온에서 공정이 이루어졌지만 본 실험에서는 2차 아민계촉매(pyridine)을 사용하여 reactor의 온도를 $30^{\circ}C$정도의 저온공정에서 $SiO_2$ 산화물을 코팅을 하였다. MO source로는 액체상태의 TEOS$(Si(OC_2H_5)_4)$를, 반응가스로는 $H_2O$를 사용하였고, 불활성 기체인 Ar 가스는 purge 가스로 각각 사용 하였다. ALD 공정에 의해 표면처리 된 $TiO_2$ 나노 파우더의 분산특성은 각 공정 cycle에 따라 FESEM을 통하여 입자의 형상 및 분산성을 확인하였으며 입도 분석기를 통하여 부피의 변화 및 분산 특성을 확인하였다. 공정 cycle 이 증가함에 따라 입자간의 응집현상이 개선되는 것을 확인 할 수 있었으며, 100cycles에서 응집현상이 가장 많이 감소하는 것을 확인할 수 있었다. 또한 표면 처리된 $SiO_2$ 산화막은 XRD를 통한 결정 분석 및 EDX를 통한 정성 분석을 통하여 확인하였다.

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Synthesis of NiO and TiO2 Combined SiC Matrix Nanocomposite and Its Photocatalytic MB Degradation

  • Zambaga, Otgonbayar;Jun Hyeok, Choi;Jo Eun, Kim;Byung Jin, Park;Won-Chun, Oh
    • Korean Journal of Materials Research
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    • v.32 no.11
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    • pp.458-465
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    • 2022
  • Interest in the use of semiconductor-based photocatalyst materials for the degradation of organic pollutants in a liquid phase has grown, due to their excellent performance and response to the light source. Herein, we fabricated a NiO-SiC-TiO2 ternary structured photocatalyst which had reduced bandgap energy, with strong activation under UV-light irradiation. The synthesized samples were examined using XRD, SEM, EDX, TEM, DRS, EIS techniques and photocurrent measurement. The results confirmed that the two types of metal oxides were well bonded to the SiC fiber surface. The junction of the new photocatalyst exhibited a large number of photoexcited electrons and holes. The holes tended to oxidize the water and form a hydroxyl radical, which promoted the decomposition of methylene blue. The close contact between the 2D SiC fiber and metal oxide semiconductors expanded the scope of absorption wavelength, and enhanced the usability of the ternary photocatalyst for the degradation of methylene blue. Among three synthesized samples, the NiO-SiC-TiO2 showed the best photocatalytic effect, and was considered to have excellent photoelectron transfer due to the synergy effect between the metal oxide and SiC.