• 한국표면공학회:학술대회논문집
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• 한국표면공학회 1998년도 추계학술발표회 초록집
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• pp.73-74
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• 1998

• 대한화학회지
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• 제41권5호
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• pp.223-233
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• 1997

초고진공조에서 산소 분압, $1{\times}10^{-6}$ Torr, 하에서 Ti 금속을 Mo(100)에 증발시킴으로써 $TiO_2$ 초박막을 성장시켰다. Ti 금속을 Mo(100) 표면에 증착시킨 시간에 따른 오재(Auger) 봉우리의 크기 변화율을 조사함으로써 Ti 금속의 증발 속도를 알아내고, 그것을 이용하여 $TiO_2$ 박막 성장시 박막의 두께를 조절하였다. 30 ML, 5 ML, 1.6 ML 두께의 $TiO_2$ 박막을 만들어 박막의 성장메카니즘, 박막의 화학적 조성, 박막의 표면 구조를 연구하였다. 박막의 성장 메커니즘은 층별 성장에 가까운 성장 방식인 것으로 설명할 수 있다. 박막의 화학적 조성은 본체 $TiO_2$ 와 동일하였다. 박막의 표면은 (001) 평면이며, 고온 1200 K에서 비가역적으로 부면화(faceging)한다. 박막으로부터 관찰된 저에너지 전자회절 무늬는 $TiO_2$ (001) 표면이 {011} 평면을 가진 부면을 형성하고 각 부면이 다시 $TiO_2$ (001) 평면에 대하여 $(2\sqrt2{\times}\sqrt2)R45^{\circ}$로 재건축한다는 것으로 설명될 수 있다. 박막은 1300 K의 고온에서 얼마간 열적 불안정성을 보인다. $Ar^+$ 이온으로 스퍼터링한 $TiO_2$ 박막에 대하여 XPS를 이용하여 역시 알아보았다.

• 한국결정성장학회지
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• 제19권1호
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• pp.25-32
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• 2009

화력발전소로부터 발생된 석탄 바닥재(coal bottom ash)에 융제로 $Na_{2}O$ 및 $Li_{2}O$를, 핵 형성제로 $TiO_2$를 첨가하여 결정화유리를 제조한 뒤 그 미세구조를 분석하였다. 시편내 주결정상은 nepheline이었고, $TiO_2$가 첨가됨에 따라 nepheline 결정상 분율이 증가되었다. $TiO_2$가 첨가되지 않은 시편은 표면 결정화 기구에 수지(dendrite) 형태의 결정상이 성장되었으며, 내부 모상에는 결정이 거의 생성되지 않았다. 그러나 $TiO_2$ 첨가량이 4% 이상으로 증가되면, 표면결정화 기구는 억제되어 표면결정층의 두께가 얇아졌고 내부 모상은 결정질로 전이되었으며 동시에 $1{\mu}m$ 이하 크기의 미립자도 함께 생성되었다. 특히 6%의 $TiO_2$가 첨가된 결정화유리 내부에는 길이가 $5{\mu}m$인 수지상 결정들이 서로 얽혀진 형태를 보였으며, 이러한 미세구조는 외부로부터 하중을 가해졌을 때 발생되는 균열의 전파를 효과적으로 억제할 수 있을 것으로 예상된다.

• 한국표면공학회지
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• 제43권4호
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• pp.180-186
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• 2010

$TiO_2$ nanotubes were formed on Ti by anodizing in 1 M $H_3PO_4$ + 0.3 M HF and 0.1 M $NH_4F$ + 2% $H_2O$ in ethylene glycol, and their surface and cross-sectional morphologies were observed using FE-SEM as a function of anodizing time and applied voltage. The cross-section of the $TiO_2$ nanotubes was readily observed from the small pieces of nanotubes remaining near the scratch lines after scratching of the anodized surface. $TiO_2$ nanotubes was observed to grow faster and thicker in non-aqueous solution than in aqueous solution. Diameter of $TiO_2$ nanotubes was proportional to the applied voltage, irrespective of the type of the electrolyte, and it is recommended to use non-aqueous solutions for the preparation of larger diameter of $TiO_2$ nanotubes.

• 한국표면공학회지
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• 제53권4호
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• pp.153-159
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• 2020

Photocatalytic decomposition of polyethylene film with TiO₂ nanotube powders (NTs) was investigated under UV irradiation at ambient conditions. TiO₂ NTs composed of individual nanotubes are prepared by rapid breakdown anodization technique. A comparative study on the photocatalytic decomposition of polyethylene-TiO₂ composite films prepared using TiO₂ nanoparticles (NPs) or TiO₂ NTs (NTs), respectively, was conducted under UV irradiation. Polyethylene film incorporated with TiO₂ NTs showed 26 wt% weight loss after 200 h under UV irradiation about two times faster decomposition rate than TiO₂ NPs which is attributed to large surface area of TiO₂ NTs.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 춘계학술대회
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• pp.309-312
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• 2007

