• 한국재료학회지
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• 제17권11호
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• pp.593-600
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• 2007

Aluminum was anodized in a $H_2SO_4$ solution, and titanium (IV) oxide ($TiO_2$) was electrodeposited into nanopores of anodic porous alumina in a mixed solution of $TiOSO_4$ and $(COOH)_2$. The photocatalytic activity of the prepared film was analyzed for photodegradation of methylene blue aqueous solution. Consequently, we found it was possible to electrodeposit $TiO_2$ onto anodic porous alumina, and synthesized it into the nanopores by hydrolysis of a titanium complex ion under AC 8-9 V when film thickness was about $15-20{\mu}m$. The photocatalytic activity of $TiO_2$-loaded anodic porous alumina ($TiO_2/Al_2O_3$) at an impressed voltage of 9 V was the highest in every condition, being about 12 times as high as sol-gel $TiO_2$ on anodic porous alumina. The results revealed that anodic porous alumina is effective as a substrate for photocatalytic film and that high-activity $TiO_2$ film can be prepared at low cost.

• Bulletin of the Korean Chemical Society
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• 제32권9호
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• pp.3317-3322
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• 2011

This study examines the photoelectric conversion efficiency of dye-sensitized solar cells (DSSCs) when nanometer-sized Zr (0.1, 0.5, and 1.0 mol %)-$TiO_2$ prepared using a solvothermal method is utilized as the working electrode material. The particle sizes observe in the transmission electron microscopy (TEM) images are < 30 nm in all samples. The absorption band is slightly broadened at the tail for the 0.1 mol % Zr-$TiO_2$, and the intensity of the photoluminescence (PL) curves of the Zr-incorporated $TiO_2$ is significantly smaller than that of the pure $TiO_2$. Compared to that using pure $TiO_2$, the energy conversion efficiency is enhanced considerably by the application of Zr-$TiO_2$ in the DSSCs to approximately 6.17% for 0.5 mol % Zr-$TiO_2$ with the N719 dye (10.0 ${\mu}m$ film thickness and 5.0 mm ${\times}$ 5.0 mm cell area) under 100 mW/$cm^2$ of simulated sunlight.

• 한국표면공학회지
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• 제39권6호
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• pp.288-294
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• 2006

Alloys of TiAl-Mn-(0, 5, 10)wt.% $Y_2O_3$ were prepared by a powder metallurgical route, and their oxidation behavior was studied at 800, 900 and $1000^{\circ}C$ in 1 atm of air. The scale formed on the alloys consisted of $TiO_2$ and $Al_2O_3$ oxides. During oxidation, Mn tended to diffuse outward, whereas oxygen diffused inward. The dispersoids of $T_2O_3$, which segregated at the matrix grain boundaries, acted as a diffusion channel for cations and oxygen ions, nucleation sites for oxides, and vacancy annihilation sites. $T_2O_3$ increased the scale thickness, but improved the scale adherence.

• Bulletin of the Korean Chemical Society
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• 제22권12호
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• pp.1366-1370
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• 2001

Thin films of the SiO2-TiO2-PDMS composite material have been prepared by the sol-gel dip coating method. Acid catalyzed solutions of tetraethoxy silane (TEOS) and polydimethyl siloxane (PDMS) mixed with titanium isopropoxide Ti(OiPr) were used as precursors. The optical and structural properties of the organically modified 70SiO2-30TiO2 composite films have been investigated with Fourier Transform Infrared Spectroscopy (FT-IR), UV-Visible Spectroscopy (UV-Vis), Differential Thermal Analysis (DTA) and prism coupling technique. The films coated on the soda-lime-silicate glass exhibit 450-750 nm thickness, 1.56-1.68 refractive index and 88-94% transmittance depending on the experimental parameters such as amount of PDMS, thermal treatment and heating rate. The optical loss of prepared composite film was measured to be about 0.34 dB/cm.

• E2M - 전기 전자와 첨단 소재
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• 제10권6호
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• pp.570-575
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• 1997

In this days, the thinner film of dielectric materials is required while its capacitance is required to be still large at the VLSI process. Most of such VLSI have MOS structures. For the research on this requirement, MOS capacitors were fabricated on the silicon wafer in four different thickness groups by RF sputtering method. SiO of the SiO/TiN film is used as the insulating layer and TiN is chosen as the barrier against the diffusion of Al which is the terminal connected by ohmic contact because TiN has the advantageous properties such as good thermal stability and very low diffusion rate in spite of its relatively low specific resistance. In this study their electrical and optical characteristics are investigated to find refractive index, absorption coefficient and Permittivity.

