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http://dx.doi.org/10.5757/JKVS.2012.21.3.158

Characteristics of Sputtered TiO2 Thin Films for Coating of Polymer Insulator  

Park, Y.S. (Department of Photoelectronics Information, Chosun College of Science & Technology)
Jung, H.S. (Korea Railroad Research Institute)
Park, C.M. (Korea Railroad Research Institute)
Park, Y. (Korea Railroad Research Institute)
Kim, H.C. (Korea Railroad Research Institute)
Publication Information
Journal of the Korean Vacuum Society / v.21, no.3, 2012 , pp. 158-163 More about this Journal
Abstract
In this work, we have fabricated the $TiO_2$ thin films on Si and glass, polymer insulator substrates as the self-cleaning coating of polymer insulator. $TiO_2$ films were deposited by RF magnetron sputtering method with $TiO_2$ ceramic target and $TiO_2$ films of 100 nm thickness were fabricated with various RF powers. We have investigated the optical and surface, and structural properties of $TiO_2$ films prepared with various RF powers. As a result, the value of the contact angle of $TiO_2$ thin film is increased with increasing RF power and the value of the rms surface roughness is increased. The transmittance is decreased with increasing RF power. These results indicate that the variation of the surface and optical properties of $TiO_2$ thin films is related to the sputtering effects by increasing RF power.
Keywords
$TiO_2$; RF magnetron sputtering; Polymer insulator; Contact angle; Surface roughness;
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Times Cited By KSCI : 2  (Citation Analysis)
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