Sputter deposition followed by surface treatment was studied using reactive RF plasma as a method for preparing titanium oxide($TiO_{2}$) films on indium tin oxide(ITO) coated glass substrate for dye-sensitized solar cells(DSSCs). Anatase structure $TiO_{2}$ films deposited by reactive RF magnetron sputtering under the conditions of $Ar/O_{2}$(5%) mixtures, RF power of 600W and substrate temperature of $400^{\circ}C$ were surface-treated by inductive coupled plasma(ICP) with $Ar/O_{2}$ mixtures at substrate temperature of $400^{\circ}C$, and thus the films were applied to the DSSCs, The $TiO_{2}$ Films made on these exhibited the BET specific surface area of 95, the pore volume of $0.3cm^{2}$ and the TEM particle size of ${\sim}25$ nm. The DSSCs made of this $TiO_{2}$ material exhibited an energy conversion efficiency of about 2.25% at $100mW/cm^{2}$ light intensity.

• 한국세라믹학회지
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• 제26권4호
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• pp.539-549
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• 1989

Polycrystalline TiO2 thin films were deposited on Si and Al2O3 substrates by CVD method. Ethyl titanate, Ti(OC2H5)4, was used as a source material for Ti and O, and Ar was used for carrier gas. In the surface chemical reaction controlled deposition condition, the apparent activation energy of 6.74 Kcal/mole was obtained, and the atomic adsorption on substrate surface was proved to be governed by Rideal-Elley mechanism. In the mass transfer controlled deposition condition, the deposition rate was in a good agreement with the result which was calculated by the simple boundary layer theory. It was also observed that TiO2 thin films show different surface morphology according to the different deposition mechanism, which was fixed by deposition conditions. This phenomenon could be well explained by the surface perturbation theory.

• 한국세라믹학회지
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• 제24권4호
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• pp.369-375
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• 1987

The effects of dopant Al2O3 and surface roughness on the photoelectrochemical conversion of TiO2 ceramic electrodes were investigated. The photocurrent increased with increasing the amount of dopant Al2O3 up to 0.1wt% and 0.05wt% in the specimens reduced at 700$^{\circ}C$ and 800$^{\circ}C$, respectively, and then decreased. However, the photoresponse appeared around 415 nm, which very closely corresponds to the energy band gap of TiO2(∼3.0eV), regardless of reduction temperature and the amount of Al2O3. And the photocurrent increased with increasing surface roughness in the undoped TiO2 ceramic electrode.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2016년도 추계학술대회 논문집
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• pp.189-189
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• 2016

In this study, the Al-rich AlTiSiN thin films that consisted of TiN/AlSiN nano-multilayers were deposited on the steel substrate by magnetron sputtering, and their high-temperature oxidation behavior was investigated, which has not yet been adequately studied to date. Since the oxidation behavior of the films depends sensitively on the deposition method and deposition parameters which affect their crystallinity, composition, stoichiometry, thickness, surface roughness, grain size and orientation, the oxidation studies under various conditions are imperative. AlTiSiN nano-multilayer thin films were deposited on a tool steel substrate, and their oxidation behavior of was investigated between 600 and $1000^{\circ}C$ in air. Since the amount of Al which had a high affinity for oxygen was the largest in the film, an ${\alpha}-Al_2O_3-rich$ scale formed, which provided good oxidation resistance. The outer surface scale consisted of ${\alpha}-Al_2O_3$ incoporated with a small amount of Ti, Si, and Fe. Below this outer surface scale, a thin ($Al_2O_3$, $TiO_2$, $SiO_2$)-intermixed scale formed by the inwardly diffusing oxygen. The film oxidized slower than the $TiO_2-forming$ kinetics and TiN films, but faster than ${\alpha}-Al_2O_3-forming$ kinetics. During oxidation, oxygen from the atmosphere diffused inwardly toward the reaction front, whereas nitrogen and the substrate element of iron diffused outwardly to a certain extent.

• 한국분말재료학회지
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• 제27권2호
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• pp.132-138
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• 2020

A facile one-pot wet chemical process to prepare pure anatase TiO₂ hollow structures using ammonium hexafluorotitanate as a precursor is developed. By defining the formic acid ratio, we fabricate TiO₂ hollow structures containing fluorine on the surface. The TiO₂ hollow sphere is composed of an anatase phase containing fluorine by various analytical techniques. A possible formation mechanism for the obtained hollow samples by self-transformation and Ostwald ripening is proposed. The TiO₂ hollow structures containing fluorine exhibits 1.2 - 2.7 times higher performance than their counterparts in photocatalytic activity. The enhanced photocatalytic activity of the TiO₂ hollow structures is attributed to the combined effects of high crystallinity, specific surface area (62 ㎡g^-1), and the advantage of surface fluorine ions (at 8%) having strong electron-withdrawing ability of the surface ≡ Ti-F groups reduces the recombination of photogenerated electrons and holes.