• Bulletin of the Korean Chemical Society
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• 제25권4호
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• pp.475-479
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• 2004

$TiO_2$ thin films were grown on Si (100) substrates by atomic layer deposition using $[Ti(OPr^i )_2(dmae)_2]$ and water as precursors. The thickness, chemical composition, crystalline structure, and morphology of the deposited films were investigated by transmission electron microscopy, UV spectrometry, X-ray photoelectron pectroscopy, X-ray diffraction, and atomic force microscopy. The results show that $TiO_2$ ALD using $[Ti(OPr^i )_2(dmae)_2]$ as a precursor is self-controlled at temperatures of 100-300$^{\circ}C$. At the growth temperatures below 300$^{\circ}C$, the surface morphology of the $TiO_2$ films is smooth and uniform. The $TiO_2$ film was grown with a preferred orientation toward the [101] direction at 400$^{\circ}C$.

• 한국진공학회지
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• 제21권3호
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• pp.158-163
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• 2012

본 연구에서는 폴리머 애자의 자가세정 코팅을 위한 소재로써 $TiO_2$ 박막을 실리콘과 유리, 폴리머애자 기판위에 증착하였다. $TiO_2$ 박막은 $TiO_2$ 세라믹 타겟이 부착된 RF 마그네트론 스퍼터링 장치를 이용하여 증착하였다. $TiO_2$ 박막은 스퍼터링의 다양한 공정조건 중 RF 파워의 크기에 따라 100 nm의 두께로 증착하였다. RF 파워에 따라 증착되어진 $TiO_2$ 박막의 접촉각, 표면거칠기등 표면 특성을 확인하였으며, UV-visible등 광학적 특성을 고찰하여, 구조적 특성과의 관계를 고찰하였다.

• 한국자기학회지
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• 제23권1호
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• pp.7-11
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• 2013

본 연구에서는 $TiO_2$/Co/Pd 구조의 다층박막을 마그네트론 스퍼터링으로 GaAs(100), MgO(100), MgO(111), Si(100), glass와 같은 다양한 종류의 기판에 대해 제작하여 수직 자기 이방성에 대해서 연구하였다. 산소 분압 등의 $TiO_2$ 층의 증착 조건과 기판의 종류에 따른 Co/Pd 층의 수직 자기 이방성을 측정하였다. 그 결과, $TiO_2$ 층이 5 nm 이하 일 때는 기판의 종류에 영향을 받지만, 그 이상의 두께에 대해서는 MgO(111)을 제외한 기판의 영향이 크지 않음을 확인하였고, 이는 $TiO_2$ 씨앗층의 성장조건과 계면의 거칠기, 결정방향 등과 관련이 있음을 발견하였다.

• 센서학회지
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• 제7권5호
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• pp.364-371
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• 1998

Field programmable gate array (FPGA)의 전압 프로그램 요소(voltage programmable link)로써 사용될 새로운 안티퓨즈를 제조하였다. 제조된 안티퓨즈는 Al/$BaTiO_3/SiO_2$/TiW-실리사이드 구조를 갖는다. 안티퓨즈의 프로그램 전압은 $BaTiO_3$의 증착 두께를 조절함으로써 정확하게 조절할 수 있었다. $BaTiO_3(120{\AA})$/$SiO_2(120{\AA})$의 안티퓨즈에서 TiW-실리사이드 전극에 (-)극성을 인가하여 측정된 프로그램 전압은 14.4 V였으며, on-저항은 $40-50{\Omega}$의 값을 갖는다. 안티퓨즈의 전류-전압 특성은 Frenkel-Poole 전도 기구를 따르고 있으며, 그 특성은 인가 전압의 극성에 따라 차이를 보였다. 이것은 Al/$BaTiO_3$계면과 TiW-silicide/$SiO_2$계면 특성이 다르기 때문이다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.151-152
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• 2009

We coated $TiO_2$ thin films on particles by a rotating cylindrical plasma chemical vapor deposition (PCVD) process and investigated the effects of various process variables on the morphology and growth of thin films. The polypropylene (PP) particles were rotated with the cylindrical PCVD reactor and they were coated with $TiO_2$ thin films uniformly by the deposition of thin mm precursors in the gas phase. The $TiO_2$ thin films were coated on the PP particles uniformly and the thickness of thin films almost proportional to the deposition time. The $TiO_2$ thin films grew more quickly on the PP particles with increasing rotation speed of the reactor. This study shows that a rotating cylindrical PCVD reactor can be a good method to coat high-quality $TiO_2$ thin films uniformly on particles.